TW200626569A - Alicyclic type epoxy(meth)acrylic acid esters and the process of manufacuture thereof, and copolymer - Google Patents
Alicyclic type epoxy(meth)acrylic acid esters and the process of manufacuture thereof, and copolymerInfo
- Publication number
- TW200626569A TW200626569A TW094141883A TW94141883A TW200626569A TW 200626569 A TW200626569 A TW 200626569A TW 094141883 A TW094141883 A TW 094141883A TW 94141883 A TW94141883 A TW 94141883A TW 200626569 A TW200626569 A TW 200626569A
- Authority
- TW
- Taiwan
- Prior art keywords
- copolymer
- monomer
- unit
- manufacuture
- meth
- Prior art date
Links
- 229920001577 copolymer Polymers 0.000 title abstract 5
- 239000004593 Epoxy Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 title 1
- 125000002723 alicyclic group Chemical group 0.000 title 1
- 239000000178 monomer Substances 0.000 abstract 7
- 150000001875 compounds Chemical class 0.000 abstract 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 abstract 4
- 238000006116 polymerization reaction Methods 0.000 abstract 3
- -1 N-substituted maleimide Chemical class 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000004321 preservation Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
- 238000003786 synthesis reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/04—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen
- C07D301/06—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen in the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/12—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/04—Compounds containing oxirane rings containing only hydrogen and carbon atoms in addition to the ring oxygen atoms
- C07D303/06—Compounds containing oxirane rings containing only hydrogen and carbon atoms in addition to the ring oxygen atoms in which the oxirane rings are condensed with a carbocyclic ring system having three or more relevant rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/16—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
- C07D303/17—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals containing oxirane rings condensed with carbocyclic ring systems having three or more relevant rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/31—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals in which the oxirane rings are condensed with a carbocyclic ring system having three or more relevant rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/32—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by aldehydo- or ketonic radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004346860A JP2006151900A (ja) | 2004-11-30 | 2004-11-30 | 脂環式エポキシ（メタ）アクリレート及びその製造方法 |
| JP2004361381 | 2004-12-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200626569A true TW200626569A (en) | 2006-08-01 |
| TWI417287B TWI417287B (zh) | 2013-12-01 |
Family
ID=36564997
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101141700A TWI417286B (zh) | 2004-11-30 | 2005-11-29 | 脂環式環氧（甲基）丙烯酸酯之製法 |
| TW094141883A TWI417287B (zh) | 2004-11-30 | 2005-11-29 | 共聚物及其製法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101141700A TWI417286B (zh) | 2004-11-30 | 2005-11-29 | 脂環式環氧（甲基）丙烯酸酯之製法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20090124776A1 (zh) |
| EP (1) | EP1818327A4 (zh) |
| KR (1) | KR101255866B1 (zh) |
| TW (2) | TWI417286B (zh) |
