Sample preparation
Standard preparation methods
for materialographic analysis
Practical experience ATM-Lab
2 Table of Contents
1. General Information
Grit conversion chart,
Pressure parameters and specimen size .......................................... 3
Explanation of symbols ........................................................................ 4
2. Preparation methods
Aluminum and wrought aluminum alloy ........................................... 5
Aluminum alloy ...................................................................................... 6
Carbon/glass fiber reinforced composites (CFC/GFC) ................... 7
Cast iron (GJS/GJL) ............................................................................... 8
Soft to medium-hard steel (5-35 HRC/350HV) ............................. 9
Medium-hard to hard steel (30-65 HRC/850HV) ............................ 10
Stainless steel (austenitic/ferritic) ..................................................... 11
Steel and welded steel (macro) .......................................................... 12
Nitrided steel .......................................................................................... 13
Ceramics .................................................................................................. 14
Cobalt based alloy ................................................................................. 15
Nickel based alloy .................................................................................. 16
Spray coatings (metallic) ..................................................................... 17
Magnesium .............................................................................................. 18
Printed circuit board (non assembled) .............................................. 19
Printed circuit board (assembled) ...................................................... 20
Copper and copper alloy ...................................................................... 21
Titanium (commercial pure: grade 1-4) ........................................... 22
Titanium alloys........................................................................................ 23
NOTES:
The preparation methods can be applied for proper sectioned and burred specimens. Parameters like
pressure (given as force in newton) are referred to single pressure and depend on specimen size.
For specimens ≠ 40mm these values have to be adjusted with the help of table „Pressure parameters
and specimen size”.
Instead of the Dia Complete diamond suspensions common diamond suspensions in combination with
lubricants (water or alcohol based) can be used. Mind right dosage!
The velocity of the sample holder is 100 rpm and can vary depending on the specific material.
Due to the diversity of materials and examination aims the provided standard preparation methods
might not cover all applications. In this case contact our application lab; our team will support you
with customized preparation methods.
lab@atm-m.com
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General Information 3
Grit conversion chart
FEPA (P) grain size [µm] ANSI/CAMI grain size [µm]
60 269 60 268
80 201 80 188
100 162 100 148
120 127 120 116
180 787 180 78
240 58.5 220 66
280 52.2 240 51.8
320 46.2
360 40.5 280 42.3
400 35 320 34.3
500 30.2 360 27.3
600 25.8 400 22.1
800 21.8
1000 18.3 500 18.2
1200 15.3 600 14.5
1500 12.6 800 12.2
2000 10.3 1000 9.2
2500 8.4 1200 6.5
4000 5
Reference:
Analytical Characterization of Aluminum, Steel and Superalloys
D. Scott MacKenzie, George E. Totten
October 10, 2005 by CRC Press
ISBN: 9780824758431
Pressure parameters and specimen size
Specimen diameter [mm] 25 30 40 50 60
Divergence in pressure - (5N…10N) - 5N 0 + 5N + (5N…10N)
used in the preparation methods
NOTES:
The preparation methods can be applied for proper sectioned and burred specimen. Parameters like pressure
(given as force in newton) are referred to single pressure and depend on specimen size. For specimens ≠ 40mm
these values have to be adjusted.
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4 Explanation of Symbols
EXPLANATION OF SYMBOLS
Symbol Meaning Symbol Meaning
Cutting Single pressure
Mounting Speed grinding disc
Grinding / Polishing Speed sample holder
Grinding / Polishing ►► Sample holder clockwise
Etching ◄► Sample holder anti-clockwise
Pre-polishing Time
Polishing / diamond Dosing lubricant
Final polishing Lubricant waterbased
Lubricant alcohol based
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Preparation Method 5
MATERIAL Aluminum (≥99,7%) and wrought aluminum alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Bakelite red/black Hot mounting
KEM 20, KEM 30 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil** H2O 250-300 ►► 20 Until plane
grinding P320 (280)
Grinding SiC-paper/foil** H2O 250-300 ►► 20 1:00
P600 (400)
Grinding SiC-paper/foil** H2O 250-300 ►► 20 1:30
P1200 (600) (change SiC
paper/foil
after 45sec)
Polishing GAMMA Dia Complete 120-150 ►► 30 6:00
Poly, 3µm
Final LAMBDA/OMEGA Eposil F 120-150 ◄► 20 2:00
polishing 0.1µm (H2O for last
30sec)
Etching Barker’s reagent 30V
(electrolyt.)
