WO2018061034A1 - Novel process for the preparation of 1-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl-ethanamine - Google Patents
Novel process for the preparation of 1-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl-ethanamine Download PDFInfo
- Publication number
- WO2018061034A1 WO2018061034A1 PCT/IN2017/050439 IN2017050439W WO2018061034A1 WO 2018061034 A1 WO2018061034 A1 WO 2018061034A1 IN 2017050439 W IN2017050439 W IN 2017050439W WO 2018061034 A1 WO2018061034 A1 WO 2018061034A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- formula
- compound
- apremilast
- acid
- alkyl
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- BXUJVINGXQGNFD-UHFFFAOYSA-N 1-(3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethanamine Chemical compound CCOC1=CC(C(N)CS(C)(=O)=O)=CC=C1OC BXUJVINGXQGNFD-UHFFFAOYSA-N 0.000 title abstract description 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 62
- IMOZEMNVLZVGJZ-QGZVFWFLSA-N apremilast Chemical compound C1=C(OC)C(OCC)=CC([C@@H](CS(C)(=O)=O)N2C(C3=C(NC(C)=O)C=CC=C3C2=O)=O)=C1 IMOZEMNVLZVGJZ-QGZVFWFLSA-N 0.000 claims abstract description 33
- 229960001164 apremilast Drugs 0.000 claims abstract description 32
- 239000002253 acid Substances 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- -1 dime thylsulf one anion Chemical class 0.000 claims description 18
- HHVIBTZHLRERCL-UHFFFAOYSA-N methylsulphonylmethane Natural products CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 12
- 125000001188 haloalkyl group Chemical group 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- PAUAJOABXCGLCN-UHFFFAOYSA-N n-(1,3-dioxo-2-benzofuran-4-yl)acetamide Chemical compound CC(=O)NC1=CC=CC2=C1C(=O)OC2=O PAUAJOABXCGLCN-UHFFFAOYSA-N 0.000 claims description 5
- ONSCGVISIRLDJQ-UHFFFAOYSA-N 3-acetamidophthalic acid Chemical compound CC(=O)NC1=CC=CC(C(O)=O)=C1C(O)=O ONSCGVISIRLDJQ-UHFFFAOYSA-N 0.000 claims description 4
- HBAQYPYDRFILMT-UHFFFAOYSA-N 8-[3-(1-cyclopropylpyrazol-4-yl)-1H-pyrazolo[4,3-d]pyrimidin-5-yl]-3-methyl-3,8-diazabicyclo[3.2.1]octan-2-one Chemical class C1(CC1)N1N=CC(=C1)C1=NNC2=C1N=C(N=C2)N1C2C(N(CC1CC2)C)=O HBAQYPYDRFILMT-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- WXNXCEHXYPACJF-ZETCQYMHSA-M N-acetyl-L-leucinate Chemical group CC(C)C[C@@H](C([O-])=O)NC(C)=O WXNXCEHXYPACJF-ZETCQYMHSA-M 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract description 4
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 abstract description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 42
- 239000002904 solvent Substances 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 26
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 23
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 235000019253 formic acid Nutrition 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 description 4
- VAMZHXWLGRQSJS-UHFFFAOYSA-N 3-ethoxy-4-methoxybenzaldehyde Chemical compound CCOC1=CC(C=O)=CC=C1OC VAMZHXWLGRQSJS-UHFFFAOYSA-N 0.000 description 3
- 0 CCOc1cc(C(NC(*)=O)I)ccc1OC Chemical compound CCOc1cc(C(NC(*)=O)I)ccc1OC 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000010511 deprotection reaction Methods 0.000 description 3
- 229960004132 diethyl ether Drugs 0.000 description 3
- 239000004210 ether based solvent Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003880 polar aprotic solvent Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- KFZUDNZQQCWGKF-UHFFFAOYSA-M sodium;4-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=C(S([O-])=O)C=C1 KFZUDNZQQCWGKF-UHFFFAOYSA-M 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- MSYGAHOHLUJIKV-UHFFFAOYSA-N 3,5-dimethyl-1-(3-nitrophenyl)-1h-pyrazole-4-carboxylic acid ethyl ester Chemical compound CC1=C(C(=O)OCC)C(C)=NN1C1=CC=CC([N+]([O-])=O)=C1 MSYGAHOHLUJIKV-UHFFFAOYSA-N 0.000 description 2
- IVOMOUWHDPKRLL-KQYNXXCUSA-N Cyclic adenosine monophosphate Chemical compound C([C@H]1O2)OP(O)(=O)O[C@H]1[C@@H](O)[C@@H]2N1C(N=CN=C2N)=C2N=C1 IVOMOUWHDPKRLL-KQYNXXCUSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 102000011017 Type 4 Cyclic Nucleotide Phosphodiesterases Human genes 0.000 description 2
- 108010037584 Type 4 Cyclic Nucleotide Phosphodiesterases Proteins 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 229940024606 amino acid Drugs 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical compound [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 229910000104 sodium hydride Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- CESUXLKAADQNTB-SSDOTTSWSA-N 2-methylpropane-2-sulfinamide Chemical compound CC(C)(C)[S@](N)=O CESUXLKAADQNTB-SSDOTTSWSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- FXJVNINSOKCNJP-UHFFFAOYSA-M 4-methylbenzenesulfinate Chemical compound CC1=CC=C(S([O-])=O)C=C1 FXJVNINSOKCNJP-UHFFFAOYSA-M 0.000 description 1