| WO (1) | WO2006059564A1 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI405038B (zh) * | 2007-03-22 | 2013-08-11 | Jsr Corp | A radiation-sensitive resin composition, an interlayer insulating film and a microlens, and a method for manufacturing the same |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008031248A (ja) * | 2006-07-27 | 2008-02-14 | Daicel Chem Ind Ltd | 硬化性樹脂組成物及び硬化塗膜の形成方法 |
| WO2008081935A1 (ja) | 2006-12-28 | 2008-07-10 | Kyocera Corporation | 弾性表面波装置およびその製造方法 |
| US8084545B2 (en) | 2007-05-11 | 2011-12-27 | Daicel Chemical Industries, Ltd. | Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles |
| JP5367324B2 (ja) | 2008-07-25 | 2013-12-11 | 株式会社ダイセル | 硬化性共重合体及び硬化性樹脂組成物 |
| CN102863872B (zh) | 2008-09-30 | 2015-08-19 | 日立化成株式会社 | 涂布剂、使用该涂布剂的光半导体元件搭载用基板及光半导体装置 |
| US8981040B2 (en) * | 2010-02-12 | 2015-03-17 | Daicel Corporation | Cationically polymerizable resin, cationically polymerizable resin composition, and cured products thereof |
| KR101740473B1 (ko) * | 2011-01-31 | 2017-05-26 | 닛산 가가쿠 고교 가부시키 가이샤 | 마이크로 렌즈 형성용 감광성 수지 조성물 |
| WO2014129486A1 (ja) * | 2013-02-22 | 2014-08-28 | 日本ゼオン株式会社 | 重合性組成物、シクロオレフィン系重合体、シクロオレフィン系樹脂成形体、および積層体 |
| KR101638354B1 (ko) * | 2013-05-28 | 2016-07-11 | 동우 화인켐 주식회사 | 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서 |
| US20160083331A1 (en) * | 2013-06-21 | 2016-03-24 | Daicel Corporation | Polyfunctional (meth)acrylate, and method for producing same |
| KR101592849B1 (ko) * | 2014-09-05 | 2016-02-11 | 동우 화인켐 주식회사 | 네가티브형 감광성 수지 조성물 |
| US10518512B2 (en) * | 2015-03-31 | 2019-12-31 | 3M Innovative Properties Company | Method of forming dual-cure nanostructure transfer film |
| JP6968535B2 (ja) * | 2016-12-28 | 2021-11-17 | 東京応化工業株式会社 | 組成物、硬化物、パターン形成方法、化合物、重合体、及び化合物の製造方法 |
| TWI741223B (zh) * | 2017-10-20 | 2021-10-01 | 南韓商東友精細化工有限公司 | 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置 |
| KR102118627B1 (ko) * | 2017-11-10 | 2020-06-09 | 주식회사 엘지화학 | 광경화성 및 열경화성을 갖는 공중합체, 이를 이용한 감광성 수지 조성물, 감광성 수지 필름, 및 컬러필터 |
| JP7192577B2 (ja) * | 2019-03-06 | 2022-12-20 | 信越化学工業株式会社 | エポキシ化合物、レジスト組成物及びパターン形成方法 |
| TW202132274A (zh) | 2019-12-25 | 2021-09-01 | 日商東京應化工業股份有限公司 | 硬化性組合物、硬化物、（甲基）丙烯酸樹脂、及化合物 |
| JP7376347B2 (ja) | 2019-12-25 | 2023-11-08 | 東京応化工業株式会社 | 樹脂組成物、硬化物、及びシロキサン変性（メタ）アクリル樹脂 |
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| FR1317779A (zh) * | 1961-03-17 | 1963-05-08 | ||
| JPH0629277B2 (ja) * | 1985-10-04 | 1994-04-20 | 日本製紙株式会社 | アクリレ−ト化合物およびその製造法 |
| US4772672A (en) * | 1986-05-15 | 1988-09-20 | Kansai Paint Company, Limited | Curable compositions and method of curing same |
| JPS63112670A (ja) * | 1986-10-29 | 1988-05-17 | Kansai Paint Co Ltd | 水性被覆用組成物 |
| JPS63221123A (ja) * | 1987-03-09 | 1988-09-14 | Kansai Paint Co Ltd | 低温硬化性樹脂組成物 |
| JPS63248839A (ja) * | 1987-04-03 | 1988-10-17 | Kansai Paint Co Ltd | 水性顔料分散液 |
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| GB2212164B (en) * | 1987-11-12 | 1992-01-29 | Kansai Paint Co Ltd | Low temperature curable composition |
| GB2212507B (en) * | 1987-11-20 | 1991-04-03 | Kansai Paint Co Ltd | Curable resin and resin composition curable at low temperature |
| GB2219591B (en) * | 1988-05-17 | 1992-01-22 | Kansai Paint Co Ltd | Radiation curable unsaturated resin |
| EP0392029B1 (en) * | 1988-10-12 | 1994-03-23 | Tosoh Corporation | Polyalicyclic polyacrylic ester derivatives |
| JPH02240126A (ja) * | 1989-03-14 | 1990-09-25 | Kansai Paint Co Ltd | 樹脂組成物、硬化性組成物及び塗料組成物 |
