ARTICLE IN PRESS
Journal of Luminescence 121 (2006) 335–339
www.elsevier.com/locate/jlumin
Doping in silicon nanocrystals: An ab initio study of the
structural, electronic and optical properties
Federico Ioria, Elena Degolib,, Eleonora Luppia, Rita Magria, Ivan Marrib,
G. Cantelec, D. Ninnoc, F. Tranic, Stefano Ossicinib
a
CNR-INFM-S3 and Dipartimento di Fisica, Università di Modena e Reggio Emilia, via Campi 213/A, I-41100 Modena, Italy
CNR-INFM-S3 and Dipartimento di Scienze e Metodi dell’Ingegneria, Università di Modena e Reggio Emilia, via Amendola, I-42100 Reggio Emilia, Italy
c
CNR-INFM-Coherentia and Università di Napoli ‘‘Federico II’’, Dipartimento di Scienze Fisiche, Complesso Universitario Monte S. Angelo,
Via Cintia, I-80126 Napoli, Italy
b
Available online 26 September 2006
Abstract
There are experimental evidences that doping control at the nanoscale can significantly modify the optical properties with respect to
the pure systems. This is the case of silicon nanocrystals (Si-nc), for which it has been shown that the photoluminescence (PL) peak can
be tuned also below the bulk Si band gap by properly controlling the impurities, for example by boron (B) and phosphorus (P) codoping.
In this work, we report on an ab initio study of impurity states in Si-nc. We consider B and P substitutional impurities for Si-nc with a
diameter up to 2.2 nm. Formation energies (FEs), electronic, optical and structural properties have been determined as a function of the
cluster dimension. For both B-doped and P-doped Si-nc the FE increases on decreasing the dimension, showing that the substitutional
doping gets progressively more difficult for the smaller nanocrystals. Moreover, subsurface impurity positions result to be the most stable
ones. The codoping reduces the FE strongly favoring this process with respect to the simple n-doping or p-doping. Such an effect can be
attributed to charge compensation between the donor and the acceptor atoms. Moreover, smaller structural deformations, with respect
to n-doped and p-doped cases, localized only around the impurity sites are observed. The band gap and the optical threshold are largely
reduced with respect to the undoped Si-nc showing the possibility of an impurity-based engineering of the Si-nc PL properties.
r 2006 Elsevier B.V. All rights reserved.
PACS: 73.22f; 71.15.m
Keywords: Nanocrystals; Doping; Luminescence
1. Introduction
During the last 10 years, various experimental and
theoretical results have raised hopes for a real employment
of nanostructured silicon as an optical active material [1].
The idea stems from the possibility of confining carriers
into tiny silicon nanocrystals (Si-nc) (1–4 nm in size) and to
use quantum confinement effects to change the physical
properties of bulk silicon. In particular, it has been
observed that Si-nc band gap increases with decreasing
size and visible luminescence external efficiency in excess of
10% has been obtained [1,2]. Moreover, optical gain in SiCorresponding author. Tel.: +39 059 2055289; fax: +39 059 374794.
E-mail address: degoli.elena@unimore.it (E. Degoli).
0022-2313/$ - see front matter r 2006 Elsevier B.V. All rights reserved.
doi:10.1016/j.jlumin.2006.08.062
nc has been demonstrated in a variety of situations [3].
Nevertheless, Si-nc still remain indirect band gap materials
where structures related to momentum-conserving phonons were clearly observed. This drawback can be
circumvented by introducing in the Si-nc isoelectronic
impurities [1,2] or by codoping with n- and p-type
impurities [4]. In a series of intriguing papers, Fujii and
collaborators [4–6] have shown the possibility of controlling the photoluminescence (PL) properties of Si-nc by nand p-type codoping, proving not only that the PL
intensity of codoped (boron (B) and phosphorus (P))
Si-nc is always higher than that of either P-doped or Bdoped Si-nc, but also that it is even higher with respect to
the pure Si-nc. Besides, under resonant excitation conditions, the codoped samples did not exhibit structures
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F. Iori et al. / Journal of Luminescence 121 (2006) 335–339
related to momentum-conserving phonons suggesting that
in this case the quasidirect optical transitions are predominant. Theoretical studies of impurities in silicon
quantum dots have lagged relative to calculations for pure,
undoped systems. Only few first-principle studies are
present in the literature, devoted to quantum confinement
effects in Si-nc doped with the introduction of only one
impurity atom [7–9]. The results point out that the
ionization energy for the Si-nc is virtually size-independent
while donor and acceptor binding energies are substantially
enhanced.
