Layer, 2014 - Google Patents
Robert A. Hall, Steven M. George, Yeongae Kim, Woonbong Hwang, Meghan E. Samberg, Nancy A. Monteiro-Riviere & Roger J. NarayanLayer, 2014
View PDF- Document ID
- 14368145044720446125
- Author
- Layer A
- Publication year
- Publication venue
- JOM
External Links
Snippet
Molecular layer deposition (MLD) is a sequential and self-limiting process that may be used to create hybrid organic/inorganic thin films from organometallic precursors and organic alcohol precursors. In this study, films of a zirconiumcontaining hybrid organic/inorganic …
- PNEYBMLMFCGWSK-UHFFFAOYSA-N AI2O3 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c+Cg== 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[O-2].[O-2].[O-2].[Al+3].[Al+3] 0 abstract description 48
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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