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 1
- JHTYZIJPKIWLGP-UHFFFAOYSA-N CCOc1cc(C(CS(C)(=O)=O)NC(OC(C)(C)C)=O)ccc1OC Chemical compound CCOc1cc(C(CS(C)(=O)=O)NC(OC(C)(C)C)=O)ccc1OC JHTYZIJPKIWLGP-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 201000004681 Psoriasis Diseases 0.000 description 1
- 201000001263 Psoriatic Arthritis Diseases 0.000 description 1
- 208000036824 Psoriatic arthropathy Diseases 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-M benzenesulfinate Chemical compound [O-]S(=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-M 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- AKPUJVVHYUHGKY-UHFFFAOYSA-N hydron;propan-2-ol;chloride Chemical compound Cl.CC(C)O AKPUJVVHYUHGKY-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 239000007935 oral tablet Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229940011530 otezla Drugs 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000001126 phototherapy Methods 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- KAVUKAXLXGRUCD-UHFFFAOYSA-M sodium trifluoromethanesulfinate Chemical compound [Na+].[O-]S(=O)C(F)(F)F KAVUKAXLXGRUCD-UHFFFAOYSA-M 0.000 description 1
- CHLCPTJLUJHDBO-UHFFFAOYSA-M sodium;benzenesulfinate Chemical compound [Na+].[O-]S(=O)C1=CC=CC=C1 CHLCPTJLUJHDBO-UHFFFAOYSA-M 0.000 description 1
- LYPGDCWPTHTUDO-UHFFFAOYSA-M sodium;methanesulfinate Chemical compound [Na+].CS([O-])=O LYPGDCWPTHTUDO-UHFFFAOYSA-M 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000009121 systemic therapy Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C315/00—Preparation of sulfones; Preparation of sulfoxides
- C07C315/04—Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/40—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with one nitrogen as the only ring hetero atom, e.g. sulpiride, succinimide, tolmetin, buflomedil
- A61K31/403—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with one nitrogen as the only ring hetero atom, e.g. sulpiride, succinimide, tolmetin, buflomedil condensed with carbocyclic rings, e.g. carbazole
- A61K31/4035—Isoindoles, e.g. phthalimide
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C315/00—Preparation of sulfones; Preparation of sulfoxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
Definitions
- the present invention relates to a process for the preparation of l-(3-ethoxy-4-methoxy- phenyl)-2-methylsulfonyl-ethanamine, an intermediate used for the preparation of apremilast.
- Apremilast is an oral small-molecule inhibitor of phosphodiesterase 4 (PDE4) specific for cyclic adenosine monophosphate (cAMP), marketed in the United states under the brand name OTEZLA ® as oral tablets and indicated for the treatment of adult patients with active psoriatic arthritis and for the treatment of patients with moderate to severe plaque psoriasis who are candidates for phototherapy or systemic therapy.
- PDE4 phosphodiesterase 4
- cAMP cyclic adenosine monophosphate
- the corresponding 5 enantiomer can be isolated from the racemic compound by techniques known in the art.
- the '638 patent discloses a process for the preparation of apremilast wherein it is synthesized from 3-acetamidophthalic anhydride and a chiral amino acid salt of (5)-l-(3-ethoxy-4- methoxyphenyl)-2-methanesulfonylethylamine.
- the U. S. Pat. No. 9,187,417 discloses the processes for enantioselective preparation of (5)-l- (3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethanamine, an intermediate which is used for preparation of apremilast by using stoichiometric quantity of chiral auxiliary namely (R)-tert- butylsulfinamide or (S)-a-methylbenzylamine.
- the U. S. Pat. No. 9,126,906 discloses the process for the enantiomerically enriched preparation of (5)-l-(3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethanamine by reducing corresponding enamine via hydrogenation in the presence of a metal catalyst and a chiral ligand or a chiral metal catalyst/ligand complex.
- the present invention provides a simple, scalable and economical process for the preparation of apremilast.
- the present invention provides a process for the preparation of apremilast, comprising:
- R is (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, or -Obenzyl, and L is a leaving group, with dimethylsulfone anion to obtain a compound of Formula IV
- the present invention also provides a novel intermediate of compound of Formula Va
- the processes of the present invention are economical and suitable for commercial production of apremilast.
- (Ci-C4)aikyl refers to an straight or branched chain, saturated monovalent hydrocarbon residue containing 1-4 carbon atoms.
- Examples of (Ci-C4)alkyl includes but are not limited to methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, and tert- butyl.
