KR20230127064A - Photosensitive resin composition, photosensitive resin layer using the same and color filter - Google Patents
Photosensitive resin composition, photosensitive resin layer using the same and color filter Download PDFInfo
- Publication number
- KR20230127064A KR20230127064A KR1020220024685A KR20220024685A KR20230127064A KR 20230127064 A KR20230127064 A KR 20230127064A KR 1020220024685 A KR1020220024685 A KR 1020220024685A KR 20220024685 A KR20220024685 A KR 20220024685A KR 20230127064 A KR20230127064 A KR 20230127064A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive resin
- weight
- resin composition
- pigment
- red
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920005989 resin Polymers 0.000 title claims abstract description 114
- 239000011347 resin Substances 0.000 title claims abstract description 114
- 239000011342 resin composition Substances 0.000 title claims abstract description 87
- 239000000049 pigment Substances 0.000 claims abstract description 100
- 239000006185 dispersion Substances 0.000 claims abstract description 69
- 150000001875 compounds Chemical class 0.000 claims abstract description 50
- 239000011230 binding agent Substances 0.000 claims abstract description 46
- 239000003086 colorant Substances 0.000 claims abstract description 21
- 239000003999 initiator Substances 0.000 claims abstract description 21
- 239000002904 solvent Substances 0.000 claims abstract description 21
- 239000001054 red pigment Substances 0.000 claims abstract description 16
- 239000001056 green pigment Substances 0.000 claims abstract description 14
- 239000001052 yellow pigment Substances 0.000 claims abstract description 14
- 150000001412 amines Chemical class 0.000 claims description 36
- 239000007787 solid Substances 0.000 claims description 29
- 238000002834 transmittance Methods 0.000 claims description 29
- 239000002270 dispersing agent Substances 0.000 claims description 20
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 20
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 17
- 229920005822 acrylic binder Polymers 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 11
- 239000002612 dispersion medium Substances 0.000 claims description 10
- 238000004611 spectroscopical analysis Methods 0.000 claims description 9
- 239000004094 surface-active agent Substances 0.000 claims description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 7
- 239000007822 coupling agent Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 230000000996 additive effect Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000002609 medium Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000007870 radical polymerization initiator Substances 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 32
- -1 No group Chemical group 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 17
- 239000000126 substance Substances 0.000 description 17
- 239000004593 Epoxy Substances 0.000 description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 6
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229940022663 acetate Drugs 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 238000004040 coloring Methods 0.000 description 4
- 230000001747 exhibiting effect Effects 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229940017219 methyl propionate Drugs 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000002835 absorbance Methods 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229940116333 ethyl lactate Drugs 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 150000002923 oximes Chemical class 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 235000019260 propionic acid Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SFAMKDPMPDEXGH-UHFFFAOYSA-N 2-hydroxyethyl propanoate Chemical compound CCC(=O)OCCO SFAMKDPMPDEXGH-UHFFFAOYSA-N 0.000 description 2
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- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
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- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
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- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
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- 150000001298 alcohols Chemical class 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
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- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
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- 125000001033 ether group Chemical group 0.000 description 2
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- 125000005843 halogen group Chemical group 0.000 description 2
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- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 2
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- 229910052717 sulfur Inorganic materials 0.000 description 2
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- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
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- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- AZQGFVRDZTUHBU-UHFFFAOYSA-N isocyanic acid;triethoxy(propyl)silane Chemical compound N=C=O.CCC[Si](OCC)(OCC)OCC AZQGFVRDZTUHBU-UHFFFAOYSA-N 0.000 description 1
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical group C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- MDEDOIDXVJXDBW-UHFFFAOYSA-N methoxymethyl acetate Chemical compound COCOC(C)=O MDEDOIDXVJXDBW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical group N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- GVXVZOSSRRPQRZ-UHFFFAOYSA-N propane-1,2-diol;propan-2-yl acetate Chemical compound CC(O)CO.CC(C)OC(C)=O GVXVZOSSRRPQRZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H01L27/14645—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다.The present disclosure relates to a photosensitive resin composition, a photosensitive resin film and a color filter prepared using the photosensitive resin composition.
이미지센서는 광자를 전자로 전환하여 디스플레이로 표시하거나 저장장치에 저장할 수 있게 하는 반도체에 해당된다.An image sensor corresponds to a semiconductor that converts photons into electrons to be displayed on a display or stored in a storage device.
상기 이미지 센서는, 제작 공정과 응용 방식에 따라, 고체 촬상 소자(charge coupled device, CCD) 이미지 센서와 상보성 금속 산화물 반도체(complementary metal oxide semiconductor, CMOS) 이미지 센서로 분류된다.The image sensor is classified into a charge coupled device (CCD) image sensor and a complementary metal oxide semiconductor (CMOS) image sensor according to a manufacturing process and an application method.
상기 상보성 금속 산화물 반도체 이미지 센서(CMOS Image Sensor, CIS)란, 카메라가 받아들인 이미지를 디지털 신호로 전환해 주는 비메모리 반도체로서, 컬러 필터, 포토 다이오드, 증폭기 등 픽셀(pixel)의 집합체이다. The complementary metal oxide semiconductor image sensor (CMOS Image Sensor, CIS) is a non-memory semiconductor that converts an image received by a camera into a digital signal, and is a collection of pixels such as color filters, photodiodes, and amplifiers.
상기 이미지 센서에 사용되는 실리콘계 포토 다이오드는 근적외선에 대한 감도를 갖고 있다. 이 때문에, 상기 이미지 센서에 근적외선 차단 필터를 추가하여 화상 품질을 보정하기도 한다. 다만, 상기 실리콘계 포토 다이오드, 상기 적외선 차단 필터 등의 성능에 의해, 이들을 포함하는 이미지 센서가 구현하는 화상 품질에 편차가 발생할 수 있다.A silicon-based photodiode used in the image sensor has sensitivity to near infrared rays. For this reason, image quality is corrected by adding a near-infrared cut filter to the image sensor. However, due to the performance of the silicon-based photodiode, the infrared cut filter, etc., a deviation may occur in image quality realized by an image sensor including them.
일 구현예는, 실리콘계 포토 다이오드, 적외선 차단 필터 등의 성능과 무관하게, 이미지 센서에 의한 화상 품질을 일정한 수준으로 구현하기 위해, 근적외선에 대한 영향성이 적은 적색 감광성 수지 조성물을 제공하기 위한 것이다.One embodiment is to provide a red photosensitive resin composition that is less affected by near-infrared rays in order to realize image quality by an image sensor at a constant level regardless of the performance of a silicon-based photodiode, an infrared cut filter, or the like.
다른 일 구현예는 상기 적색 감광성 수지 조성물을 이용하여 제조된 적색 감광성 수지막을 제공하기 위한 것이다.Another embodiment is to provide a red photosensitive resin film prepared using the red photosensitive resin composition.
또 다른 일 구현예는 상기 적색 감광성 수지막을 이용하여 제조된 컬러 필터를 제공하기 위한 것이다.Another embodiment is to provide a color filter manufactured using the red photosensitive resin film.
일 구현예는 (A) 착색제; (B) 바인더 수지; (C) 광중합성 화합물; (D) 광중합 개시제; 및 (E) 용매를 포함하고, 상기 착색제는 안료 분산액을 포함하고, 상기 안료 분산액은 전체 안료 100 중량% 중에서, C.I. 적색 안료 254를 50 중량% 내지 80 중량% 포함하고, C.I. 황색 안료 139를 20 중량% 내지 40 중량% 포함하고, C.I. 녹색 안료 58을 0.1 중량% 내지 10 중량% 포함하는, 적색 감광성 수지 조성물을 제공한다.One embodiment includes (A) a colorant; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the colorant comprises a pigment dispersion, and the pigment dispersion comprises C.I. 50% to 80% by weight of red pigment 254, C.I. 20% to 40% by weight of yellow pigment 139, C.I. A red photosensitive resin composition comprising 0.1% by weight to 10% by weight of the green pigment 58 is provided.