** To reduce the contamination of the specimen by SiC particles, it should be coated with paraffin wax before
grinding
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6 Preparation Method
MATERIAL Aluminum alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Bakelite black/red Hot mounting
KEM 20 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 25 Until plane
grinding P320 (280)
Pre-polishing BETA Dia Complete 120-150 ◄► 25 5:00
Poly, 9µm
Polishing SIGMA Dia Complete 120-150 ►► 30 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposil F 120-150 ◄► 20 2:00
polishing 0.1µm (H2O for last
30sec)
Etching Kroll’s reagent 0:30
(chem.)
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Preparation Method 7
MATERIAL Carbon/glass fiber reinforced composites (CFC/GFC)
CUTTING Equipment Consumable
Brillant Cut-off wheel: diamond, metal bond (bronze)
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Pressure vessel KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 35 Until plane
grinding P320 (280)
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 30 5:00
Poly, 9µm
Polishing GAMMA/DELTA Dia Complete 120-150 ►► 30 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 1:30
polishing 0.06µm (H2O for last
30sec)
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8 Preparation Method
MATERIAL Cast iron (GJS/GJL)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Bakelite red/black Hot mounting
KEM 30 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280)
Grinding SiC-paper/foil H2O 250-300 ►► 30 1:00
P600 (400)
Grinding SiC-paper/foil H2O 250-300 ►► 30 1:00
P1200 (600)
Polishing SIGMA Dia Complete 120-150 ►► 25 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 1:00
polishing 0.06µm (H2O for last
10sec)*
Etching Nital 0:03-0:10
(chem.)
* Rinsing with water can cause corrosion
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Preparation Method 9
MATERIAL Soft to medium-hard steel (<35 HRC/350HV)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black, Bakelite red/black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280)
Pre-polishing BETA Dia Complete 120-150 ◄► 35 5:00
Poly, 9µm
Polishing SIGMA/GAMMA Dia Complete 120-150 ►► 30 6:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 1:00
polishing 0.06µm (H2O for last
30sec)
Etching Nital (micro) 0:03
(chem.) Adler’s reagent 0:03
(macro)*
* For weld analysis
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10 Preparation Method
MATERIAL Medium-hard to hard steel (35-65 HRC/850HV)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar GALAXY red H2O 250-300 ►► 30 Until plane
grinding
Pre-polishing BETA Dia Complete 120-150 ◄► 30 5:00
Poly, 9µm
Final IOTA Dia Complete 120-150 ◄► 30 4:00
polishing Poly, 3µm
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Preparation Method 11
MATERIAL Stainless steel (austenitic/ferritic)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black, Bakelite red/black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280)
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 25 5:00
Poly, 9µm
Polishing GAMMA Dia Complete 120-150 ►► 25 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 2:00
polishing 0.06µm (H2O for last
30sec)
Etching V2A reagent 0:05-0:30
(chem.)