Recently, we have performed a preliminary theoretical
study considering the codoping of Si-nc with n- and p-type
impurities [10]. In the present paper, we will present our
recent results concerning the structural, electronic and
optical properties of n-doped, p-doped and codoped Si-nc.
The paper is organized as follows: in Section 2, we briefly
elucidate the theoretical framework used, Section 3 is
devoted to the discussion of the results and Section 4
presents our conclusions.
2. Computational methods
Our results have been obtained by using a plane-wave,
pseudopotential density functional calculation of impurity
states in spherical Si-nc, with diameter ranging from
1.04 nm (Si29H36) to 2.24 nm (Si293H172). The Si-nc have
been built taking all the bulk Si atoms contained within a
sphere of a given radius and terminating the surface
dangling bonds with hydrogen. Each cluster has been
centered on an Si atom. As in the experiments, we consider
B and P impurities in substitutional sites. Full relaxation
with respect to the atomic positions has been performed for
both doped and undoped systems. All the calculations have
been done using the Quantum-Espresso package [11],
within the GGA approximation using Vanderbilt ultrasoft
[12] pseudopotentials. The Si-nc have been embedded in a
large supercell in order to prevent interactions between the
periodic replicas (about 6 Å of vacuum separates neighbor
clusters in all the considered systems). A careful analysis
has been performed on the convergence of both the
electronic and structural properties with respect to both
the supercell side and plane-wave basis set cut-off.
Both the structural and electronic properties have been
investigated as a function of the size and of the impurity
position within the Si-nc. The impurity formation energy
(FE) has been calculated as a function of the Si-nc
dimension and of the impurity position within the
nanocluster. Absorption properties of the Si-nc have been
calculated through the imaginary part of the dielectric
function.
3. Results: structural, electronic and optical properties
The structural changes of the doped Si-nc have been
investigated as a function of the size of the impurity
position and of the number of dopant species present
within the Si-nc. The first important point is that the
amount of the relaxation around the impurity is directly
related to the impurity valence. A more significant
distortion is obtained doping with trivalent atoms (e.g.
B), in which an electron that could be used to form a bond
with the surrounding Si atoms is missing. Actually, in the
B-doped clusters, while the Si–Si bond lengths keep almost
unchanged, some reconstruction occurs around the impurity. The overall structure has C3v symmetry, with an
impurity displacement along the /1 1 1S direction when it
is placed at the nanocluster center. Such a displacement
leads to one longer and three shorter (and equal) Siimpurity distances. While the longer bond is ‘‘almost’’
independent of the Si-nc size, the shorter one decreases
with the size. It is interesting to note that the relaxation of
the bulk Si supercell containing the B impurity leads to an
‘‘almost’’ Td configuration, in which the four B–Si bonds
are practically the same. On the contrary, for pentavalent
atoms, such as the P-doped Si-nc, the relaxation leads to a
nearly Td symmetry, in which the differences between the
four P–Si bonds are negligible, less than 0.7% [13].
Starting from the SinHm nanocluster [14], the FE for the
neutral X impurity can be defined as the energy needed to
insert the X atom with chemical potential mX within the
cluster after removing a Si atom (transferred to the
chemical reservoir, assumed to be bulk Si)
E f ¼ EðSin1 XHm Þ EðSin Hm Þ þ mSi mX ,
(1)
where E is the total energy of the system, mSi the total
energy per atom in bulk Si, mX the total energy per atom of
the impurity [15]. Our calculations clearly show that for
smaller Si-nc, a larger energy is needed for the formation of
the impurity. For B-doped Si-nc, a decreasing behavior of
Ef vs. R is observed, that can be described by the linear
formula
E f ¼ 0:796 þ 4:63971=R,
(2)
where R is expressed in Å and Ef in eV, and the value
Ef ¼ 0.796 eV corresponds to doped Si bulk. For P-doped
Si-nc, the same decreasing behavior is observed and the
linear formula is now:
E f ¼ 0:21008 þ 4:98131=R.
(3)
The fact that the calculated FE is lower for larger Si-nc is in
qualitative agreement with the observed suppression of the
PL in doped Si-nc. The increase of the Si-nc size and the
stronger PL suppression observed by Fujii et al. [6] when
the annealing temperature is augmented (this effect is a
signature of a higher impurity concentration) show that
larger Si-nc can more easily sustain the doping.