상기 전체 안료 100 중량% 중에서, C.I. 적색 안료 254를 57 중량% 내지 67 중량% 포함하고, C.I. 황색 안료 139를 30 중량% 내지 35 중량% 포함하고, C.I. 녹색 안료 58을 1.5 중량% 내지 9 중량% 포함할 수 있다.Out of 100% by weight of the total pigment, C.I. 57% to 67% by weight of red pigment 254, C.I. 30% to 35% by weight of yellow pigment 139, C.I. 1.5% to 9% by weight of green pigment 58.
상기 안료 분산액은, 분산제, 분산 수지, 분산매 또는 이들의 조합을 더 포함할 수 있다.The pigment dispersion may further include a dispersing agent, a dispersing resin, a dispersing medium, or a combination thereof.
상기 분산제는, 아민가가 100 mgKOH/g 이하(단, 0 mgKOH/g 초과)일 수 있다.The dispersant may have an amine value of 100 mgKOH/g or less (however, greater than 0 mgKOH/g).
상기 안료 분산액은, 하기 수학식 1에 따른 안료의 함량이 40 중량% 내지 80 중량%일 수 있다:The pigment dispersion may have a pigment content of 40% to 80% by weight according to Equation 1 below:
[수학식 1][Equation 1]
안료 함량 = 100 * p / bPigment content = 100 * p/b
상기 수학식 1에서, p는 상기 안료 분산액 내 안료 고형분의 무게이고, b는 상기 안료 분산액 내 전체 고형분의 무게이다.In Equation 1, p is the weight of the pigment solids in the pigment dispersion, and b is the weight of the total solids in the pigment dispersion.
상기 분산매는, 프로필렌 글리콜 모노메틸 에테르 아세테이트(propylene glycol monomethyl ether acetate, PGMEA), 프로필렌 글리콜 메틸 에테르(Propylene glycol monomethyl ether, PGME), 또는 이들의 조합을 포함할 수 있다.The dispersion medium may include propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), or a combination thereof.
상기 안료 분산액 내 전체 고형분 함량은 10 중량% 내지 40 중량%일 수 있다.The total solid content in the pigment dispersion may be 10 wt % to 40 wt %.
상기 안료 분산액 내 전체 고형분의 D50 입경은 15 ㎚ 내지 70 ㎚일 수 있다.The D50 particle diameter of the total solid content in the pigment dispersion may be 15 nm to 70 nm.
상기 안료 분산액은, 상기 안료 분산액 총량에 대해, 상기 전체 안료를 10 중량% 내지 20 중량% 포함하고, 상기 분산제를 0.1 중량% 내지 5 중량% 포함하고, 상기 분산 수지를 0.1 중량% 내지 5 중량% 포함하고, 상기 분산매를 잔부로 포함할 수 있다.The pigment dispersion contains 10% to 20% by weight of the total pigments, 0.1% to 5% by weight of the dispersant, and 0.1% to 5% by weight of the dispersion resin, based on the total amount of the pigment dispersion. and may include the dispersion medium as the remainder.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 하기 수학식 2를 만족할 수 있다:Upon spectroscopic analysis of a red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, Equation 2 below may be satisfied:
[수학식 2][Equation 2]
70 ≤ A/B ≤ 10070 ≤ A/B ≤ 100
상기 수학식 2에서, A는 상기 적색 감광성 수지막이 725 ㎚의 파장에서 나타내는 투과율이고, B는 상기 적색 감광성 수지막이 625 ㎚의 파장에서 나타내는 투과율이다.In Equation 2, A is the transmittance of the red photosensitive resin film at a wavelength of 725 nm, and B is the transmittance of the red photosensitive resin film at a wavelength of 625 nm.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 430 ㎚의 파장에서 나타내는 투과율이 5 % 이하(단, 0% 초과)일 수 있다.Upon spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, the transmittance at a wavelength of 430 nm may be 5% or less (however, greater than 0%).
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 560 ㎚의 파장에서 나타내는 투과율이 3.5 % 이하(단, 0% 초과)일 수 있다.Upon spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, the transmittance at a wavelength of 560 nm may be 3.5% or less (however, greater than 0%).
상기 바인더 수지는 아크릴계 바인더 수지를 포함할 수 있다.The binder resin may include an acrylic binder resin.
상기 감광성 수지 조성물은, 상기 감광성 수지 조성물 총량에 대해, 상기 (A) 착색제 5 중량% 내지 70 중량%; 상기 (B) 바인더 수지 0.1 중량% 내지 20 중량%; 상기 (C) 광중합성 화합물 0.1 중량% 내지 20 중량%; 상기 (D) 광중합 개시제 0.1 중량% 내지 5 중량%; 및 상기 (E) 용매 잔부량을 포함할 수 있다.The photosensitive resin composition, based on the total amount of the photosensitive resin composition, (A) 5% to 70% by weight of the colorant; 0.1% to 20% by weight of the (B) binder resin; 0.1% to 20% by weight of the (C) photopolymerizable compound; 0.1% to 5% by weight of the (D) photopolymerization initiator; and (E) the remainder of the solvent.
상기 감광성 수지 조성물은 말론산; 3-아미노-1,2-프로판디올; 비닐기 또는 (메타)아크릴옥시기를 포함하는 커플링제; 레벨링제; 불소계 계면활성제; 및 라디칼 중합 개시제로부터 선택되는 적어도 하나의 첨가제를 더 포함할 수 있다.The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; A coupling agent containing a vinyl group or a (meth)acryloxy group; leveling agent; fluorine-based surfactants; And it may further include at least one additive selected from a radical polymerization initiator.
다른 일 구현예에서는, 상기 적색 감광성 수지 조성물을 이용하여 제조된 적색 감광성 수지막을 제공한다.In another embodiment, a red photosensitive resin film prepared using the red photosensitive resin composition is provided.
또 다른 일 구현예에서는, 상기 적색 감광성 수지막을 포함하는 적색 컬러 필터를 제공한다.In another embodiment, a red color filter including the red photosensitive resin layer is provided.
또 다른 일 구현예에서는, 상기 적색 컬러 필터를 포함하는 CMOS 이미지 센서를 제공한다.In another embodiment, a CMOS image sensor including the red color filter is provided.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.The specific details of other aspects of the present invention are included in the detailed description below.
일 구현예의 적색 감광성 수지 조성물은 근적외선에 대한 영향성이 적어, 실리콘계 포토 다이오드, 적외선 차단 필터 등의 성능과 무관하게, 이미지 센서에 의한 화상 품질을 일정한 수준으로 구현할 수 있다.The red photosensitive resin composition according to one embodiment has little effect on near-infrared rays, and thus image quality by an image sensor can be implemented at a constant level regardless of the performance of a silicon-based photodiode, an infrared cut filter, or the like.
