Colloid Polym Sci (2007) 285:681–686
DOI 10.1007/s00396-006-1593-5
SHORT COMMUNICATION
Photo-optical properties of photopolymerizable
cholesteric compositions
Natalia Dadivanyan & Alexey Bobrovsky &
Valery Shibaev
Received: 27 July 2006 / Accepted: 4 October 2006 / Published online: 19 January 2007
# Springer-Verlag 2007
Abstract Compositions consisting of nematogenic diacrylate monomer and chiral dopants capable of forming the
cholesteric mesophase and of photopolymerizing were
obtained and studied. For the first time, the change of
optical properties and cholesteric helix pitch during photocrosslinking of diacrylate under UV irradiation (365 nm)
was investigated. The kinetics of photopolymerization was
studied and several stages of this process were observed.
Cholesteric photopolymerizable blends containing chiral
photosensitive dopant capable of E–Z isomerizing under
UV irradiation (313 nm) were studied. The decrease of the
helix twisting power of the dopant during photoisomerization was observed resulting in untwisting of the helix and
shift of the selective light reflection peak into the longwavelength region of the spectrum. The possibility of the
photoregulation of optical properties of such blends with
following fixation of structure and of these properties by
means of photopolymerization under UV irradiation
(365 nm) was demonstrated.
Keywords Cholesteric photopolymerizing mixtures .
Chiral-photochromic dopant . E–Z isomerization .
Selective light reflection peak photoregulation
Introduction
Among liquid crystalline (LC) systems, cholesteric LC
polymers, and blends are of great interest because of their
unique optical properties. The first of these properties is the
N. Dadivanyan : A. Bobrovsky (*) : V. Shibaev
Department of Chemistry, Moscow State University,
Lenin Hills,
Moscow 119992, Russia
e-mail: bbrvsky@yahoo.com
selective circularly polarized light reflection. This property
gives one the opportunity to use such materials in
polarizing filters and reflectors of light in different regions
of the spectrum in optics and optoelectronics.
There are several ways to prepare polymer cholesteric
LC systems [1–5]. One of them is the synthesis of comblike copolymers containing nematogenic groups that form
the mesophase and chiral groups responsible for cholesteric
helix formation. Another possibility is related to obtaining
blends consisting of the nematogenic polymerizable monomer and chiral dopant, which is responsible for the
formation of the cholesteric helix. From such blends, not
only linear polymers, but also polymer networks can be
obtained. The advantage of such crosslinked systems is the
fixation of the helix pitch (P). This method allows getting
films with constant wavelength maximum (1λ
max) of the
selective light reflection.
One of the methods of network preparation is the
photopolymerization of a blend containing a bifunctional
nematogenic monomer which is a crosslinker and, at the
same time, a chiral dopant. Such experiments are described
by Broer et al. [6, 7], Lub et al. [8, 9], and others [10–13].
It is of practical interest to get from one blend cholesteric
films samples with different values of 1λ
max which are
related to P : lmax ¼ nP, where n is the average refractive
index. There are several methods of cholesteric helix pitch
changing. The first method is based on the dependence of
the helix pitch on temperature. Variation of the temperature
allows one to obtain films with selective light reflection in
different regions of the spectra. On the other hand, the P
value can be changed by introducing photosensitive chiral
groups into the cholesteric matrix. These groups can change
their geometry under irradiation, which results in the
change of P. This approach was used, for example, in
[14–18]. In [14], the conformational transition in chiral
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Colloid Polym Sci (2007) 285:681–686
azobenzene derivative fragments was described. In these
substances, E–Z isomerization of N=N-bond under UV
irradiation takes place. In [15–17], the analogous isomerization of C=C-bond is observed. In [18], the isomerization
of a chiral dopant based on isosorbide derivatives was
described. In all the above mentioned cases, E–Z isomerization leads to a decrease of the chiral fragments
anisometry, helix untwisting, and shift of the selective light
reflection to the long-wavelength region of the spectrum.
In this work, the combination of the two methods is
presented: on one hand, photocrosslinking of blends
containing bifunctional nematogenic monomer and chiral
photochromic dopant; on the other hand, change of the
helix pitch by photoisomerization of chiral photochromic
dopant (Fig. 1). The changes of the optical properties
during irradiation were studied in detail.
As objects for this study, two types of blends consisting
of photopolymerizable bifunctional nematogenic monomer
and low-molar-mass chiral dopant were chosen. In both
cases, diacrylate monomer DA was used as nematogenic
monomer.