The FE changes also as a function of the impurity
position within the Si-nc. An energy drop of about 0.30 eV
is found as the B impurity is moved from the cluster center
to the Si layer just below the surface. Thus as the impurity
atoms are moved toward the surface, the FE decreases,
making the subsurface positions more stable. The local
structure has now a C2v symmetry, with two shorter and
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F. Iori et al. / Journal of Luminescence 121 (2006) 335–339
Bond
Si87H76 (Å) Bond Si86BH76 (Å) Si86PH76 (Å) Si85BPH76 (Å)
Si–Sis
Si–Sis
Si–Sii
Si–Sii
2.355
2.355
2.363
2.363
B–Sis
B–Sis
B–Sii
B–Sii
Si–Sis
Si–Sis
Si–Sii
Si–Sii
2.355
2.355
2.363
2.363
P–Sis
P–Sis
P–Sii
P–Sii
2.036
2.036
2.014
2.014
2.021
2.021
2.034
2.034
2.294
2.294
2.380
2.380
2.295
2.295
2.331
2.331
1.2
1
Formation Energy (eV)
Table 1
Bond lengths at the subsurface substitutional site where the impurities are
located for the undoped Si87H76 cluster, the B-doped, the P-doped and
codoped ones
0.8
0.6
0.4
0.2
0
-0.2
-0.4
Si:B
Sis and Sii refer to surface and inner Si atoms around this site, respectively.
two longer Si-impurity distances with respect to the surface
and inner Si atoms (see Table 1).
Table 1 gives the optimized bond lengths around the
impurity in subsurface positions for the Si87H76-nc (the
results are quite similar for Si147H100). Both n-doped or pdoped and codoped cases have been considered. It is
interesting to note that in the codoped case, the differences
among the four impurity-Si bond lengths are clearly
smaller with respect to the n-doped or p-doped case. Thus,
when carriers in the Si-nc are perfectly compensated by
codoping with n- and p-type impurities, an almost Td
configuration is recovered in which the four impurity-Si
bonds are practically the same.
This fact is reflected in the FE results reported in Fig. 1,
for B-doped, P-doped and B–P-codoped Si-nc for two,
different in size, nanocrystals. In all cases the impurities are
located in subsurface positions. In the figure, dashed lines
connect the FE values obtained when neutral impurities are
located at the largest possible distance in the codoped
clusters, while solid lines are used for the cases in which the
impurities are nearest neighbors. From Fig. 1, it is clear
that codoping strongly reduces (of about 1 eV) Ef with
respect to the doping with only one type of impurity atom.
This reduction is similar for Si-nc of different size. The
important point here is that Si-nc can be more easily
codoped than doped with the introduction of only one
impurity atom; this is a consequence of both the charge
compensation and the minor structural deformation.
Moreover, the FE is lower when the impurities are nearest
neighbors.
The presence of a single donor or acceptor state (ndoping or p-doping) gives rise to a reduction of the energy
gap EG, inducing the formation of a highest occupied
molecular orbital (HOMO) level strongly localized on B or
P impurity. Nevertheless, whereas the EG reduction in Bdoped Si-nc is due to the formation of a defect level just
above the valence edge (see for instance the case of the
Si86BH76-doped Si-nc [10], where EG reduces to
2.59–2.31 eV), in P-doped Si-nc the effect is caused by the
formation of a single level localized just below the
Si:BP
Si:P
Fig. 1. Formation energy of the neutral impurities located at subsurface
positions as a function of the doping: B-doped, P-doped and B–P codoped
nanoclusters are considered. The lines are a guide for the eyes. Dashed
lines (green and blue): neutral impurities located at largest possible
distance, and solid lines (black and red): neutral impurities located at
nearest-neighbor distances in the codoped clusters. Squares (green and
black) are related to the Si87H76 nanoclusters, circles (red and blue) to the
Si147H100 ones.
conduction band (see for instance the case of the Si86PH76
nanocrystal [10], where EG is 0.28 eV). Changes in EG have
been evaluated also for various B- and P-codoped Si-nc;
e.g. we have observed a reduction of EG from 2.59 (for the
pure Si-nc Si87H76 ) to 1.82 eV for the codoped Si85BPH76
and similarly a reduction from 2.30 (for the pure Si-nc
Si147H100 ) to 1.56 for the codoped Si145BPH100.
Obviously, for pure Si-nc larger than those considered
here, having a smaller EG, it would be possible by codoping
to obtain an EG even smaller than the bulk Si band gap in
agreement with the experimental outcomes [4,6]. Besides,
on going from the pure, to the B-doped or P-doped case, to
the codoped Si-nc, the HOMO and lowest occupied
molecular orbital (LUMO) states progressively localize
on the impurities. In the codoped case, the HOMO is
strongly localized on the B impurity and the LUMO on the
P impurity.