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다.Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "치환"이란 화합물 중의 적어도 하나의 수소 원자가 할로겐 원자(F, Cl, Br, I), 히드록시기, C1 내지 C20 알콕시기, 니트로기, 시아노기, 아민기, 이미노기, 아지도기, 아미디노기, 히드라지노기, 히드라조노기, 카르보닐기, 카르바밀기, 티올기, 에스테르기, 에테르기, 카르복실기 또는 그것의 염, 술폰산기 또는 그것의 염, 인산이나 그것의 염, C1 내지 C20 알킬기, C2 내지 C20 알케닐기, C2 내지 C20 알키닐기, C6 내지 C30 아릴기, C3 내지 C20 사이클로알킬기, C3 내지 C20 사이클로알케닐기, C3 내지 C20 사이클로알키닐기, C2 내지 C20 헤테로사이클로알킬기, C2 내지 C20 헤테로사이클로알케닐기, C2 내지 C20 헤테로사이클로알키닐기 또는 이들의 조합의 치환기로 치환된 것을 의미한다.Unless otherwise specified herein, "substitution" means that at least one hydrogen atom in a compound is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, No group, azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt, phosphoric acid or its salt. , C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C30 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group , A C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, or a substituent of a combination thereof.
본 명세서에서 특별한 언급이 없는 한, "헤테로사이클로알킬기", "헤테로사이클로알케닐기", "헤테로사이클로알키닐기" 및 "헤테로사이클로알킬렌기"란 각각 사이클로알킬, 사이클로알케닐, 사이클로알키닐 및 사이클로알킬렌의 고리 화합물 내에 적어도 하나의 N, O, S 또는 P의 헤테로 원자가 존재하는 것을 의미한다.Unless otherwise specified herein, "heterocycloalkyl group", "heterocycloalkenyl group", "heterocycloalkynyl group" and "heterocycloalkylene group" mean cycloalkyl, cycloalkenyl, cycloalkynyl and cycloalkyl, respectively. It means that at least one N, O, S or P heteroatom exists in the ring compound of ene.
본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미한다.Unless otherwise specified herein, "(meth)acrylate" means both "acrylate" and "methacrylate".
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formula within this specification, if a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.
본 명세서에서 카도계 수지란, 하기 화학식 4-1 내지 화학식 4-11로 이루어진 군에서 선택된 하나 이상의 관능기가 수지 내 주골격(backbone)에 포함되는 수지를 의미한다.In the present specification, the cardo-based resin refers to a resin in which at least one functional group selected from the group consisting of Chemical Formulas 4-1 to 4-11 is included in the backbone of the resin.
또한, 본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다.In addition, unless otherwise defined in this specification, "*" means a part connected to the same or different atom or chemical formula.
(감광성 수지 조성물)(Photosensitive Resin Composition)
일 구현예는 (A) 착색제; (B) 바인더 수지; (C) 광중합성 화합물; (D) 광중합 개시제; 및 (E) 용매를 포함하고, 상기 착색제는 안료 분산액을 포함하고, 상기 안료 분산액은, 전체 안료 100 중량% 중에서, C.I. 적색 안료 254를 50 중량% 내지 80 중량% 포함하고, C.I. 황색 안료 139를 20 중량% 내지 40 중량% 포함하고, C.I. 녹색 안료 58을 0.1 중량% 내지 10 중량% 포함하는, 적색 감광성 수지 조성물을 제공한다.One embodiment includes (A) a colorant; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the colorant includes a pigment dispersion, and the pigment dispersion, in 100% by weight of the total pigment, contains C.I. 50% to 80% by weight of red pigment 254, C.I. 20% to 40% by weight of yellow pigment 139, C.I. A red photosensitive resin composition comprising 0.1% by weight to 10% by weight of the green pigment 58 is provided.
일 구현예의 적색 감광성 수지 조성물은 근적외선에 대한 영향성이 적어, 실리콘계 포토 다이오드, 적외선 차단 필터 등의 성능과 무관하게, 이미지 센서에 의한 화상 품질을 일정한 수준으로 구현할 수 있다.The red photosensitive resin composition according to one embodiment has little effect on near-infrared rays, and thus image quality by an image sensor can be implemented at a constant level regardless of the performance of a silicon-based photodiode, an infrared cut filter, or the like.
이하, 일 구현예의 적색 감광성 수지 조성물에 포함된 각 성분을 구체적으로 설명한다.Hereinafter, each component included in the red photosensitive resin composition of one embodiment will be described in detail.
(A) 착색제(A) colorant
일 구현예의 적색 감광성 수지 조성물은 안료형 감광성 수지 조성물로서 안료 분산액을 포함한다. 상기 안료 분산액은 적색을 구현하기 위해 적색 안료(R)를 포함함과 더불어, 근적외선 영역의 파장을 차단하기 위해 황색 안료(Y) 및 녹색 안료(G)를 더 포함한다.The red photosensitive resin composition of one embodiment includes a pigment dispersion as a pigment type photosensitive resin composition. The pigment dispersion includes a red pigment (R) to realize red color, and further includes a yellow pigment (Y) and a green pigment (G) to block wavelengths in the near infrared region.
특히, 상기 적색 안료로서 C.I. 적색 안료 254(R254)를 사용하고, 상기 황색 안료로서 C.I. 황색 안료 139(Y139)를 사용하고, 상기 녹색 안료로서 C.I. 녹색 안료 58(G58)을 사용하면서; 상기 전체 안료 100 중량% 중에서 각 안료의 함량을 50 중량% 내지 80 중량%(R254), 20 중량% 내지 40 중량%(Y139) 및 0.1 중량% 내지 10 중량%(Y139)로 한정할 때, 적색의 구현 효과 및 근적외선 영역의 파장 차단 효과를 조화롭게 구현할 수 있다.In particular, as the red pigment, C.I. Red pigment 254 (R254) is used, and C.I. Yellow pigment 139 (Y139) is used, and C.I. while using Green Pigment 58 (G58); When the content of each pigment is limited to 50 wt% to 80 wt% (R254), 20 wt% to 40 wt% (Y139), and 0.1 wt% to 10 wt% (Y139) in 100 wt% of the total pigment, red It is possible to harmoniously implement the implementation effect and the wavelength blocking effect of the near-infrared region.
구체적으로, 상기 적색 안료로서 C.I. 적색 안료 254(R254)는 하기 화학식 A로 표시되는 화합물에 해당되며, 디케토피롤로피롤(Diketopyrrolopyrrole, DPP) 구조를 가짐으로써, 다른 적색 안료에 대비하여 470 ㎚ 내지 570 ㎚의 파장 범위에서의 높은 흡광도를 나타내면서도 우수한 착색력을 발현하는 효과가 있다.Specifically, as the red pigment, C.I. Red pigment 254 (R254) corresponds to a compound represented by the following formula A, and has a diketopyrrolopyrrole (DPP) structure, thereby exhibiting high absorbance in the wavelength range of 470 nm to 570 nm compared to other red pigments. While exhibiting, there is an effect of expressing excellent coloring power.
[화학식 A][Formula A]
상기 C.I. 적색 안료 254는 감광성 수지 조성물 및 이를 사용하여 제조된 수지막의 색을 적색으로 구현하기 위해, 상기 전체 안료 100 중량% 중 50 중량% 이상, 53 중량% 이상, 55 중량% 이상 또는 57 중량% 이상인 범위 내에서, 다른 색상의 안료에 대비하여 과량으로 사용할 수 있다.The C.I. Red pigment 254 is in the range of 50% by weight or more, 53% by weight or more, 55% by weight or more, or 57% by weight or more based on 100% by weight of the total pigment in order to realize a red color of the photosensitive resin composition and a resin film prepared using the same. Within, it can be used in excess compared to pigments of other colors.