| JPH03240780A (ja) * | 1990-02-14 | 1991-10-28 | Tosoh Corp | ジシクロペンタジエン誘導体のエポキシ化物の製造方法 |
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| JP2906276B2 (ja) * | 1990-06-05 | 1999-06-14 | ダイセル化学工業株式会社 | エポキシ化された（メタ）アクリレートの製造方法 |
| FR2664272B3 (fr) * | 1990-07-06 | 1992-11-27 | Norsolor | Procede d'epoxydation selective de (meth)acrylates insatures, nouveaux (meth)acrylates fonctionnels obtenus et leur application a la synthese de nouveaux polymeres. |
| JPH0794587B2 (ja) * | 1990-11-14 | 1995-10-11 | 日本ペイント株式会社 | 新規常温硬化性樹脂組成物及び塗料組成物 |
| JP2865889B2 (ja) * | 1991-03-01 | 1999-03-08 | 関西ペイント株式会社 | 上塗り着色ベース塗料組成物及び塗装方法 |
| JPH05247402A (ja) * | 1992-03-10 | 1993-09-24 | Kansai Paint Co Ltd | 自動車プラスチック部材用塗料 |
| US5800965A (en) * | 1996-02-29 | 1998-09-01 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it |
| US6106998A (en) * | 1997-06-19 | 2000-08-22 | Nec Corporation | Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices |
| JP3055495B2 (ja) * | 1997-06-23 | 2000-06-26 | 日本電気株式会社 | 感光性樹脂組成物およびそれを用いたパターン形成方法 |
| JP3784933B2 (ja) * | 1997-08-25 | 2006-06-14 | コダックポリクロームグラフィックス株式会社 | 感光性平版印刷版の現像処理方法 |
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| JPH11311862A (ja) * | 1998-04-30 | 1999-11-09 | Mitsubishi Chemical Corp | 光重合性感光材料 |
| KR100382960B1 (ko) * | 1998-07-03 | 2003-05-09 | 닛뽕덴끼 가부시끼가이샤 | 락톤 구조를 갖는 (메트)아크릴레이트 유도체, 중합체,포토레지스트 조성물, 및 이것을 사용한 패턴 형성 방법 |
| US6437052B1 (en) * | 1998-11-02 | 2002-08-20 | Nec Corporation | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same |
| WO2001019888A1 (en) * | 1999-09-10 | 2001-03-22 | Sartomer Company, Inc. | Coating composition and method of coating substrates |
| DE10112023A1 (de) * | 2001-03-07 | 2002-10-02 | Atotech Deutschland Gmbh | Verfahren zum Bilden eines Metallmusters auf einen dielektrischen Substrat |
| US6643165B2 (en) * | 2001-07-25 | 2003-11-04 | Nantero, Inc. | Electromechanical memory having cell selection circuitry constructed with nanotube technology |
| KR100697584B1 (ko) * | 2001-09-25 | 2007-03-22 | 다이니폰 인사츠 가부시키가이샤 | 알칼리 가용성 말레이미드 공중합체 및 이를 함유하는액정 디스플레이 |
| US6620905B1 (en) * | 2002-02-23 | 2003-09-16 | National Starch And Chemical Investment Holding Corporation | Curable compositions containing benzoxazine |
| US6806026B2 (en) * | 2002-05-31 | 2004-10-19 | International Business Machines Corporation | Photoresist composition |
-
2005
- 2005-11-28 WO PCT/JP2005/021794 patent/WO2006059564A1/ja active Application Filing
- 2005-11-28 US US11/666,943 patent/US20090124776A1/en not_active Abandoned
- 2005-11-28 EP EP05809648A patent/EP1818327A4/en not_active Withdrawn
- 2005-11-28 KR KR1020077015001A patent/KR101255866B1/ko active Active
- 2005-11-29 TW TW101141700A patent/TWI417286B/zh not_active IP Right Cessation
- 2005-11-29 TW TW094141883A patent/TWI417287B/zh active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI405038B (zh) * | 2007-03-22 | 2013-08-11 | Jsr Corp | A radiation-sensitive resin composition, an interlayer insulating film and a microlens, and a method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI417287B (zh) | 2013-12-01 |
| WO2006059564A1 (ja) | 2006-06-08 |
| TW201313694A (zh) | 2013-04-01 |
| TWI417286B (zh) | 2013-12-01 |
| US20090124776A1 (en) | 2009-05-14 |
| EP1818327A1 (en) | 2007-08-15 |
| KR101255866B1 (ko) | 2013-04-17 |
| EP1818327A4 (en) | 2010-02-24 |
| KR20070086833A (ko) | 2007-08-27 |
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