[go: up one dir, main page]

Dendooven et al., 2012 - Google Patents

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Dendooven et al., 2012

Document ID
16609962476398239582
Author
Dendooven J
Devloo-Casier K
Levrau E
Van Hove R
Pulinthanathu Sree S
Baklanov M
Martens J
Detavernier C
Publication year
Publication venue
Langmuir

External Links

Snippet

Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition …
Continue reading at pubs.acs.org (other versions)

Similar Documents

Publication Publication Date Title
Dendooven et al. In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
Cruz et al. Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
Peng et al. “Zincone” zinc oxide− organic hybrid polymer thin films formed by molecular layer deposition
Su et al. Vapor-phase processing of metal–organic frameworks
Dendooven et al. In situ x-ray fluorescence measurements during atomic layer deposition: Nucleation and growth of TiO2 on planar substrates and in nanoporous films
Ferguson et al. Atomic layer deposition of Al2O3 films on polyethylene particles
Dameron et al. Gas diffusion barriers on polymers using multilayers fabricated by Al2O3 and rapid SiO2 atomic layer deposition
Martinson et al. Atomic layer deposition of Fe2O3 using ferrocene and ozone
Koganti et al. Generalized coating route to silica and titania films with orthogonally tilted cylindrical nanopore arrays
Dendooven et al. Low-temperature atomic layer deposition of platinum using (methylcyclopentadienyl) trimethylplatinum and ozone
Vervuurt et al. Uniform atomic layer deposition of Al2O3 on graphene by reversible hydrogen plasma functionalization
Bae et al. Investigation of the hydrophobic nature of metal oxide surfaces created by atomic layer deposition
George Atomic layer deposition: an overview
Dafinone et al. Mechanical reinforcement of nanoparticle thin films using atomic layer deposition
Elam et al. Conformal coating on ultrahigh-aspect-ratio nanopores of anodic alumina by atomic layer deposition
Methaapanon et al. Comparative study of titanium dioxide atomic layer deposition on silicon dioxide and hydrogen-terminated silicon
Watkins et al. Chemical fluid deposition: reactive deposition of platinum metal from carbon dioxide solution
Kanezashi et al. Experimental and theoretical study on small gas permeation properties through amorphous silica membranes fabricated at different temperatures
Emmez et al. Permeation of a single-layer SiO2 membrane and chemistry in confined space
Loscutoff et al. Deposition of ultrathin polythiourea films by molecular layer deposition
Meckler et al. Sub-micron polymer–zeolitic imidazolate framework layered hybrids via controlled chemical transformation of naked ZnO nanocrystal films
Lee et al. Ultra gas-proof polymer hybrid thin layer
Min et al. Atomic layer deposition of Al2O3 thin films from a 1-methoxy-2-methyl-2-propoxide complex of aluminum and water
Jiang et al. Nanometer-thick conformal pore sealing of self-assembled mesoporous silica by plasma-assisted atomic layer deposition
Ye et al. Effects of residual solvent molecules facilitating the infiltration synthesis of ZnO in a nonreactive polymer