The main difference between Cinsorb and Hexsorb is the
presence of the double bonds in Cinsorb. This means that
under UV irradiation of the system containing this substance,
two processes may take place: photopolymerization of
diacrylate monomer and photoisomerization of chiral dopant. In addition, the photoinitiator Irgacure 651 was added
into both blends (2.0 wt.%):
CH 3 O
OCH 3
Irgacure 651
O
In order to prevent unwanted uncontrolled thermopolymerization the inhibitor, 4-methyl-2,6-ditert-butylphenol
was introduced (2.0 wt.%):
OH
O
O
O
O
O
DA
O
O
O
O
O
For the first blend, we used a chiral derivative of
isosorbide Hexsorb (8.5 wt.%):
For the second blend, a derivative of isosorbide and
cinnamic acid Cinsorb was chosen (8.5 wt.%). This
substance contains double bonds, and under UV irradiation,
E–Z isomerization is possible:
OCH3
UV
O
The absorbance maximum of the photoinitiator is
335 nm (Fig. 2). Therefore, the irradiation with 365 nm
leads to formation of the network in both types of blends
(Fig. 1). Chiral photochromic dopant Cinsorb absorbs in the
short-wave region of the spectrum (313 nm, Fig. 2). UVirradiation (313 nm) of the blend containing Cinsorb
induces E–Z isomerization of the dopant, which results in
helix untwisting which can be fixed afterwards by 365 nm
irradiation (Fig. 1). Other components of mixtures (DA,
Hexsorb and inhibitor) absorb light at shorter wavelengths,
below 300 nm and they are not involved directly in
photochemical processes described above.
Cinsorb
O
H
H
O
O
O
O
O
C H 3O
O
H
H
O
UV
O
O
O
OCH 3
C H3O
OCH 3
O
O
H
H
O
O
O
O
OCH 3
Fig. 1 The scheme of the photoinduced processes in films of
cholesteric photopolymerizable blends, P helix pitch, P2 >P1
Colloid Polym Sci (2007) 285:681–686
683
313 nm
1.4
1.2
Absorbance
measurements was 0.1 °C. The spectra were obtained after
annealing of the samples.
Cinsorb
Irgacure651
Photopolymerization
1.0
0.8
365 nm
0.6
0.4
0.2
0.0
300
350
400
λ / nm
Fig. 2 UV-spectra of photoinitiator Irgacure 651 and chiral-photochromic dopant Cinsorb in dichloroethane solution. The concentration
of substances in solution is almost equal to mixture composition
The samples were photopolymerized at different temperatures in the LC state. The study of the photo-optical
properties of the blends was performed using a specially
constructed optical set-up including mercury lamp DRSh250. Light with λ=313 and 365 nm was separated using
interference filters. To avoid heating of the sample because
of the IR irradiation of the lamp, a water filter was used. To
obtain the planar-parallel beam of light, a quartz lens was
used. The light intensity was determined by intensity
analyzer (gauge) Laser Mate-Q (Coherent).
Results and discussion
Phase behavior
Experimental part
Preparation of blends and films
Blends were prepared by dissolution of the components in
chloroform and then were dried on air. Residual solvent
was removed by heating in vacuum at a temperature a little
bit lower than the isotropization temperature (110–115 °C).
Samples of planar-oriented films were prepared between
two glasses; the thickness was fixed using glass spacers
(11 μm). For samples’ preparation, a thermostatic cell
“Mettler FP-86” was used. The samples were made at
temperatures 10–15 °C below the clearing temperature
(Tcl). Planar texture of the samples was formed as a result of
mechanical shear. Afterwards, the samples were annealed
for 15–20 min at the same temperature.
Methods
Polarization microscopy
The phase transition temperatures were determined using
polarization microscope “LOMO R-112” equipped with
controlled hot-stage “Mettler FP-86.” Observations were
made using crossed polarizers.
The selective light reflection studies
Selective light reflection was studied by measuring light
absorbance using spectrometer J&M TIDAS. For studying
temperature dependence of the selective light reflection, a
specially constructed cell was used compatible with the
thermostatic cell “Mettler FP-80.” The accuracy of such
According to the polarization microscopy study, both
blends (DA/Cinsorb and DA/Hexsorb) are crystalline at
room temperature and, after heating, first become LC and
then transform into isotropic state (Table 1).
It is clearly seen from optical microscopy that the phase
transition from crystalline to LC state is accompanied by an
appearance of “oily strikes,” which are typical for the
cholesteric phase [19]. Besides, the selective light reflection
above the melting point is observed. This also confirms
cholesteric structure formation.
