Mask industry assessment: 2009

29 September 2009 Mask industry assessment: 2009

Greg Hughes, Henry Yun

Proceedings Volume 7488, Photomask Technology 2009; 748803 (2009) https://doi.org/10.1117/12.832722
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by David Powell Consulting to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the eighth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 through 2008 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry. This in combination with the past surveys represents a comprehensive view of changes in the industry.

Citation Download Citation

Greg Hughes and Henry Yun "Mask industry assessment: 2009", Proc. SPIE 7488, Photomask Technology 2009, 748803 (29 September 2009); https://doi.org/10.1117/12.832722

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