다만, 상기 C.I. 적색 안료 254는, 이의 함량이 증가할수록 상대적으로 근적외선 영역의 파장 차단 효과를 부여하는 안료들의 함량이 감소해야 하므로, 상기 전체 안료 100 중량% 중 80 중량% 이하, 75 중량% 이하, 70 중량% 이하 또는 67 중량% 이하인 범위 내에서 사용할 수 있다.However, the C.I. Red pigment 254, since the content of pigments providing a wavelength blocking effect in the near infrared region should decrease as its content increases, 80% by weight or less, 75% by weight or less, 70% by weight or less out of 100% by weight of the total pigment Or it can be used within the range of 67% by weight or less.
상기 황색 안료로서 C.I. 황색 안료 139(Y139)는 하기 화학식 B로 표시되는 화합물에 해당되며, 이소인돌린(Isoindoline) 구조를 가짐으로써, 다른 황색 안료에 대비하여 400 ㎚ 내지 500 ㎚의 파장 범위에서의 높은 흡광도를 나타내면서도 우수한 착색력을 발현하는 효과가 있다.As the yellow pigment, C.I. Yellow pigment 139 (Y139) corresponds to the compound represented by the following formula B, and has an isoindoline structure, thereby exhibiting high absorbance in the wavelength range of 400 nm to 500 nm compared to other yellow pigments. It has the effect of expressing excellent coloring power.
[화학식 B][Formula B]
상기 C.I. 황색 안료 139(Y139)는, 감광성 수지 조성물 및 이를 사용하여 제조된 수지막에 근적외선 영역의 파장 차단 효과를 부여하기 위해, 상기 전체 안료 100 중량% 중 20 중량% 이상, 25 중량% 이상, 27 중량% 이상 또는 30 중량% 이상인 범위 내에서 사용할 수 있다.The C.I. Yellow pigment 139 (Y139) is used in an amount of 20% by weight or more, 25% by weight or more, 27% by weight or more based on 100% by weight of the total pigment in order to impart a wavelength blocking effect in the near infrared region to the photosensitive resin composition and the resin film prepared using the same. It can be used within the range of % or more or 30% by weight or more.
다만, 상기 C.I. 황색 안료 139(Y139)는, 이의 함량이 증가할수록 상대적으로 적색을 구현하는 안료의 함량이 감소해야 하므로, 상기 전체 안료 100 중량% 중 40 중량% 이하, 38 중량% 이하, 36 중량% 이하 또는 35 중량% 이하인 범위 내에서 사용할 수 있다.However, the C.I. As the content of yellow pigment 139 (Y139) increases, the content of the pigment implementing red color should decrease, so 40% by weight or less, 38% by weight or less, 36% by weight or less, or 35% by weight or less based on 100% by weight of the total pigment. It can be used within the range of weight % or less.
상기 녹색 안료로서 C.I. 녹색 안료 58(G58)는 하기 화학식 C로 표시되는 화합물에 해당되며, 프탈로시아닌(Phthalocyanine) 구조를 가짐으로써, 다른 녹색 안료에 대비하여 650 ㎚ 내지 680 ㎚의 파장 범위에서의 높은 흡광도를 나타내면서도 우수한 착색력을 발현하는 효과가 있다.As the green pigment, C.I. Green Pigment 58 (G58) corresponds to the compound represented by Formula C, and has a Phthalocyanine structure, thereby exhibiting high absorbance in the wavelength range of 650 nm to 680 nm compared to other green pigments and excellent coloring power has the effect of expressing
[화학식 C][Formula C]
상기 화학식 C에서, a 및 b는 각각 독립적으로, 0 내지 4의 정수이다.In Formula C, a and b are each independently an integer of 0 to 4.
상기 C.I. 녹색 안료 58(G58)는, 감광성 수지 조성물 및 이를 사용하여 제조된 수지막에 근적외선 영역의 파장 차단 효과를 부여하기 위해, 상기 전체 안료 100 중량% 중 0.1 중량% 이상, 0.5 중량% 이상, 1 중량% 이상 또는 1.5 중량% 이상인 범위 내에서 사용할 수 있다.The C.I. Green pigment 58 (G58) is used in an amount of 0.1% by weight or more, 0.5% by weight or more, and 1% by weight, based on 100% by weight of the total pigment, in order to impart a wavelength blocking effect in the near-infrared region to the photosensitive resin composition and a resin film prepared using the same. It can be used within the range of % or more or 1.5% by weight or more.
다만, 상기 C.I. 녹색 안료 58(G58)는, 이의 함량이 증가할수록 상대적으로 적색을 구현하는 안료의 함량이 감소해야 하므로, 상기 전체 안료 100 중량% 중 10 중량% 이하, 9.5 중량% 이하, 9.3 중량% 이하 또는 9 중량% 이하인 범위 내에서 사용할 수 있다.However, the C.I. Green pigment 58 (G58), since the content of the pigment implementing red color should decrease as its content increases, 10% by weight or less, 9.5% by weight or less, 9.3% by weight or less, or 9% by weight or less based on 100% by weight of the total pigment. It can be used within the range of weight % or less.
상기 안료는 분산액 형태로 컬러 필터용 감광성 수지 조성물에 포함될 수 있다. 이러한 안료 분산액은 상기 안료와 더불어, 분산제, 분산 수지, 분산매 또는 이들의 조합을 더 포함할 수 있다.The pigment may be included in the photosensitive resin composition for color filters in the form of a dispersion. The pigment dispersion may further include a dispersing agent, a dispersing resin, a dispersing medium, or a combination thereof in addition to the pigment.
상기 분산제는 상기 안료가 분산액 내에 균일하게 분산되도록 도와주며, 비이온성, 음이온성 또는 양이온성의 분산제 각각 사용할 수 있다. 구체적으로는 폴리알킬렌 글리콜 또는 이의 에스테르, 폴리옥시 알킬렌, 다가 알콜 에스테르 알킬렌 옥사이드 부가물, 알코올 알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복시산 에스테르, 카르복시산 염, 알킬 아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 사용할 수 있으며, 이들은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.The dispersant helps to uniformly disperse the pigment in the dispersion, and each of a nonionic, anionic or cationic dispersant may be used. Specifically, polyalkylene glycol or its ester, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkyl amide alkylene oxide adduct Water, alkyl amine, etc. may be used, and these may be used alone or in combination of two or more.
구체적으로, 상기 분산제는 아민가가 100 mgKOH/g 이하(단, 0 mgKOH/g 초과)인 분산제를 포함할 수 있고, 이를 통해 고명도의 컬러 필터를 구현할 수 있다.Specifically, the dispersant may include a dispersant having an amine value of 100 mgKOH/g or less (however, greater than 0 mgKOH/g), and through this, a color filter with high brightness may be implemented.
여기서, 아민가란 '유지 1g 중의 전체 아민을 중화하는데 필요로 하는 염산에 당량의 수산화 칼륨의 mg 수'로서, 1급(RNH2), 2급(R2NH) 및 3급(RN(CH3)2, R2NCH3, R3N) 아민의 총량을 의미한다. 상기 아민가는, 테트라하이드로푸란, 아세톤 등의 중성 에탄올에 시료를 용해시킨 뒤, 브롬 페놀 블루, 크리스탈 바이올렛 등을 지시약으로 하여, 에탄올성 염산 용액 혹은 과염소산 용액으로 중화 적정하거나 전위차를 측정함으로써 구할 수 있다.Here, the amine value is 'the number of milligrams of potassium hydroxide equivalent to hydrochloric acid required to neutralize all amines in 1 g of fat', and is classified as primary (RNH 2 ), secondary (R 2 NH) and tertiary (RN(CH 3 ) 2 , R 2 NCH 3 , R 3 N) means the total amount of amines. The amine value can be obtained by dissolving a sample in neutral ethanol such as tetrahydrofuran or acetone, neutralizing titration with an ethanolic hydrochloric acid solution or perchloric acid solution, or measuring a potential difference using bromine phenol blue, crystal violet, etc. as an indicator. .