Temperature dependences of the selective light reflection
maximum
It is well known that cholesterics reflect the circularly
polarized light [20]. The directions of the polarization of
the light and of the cholesteric helix are the same. This
allows one to study the optical properties of cholesterics by
measuring transmittance (Tr) of the thin films using a spectrometer. Thus, the transmittance minimum corresponds
to the reflection maximum. In Fig. 3, the dependence of
the logarithm of the transmittance of the right-handed
circularly polarized light for the planarly oriented film
of one of the blends as a function of the wavelength is
Table 1 Phase transition and optical properties of cholesteric blends
Blend
Phase transition temperatures,
°C
1λ
max at T=0.8 Tcl,
nm
DA/Cinsorb
DA/Hexsorb
Cr 104–105 N* 129.3 I
Cr 105–107N* 128.8 I
469
545
684
Colloid Polym Sci (2007) 285:681–686
800
1.0
-lg Tr
DA/Hexsorb
DA/Cinsorb
700
λmax, nm
Fig. 3 The temperature dependence of the wavelength maximum for blends DA/Cinsorb
and DA/Hexsorb and the dependence of lgTr as a function
of the wavelength for
DA/Hexsorb (t=112 °C)
0.5
0.0
400
500
600
600
λ , nm
500
400
60
80
100
120
140
0
T, C
Photopolymerization of cholesteric blends
During irradiation of the DA/Hexsorb and DA/Cinsorb
samples with 1λ= 365 nm, fast crosslinking is observed.
During this process, the selective light reflection peak position
is fixed. After irradiation, the films become insoluble in
chloroform, while before that the blends were completely
soluble in this solvent. Polarization microscopy shows that the
texture of the samples doesn’t change during irradiation.
During irradiation, the position of the selective light
reflection peak changes. The kinetic curves obtained during
photopolymerization are presented in Fig. 4. They can be
divided into four portions. The first one (I) corresponds to
the induction time, which is typical for the radical
polymerization. During this time, the value of 1λ
max for the
blend DA/Cinsorb doesn’t change; however, in the case of
the blend DA/Hexsorb, 1λ
max slightly changes during the
first few seconds. This means that the helix pitch is almost
constant and the structure is rather stable. During the
second time period (II), the value of 1λ
max increases; in other
words, the helix pitch increases. This probably can be
explained by the decreasing in the order parameter
because of the oligomer products formation, resulting in
appearance of the helix defects and its untwisting. The
third region (III) of the curve shows λmax decreasing
1
2
3
510
110
500
100
560
II
λmax, nm
540
520
IV
DA/Hexsorb
I
490
90
480
80
470
II
500
λmax/ nm
III
III
IV
I
DA/Cinsorb
460
Width / nm
presented. This spectrum corresponds to almost complete
reflection of the right-handed circularly polarized light.
Using the selective light reflection spectra obtained at
different temperatures, the temperature dependences of the
wavelength maximum of the selective light reflection were
derived for both blends (Fig. 3).
The shift of the wavelength maximum into the longwavelength region of the spectrum with the temperature
decrease is observed. Probably, it is explained by an
appearance of the smectic order elements during cooling
of the sample. This effect was observed earlier [19] and was
explained by increasing of the twisting constant of liquid
crystal during the formation of layer structure elements.
0
2
4
6
8
10
70
t / min
480
0
20
40
100
120
140
t, s
Fig. 4 The time dependence of the wavelength maximum for blends
DA/Cinsorb and DA/Hexsorb; 1λ
irr =365 nm, Tirr =115 °C
Fig. 5 The dependence of the wavelength maximum on the
irradiation time for DA/Cinsorb blend with different photoinitiator
concentration (1–2%, 2–0.5%) and the dependence of the selective
light reflection peak width on the irradiation time (3–0.5% of
photoinitiator); 1λ
irr =365 nm, Tirr =115 °C
Colloid Polym Sci (2007) 285:681–686
685
defects in the formed network as a result of the distortion
of the helical structure of the sample during shrinkage.
In Fig. 6, temperature dependences of the wavelength
maximum of the selective light reflection for the crosslinked samples are presented. It is clearly seen that after
irradiation there is almost no temperature dependence of
1λ
max, whereas before irradiation this dependence was
obvious (Fig. 3). This means that during irradiation, a
polymer network with fixed helix pitch was obtained.
Thus, crosslinking leads to stabilization of optical properties up to decomposition temperature of the blend samples.