- -0(Ci-C4)alkyl refers to a group in which (Ci-C4)alkyl group as defined above, is attached to another group via an oxygen atom. Examples of -0(Ci-C4)alkyl includes but are not limited to methoxy, ethoxy, n-propoxy, n-butoxy, teri-butoxy and the like.
- (Ci-C4)haloalkyl refers to C 1 -C4 alkyl group as defined above, wherein one or more hydrogen atoms of alkyl group is substituted by one or more halogens.
- Examples of (Ci-C4)haloalkyl includes but are not limited to trifluromethyl, trichloromethyl.
- halogen refers to chloro, bromo, iodo or fluoro.
- the present invention provides a process for the preparation of apremilast, comprising:
- R is (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, or -O-benzyl, and L is a leaving group, with dimethylsulfone anion to obtain a compound of Formula IV
- R in the compound of Formula IV and V is selected from (Ci-C4)alkyl, (Ci-C 4 )haloalkyl, -0(Ci-C 4 )alkyl, and -O-benzyl; preferably R is -0(Ci-C 4 )alkyl; more preferably R is teri-butoxy.
- L in the compound of Formula V is a leaving group selected from a group consisting of -S(0)2-(Ci-C 4 alkyl), -S(0)2-(Ci-C 4 haloalkyl), benzenesulfonyl, p- toluenesulfonyl, -0(Ci-C 4 )alkyl or halogen.
- L is p-toluenesulfonyl group.
- step a involve reaction of compound of Formula V with dimethylsulfone anion.
- Dimethylsulfone anion can be prepared by reacting dimethylsulfone with a strong base. Strong base suitable for the purpose can be selected from sodium
- the base is NaHMDS or NaH. In another embodiment, the base is NaHMDS.
- Dimethylsulfone anion is reacted with compound of Formula V. The reaction can be carried out in presence of a solvent.
- a suitable solvent for the reaction may be selected from a group comprising of ether solvents such as tetrahydrofuran (THF), Me-THF, diethylether, 1,4- dioxane; or halogenated solvents such as dichloromethane, dichloroe thane; or polar aprotic solvents such as acetonitrile, N,N-dimethylformamide, dimethylsulfoxide, dimethylacetamide, N-methyl-2-pyrrolidone or a mixture thereof.
- ether solvents such as tetrahydrofuran (THF), Me-THF, diethylether, 1,4- dioxane
- halogenated solvents such as dichloromethane, dichloroe thane
- polar aprotic solvents such as acetonitrile, N,N-dimethylformamide, dimethylsulfoxide, dimethylacetamide, N-methyl-2-pyrrolidone or a mixture thereof.
- compound of Formula V and dimethylsulfone may be mixed together in a solvent and then a base may be added thus generating the dimethylsulfone anion in-situ followed by reaction with the compound of Formula V.
- the reaction may be carried out at a temperature ranging from about -78 °C to about 10 °C, more preferably at a temperature of about -40 °C to about 5 °C; most preferably at a temperature of about -10 °C to 0 °C.
- the reaction may be carried out for a time sufficient enough to complete the reaction, for example about 30 minutes to 12 hours.
- the compound of Formula IV may be isolated by the well known techniques in the art such as extraction by the solvent and then evaporation of the solvent under reduced pressure. The obtained compound of Formula IV may be further purified before subjecting it to reaction of step b.
- Step b involves deprotecting the compound of Formula IV to obtain compound of Formula III.
- the deprotection of compound of Formula IV may be carried out by a process known for the deprotection of amino protecting group, such as by using acids, bases or by hydrogenolysis.
- Boc-deprotection of compound of Formula IV (when R is tert- butoxy) may be carried out by using reagents such as hydrochloric acid, trifluoroacetic acid, and the like.
- Step c involves converting the compound of Formula III to apremilast.
- the compound of Formula III can be converted to apremilast by a process comprising:
- the compound of Formula III is reacted with a chiral acid HX wherein H is hydrogen and X is acid counterpart.
- the chiral acid can be selected from amino acids or their derivatives.
- a preferred chiral acid is N-acetyl-L-leucine.
- the reaction can be conveniently carried out in presence of a solvent selected from C1-C4 alcohols, acetone and other equivalent ketones, halogenated solvents like dichloromethane and chloroform. In an embodiment the preferred solvent is methanol.
- the reaction may be carried out at a temperature of 25 °C to reflux temperature of the solvent.
- the acid addition salt may be separated from the reaction mass by the processes known to a person skilled in the art.
- the acid addition salt obtained in above step is reacted with 3-acetamidophthalic acid or 3- acetamidophthalic anhydride in presence of a suitable solvent.
- the solvent may be selected from acetone and other equivalent ketones, halogenated solvents like dichloromethane and chloroform, ethers like tetrahydrofuran and 1,4-dioxane or acids like acetic acid or formic acid.
- the solvent is acetic acid.
- an acid like acetic acid or dilute hydrochloric acid may be added to the reaction mixture.