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12 Preparation Method
MATERIAL Steel and welded steel (macro)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black, Bakelite red/black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P180 (180)
Grinding SiC-paper/foil H2O 250-300 ►► 35 1:00
P320 (280)
Etching Adler’s reagent 0:03-0:10
(chem.) (macro)
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Preparation Method 13
MATERIAL Nitrided steel
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black** Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar GALAXY green H2O 250-300 ►► 25 Until plane
grinding
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 25 5:00
Poly, 9µm
Polishing GAMMA/DELTA Dia Complete 120-150 ►► 30 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 15 1:00
polishing 0.06µm (H2O for last
30sec)
** Before hot mounting the specimen should be wrapped in aluminum foil to stabilize the nitrided layer
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14 Preparation Method
MATERIAL Ceramics
CUTTING Equipment Consumable
Brillant Cut-off wheel: diamond, metal bond (bronze)
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Vacuum KEM 90 (porous material) Castable
KEM 35 (high-density, solid
material)
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar GALAXY red H2O 250-300 ►► 30 Until plane
grinding
Grinding GALAXY blue H2O 250-300 ►► 30 2:00
Pre-polishing BETA Dia Complete 120-150 ◄► 40 6:00
Poly, 9µm +
diamond paste
Final GAMMA Dia Complete 120-150 ►► 30 5:00
polishing Poly, 3µm +
diamond paste
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Preparation Method 15
MATERIAL Cobalt based alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin or rubber bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280)
Pre-polishing BETA Dia Complete 120-150 ◄► 30 8:00
Poly, 9µm
Polishing GAMMA Dia Complete 120-150 ►► 30 6:00
Poly, 3µm
Polishing ZETA/IOTA Dia Complete 120-150 ►► 30 3:00
Poly, 1µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 2:00
polishing 0.06µm (H2O for last
30sec)
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16 Preparation Method
MATERIAL Nickel based alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin or rubber bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black Hot mounting
KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar GALAXY green H2O 250-300 ►► 30 Until plane
grinding
Pre-polishing BETA Dia Complete 120-150 ◄► 30 6:00
Poly, 9µm
Polishing GAMMA Dia Complete 120-150 ►► 30 5:00
Poly, 3µm
Final LAMBDA/OMEGA Eposal 120-150 ◄► 20 1:30-2:00
polishing 0.06µm (H2O for last
30sec)
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Preparation Method 17
MATERIAL Spray coatings (metallic, ceramic)
CUTTING Equipment Consumable
Brillant Cut-off wheel: diamond, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Vacuum KEM 90 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P180 (180)
Grinding SiC-paper/foil H2O 250-300 ►► 30 1:30
P320 (280)
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 30 5:00-8:00**
Poly, 9µm
Polishing GAMMA Dia Complete 120-150 ►► 30 5:00-8:00**
Poly, 3µm
Polishing ZETA Dia Complete 120-150 ►► 20 2:00
Poly, 1µm
Final LAMBDA Eposal 120-150 ◄► 20 1:30
polishing 0.06µm (H2O for last
30sec)
** Until constant porousity å next polishing step
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18 Preparation Method
MATERIAL Magnesium
CUTTING Equipment Consumable
Brillant Cut-off wheel: diamond, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Bakelite red/black, Thermoplast, Hot mounting
KEM 20 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil* H2O 250-300 ►► 15 Until plane
grinding P600 (400)
Polishing BETA 120-150 ►► 15 5:00
Diamond
suspension
(alcohol or oil
based) 9µm, poly
Polishing SIGMA 120-150 ►► 15 5:00
Diamond
suspension
(alcohol or oil
based) 3µm, poly
Polishing ZETA 120-150 ►► 15 5:00
Diamond
suspension
(alcohol or oil
based) 1µm, poly
Final OMEGA** Etosil E 0.06µm 120-150 ◄► 15 4:00
