Recent Progress in Photodetectors: From Materials to Structures and Applications
<p>Design and application of photodetectors [<a href="#B36-micromachines-15-01249" class="html-bibr">36</a>,<a href="#B37-micromachines-15-01249" class="html-bibr">37</a>,<a href="#B38-micromachines-15-01249" class="html-bibr">38</a>].</p> "> Figure 2
<p>Microscope photographs of the device structure and the performance of 2D single-crystalline microplate photodetectors. (<b>a</b>) Schematic diagram of the device structure. (<b>b</b>) Photodetectors based on (BA)<sub>2</sub>(MA)<sub>n−1</sub>PbnI<sub>3n+1</sub> microplate stacking on Au electrodes (images i–v correspond to <span class="html-italic">n</span> = 1–5, respectively). Scale bar: 15 μm. (<b>c</b>) Schematic diagram of hetero-/homostructure-based photodetectors. (<b>d</b>) Band alignment diagram of the (BA)<sub>2</sub>(MA)<sub>3</sub>Pb<sub>4</sub>I<sub>13</sub>/(BA)<sub>2</sub>(MA)<sub>2</sub>Pb<sub>3</sub>I<sub>10</sub> heterostructure. (<b>e</b>) Self-powered property comparison of the ITO-n<sub>4</sub>/n<sub>3</sub>-Au, ITO-n<sub>4</sub>/n<sub>4</sub>-Au, ITO-n<sub>4</sub>-Au, and Au-n<sub>4</sub>-Au PDs. Semilogarithmic I-t curves under 600 nm illumination at 0 V [<a href="#B51-micromachines-15-01249" class="html-bibr">51</a>].</p> "> Figure 3
<p>Architecture of the flexible photodetector and the characterization of the active layer. (<b>a</b>) Schematic of the device. (<b>b</b>) Schematic representations of the solution growth including the following four steps: (i) cleaving the mica, (ii) dropping the solution between the micas, (iii) heating and quasi-static solution (QSS) growth, and (iv) bending the mica substrate. (<b>c</b>) Photograph of the device. Inset: micrograph of the device, with a scale bar of 100 μm. (<b>d</b>) False-color SEM image of the device, where light yellow outlines the Au electrodes, and the scale bar is 3 μm. Inset: tilted SEM image of the edge of the perovskite nanosheet on mica [<a href="#B11-micromachines-15-01249" class="html-bibr">11</a>].</p> "> Figure 4
<p>Characterization of light-trapping capability. (<b>a</b>–<b>d</b>) Schematic structure. (<b>e</b>–<b>h</b>) Cross-sectional SEM images, blue dashed lines marks the edge of PVK films. (<b>i</b>–<b>k</b>) Absorbance spectra, reflectance spectra, and light-harvesting efficiency. (<b>l</b>–<b>o</b>) Field plots of time-averaged electromagnetic energy density with respect to the <span class="html-italic">x</span>–<span class="html-italic">z</span> plane at the wavelength of 650 nm of F-PVK, T-G-PVK, B-G-PVK, and T-B-G-PVK films. T-B-G-PVK exhibits the highest light-harvesting capability [<a href="#B56-micromachines-15-01249" class="html-bibr">56</a>].</p> "> Figure 5
<p>(<b>a</b>) Schematic illustration of the fabrication process of the bilayer MoS<sub>2</sub>, silicon nanowire, silver nanoparticle, and hybrid photodetector. (<b>b</b>) Optical image of the hybrid MoS<sub>2</sub> device. Scale bar, 100 μm. (<b>c</b>) Normalized TRPL decay of bilayer MoS<sub>2</sub> on SiNW and sapphire substrates. The exponential fits of both trends are shown with a black solid line [<a href="#B75-micromachines-15-01249" class="html-bibr">75</a>]. (<b>d</b>) An illustration of the monolayer MoS<sub>2</sub>/BTP-4F device. (<b>e</b>) The energy-level marching for the monolayer MoS<sub>2</sub> and BTP-4F film at the VDS of 5 V. (<b>f</b>) The I–V curves corresponding to the pure MoS<sub>2</sub> and MoS<sub>2</sub>/BTP-4F devices, respectively [<a href="#B76-micromachines-15-01249" class="html-bibr">76</a>].</p> "> Figure 6
