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TW200602157A - Polishing pad having grooves configured to promote mixing wakes during polishing - Google Patents

Polishing pad having grooves configured to promote mixing wakes during polishing

Info

Publication number
TW200602157A
TW200602157A TW094116738A TW94116738A TW200602157A TW 200602157 A TW200602157 A TW 200602157A TW 094116738 A TW094116738 A TW 094116738A TW 94116738 A TW94116738 A TW 94116738A TW 200602157 A TW200602157 A TW 200602157A
Authority
TW
Taiwan
Prior art keywords
polishing
polishing pad
promote mixing
grooves configured
mixing wakes
Prior art date
Application number
TW094116738A
Other languages
English (en)
Other versions
TWI353906B (en
Inventor
Gregory P Muldowney
Original Assignee
Rohm & Haas Elect Mat
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas Elect Mat filed Critical Rohm & Haas Elect Mat
Publication of TW200602157A publication Critical patent/TW200602157A/zh
Application granted granted Critical
Publication of TWI353906B publication Critical patent/TWI353906B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S451/00—Abrading
    • Y10S451/921—Pad for lens shaping tool

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW094116738A 2004-06-16 2005-05-23 Polishing pad having grooves configured to promote TWI353906B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/869,394 US6974372B1 (en) 2004-06-16 2004-06-16 Polishing pad having grooves configured to promote mixing wakes during polishing

Publications (2)

Publication Number Publication Date
TW200602157A true TW200602157A (en) 2006-01-16
TWI353906B TWI353906B (en) 2011-12-11

Family

ID=35452479

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116738A TWI353906B (en) 2004-06-16 2005-05-23 Polishing pad having grooves configured to promote

Country Status (7)

Country Link
US (2) US6974372B1 (zh)
JP (1) JP4786946B2 (zh)
KR (1) KR101184628B1 (zh)
CN (1) CN100479992C (zh)
DE (1) DE102005023469A1 (zh)
FR (1) FR2871716B1 (zh)
TW (1) TWI353906B (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7377840B2 (en) * 2004-07-21 2008-05-27 Neopad Technologies Corporation Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
US7704125B2 (en) 2003-03-24 2010-04-27 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US8864859B2 (en) 2003-03-25 2014-10-21 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US9278424B2 (en) 2003-03-25 2016-03-08 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
US7266568B1 (en) * 2003-04-11 2007-09-04 Ricoh Company, Ltd. Techniques for storing multimedia information with source documents
US6974372B1 (en) * 2004-06-16 2005-12-13 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad having grooves configured to promote mixing wakes during polishing
TWI385050B (zh) 2005-02-18 2013-02-11 Nexplanar Corp 用於ｃｍｐ之特製拋光墊及其製造方法及其用途
KR100721196B1 (ko) * 2005-05-24 2007-05-23 주식회사 하이닉스반도체 연마패드 및 이를 이용한 화학적기계적연마장치
US7311590B1 (en) 2007-01-31 2007-12-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with grooves to retain slurry on the pad texture
US7520798B2 (en) * 2007-01-31 2009-04-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with grooves to reduce slurry consumption
JP5284610B2 (ja) * 2007-08-20 2013-09-11 八千代マイクロサイエンス株式会社 両面ラップ盤用回転定盤
US9180570B2 (en) 2008-03-14 2015-11-10 Nexplanar Corporation Grooved CMP pad
TWI492818B (zh) * 2011-07-12 2015-07-21 Iv Technologies Co Ltd 研磨墊、研磨方法以及研磨系統
US20140024299A1 (en) * 2012-07-19 2014-01-23 Wen-Chiang Tu Polishing Pad and Multi-Head Polishing System
TWI599447B (zh) 2013-10-18 2017-09-21 卡博特微電子公司 具有偏移同心溝槽圖樣之邊緣排除區的ｃｍｐ拋光墊
CN103769995B (zh) * 2013-12-31 2017-01-25 于静 一种研磨下盘结构
TWI549781B (zh) * 2015-08-07 2016-09-21 智勝科技股份有限公司 研磨墊、研磨系統及研磨方法
CN111941251A (zh) * 2020-07-08 2020-11-17 上海新昇半导体科技有限公司 一种抛光垫、抛光设备及硅片的抛光方法
CN117862986B (zh) * 2024-03-06 2024-05-10 长沙韶光芯材科技有限公司 一种玻璃基片研磨装置及研磨方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE398709A (zh) * 1932-09-22
FR2365411A1 (fr) * 1976-09-27 1978-04-21 Robert Jean Ponceuse a disque de papier abrasif monte sur un plateau circulaire tournant
JPS63237865A (ja) * 1987-03-25 1988-10-04 Matsushima Kogyo Co Ltd 回転式研磨機の定盤
US5690540A (en) * 1996-02-23 1997-11-25 Micron Technology, Inc. Spiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafers
US6273806B1 (en) * 1997-05-15 2001-08-14 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus
US5921855A (en) * 1997-05-15 1999-07-13 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing system
US5990012A (en) * 1998-01-27 1999-11-23 Micron Technology, Inc. Chemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing pads
JPH11216663A (ja) * 1998-02-03 1999-08-10 Sony Corp 研磨パッド、研磨装置および研磨方法
US6315857B1 (en) * 1998-07-10 2001-11-13 Mosel Vitelic, Inc. Polishing pad shaping and patterning
JP2000237950A (ja) * 1999-02-18 2000-09-05 Nec Corp 半導体ウェハーの研磨パッド及び半導体装置の製造方法
US6328632B1 (en) * 1999-08-31 2001-12-11 Micron Technology, Inc. Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies
US20020068516A1 (en) * 1999-12-13 2002-06-06 Applied Materials, Inc Apparatus and method for controlled delivery of slurry to a region of a polishing device
US6656019B1 (en) * 2000-06-29 2003-12-02 International Business Machines Corporation Grooved polishing pads and methods of use
KR20020022198A (ko) 2000-09-19 2002-03-27 윤종용 표면에 비 선형 트랙이 형성된 연마 패드를 구비하는화학적 기계적 연마 장치
KR100646702B1 (ko) * 2001-08-16 2006-11-17 에스케이씨 주식회사 홀 및/또는 그루브로 형성된 화학적 기계적 연마패드
US6783436B1 (en) * 2003-04-29 2004-08-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with optimized grooves and method of forming same
US6843711B1 (en) * 2003-12-11 2005-01-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc Chemical mechanical polishing pad having a process-dependent groove configuration
US6843709B1 (en) * 2003-12-11 2005-01-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method for reducing slurry reflux
US6955587B2 (en) 2004-01-30 2005-10-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc Grooved polishing pad and method
US6974372B1 (en) * 2004-06-16 2005-12-13 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad having grooves configured to promote mixing wakes during polishing

Also Published As

Publication number Publication date
JP4786946B2 (ja) 2011-10-05
US20050282479A1 (en) 2005-12-22
US20060025061A1 (en) 2006-02-02
US6974372B1 (en) 2005-12-13
CN1712187A (zh) 2005-12-28
KR20060048390A (ko) 2006-05-18
US7108597B2 (en) 2006-09-19
JP2006007412A (ja) 2006-01-12
FR2871716A1 (fr) 2005-12-23
TWI353906B (en) 2011-12-11
CN100479992C (zh) 2009-04-22
KR101184628B1 (ko) 2012-09-21
FR2871716B1 (fr) 2008-03-28
DE102005023469A1 (de) 2006-03-16

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