상기 분산제는 아민가가 100 mgKOH/g 이하, 90 mgKOH/g 이하, 80 mgKOH/g 이하, 70 mgKOH/g 이하, 65 mgKOH/g 이하, 60 mgKOH/g 이하또는 55mgKOH/g 이하이면서, 0 mgKOH/g 이상, 5 mgKOH/g 이상 또는 10mgKOH/g 이상인 것일 수 있다.The dispersant has an amine value of 100 mgKOH/g or less, 90 mgKOH/g or less, 80 mgKOH/g or less, 70 mgKOH/g or less, 65 mgKOH/g or less, 60 mgKOH/g or less, or 55 mgKOH/g or less, and g or more, 5 mgKOH/g or more, or 10 mgKOH/g or more.
이에 해당되는 분산제는, DISPERBYK-161(아민가:11 mgKOH/g, 제조사: BYK社), DISPERBYK-162(아민가:13 mgKOH/g, 제조사: BYK社), DISPERBYK-163(아민가:10 mgKOH/g, 제조사: BYK社), DISPERBYK-164(아민가:18 mgKOH/g, 제조사: BYK社), DISPERBYK-166(아민가:20 mgKOH/g, 제조사: BYK社), DISPERBYK-167(아민가:13 mgKOH/g, 제조사: BYK社), DISPERBYK-182(아민가:13 mgKOH/g, 제조사: BYK社), DISPERBYK-184(아민가:15 mgKOH/g, 제조사: BYK社), DISPERBYK-185(아민가:17mgKOH/g, 제조사: BYK社), DISPERBYK-2000(아민가:4mgKOH/g, 제조사: BYK社), DISPERBYK-2001(아민가:29mgKOH/g, 제조사: BYK社), DISPERBYK-2008(아민가:66mgKOH/g, 제조사: BYK社), DISPERBYK-2009(아민가:4mgKOH/g, 제조사: BYK社), DISPERBYK-2022(아민가:61mgKOH/g, 제조사: BYK社), DISPERBYK-2050(아민가:30mgKOH/g, 제조사: BYK社), DISPERBYK-2055(아민가:40mgKOH/g, 제조사: BYK社), DISPERBYK-2061(아민가:3mgKOH/g, 제조사: BYK社), DISPERBYK-2150(아민가:57mgKOH/g, 제조사: BYK社), DISPERBYK-2155(아민가:48mgKOH/g, 제조사: BYK社), DISPERBYK-2163(아민가:10mgKOH/g, 제조사: BYK社), DISPERBYK-2164(아민가:14mgKOH/g, 제조사: BYK社), BYK-9077(아민가:48mgKOH/g, 제조사: BYK社), BYKLPN-21116(아민가:29mgKOH/g, 제조사: BYK社), BYKLPN-21324(아민가:0mgKOH/g, 제조사: BYK社) 등을 들 수 있다.Dispersants corresponding to this are DISPERBYK-161 (amine value: 11 mgKOH/g, manufacturer: BYK company), DISPERBYK-162 (amine value: 13 mgKOH/g, manufacturer: BYK company), DISPERBYK-163 (amine value: 10 mgKOH/g , Manufacturer: BYK), DISPERBYK-164 (amine value: 18 mgKOH/g, manufacturer: BYK), DISPERBYK-166 (amine value: 20 mgKOH/g, manufacturer: BYK), DISPERBYK-167 (amine value: 13 mgKOH/ g, manufacturer: BYK), DISPERBYK-182 (amine value: 13 mgKOH/g, manufacturer: BYK), DISPERBYK-184 (amine value: 15 mgKOH/g, manufacturer: BYK), DISPERBYK-185 (amine value: 17mgKOH/ g, manufacturer: BYK), DISPERBYK-2000 (amine value: 4mgKOH/g, manufacturer: BYK), DISPERBYK-2001 (amine value: 29mgKOH/g, manufacturer: BYK), DISPERBYK-2008 (amine value: 66mgKOH/g, Manufacturer: BYK), DISPERBYK-2009 (amine value: 4mgKOH/g, manufacturer: BYK), DISPERBYK-2022 (amine value: 61mgKOH/g, manufacturer: BYK), DISPERBYK-2050 (amine value: 30mgKOH/g, manufacturer: BYK Company), DISPERBYK-2055 (amine value: 40mgKOH/g, manufacturer: BYK Company), DISPERBYK-2061 (amine value: 3mgKOH/g, manufacturer: BYK Company), DISPERBYK-2150 (amine value: 57mgKOH/g, manufacturer: BYK Company) ), DISPERBYK-2155 (amine value: 48mgKOH/g, manufacturer: BYK), DISPERBYK-2163 (amine value: 10mgKOH/g, manufacturer: BYK), DISPERBYK-2164 (amine value: 14mgKOH/g, manufacturer: BYK), BYK-9077 (amine value: 48mgKOH/g, manufacturer: BYK), BYKLPN-21116 (amine value: 29mgKOH/g, manufacturer: BYK), BYKLPN-21324 (amine value: 0mgKOH/g, manufacturer: BYK), etc. can
상기 분산 수지로는 아크릴계계 수지를 사용할 수 있으며, 이는 안료 분산액의 안정성을 향상시킬 수 있을 뿐만 아니라 픽셀의 패턴성도 개선시킬 수 있다.As the dispersion resin, an acrylic resin can be used, which can improve the stability of the pigment dispersion and also improve the pattern of pixels.
구체적으로, 상기 분산 수지는, 하기 화학식 1-1로 표시되는 반복 단위, 하기 화학식 1-2로 표시되는 반복 단위 및 하기 화학식 1-3으로 표시되는 반복 단위를 포함하는 공중합체일 수 있다:Specifically, the dispersion resin may be a copolymer including a repeating unit represented by Formula 1-1 below, a repeating unit represented by Formula 1-2 below, and a repeating unit represented by Formula 1-3 below:
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
상기 화학식 1-1 및 1-3에서, R1 및 R2는 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬이다.In Formulas 1-1 and 1-3, R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl.
상기 분산 수지는 중량평균분자량이 10,000 내지 20,000 g/mol이고, 80 내지 200 KOHmg/g일 수 있다.The dispersion resin may have a weight average molecular weight of 10,000 to 20,000 g/mol and 80 to 200 KOHmg/g.
또한, 상기 분산 수지는 랜덤 공중합체 또는 블록 공중합체일 수 있고, 후자의 경우 하기 화학식 1로 표시될 수 있다:In addition, the dispersion resin may be a random copolymer or a block copolymer, and in the case of the latter, it may be represented by Formula 1:
상기 화학식 1에서, R1 및 R2는 각각 독립적으로 수소 원자 또는 메틸이고; a 내지 c는 각각 독립적으로 1 내지 100의 정수이다. In Formula 1, R 1 and R 2 are each independently a hydrogen atom or methyl; a to c are each independently an integer of 1 to 100;
상기 안료 분산액은, 하기 수학식 1을 만족할 수 있다. 상기 안료 분산액이 하기 수학식 1을 만족하는 범위 내에서 수지막의 외관이 향상될 수 있으나, 이를 만족하지 못하는 경우 수지막의 외관이 저하될 수 있다:The pigment dispersion may satisfy Equation 1 below. The appearance of the resin film may be improved within the range where the pigment dispersion satisfies Equation 1 below, but if this is not satisfied, the appearance of the resin film may be deteriorated:
[수학식 1][Equation 1]
안료 함량 = 100 * p / bPigment content = 100 * p/b
상기 수학식 1에서, p는 상기 안료 분산액 내 안료 고형분의 무게이고, b는 상기 안료 분산액 내 전체 고형분의 무게이다.In Equation 1, p is the weight of the pigment solids in the pigment dispersion, and b is the weight of the total solids in the pigment dispersion.