- the reaction may be carried out at temperature of about 25 °C to reflux temperature of the solvent used for a time sufficient for completion of the reaction. Apremilast may be isolated from the reaction mass as per the common processes known in the art. For instance, by distilling out the solvent to obtain crude and purifying the crude by means of crystallization.
- the compound of Formula V used in the above process may be prepared by reacting 3- ethoxy-4-methoxybenzaldehyde (compound of Formula VIII), a compound of Formula VII and a compound of Formula VI in a suitable solvent (Scheme I)
- L in the compound of Formula VI is selected from a group consisting of (C1-C4 alkyl)sulfinate, (C1-C4 haloalkyl)sulfinate, benzenesulfinate, p-toluenesulfinate, - 0(Ci-C4)alkyl or halogen; and the metal is selected from zinc (Zn), iron (Fe), sodium (Na), lithium (Li), potassium (K), calcium (Ca), magnesium (Mg), strontium (Sr) or titanium (Ti); and wherein n is an integer selected from 0 to 4, depending on the valency of metal ion selected.
- the non-limiting examples of Metal + -(L) n " includes sodium benzenesulfinate, sodium p-toluenesulfinate, sodium methanesulfinate, sodium trifluoromethanesulfinate, zinc chloride, lithium bromide, ferric chloride, sodium methoxide, potassium teri-butoxide, titanium ethoxide and the like.
- a suitable solvent for the reaction may be selected from alcoholic solvents such as methanol, ethanol; or aromatic hydrocarbon solvents such as toluene; or ether solvents such as tetrahydrofuran (THF), diethylether; or chlorinated hydrocarbons solvents such as dichlorome thane; or polar aprotic solvents such as acetonitrile, DMF; or ester solvents such as ethyl acetate; or water or a mixture thereof.
- an acid such as formic acid or acetic acid may be added in the reaction mixture.
- the reaction may be carried out at a temperature of about room temperature to about reflux temperature of the solvent for a time sufficient to complete the reaction.
- the product may be isolated by the technique known in the art such as filtration or extraction by using organic solvent.
- the present invention provides a process for the preparation of apremilast, wherein R in the compound of Formula V and IV is teri-butoxy and L in the compound of Formula V is p-toluenesulfonyl group; the process comprises:
- the steps a, b and c can be performed as per the process disclosed earlier in the specification.
- the present invention provides a compound of Formula Va
- the compound of Formula Va can be prepared by one pot process comprising mixing 3- ethoxy-4-methoxybenzaldehyde, teri-butyl carbamate and alkali metal p-toluenesulfinate such as sodium p-toluenesulfinate in a suitable solvent.
- a suitable solvent for the reaction may be selected from alcoholic solvents such as methanol, ethanol; or aromatic hydrocarbon solvents such as toluene; or ether solvents such as tetrahydrofuran (THF), diethylether; or chlorinated hydrocarbons solvents such as dichlorome thane; or polar aprotic solvents such as acetonitrile, DMF; or ester solvents such as ethyl acetate; or water or a mixture thereof.
- the preferred solvent is water.
- the reaction is carried out in presence of an acid such as formic acid.
- the reaction may be carried out at a temperature of about room temperature to about 60 °C, more preferably at room temperature, for a time sufficient to complete the reaction.
- L is a leaving group
- R is (C -C,)alkyl, -0(C -C,)alkyl, or -O-benzyl
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Abstract
The present invention relates to a process for the preparation of 1-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl-ethanamine, an intermediate for the preparation of apremilast via a compound of Formula (V) wherein R is (C1-C4)alkyl, (C1-C4)haloalkyl, -O(C1-C4)alkyl, or –O-benzyl, and L is a leaving group.
Description
NOVEL PROCESS FOR THE PREPARATION OF l-(3-ETHOXY-4-METHOXY- PHENYL)-2-METHYLSULFONYL-ETHANAMINE
FIELD OF THE INVENTION
The present invention relates to a process for the preparation of l-(3-ethoxy-4-methoxy- phenyl)-2-methylsulfonyl-ethanamine, an intermediate used for the preparation of apremilast.
BACKGROUND OF THE INVENTION
Apremilast chemically known as N-[2-[(15)-l-(3-ethoxy-4-methoxyphenyl)-2- (methylsulfonyl)ethyl]-2,3-dihydro-l,3-dioxo-iH-isoindol-4-yl]acetamide is represented by the compound of Formula I:
Formula I
Apremilast is an oral small-molecule inhibitor of phosphodiesterase 4 (PDE4) specific for cyclic adenosine monophosphate (cAMP), marketed in the United states under the brand name OTEZLA® as oral tablets and indicated for the treatment of adult patients with active psoriatic arthritis and for the treatment of patients with moderate to severe plaque psoriasis who are candidates for phototherapy or systemic therapy.
Apremilast is first disclosed in United States Patent No. 7,427,638 (the '638 patent).