<p>Fabrication and characterization of bare β-Ga<sub>2</sub>O<sub>3</sub> and GQDs/β-Ga<sub>2</sub>O<sub>3</sub> PDs. (<b>a</b>) Schematic diagram of the hybrid GQDs/β-Ga<sub>2</sub>O<sub>3</sub> PD under light illumination. (<b>b</b>) Optical microscope image of the fabricated β-Ga<sub>2</sub>O<sub>3</sub> device after annealing with the SEM image of the effective area of the β-Ga<sub>2</sub>O<sub>3</sub> flake, as shown in the inset. (<b>c</b>) AFM images of the bare β-Ga<sub>2</sub>O<sub>3</sub> device (left) and (<b>d</b>) the GQDs/β-Ga<sub>2</sub>O<sub>3</sub> device (left) with a cross-sectional height profile (right) along the white dashed line depicted in the AFM images of (<b>c</b>,<b>d</b>). The enlarged images in (<b>c</b>,<b>d</b>) reveal that the size of these GQDs is ~10.1 nm [<a href="#B82-micromachines-15-01249" class="html-bibr">82</a>]. (<b>e</b>) A 3D schematic representation of the MoS<sub>2</sub>/SnS<sub>2</sub> QDs heterojunction. (<b>f</b>) Schematic illustration of the SnS<sub>2</sub>-QDs and monolayer MoS<sub>2</sub> band structure after the formation of a heterojunction with proposed (<b>e</b>–<b>h</b>) pair separation [<a href="#B83-micromachines-15-01249" class="html-bibr">83</a>]. (<b>g</b>) A 3D scheme of the a-IGZO/PbS QDs heterojunction device. (<b>h</b>) I–V curves under dark and NIR light (@1064 m, 11.3 μW) of the a-IGZO/PbS QDs heterojunction device and the PbS QDs-EDT film-only device [<a href="#B84-micromachines-15-01249" class="html-bibr">84</a>].</p> "> Figure 7
<p>(<b>a</b>) Schematic diagram of the CuI/Si photodiode. (<b>b</b>) Time-resolved photoresponse of the device at 0 V bias under illumination with different monochromatic light wavelengths. (<b>c</b>) Current–voltage characteristics of the CuI/Si photodetector in the dark and under illumination with 365 nm light at 1000 μWcm<sup>−2</sup>. (<b>d</b>) Transient responses of the CuI/Si photodetector under various light intensities of 365 nm light at 0 V bias. (<b>e</b>) Light–power-dependent photocurrent of the photodetector under 365 nm light irradiation at 0 V bias [<a href="#B98-micromachines-15-01249" class="html-bibr">98</a>]. (<b>f</b>) Schematic diagram of a single Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>-RAN PD structure. (<b>g</b>) Photocurrent curves of devices with concentrations of 10, 7.5, and 5 mg mL<sup>−1</sup> at 915, 1064, 1122, and 1342 nm. (<b>h</b>) Plots of photocurrent changes with different optical power densities for devices with concentrations of 10, 7.5, and 5 mg mL<sup>−1</sup> at a wavelength of 1064 nm [<a href="#B99-micromachines-15-01249" class="html-bibr">99</a>].</p> "> Figure 8
<p>(<b>a</b>) Schematic illustration of the Ag NW@S-ZnO NR-based UV detector. (<b>b</b>) UV–Vis optical transmittance spectra of Ag NW@S-ZnO NR thin films with different drop-coating times. The insets are corresponding SEM images of the Ag NW@S-ZnO NRs network of PD1, PD2, and PD3. (<b>c</b>) Appearance of Ag NW@ZnO NR film on HIT-logo paper [<a href="#B100-micromachines-15-01249" class="html-bibr">100</a>]. (<b>d</b>) Schematic diagram of the Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>/Al<sub>2</sub>O<sub>3</sub>/ZnO/Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>/ITO/PET device, accompanied by digital images of it. (<b>e</b>) Transmittance profiles of the ZnO-based flexible photodetector with and without Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>. (<b>f</b>) Cross-section TEM image of the Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>/Al<sub>2</sub>O<sub>3</sub>/ZnO/Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub>/ITO/PET device, along with elemental mapping profiles of Ti, Al, Zn, In, and O [<a href="#B101-micromachines-15-01249" class="html-bibr">101</a>].</p> "> Figure 9
<p>(<b>a</b>) Schematic diagram of the CsI:Na scintillator with a PhC cavity (TiO<sub>2</sub> + porous SiO<sub>2</sub>). The TiO<sub>2</sub>/SiO<sub>2</sub> PhCs have been shown to be feasible in previous work. Here, we replace the SiO<sub>2</sub> film with a porous SiO<sub>2</sub> material so as to achieve a low refractive index (1.06) for the SiO<sub>2</sub> layer. The porous SiO<sub>2</sub> material can be realized by random SiO<sub>2</sub> nanorod arrangement. (<b>b</b>) Photodetector signal enhancement vs. period and filling factor of the photonic crystal. (<b>c</b>) Spectral density of photons (ph) and photoelectrons (phe) with optimized configuration of the PhC cavity (TiO<sub>2</sub> + porous SiO<sub>2</sub>). The emission spectrum is shifted to a longer wavelength to match the quantum efficiency spectrum of the photodetector [<a href="#B107-micromachines-15-01249" class="html-bibr">107</a>]. (<b>d</b>) The pulse photoresponse of the photodetector for red light with varying intensity at non-biased and self-biased conditions. (<b>e</b>) Different bias voltages at a 30 mW/cm<sup>2</sup> intensity [<a href="#B108-micromachines-15-01249" class="html-bibr">108</a>].</p> "> Figure 10