구체적으로, 상기 안료 분산액 내 분산매를 제외한 전체 고형분(예를 들어, 전체 안료, 분산제, 분산 수지 등) 100 중량% 중에서, 상기 안료 고형분(전체 안료 고형분)의 함량이 40 중량% 내지 80 중량%, 보다 구체적으로 45 중량% 내지 80 중량%, 보다 더 구체적으로 50 중량% 내지 80 중량%, 예컨대 60 중량% 내지 78 중량%일 수 있다.Specifically, out of 100% by weight of the total solids (eg, total pigments, dispersants, dispersion resins, etc.) excluding the dispersion medium in the pigment dispersion, the content of the pigment solids (total pigment solids) is 40% to 80% by weight, It may be more specifically 45% to 80% by weight, more specifically 50% to 80% by weight, such as 60% to 78% by weight.
상기 분산매로는, 프로필렌 글리콜 모노메틸 에테르 아세테이트(propylene glycol monomethyl ether acetate, PGMEA), 프로필렌 글리콜 메틸 에테르(Propylene glycol monomethyl ether, PGME), 에틸 락테이트(ethyl lactate, EL), 에틸렌 글리콜 에틸 아세테이트(ethylene glycol ethyl acetate, EGA), 시클로헥사논(cyclohexanone), 3-메톡시-1-부탄올(3-methoxy-1-butanol) 또는 이들의 조합을 사용할 수 있다. 구체적으로, 상기 분산매로는, 프로필렌 글리콜 모노메틸 에테르 아세테이트(propylene glycol monomethyl ether acetate, PGMEA), 프로필렌 글리콜 메틸 에테르(Propylene glycol monomethyl ether, PGME), 또는 이들의 조합을 사용할 수 있다.As the dispersion medium, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), ethyl lactate (EL), ethylene glycol ethyl acetate (ethylene glycol ethyl acetate, EGA), cyclohexanone, 3-methoxy-1-butanol, or a combination thereof may be used. Specifically, as the dispersion medium, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), or a combination thereof may be used.
상기 안료 분산액 내 분산매를 제외한 전체 고형분(예를 들어, 전체 안료, 분산제, 분산 수지 등)의 D50 입경이 15 ㎚ 내지 70 ㎚, 구체적으로 20 ㎚ 내지 65 ㎚, 보다 구체적으로 25 ㎚ 내지 60 ㎚, 예컨대 35 ㎚ 내지 55 ㎚일 수 있다. 이 범위에서, 반도체, 디스플레이 장치 등에 적절히 사용될 수 있다.The D50 particle diameter of the total solid content (eg, total pigment, dispersant, dispersion resin, etc.) excluding the dispersion medium in the pigment dispersion is 15 nm to 70 nm, specifically 20 nm to 65 nm, more specifically 25 nm to 60 nm, For example, it may be 35 nm to 55 nm. Within this range, it can be appropriately used for semiconductors, display devices, and the like.
상기 안료 분산액 내 분산매를 제외한 전체 고형분(예를 들어, 전체 안료, 분산제, 분산 수지 등)의 함량은, 상기 안료 분산액 100 중량% 중 10 중량% 내지 40 중량%, 구체적으로 12 중량% 내지 30 중량%, 보다 구체적으로 15 중량% 내지 25 중량%일 수 있다.The content of the total solid content (eg, total pigment, dispersant, dispersion resin, etc.) excluding the dispersion medium in the pigment dispersion is 10% to 40% by weight, specifically 12% to 30% by weight, based on 100% by weight of the pigment dispersion. %, more specifically from 15% to 25% by weight.
또한, 상기 안료 분산액은, 상기 안료 분산액 총량에 대해, 상기 안료 고형분(전체 안료)을 10 중량% 내지 20 중량%, 구체적으로 12 중량% 내지 18 중량% 포함하고; 상기 분산제를 0.1 중량% 내지 5 중량%, 구체적으로 1 중량% 내지 4 중량% 포함하고; 상기 분산 수지를 0.1 중량% 내지 5 중량%, 구체적으로 1 중량% 내지 4 중량% 포함하고; 상기 분산매를 잔부로 포함할 수 있다.In addition, the pigment dispersion contains 10% to 20% by weight, specifically 12% to 18% by weight of the pigment solids (total pigments) with respect to the total amount of the pigment dispersion; 0.1% to 5% by weight, specifically 1% to 4% by weight of the dispersant; 0.1% to 5% by weight, specifically 1% to 4% by weight of the dispersion resin; The dispersion medium may be included as the remainder.
이 범위를 만족함에 따라, 일 구현예의 적색 감광성 수지 조성물은 우수한 착색력을 발현할 수 있다.As this range is satisfied, the red photosensitive resin composition of one embodiment may exhibit excellent coloring strength.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 하기 수학식 2를 만족할 수 있다:Upon spectroscopic analysis of a red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, Equation 2 below may be satisfied:
[수학식 2][Equation 2]
70 ≤ A/B ≤ 10070 ≤ A/B ≤ 100
상기 수학식 2에서, A는 상기 적색 감광성 수지막이 725 ㎚의 파장에서 나타내는 투과율이고, B는 상기 적색 감광성 수지막이 625 ㎚의 파장에서 나타내는 투과율이다.In Equation 2, A is the transmittance of the red photosensitive resin film at a wavelength of 725 nm, and B is the transmittance of the red photosensitive resin film at a wavelength of 625 nm.
구체적으로, 상기 수학식 2의 하한은 70, 71, 72, 74 또는 75일 수 있고, 상한은 100, 99, 98, 97, 96 또는 95일 수 있다.Specifically, the lower limit of Equation 2 may be 70, 71, 72, 74 or 75, and the upper limit may be 100, 99, 98, 97, 96 or 95.
또한, 상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 430 ㎚의 파장에서 나타내는 투과율이 5 % 이하(단, 0% 초과)일 수 있고, 560 ㎚의 파장에서 나타내는 투과율이 3.5 % 이하(단, 0% 초과)일 수 있다.In addition, upon spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, the transmittance at a wavelength of 430 nm may be 5% or less (however, greater than 0%), , transmittance at a wavelength of 560 nm may be 3.5% or less (however, greater than 0%).
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대한 분광 분석 결과가 상기 설명들을 만족할 때, 근적외선에 대한 영향성이 적어, 실리콘계 포토 다이오드, 적외선 차단 필터 등의 성능과 무관하게, 이미지 센서에 의한 화상 품질을 일정한 수준으로 구현할 수 있다.When the results of spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition satisfy the above descriptions, the effect on near-infrared rays is small, so that silicon-based photodiodes, infrared cut-off filters, etc. Regardless of performance, image quality by an image sensor can be implemented at a certain level.
(B) 바인더 수지(B) binder resin
상기 감광성 수지 조성물은 바인더 수지를 더 포함할 수 있고, 상기 바인더 수지는 아크릴계 바인더 수지를 포함할 수 있다.The photosensitive resin composition may further include a binder resin, and the binder resin may include an acrylic binder resin.