These facts have a profound influence on the optical
properties of the Si-nc. The optical properties have been
calculated through the imaginary part e2 of the dielectric
function:
a2 ðoÞ ¼
4p2 e2 X 2
m2 o2 v;c;k V
cc;k pa cv;k
d½E c ðkÞ E v ðkÞ _o,
2
ð4Þ
where a ¼ ðx; y; zÞ, Ev and Ec denote the energies of the
valence cv,k and conduction cc,k band states at a k point (G
in our case), and V is the supercell volume. The optical
absorption coefficient
aðoÞ ¼
o
2 ðoÞ
nc
(5)
is directly related to e2; thus the imaginary part of the
dielectric function contains all the necessary information
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ε2 (a.u.)
F. Iori et al. / Journal of Luminescence 121 (2006) 335–339
0
0.5
1
1.5
2
Energy (eV)
2.5
3
3.5
Fig. 2. Top panel: calculated imaginary part of the dielectric function (e2)
for the Si86BH76 cluster (solid-red line). Center panel: the same for the
Si86PH76 cluster (solid-red line). Bottom panels: the same for the
Si85BPH76 codoped cluster (solid-red line). In all panels, the result for
the e2 of the undoped Si87H76 cluster is reported for comparison (dashedblack line). A Gaussian broadening of 0.1 eV has been used.
electronic and optical properties as a function of size and
impurity position within the cluster. We have shown that in
n-doped and p-doped Si-nc, the structural deformation
around the impurity depends on both the impurity valence
and impurity position. The impurity subsurface positions
are always the most stable ones. As a consequence of
charge compensation, it is easier codoping the nanocrystal
than doping it with only one type of impurity atom. The
study of the electronic properties shows that for B-doped
and P-doped Si-nc, the HOMO is located around the
impurity, whereas the LUMO is delocalized in the
nanocrystals and that the energy gap strongly depends on
the impurity valence. For the B- and P-codoped Si-nc, both
HOMO and LUMO are localized around the impurity sites
thus strongly lowering the energy gap with respect to that
of the pure silicon nanostructures. The optical properties
reflect the electronic ones, thus for B-doped and P-doped
nanocrystals absorption features are present in the infrared
region, whereas for the case of B–P-codoping electronic
transitions between donor and acceptor states in the optical
region are allowed, making it possible to engineer the PL
spectrum of the nanocrystals that will depend on the
nanocrystal size.
Acknowledgements
about the absorption properties of the nanocrystals. Owing
to the strong confinement effects present in nanoclusters,
only transitions at the G point have been considered. Fig. 2
reports the calculated imaginary parts of the dielectric
function (e2) for the Si87H76 clusters, considering B-doped
(top panel) and P-doped (center panel) nanocrystals and
the B–P codoped (bottom panel) nanocrystal. For all cases,
the result is compared with the corresponding one for the
undoped Si87H76 clusters.
Concerning both the B-doped and P-doped cases, we see
that several new peaks appear in the low-energy region
between 0 and 2 eV. These peaks are due to the interband
and intraband transitions that involve the impurity state
located in the band energy gap. These new features could
be important for applications in the infrared region and in
Raman lasers technology. For the codoped Si85BPH76
cluster, as shown at the bottom of Fig. 2, we note the shift
of the optical gap to lower energies and the rise of new
features not present for the undoped Si87H76 cluster. The
enhancement of the intensity in this region is a direct
consequence of the localization process of the HOMO and
LUMO states on the impurities described above. These
outcomes can explain the experimental data [4,6] that show
a PL intensity for codoped Si-nc even higher than that of
pure Si-nc and prove that by codoping it is possible to shift
the PL peak even below the Si bulk band gap.
4. Conclusions
A detailed first-principle study of B- and/or P-doping in
Si-nc has been performed analyzing their structural,
We acknowledge the support of the MIUR PRIN (2005)
Italy and of the CRUI Vigoni Project (2005) Italy–Germany. All the calculations were performed at CINECABologna (‘‘Iniziativa Calcolo Parallelo del CNR- INFM’’),
CICAIA-Modena and ‘‘Campus Computational Grid’’Università di Napoli ‘‘Federico II’’.
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[13] Calculations have been done also for isovalent impurity (C and
Ge) and other group III (Al) and group V (N) impurities; in
general, trivalent impurity tends to lower the symmetry down
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339
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