600
DA/Hexsorb
500
DA/Cinsorb
450
400
20
40
60
80
100
120
140
160
180
0
Helix pitch photoregulation due to photoisomerization
of chiral photochromic dopant
T, C
Fig. 6 The temperature dependence of the 1λ
max for blends DA/
Cinsorb and DA/Hexsorb after irradiation; 1λ
irr =365 nm, Tirr =115 °C
During irradiation of the DA/Cinsorb sample with 1λ=313
nm E–Z isomerization of C=C double bond in dopant
Cinsorb is observed, which results in the shift of the
selective light reflection peak to the long-wavelength region
of the spectrum after 2–3 min of irradiation (Fig. 7). During
further irradiation (5 min), the selective light reflection peak
degeneration takes place. This is the result of cholesteric
helix deterioration, which is clearly seen in the polarizing
microscope. Thus, it is impossible to fix the selective light
reflection during irradiation with this wavelength. To solve
this problem, we divided the experiment into two parts
(Fig. 1). Firstly, the samples were irradiated with 1λ=313
nm for 2 min. This time is enough for Cinsorb E–Z
isomerization. Afterwards, the sample was irradiated with
1λ=365 nm for 10 s. This results in network formation with
planar texture and selective light reflection in the “green”
region of the spectrum. For this system, the temperature
dependence of the wavelength maximum of the selective
light reflection was obtained. 1λ
max doesn’t change with
temperature, as it was shown previously, but before
irradiation there was a strong dependence.
The influence of the irradiation light intensity was
studied. The samples of DA/Cinsorb were irradiated with
1λ=313 nm using the different intensity of the UV-light. It is
pointing out the pitch decrease because of the network
shrinkage [13]. Finally, in the fourth portion (IV) of the
curve, the values of 1λ
max become constant again. This
means that the helix pitch is fixed in the solid state and the
helical supramolecular structure is preserved. Thus, these
data confirm the stable network formation. It should be
mentioned that the value of 1λ
max after irradiation differs
from the initial one. This difference is small for DA/
Cinsorb (less then 10 nm), while for DA/Hexsorb, Δλ=
30 nm. The time of helix shrinkage in region III for blend
DA/Hexsorb is four times greater than for DA/Cinsorb.
The initiator concentration effect on kinetics of photocrosslinking is shown in Fig. 5. The four-fold decrease of
the initiator concentration results in increasing of the full
reaction time from 40 s to 10 min. The increasing of the
initiator concentration doesn’t influence Δ1λ
.
One of the most important characteristics of cholesterics
is the selective light reflection peak width. We studied the
change of this parameter during irradiation (Fig. 5). It was
shown that the peak width increases, especially in portion
III of the kinetic curve. This peak widening can probably be
explained by the growth of the amount of the structural
1.2
time
650
1.0
*2
600
0.8
- lg Tr
Fig. 7 The dependence of lg Tr
from the wavelength and the
dependence of the wavelength
maximum as a function of the
irradiation time for DA/Cinsorb
blend at different light intensities of the irradiation (1–I=
0.22 mW/cm2, 2−I=0.44 mW/
cm2, asterisks represent the deterioration of the selective light
reflection peak); λirr =313 nm,
Tirr =115 °C
0s
30 s
1 min
1.5 min
2 min
0.6
0.4
0.2
0.0
400
500
600
λ, nm
700
800
λmax, nm
λmax, nm
550
550
*1
500
450
0
5
10
t, min
15
20
686
seen (Fig. 7) that the two-fold increasing of the intensity
leads to the decreasing of the complete peak deterioration
time by approximately three times. The increase in the
intensity results in the variation of the λmax value, which
can be fixed later by the photopolymerization process.
Conclusions
For the first time, the optical properties and cholesteric
helix pitch changes during photopolymerization of the
blends consisting of bifunctional nematogenic diacrylate
monomer and chiral dopant were studied. The photocrosslinking kinetics was investigated in details and several
stages of this process were discovered and described.
Optical properties of the blend containing chiral photochromic dopant capable of E–Z photoisomerization under
UV irradiation with 1λ=313 nm were studied. The decreasing of the dopant helical twisting power during photoisomerization is observed. This leads to the helix untwisting
and shift of the selective light reflection peak to the longwavelength region of the spectrum. The possibility of
photoregulation of optical properties of such blends with
further fixation of structure by means of photocrosslinking
during irradiation with 1λ=365 nm was demonstrated.
Acknowledgments This research was supported by the Russian
Foundation of Fundamental Research (05-03-33193) and Federal
Scientific Technical Program (contract no. 02.434.11.2025). A.B.
gratefully acknowledges the Russian Science Support Foundation, the
research fellowships provided by INTAS (reference no. 03-55-956).
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Colloid Polym Sci (2007) 285:681–686
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