"Side and Corner Region Non-Uniformities in Grown SiO2 and Their ..."

J. P. Bastos et al. (2024)

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DOI: 10.1109/IRPS48228.2024.10529495

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-29

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J. P. Bastos, Barry J. O'Sullivan, Yusuke Higashi, Adrian Vaisman Chasin, Jacopo Franco, Hiroaki Arimura, J. Ganguly, Elena Capogreco, Alessio Spessot, N. Horiguchi:
Side and Corner Region Non-Uniformities in Grown SiO2 and Their Implications on Current, Capacitance and Breakdown Characteristics. IRPS 2024: 36

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