Many processes for the preparation of N-[2-[(15)-l-(3-ethoxy-4-methoxyphenyl)-2- (methylsulfonyl)ethyl]-2,3-dihydro-l,3-dioxo-iH-isoindol-4-yl]acetamide or apremilast are reported. Generally, racemic 2-[l-(3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethyl]-4- acetylaminoisoindoline-l,3-dione can be prepared using the methods described in United States Patent No. 6,020,358. The corresponding 5 enantiomer can be isolated from the racemic compound by techniques known in the art.
The '638 patent discloses a process for the preparation of apremilast wherein it is synthesized from 3-acetamidophthalic anhydride and a chiral amino acid salt of (5)-l-(3-ethoxy-4- methoxyphenyl)-2-methanesulfonylethylamine.
The U. S. Pat. No. 9,187,417 discloses the processes for enantioselective preparation of (5)-l- (3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethanamine, an intermediate which is used for preparation of apremilast by using stoichiometric quantity of chiral auxiliary namely (R)-tert- butylsulfinamide or (S)-a-methylbenzylamine.
The U. S. Pat. No. 9,126,906 discloses the process for the enantiomerically enriched preparation of (5)-l-(3-ethoxy-4-methoxyphenyl)-2-methylsulfonylethanamine by reducing corresponding enamine via hydrogenation in the presence of a metal catalyst and a chiral ligand or a chiral metal catalyst/ligand complex.
Although these methods are enabling and useful for preparing apremilast, there is a need for developing a process which is commercially efficient.
The present invention provides a simple, scalable and economical process for the preparation of apremilast.
SUMMARY OF THE INVENTION
The present invention provides a process for the preparation of apremilast, comprising:
(a) reacting a compound of Formula V,
Formula V wherein R is (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, or -Obenzyl, and L is a leaving group, with dimethylsulfone anion to obtain a compound of Formula IV
Formula IV wherein R is as defined above,
(b) deprotecting the compound of Formula IV to obtain a compound of Formula III
Formula III
, and
(c) converting the compound of Formula III to apremilast.
The present invention also provides a novel intermediate of compound of Formula Va
Formula Va its enantiomers or acid addition salts thereof.
The processes of the present invention are economical and suitable for commercial production of apremilast.
DEFINITIONS
The term "(Ci-C4)aikyl" as used herein refers to an straight or branched chain, saturated monovalent hydrocarbon residue containing 1-4 carbon atoms. Examples of (Ci-C4)alkyl includes but are not limited to methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, and tert- butyl.
The term "-0(Ci-C4)alkyl" as used herein refers to a group in which (Ci-C4)alkyl group as defined above, is attached to another group via an oxygen atom. Examples of -0(Ci-C4)alkyl includes but are not limited to methoxy, ethoxy, n-propoxy, n-butoxy, teri-butoxy and the like.
The term "(Ci-C4)haloalkyl" as used herein refers to C1-C4 alkyl group as defined above, wherein one or more hydrogen atoms of alkyl group is substituted by one or more halogens. Examples of (Ci-C4)haloalkyl includes but are not limited to trifluromethyl, trichloromethyl.
The term "halogen" as used herein refers to chloro, bromo, iodo or fluoro.
DETAILED DESCRIPTION OF THE INVENTION
In one aspect, the present invention provides a process for the preparation of apremilast, comprising:
(a) reacting a compound of Formula V
Formula V wherein R is (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, or -O-benzyl, and L is a leaving group, with dimethylsulfone anion to obtain a compound of Formula IV
Formula IV wherein R is as defined above,
Formula III
, and
(c) converting the compound of Formula III to apremilast.
In one embodiment, R in the compound of Formula IV and V is selected from (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, and -O-benzyl; preferably R is -0(Ci-C4)alkyl; more preferably R is teri-butoxy.
In another embodiment, L in the compound of Formula V is a leaving group selected from a group consisting of -S(0)2-(Ci-C4 alkyl), -S(0)2-(Ci-C4 haloalkyl), benzenesulfonyl, p- toluenesulfonyl, -0(Ci-C4)alkyl or halogen. In a preferred embodiment L is p-toluenesulfonyl group.
Accordingly, step a involve reaction of compound of Formula V with dimethylsulfone anion. Dimethylsulfone anion can be prepared by reacting dimethylsulfone with a strong base. Strong base suitable for the purpose can be selected from sodium
(NaHMDS), lithium Ws<trimethylsilyl)amide (LiHMDS), «-butyl lithium («-BuLi), sodium hydride or hydroxide like potassium hydroxide. In one embodiment, the base is NaHMDS or NaH. In another embodiment, the base is NaHMDS. Dimethylsulfone anion is reacted with compound of Formula V. The reaction can be carried out in presence of a solvent. A suitable solvent for the reaction may be selected from a group comprising of ether solvents such as tetrahydrofuran (THF), Me-THF, diethylether, 1,4- dioxane; or halogenated solvents such as dichloromethane, dichloroe thane; or polar aprotic solvents such as acetonitrile, N,N-dimethylformamide, dimethylsulfoxide, dimethylacetamide, N-methyl-2-pyrrolidone or a mixture thereof. The most preferred solvent is tetrahydrofuran. Alternatively, compound of Formula V and dimethylsulfone may be mixed together in a solvent and then a base may be added thus generating the dimethylsulfone anion in-situ followed by reaction with the compound of Formula V. The reaction may be carried out at a temperature ranging from about -78 °C to about 10 °C, more
preferably at a temperature of about -40 °C to about 5 °C; most preferably at a temperature of about -10 °C to 0 °C. The reaction may be carried out for a time sufficient enough to complete the reaction, for example about 30 minutes to 12 hours. The compound of Formula IV may be isolated by the well known techniques in the art such as extraction by the solvent and then evaporation of the solvent under reduced pressure. The obtained compound of Formula IV may be further purified before subjecting it to reaction of step b.