polishing (ethanol for last
30sec)
Etching 3% nitric acid 0:03-0:10
(chem.) (ethanol for
30sec)
* To reduce the contamination of the specimen by SiC particles, it should be coated with paraffin wax before
grinding
** Wet the polishing cloth with ethanol before polishing
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Preparation Method 19
MATERIAL Printed circuit board (non assembled)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Pressure vessel KEM 20 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P180 (180) (slightly before
point of interest)
Grinding SiC-paper/foil H2O 250-300 ►► 25 1:00
P800 (500) (until point of
interest)
Grinding SiC-paper/foil H2O 250-300 ►► 25 1:00
P1200 (600) (until point of
interest)
Polishing GAMMA/DELTA Dia Complete 120-150 ►► 30 3:00
Poly, 3µm
Final ZETA/LAMBDA Eposal 120-150 ◄► 25 2:00
polishing 0.06µm (LAMBDA: H2O
for last 30sec)
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20 Preparation Method
MATERIAL Printed circuit board (assembled)
CUTTING Equipment Consumable
Brillant Cut-off wheel: diamond, metal bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Vacuum KEM 90, KEM 20 Castable
Pressure vessel
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280),
GALAXY green**
Grinding SiC-paper/foil H2O 250-300 ►► 30 1:00
P600 (400),
GALAXY blue**
Grinding SiC-paper/foil H2O 250-300 ►► 30 1:00
P1200 (600),
GALAXY yellow**
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 25 4:00
Poly, 9µm
Polishing GAMMA/DELTA Dia Complete 120-150 ►► 25 4:00
Poly, 3µm
Final ZETA/OMEGA Eposal 120-150 ◄► 20 1:30
polishing 0.06µm (LAMBDA: H2O
for last 30sec)
** For printed circuit boards with ceramic components
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Preparation Method 21
MATERIAL Copper and copper alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Bakelite red/black, Thermoplast Hot mounting
KEM 20, KEM 30 Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 30 Until plane
grinding P320 (280)
Grinding SiC-paper/foil** H2O 250-300 ►► 30 1:30
P600 (400)
Grinding SiC-paper/foil** H2O 250-300 ►► 30 1:30
P1200 (600)
Polishing SIGMA Dia Complete 120-150 ►► 30 4:00
Poly, 3µm
Final OMEGA Eposil F 120-150 ◄► 15 2:00
polishing 0.1µm** (H2O for last
30sec)
Etching Klemm’s I 0:02
(chem.) reagent
** 50ml Eposil F + 1ml H2O2 + 1ml NH3
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22 Preparation Method
MATERIAL Titanium (commercial pure: grade 1-4)
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black Hot mounting
KEM 20, KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 25 Until plane
grinding P320 (280)
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 20 10:00
Poly, 9µm
Final LAMBDA Eposil F 120-150 ◄► 20 10:00 – 15:00*
polishing 0.1µm** (H2O for last
30sec)
Etching Kroll’s reagent 0:45
(chem.)
* Depends on grade of titanium
** Eposil F has to be mixed with hydrogen peroxide (35%) in a ratio of 5:1
(safety advice: use personal protective equipment)
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Preparation Method 23
MATERIAL Titanium alloy
CUTTING Equipment Consumable
Brillant Cut-off wheel: corundum, resin bond
Anti-corrosion coolant
MOUNTING Equipment Consumable Method
Opal Epo black Hot mounting
KEM 20, KEM 15 plus Castable
GRINDING/ Specimen size Ø 40 mm
POLISHING
STEP MEDIUM
rpm N min
Planar SiC-paper/foil H2O 250-300 ►► 25 Until plane
grinding P320 (280)
Grinding SiC-paper/foil H2O 250-300 ►► 25 1:30
P600 (400)
Pre-polishing ALPHA/BETA Dia Complete 120-150 ◄► 20 5:00
Poly, 9µm
Final LAMBDA Eposil F 120-150 ◄► 20 5:00 – 10:00*
polishing 0.1µm** (H2O for last
30sec)
Etching Kroll’s reagent 0:45
(chem.)
* Depends on the alloy
** Eposil F has to be mixed with hydrogen peroxide (35%) in a ratio of 5:1
(safety advice: use personal protective equipment)
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2 Preparation Method
Subject to technical modification and errors ∙ Stand 04_2018
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