<p>(<b>a</b>) Chemical structures of PM6 and Y6. (<b>b</b>) Finger photoplethysmography setup. (<b>c</b>) Direct current read-out of the PPG device using 950 and 630 nm LEDs [<a href="#B36-micromachines-15-01249" class="html-bibr">36</a>]. (<b>d</b>) Photograph of a typical flexible photodetector based on 1D arrays bent at a bending radius of 10 mm, with the inset presenting the schematic illustration of the device. (<b>e</b>) Scheme of the flexible photodetectors monitoring the UV photodetection signals. (<b>f</b>) Typical I-V curves of the polymer array-based photodetectors under the dark condition and under different UV light illuminations, obtained from the attached flexible photodetector device on the back skin of the mouse. Inset: photograph of the flexible device attached closely to the back skin of a nude mouse [<a href="#B114-micromachines-15-01249" class="html-bibr">114</a>].</p> "> Figure 11
<p>(<b>a</b>) The schematic representation of the device under humid conditions shows the formation of physisorbed layers and dipoles on the basal planes of SnSe, and a schematic representation of a freshly prepared pristine Au/Ti/SnSe/Ti/Au device after air exposure and under white light illumination [<a href="#B120-micromachines-15-01249" class="html-bibr">120</a>]. (<b>b</b>) Structural schematic of a Sb<sub>2</sub>O<sub>3</sub>/PdTe<sub>2</sub>/Si heterojunction photodetector and a self-powered photoresponse mechanism of Sb<sub>2</sub>O<sub>3</sub>/PdTe<sub>2</sub>/Si heterojunction photodetectors [<a href="#B37-micromachines-15-01249" class="html-bibr">37</a>].</p> "> Figure 12
<p>(<b>a</b>) Schematic diagram of the Pd-Hf-contacted CNT photodetector under illumination and a false-colored SEM image showing the channel of an as-fabricated CNT photodetector with Lch = 200 nm and total Wch = 200 μm. Relative response as a function of the modulation frequency of the input signal for the CNT photodetector. The extracted 3 dB bandwidth is 40 GHz at V = −0.2 V [<a href="#B131-micromachines-15-01249" class="html-bibr">131</a>]. (<b>b</b>) A 3D cross-section representation of the heterogeneous InSe/SiN photodetector and electric-field profiles (|E|<sup>2</sup>) of TE modes of an unloaded SiN waveguide and 90 nm InSe on SiN at 976 nm (top panel). Normalized frequency response at 10 V. A total of 50 measurements (blue-scattered points) and average (red line) data are plotted. A 3 dB cut-off frequency of 85 MHz is measured [<a href="#B130-micromachines-15-01249" class="html-bibr">130</a>].</p> ">
Abstract
:1. Introduction
2. Synthesis of Emerging Photodetecting Materials
2.1. Perovskite-Based Photodetectors
2.2. Two-Dimensional (2D) Materials
2.3. Quantum Dots in Photodetectors
3. Novel Photodetector Structures and Performance
3.1. Flexible and Transparent Photodetectors
3.2. Photonic Crystal and Nanostructured Photodetectors
4. Emerging Applications of Photodetectors
4.1. Healthcare and Biometric Sensors
4.2. Environmental and Atmospheric Sensing
4.3. Information Processing
5. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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Ma, T.; Xue, N.; Muhammad, A.; Fang, G.; Yan, J.; Chen, R.; Sun, J.; Sun, X. Recent Progress in Photodetectors: From Materials to Structures and Applications. Micromachines 2024, 15, 1249. https://doi.org/10.3390/mi15101249
Ma T, Xue N, Muhammad A, Fang G, Yan J, Chen R, Sun J, Sun X. Recent Progress in Photodetectors: From Materials to Structures and Applications. Micromachines. 2024; 15(10):1249. https://doi.org/10.3390/mi15101249
Chicago/Turabian StyleMa, Tianjun, Ning Xue, Abdul Muhammad, Gang Fang, Jinyao Yan, Rongkun Chen, Jianhai Sun, and Xuguang Sun. 2024. "Recent Progress in Photodetectors: From Materials to Structures and Applications" Micromachines 15, no. 10: 1249. https://doi.org/10.3390/mi15101249