Step b involves deprotecting the compound of Formula IV to obtain compound of Formula III. The deprotection of compound of Formula IV may be carried out by a process known for the deprotection of amino protecting group, such as by using acids, bases or by hydrogenolysis. For instance Boc-deprotection of compound of Formula IV (when R is tert- butoxy) may be carried out by using reagents such as hydrochloric acid, trifluoroacetic acid, and the like.
Step c involves converting the compound of Formula III to apremilast. The compound of Formula III can be converted to apremilast by a process comprising:
(i) reacting the compound of Formula III with a chiral acid HX, to form an acid addition salt of following formula
Acid addition salt
wherein H is hydrogen and X is acid counterpart, and
(ii) reacting the acid addition salt with 3-acetamidophthalic acid or 3-acetamidophthalic anhydride to obtain apremilast.
The compound of Formula III is reacted with a chiral acid HX wherein H is hydrogen and X is acid counterpart. The chiral acid can be selected from amino acids or their derivatives. A preferred chiral acid is N-acetyl-L-leucine. The reaction can be conveniently carried out in presence of a solvent selected from C1-C4 alcohols, acetone and other equivalent ketones, halogenated solvents like dichloromethane and chloroform. In an embodiment the preferred
solvent is methanol. The reaction may be carried out at a temperature of 25 °C to reflux temperature of the solvent. The acid addition salt may be separated from the reaction mass by the processes known to a person skilled in the art.
The acid addition salt obtained in above step is reacted with 3-acetamidophthalic acid or 3- acetamidophthalic anhydride in presence of a suitable solvent. The solvent may be selected from acetone and other equivalent ketones, halogenated solvents like dichloromethane and chloroform, ethers like tetrahydrofuran and 1,4-dioxane or acids like acetic acid or formic acid. In a preferred embodiment the solvent is acetic acid. When the solvent is other than acid, an acid like acetic acid or dilute hydrochloric acid may be added to the reaction mixture. The reaction may be carried out at temperature of about 25 °C to reflux temperature of the solvent used for a time sufficient for completion of the reaction. Apremilast may be isolated from the reaction mass as per the common processes known in the art. For instance, by distilling out the solvent to obtain crude and purifying the crude by means of crystallization.
The compound of Formula V used in the above process, may be prepared by reacting 3- ethoxy-4-methoxybenzaldehyde (compound of Formula VIII), a compound of Formula VII and a compound of Formula VI in a suitable solvent (Scheme I)
Scheme I
Formula VIII Formula V
wherein, R in the compound of Formula VII and V and L in the compound of Formula V are as defined above; L in the compound of Formula VI is selected from a group consisting of (C1-C4 alkyl)sulfinate, (C1-C4 haloalkyl)sulfinate, benzenesulfinate, p-toluenesulfinate, - 0(Ci-C4)alkyl or halogen; and the metal is selected from zinc (Zn), iron (Fe), sodium (Na), lithium (Li), potassium (K), calcium (Ca), magnesium (Mg), strontium (Sr) or titanium (Ti); and wherein n is an integer selected from 0 to 4, depending on the valency of metal ion selected. The non-limiting examples of Metal+-(L)n " (Formula VI) includes sodium benzenesulfinate, sodium p-toluenesulfinate, sodium methanesulfinate, sodium
trifluoromethanesulfinate, zinc chloride, lithium bromide, ferric chloride, sodium methoxide, potassium teri-butoxide, titanium ethoxide and the like.
A suitable solvent for the reaction may be selected from alcoholic solvents such as methanol, ethanol; or aromatic hydrocarbon solvents such as toluene; or ether solvents such as tetrahydrofuran (THF), diethylether; or chlorinated hydrocarbons solvents such as dichlorome thane; or polar aprotic solvents such as acetonitrile, DMF; or ester solvents such as ethyl acetate; or water or a mixture thereof. Optionally an acid such as formic acid or acetic acid may be added in the reaction mixture. The reaction may be carried out at a temperature of about room temperature to about reflux temperature of the solvent for a time sufficient to complete the reaction. The product may be isolated by the technique known in the art such as filtration or extraction by using organic solvent.