구체적으로, 상기 아크릴계 바인더 수지는 하기 화학식 2-1로 표시되는 반복 단위, 하기 화학식 2-2로 표시되는 반복 단위 및 하기 화학식 2-3으로 표시되는 반복 단위를 포함하는 공중합체일 수 있다:Specifically, the acrylic binder resin may be a copolymer including a repeating unit represented by Formula 2-1 below, a repeating unit represented by Formula 2-2 below, and a repeating unit represented by Formula 2-3 below:
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
[화학식 2-3][Formula 2-3]
상기 화학식 2-1 및 2-3에서, R3 및 R4는 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬이다.In Formulas 2-1 and 2-3, R 3 and R 4 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl.
상기 아크릴계 바인더 수지는 중량평균분자량이 6,000 내지 10,000 g/mol이고, 30 내지 50 KOHmg/g이며, 이중결합 당량이 300 내지 400 g/mol일 수 있다.The acrylic binder resin may have a weight average molecular weight of 6,000 to 10,000 g/mol, 30 to 50 KOHmg/g, and a double bond equivalent of 300 to 400 g/mol.
또한, 상기 아크릴계 바인더 수지는 랜덤 공중합체 또는 블록 공중합체일 수 있고, 후자의 경우 하기 화학식 2로 표시될 수 있다:In addition, the acrylic binder resin may be a random copolymer or a block copolymer, and in the case of the latter, it may be represented by Formula 2:
[화학식 2][Formula 2]
상기 화학식 1에서, R3 및 R4는 각각 독립적으로 수소 원자 또는 메틸이고; d 내지 f는 각각 독립적으로 1 내지 100의 정수이다. In Formula 1, R 3 and R 4 are each independently a hydrogen atom or methyl; d to f are each independently an integer of 1 to 100;
일 구현예의 적색 감광성 수지 조성물은, 상기 화학식 1로 표시되는 아크릴계 바인더 수지를 제1 아크릴계 바인더 수지로 포함하면서, 제2 아크릴계 바인더 수지, 에폭시계 바인더 수지, 카도계 바인더 수지, 또는 이들의 조합을 더 포함할 수 있다.The red photosensitive resin composition of one embodiment includes the acrylic binder resin represented by Chemical Formula 1 as the first acrylic binder resin, and further comprises a second acrylic binder resin, an epoxy binder resin, a cardo binder resin, or a combination thereof. can include
상기 제2 아크릴계 수지는 제1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지이다.The second acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and includes one or more acrylic repeating units.
상기 제1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산또는 이들의 조합을 들 수 있다.The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량% 내지 50 중량%, 예컨대 10 중량% 내지 40 중량%로 포함될 수 있다.The first ethylenically unsaturated monomer may be included in an amount of 5 wt % to 50 wt %, for example, 10 wt % to 40 wt %, based on the total amount of the acrylic binder resin.
상기 제2 에틸렌성 불포화 단량체는 스티렌, α-메틸스티렌, 비닐톨루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시 부틸(메타)아크릴레이트, 벤질(메타)아크릴레이트, 사이클로헥실(메타)아크릴레이트, 페닐(메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물; 2-아미노에틸(메타)아크릴레이트, 2-디메틸아미노에틸(메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; 글리시딜(메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, or vinylbenzylmethyl ether; Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy butyl (meth)acrylate, benzyl (meth)acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; Unsaturated carboxylic acid amino alkyl ester compounds, such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.
상기 제2 아크릴계 수지의 구체적인 예로는 (메타)아크릴산/벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌 공중합체, (메타)아크릴산/벤질메타크릴레이트/2-히드록시에틸메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌/2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.Specific examples of the second acrylic resin include (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, and the like, but are not limited thereto, and these can be used alone or in combination of two or more. may be
상기 바인더 수지는 에폭시계 바인더 수지를 더 포함할 수 있다.The binder resin may further include an epoxy-based binder resin.
상기 바인더 수지는 에폭시계 바인더 수지를 더 포함함으로써, 내열성을 향상시킬 수 있다. 상기 에폭시계 바인더 수지는 예컨대, 페놀 노볼락 에폭시 수지, 테트라메틸 비페닐 에폭시 수지, 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 지환족 에폭시 수지 또는 이들의 조합 등을 들 수 있으나, 이에 한정되는 것은 아니다.The binder resin may improve heat resistance by further including an epoxy-based binder resin. The epoxy-based binder resin may include, for example, a phenol novolak epoxy resin, a tetramethyl biphenyl epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, an alicyclic epoxy resin, or a combination thereof, but is limited thereto It is not.
나아가, 상기 에폭시계 바인더 수지를 포함하는 바인더 수지는 후술할 안료 등의 착색제의 분산 안정성을 확보함과 동시에, 현상 과정에서 원하는 해상도의 픽셀이 형성되도록 돕는다. Furthermore, the binder resin including the epoxy-based binder resin secures dispersion stability of a colorant such as a pigment, which will be described later, and helps to form a pixel having a desired resolution during a developing process.
상기 에폭시계 바인더 수지는 상기 바인더 수지 총량에 대해 1 중량% 내지 10 중량%, 예컨대 5 중량% 내지 10 중량%로 포함될 수 있다. 상기 에폭시계 바인더 수지가 상기 범위로 포함될 경우, 잔막률 및 내화학성이 크게 개선될 수 있다.The epoxy-based binder resin may be included in an amount of 1 wt % to 10 wt %, for example, 5 wt % to 10 wt %, based on the total amount of the binder resin. When the epoxy-based binder resin is included in the above range, film remaining rate and chemical resistance may be greatly improved.
상기 에폭시계 바인더 수지의 에폭시당량(epoxy equivalent weight)은 150 g/eq 내지 200 g/eq 일 수 있다. 상기 범위 내의 에폭시당량을 가지는 에폭시계 바인더 수지가 바인더 수지 내에 포함될 경우, 형성된 패턴의 경화도 향상 및 패턴이 형성된 구조 내에서의 착색제 고착에 유리한 효과가 있다.The epoxy equivalent weight of the epoxy-based binder resin may be 150 g/eq to 200 g/eq. When an epoxy-based binder resin having an epoxy equivalent within the above range is included in the binder resin, there is an advantageous effect in improving the curing degree of the formed pattern and fixing the colorant in the patterned structure.
상기 바인더 수지는 카도계 바인더 수지를 더 포함할 수 있다.The binder resin may further include a cardo-based binder resin.
상기 카도계 바인더 수지는 하기 화학식 3으로 표시되는 반복단위를 포함할 수 있다.The cardo-based binder resin may include a repeating unit represented by Chemical Formula 3 below.
[화학식 3][Formula 3]
상기 화학식 3에서,In Formula 3,
R11 및 R12는 각각 독립적으로 수소원자 또는 치환 또는 비치환된 (메타)아크릴로일옥시알킬기이고,R 11 and R 12 are each independently a hydrogen atom or a substituted or unsubstituted (meth)acryloyloxyalkyl group;
R13 및 R14는 각각 독립적으로 수소원자, 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고, R 13 and R 14 are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C1 to C20 alkyl group;
Z1은 단일결합, O, CO, SO2, CR15R16, SiR17R18(여기서, R15 내지 R18은 각각 독립적으로 수소원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기임) 또는 하기 화학식 4-1 내지 화학식 4-11로 표시되는 연결기 중 어느 하나이고, Z 1 is a single bond, O, CO, SO 2 , CR 15 R 16 , SiR 17 R 18 (where R 15 to R 18 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group) or the following any one of the linking groups represented by Chemical Formulas 4-1 to 4-11;
[화학식 4-1][Formula 4-1]
[화학식 4-2][Formula 4-2]
[화학식 4-3][Formula 4-3]
[화학식 4-4][Formula 4-4]
[화학식 4-5][Formula 4-5]
(상기 화학식 4-5에서,(In Chemical Formula 4-5,
Ra는 수소원자, 에틸기, C2H4Cl, C2H4OH, CH2CH=CH2 또는 페닐기이다.)R a is a hydrogen atom, an ethyl group, C 2 H 4 Cl, C 2 H 4 OH, CH 2 CH=CH 2 or a phenyl group.)