In a preferred embodiment, the present invention provides a process for the preparation of apremilast, wherein R in the compound of Formula V and IV is teri-butoxy and L in the compound of Formula V is p-toluenesulfonyl group; the process comprises:
(a) reacting a compound of Formula
Formula Va
with dimethylsulfone anion to obtain la IVa
Formula IVa
Formula III
, and
(c) converting the compound of Formula III to apremilast.
In another embodiment, the steps a, b and c can be performed as per the process disclosed earlier in the specification.
In another aspect, the present invention provides a compound of Formula Va
Formula Va its enantiomers or salts thereof.
The compound of Formula Va can be prepared by one pot process comprising mixing 3- ethoxy-4-methoxybenzaldehyde, teri-butyl carbamate and alkali metal p-toluenesulfinate such as sodium p-toluenesulfinate in a suitable solvent. A suitable solvent for the reaction may be selected from alcoholic solvents such as methanol, ethanol; or aromatic hydrocarbon solvents such as toluene; or ether solvents such as tetrahydrofuran (THF), diethylether; or chlorinated hydrocarbons solvents such as dichlorome thane; or polar aprotic solvents such as acetonitrile, DMF; or ester solvents such as ethyl acetate; or water or a mixture thereof. The preferred solvent is water. Preferably the reaction is carried out in presence of an acid such as formic acid. The reaction may be carried out at a temperature of about room temperature to about 60 °C, more preferably at room temperature, for a time sufficient to complete the reaction.
The complete process for the preparation of apremilast of the present invention can be depicted as in Scheme below:
Formula V
L is a leaving group
R is (C -C,)alkyl, -0(C -C,)alkyl, or -O-benzyl
Formula I Acid addition salt
The present invention is further illustrated in detail with reference to the following examples. It is desired that the examples be considered in all respect as illustrative and are not intended to limit the scope of the claimed invention.
EXAMPLES:
Example 1: Preparation of tert-butyl N-[(3-ethoxy-4-methoxy-phi toly
A solution of 3-ethoxy-4-methoxybenzaldehyde, ieri-butyl carbamate and sodium p- toluenesulfinate in water was stirred at 25-30 °C. Formic acid was added into the reaction mixture and stirred for 48 hours at 25-30 °C. After completion of reaction, the reaction mixture was filtered to obtain the solid product, washed with methanol: water (1:9) mixture and dried in vacuum oven. Yield: 90 %. ¾ NMR (400 MHz, DMSO-d6) δ 8.63-8.66 (d, 1H), 7.73-7.75 (d, 2H), 7.46-7.48 (d, 2H), 7.29 (s, 1H), 7.12-7.15 (dd, 1H), 6.97-7.12 (d, 1H), 5.89-5.91(d, 2H), 4.02-4.07 (q, 2H), 3.82 (s, 3H), 2.43 (s, 3H), 1.36-1.40 (t, 3H), 1.25 (s, 9H).
Example 2: Preparation of tert-butyl N-[l-(3-ethoxy-4-methoxy-phenyl)-2- methylsulfonyl-ethyljc
A mixture of dimethylsulfone in dry tetrahydrofuran was cooled to -5 °C to 0 °C and was added a solution of NaHMDS in THF (35 % solution). The resulting suspension was stirred at -5 °C to 0 °C for 1 hour. A solution of teri-butyl N-[(3-ethoxy-4-methoxy-phenyl)-(p- tolylsulfonyl)methyl]carbamate in dry dichloromethane was added into the reaction mass at - 5 °C to 0 °C and stirred fori hour. After completion of reaction, the reaction mixture was quenched with water and diluted with dichloromethane. The organic layer was separated and concentrated under reduced pressure to afford the crude product, which was triturated with isopropanol and hexane mixture to yield off-white solid of title compound. Yield: 90 %. ¾ NMR (400MHZ, CDCb) δ 6.83-6.88 (m, 3H), 5.59-5.60 (broad d, 1H), 5.13-5.14 (broad d, 1H), 4.02-4.26 (q, 2H), 3.84-3.89 (s, 3H), 3.63-3.66 (m, 1H), 3.37-3.41 (m, 1H), 2.61-2.66 (s, 3H), 1.41-1.46 (m, 12H).
Example 3: Preparation of l-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl- ethanamine
To a solution of teri-butyl N-[l-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl- ethyl]carbamate in acetonitrile was added isopropyl alcohol hydrochloride solution (IPA- HC1, 14 %) at 25-30 °C. The resultant reaction mixture was stirred for 12 hours at the same temperature. After completion of the reaction, the reaction mass was concentrated under reduced pressure and partitioned between 10 % aq. NaOH solution and dichloromethane. The organic layer was separated and concentrated under reduced pressure to afford the title compound as white solid. Yield: 95 %.
Example 4: Preparation of (S)-2-(3-ethoxy-4-methoxy-phenyl)-2-(methylsulfonyl)-eth- 2-ylamine-N-ace
To 1 liter round bottom flask , l-(3-ethoxy-4-methoxy-phenyl)-2-methylsulfonyl-ethanamine, N-acetyl-L-leucine and methanol were charged and the suspension was stirred at 60 °C to 65 °C for 1 hour, the suspension was cooled to room temperature and stirred for another 3 hours. The solid was filtered and dried under reduced pressure to obtain the title compound with chiral purity of 85 % desired isomer. Yield: 40 %.
It was further purified by methanol to give pure title compound having chiral purity 99.5%.
Example 5: Apremilast
To a 500 mL RBF the product of example 4, 3-acetamidophthalic anhydride and acetic acid were charged and stirred at 110 °C to 115 °C for 1 hour and the solution was cooled to 60-65 °C. Acetic acid was distilled off completely and the residue was dissolved in dichloromethane. The dichloromethane layer was washed with water followed by washing with aq. sodium bicarbonate solution. The dichloromethane layer was separated and distilled off completely. The product was isolated by recrystallization in acetone:ethanol mixture to give apremilast as a light yellow solid with chiral purity of 99.9 % and HPLC purity of 99.8 %. Yield: 75 %.
Example 6: Apremilast
To a 500 mL RBF the product of example 4, 3-acetamidophthalic acid and acetic acid were charged and stirred at 110 °C to 115 °C for 1 hour and the solution was cooled to 60-65 °C. Acetic acid was distilled off completely and the residue was dissolved in dichloromethane. The dichloromethane layer was washed with water followed by washing with aq. sodium bicarbonate solution. The dichloromethane layer was separated and distilled off completely. The product was isolated by recrystallization in acetone :ethanol mixture to give apremilast as a light yellow solid with HPLC purity of 99.9 %. Yield: 75 %.
Claims
1. A process for the preparation of apremilast, comprising
(a) reacting a compound of Formu
Formula V wherein R is (Ci-C4)alkyl, (Ci-C4)haloalkyl, -0(Ci-C4)alkyl, or -O-benzyl, and L is a leaving group, with dime thylsulf one anion to obtain a compound of Formula IV
Formula IV wherein R is as defined above,
(b) deprotecting the compound of Formula IV to obtain a compound of Formula III
Formula III
, and
(c) converting the compound of Formula III to apremilast.
2. The process as claimed in claim 1, wherein L is a leaving group selected from a group consisting of -S(0)2-(Ci-C4 alkyl), -S(0)2-(Ci-C4 haloalkyl), benzenesulfonyl, p- toluenesulfonyl, -0(Ci-C4)alkyl or halogen.
3. The process as claimed in claim 1, wherein R is teri-butoxy and L is p-toluenesulfonyl.
4. The process as claimed in claim 1, wherein in step c, the compound of Formula III is converted to apremilast by a process comprising:
(i) reacting the compound of Formula III with a chiral acid HX, to form an acid addition salt of following formula
Acid addition salt
wherein H is hydrogen and X is acid counterpart, and
(ii) reacting the acid addition salt with 3-acetamidophthalic acid or 3- acetamidophthalic anhydride to obtain apremilast.
5. The process as claimed in claim 4, wherein the chiral acid HX is N-acetyl-L-leucine.
6. A compound of Formula Va
Formula Va its enantiomers or acid addition salts thereof.
7. A process for the preparation of apremilast, comprising:
(a) reacting a compound of Formu
Formula Va
Formula IVa
(b) deprotecting the compound of Formula IVa to obtain a compound of Formula III
Formula III
, and
(c) converting the compound of Formula III to apremilast.
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Cited By (2)
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---|---|---|---|---|
WO2018184933A1 (en) * | 2017-04-04 | 2018-10-11 | Quimica Sintetica, S. A. | Racemic beta-aminosulfone compounds |
EP3929179A1 (en) * | 2020-06-22 | 2021-12-29 | Biohorm, S.L. | Anti-inflammatory compounds and methods for their manufacture |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US20130217918A1 (en) * | 2012-02-21 | 2013-08-22 | Celgene Corporation | Processes for the preparation of (s)-1-(3-ethoxy-4-methoxyphenyl)-2-methanesulfonylethylamine |
CN104447445A (en) * | 2014-12-05 | 2015-03-25 | 新发药业有限公司 | Preparation method for synthesizing apremilast intermediate |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US20130217918A1 (en) * | 2012-02-21 | 2013-08-22 | Celgene Corporation | Processes for the preparation of (s)-1-(3-ethoxy-4-methoxyphenyl)-2-methanesulfonylethylamine |
CN104447445A (en) * | 2014-12-05 | 2015-03-25 | 新发药业有限公司 | Preparation method for synthesizing apremilast intermediate |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2018184933A1 (en) * | 2017-04-04 | 2018-10-11 | Quimica Sintetica, S. A. | Racemic beta-aminosulfone compounds |
EP3929179A1 (en) * | 2020-06-22 | 2021-12-29 | Biohorm, S.L. | Anti-inflammatory compounds and methods for their manufacture |
WO2021259860A1 (en) * | 2020-06-22 | 2021-12-30 | Biohorm, S.L. | Anti-inflammatory compounds and methods for their manufacture |
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