[화학식 4-6][Formula 4-6]
[화학식 4-7][Formula 4-7]
[화학식 4-8][Formula 4-8]
[화학식 4-9][Formula 4-9]
[화학식 4-10][Formula 4-10]
[화학식 4-11][Formula 4-11]
Z2는 산이무수물 잔기이고,Z 2 is an acid dianhydride moiety;
m1 및 m2는 각각 독립적으로 0 내지 4의 정수이다.m1 and m2 are each independently an integer of 0 to 4.
상기 카도계 바인더 수지는 양 말단 중 적어도 하나에 하기 화학식 5으로 표시되는 관능기를 포함할 수 있다.The cardo-based binder resin may include a functional group represented by Chemical Formula 5 at at least one of both terminals.
[화학식 5][Formula 5]
상기 화학식 5에서,In Formula 5,
Z3은 하기 화학식 5-1 내지 화학식 5-7로 표시될 수 있다.Z 3 may be represented by Formulas 5-1 to 5-7 below.
[화학식 5-1][Formula 5-1]
(상기 화학식 5-1에서, Rb 및 Rc는 각각 독립적으로, 수소원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 에스테르기 또는 에테르기이다.)(In Formula 5-1, R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group.)
[화학식 5-2][Formula 5-2]
[화학식 5-3][Formula 5-3]
[화학식 5-4][Formula 5-4]
[화학식 5-5][Formula 5-5]
(상기 화학식 5-5에서, Rd는 O, S, NH, 치환 또는 비치환된 C1 내지 C20 알킬렌기, C1 내지 C20 알킬아민기 또는 C2 내지 C20 알케닐아민기이다.)(In Formula 5-5, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 alkenylamine group.)
[화학식 5-6][Formula 5-6]
[화학식 5-7][Formula 5-7]
상기 카도계 바인더 수지는 예컨대, 9,9-비스(4-옥시라닐메톡시페닐)플루오렌 등의 플루오렌 함유 화합물; 벤젠테트라카르복실산디무수물, 나프탈렌테트라카르복실산디무수물, 비페닐테트라카르복실산디무수물, 벤조페논테트라카르복실산디무수물, 피로멜리틱디무수물, 사이클로부탄테트라카르복실산디무수물,페릴렌테트라카르복실산디무수물, 테트라히드로푸란테트라카르복실산디무수물, 테트라하이드로프탈산무수물 등의 무수물 화합물; 에틸렌글리콜, 프로필렌글리콜, 폴리에틸렌글리콜 등의 글리콜 화합물; 메탄올, 에탄올, 프로판올, n-부탄올, 사이클로헥산올, 벤질알코올 등의 알코올 화합물; 프로필렌글리콜메틸에틸아세테이트, N-메틸피롤리돈 등의 용매류 화합물; 트리페닐포스핀 등의 인 화합물; 및 테트라메틸암모늄클로라이드, 테트라에틸암모늄브로마이드, 벤질디에틸아민, 트리에틸아민, 트리부틸아민, 벤질트리에틸암모늄클로라이드 등의 아민 또는 암모늄염 화합물 중에서 둘 이상을 혼합하여 제조할 수 있다.The cardo-based binder resin may be, for example, fluorene-containing compounds such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; Benzene tetracarboxylic acid dianhydride, naphthalene tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, benzophenone tetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic acid dianhydride, perylene tetracarboxylic acid dianhydride , anhydride compounds such as tetrahydrofurantetracarboxylic acid dianhydride and tetrahydrophthalic acid anhydride; Glycol compounds, such as ethylene glycol, propylene glycol, and polyethylene glycol; alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds such as propylene glycol methylethyl acetate and N-methylpyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.
상기 카도계 바인더 수지를 전술한 아크릴계 바인더 수지와 함께 사용할 경우, 밀착력이 우수하고, 고해상도 및 고휘도 특성을 가지는 감광성 수지 조성물을 얻을 수 있다.When the cardo-based binder resin is used together with the above-described acrylic binder resin, a photosensitive resin composition having excellent adhesion and high resolution and high luminance characteristics can be obtained.
상기 카도계 바인더 수지의 중량평균 분자량은 500 g/mol 내지 50,000 g/mol, 예컨대 3,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 카도계 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우 컬러필터 제조시 잔사없이 패턴 형성이 잘 되며, 현상시 막 두께의 손실이 없고, 양호한 패턴을 얻을 수 있다.The cardo-based binder resin may have a weight average molecular weight of 500 g/mol to 50,000 g/mol, such as 3,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the cardo-based binder resin is within the above range, a pattern is well formed without residue during manufacturing of the color filter, there is no loss of film thickness during development, and a good pattern can be obtained.
상기 카도계 바인더 수지는 100 mgKOH/g 내지 140 mgKOH/g의 산가를 가질 수 있다. The cardo-based binder resin may have an acid value of 100 mgKOH/g to 140 mgKOH/g.
상기 바인더 수지는 고형분 형태로 후술하는 용매에 용해되어, 감광성 수지 조성물을 구성할 수 있다. 이 경우, 상기 고형분 형태의 바인더 수지는 용매에 용해된 바인더 수지 용액 총량에 대해 약 10 중량% 내지 50 중량%, 예컨대 20 중량% 내지 40 중량% 일 수 있다.The binder resin may be dissolved in a solvent to be described later in a solid form to form a photosensitive resin composition. In this case, the binder resin in the solid form may be about 10% to 50% by weight, for example, 20% to 40% by weight based on the total amount of the binder resin solution dissolved in the solvent.
상기 바인더 수지는 상기 감광성 수지 조성물 총량에 대하여 0.1 중량% 내지 5 중량%, 구체적으로 1 중량% 내지 4 중량%, 예컨대 1 중량% 내지 3 중량%로 포함될 수 있다. 바인더 수지가 상기 범위 내로 포함될 경우, 컬러 필터 제조 시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다.The binder resin may be included in an amount of 0.1 wt % to 5 wt %, specifically 1 wt % to 4 wt %, for example, 1 wt % to 3 wt %, based on the total amount of the photosensitive resin composition. When the binder resin is included within the above range, it is possible to obtain excellent surface smoothness due to excellent developability and improved crosslinking property during manufacture of the color filter.
(C) 광중합성 화합물(C) photopolymerizable compound
상기 광중합성 화합물로는, 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 추가로 사용될 수 있다.As the photopolymerizable compound, a monofunctional or multifunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond may be additionally used.
상기 광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광 시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the photopolymerizable compound has the ethylenically unsaturated double bond, it can form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure in the pattern forming process.
상기 광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트 등을 들 수 있다. Specific examples of the photopolymerizable compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate Acrylates, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl ether (meth)acrylate, trimethylol propane tri( meth)acrylate, tris(meth)acryloyloxyethyl phosphate, novolac epoxy (meth)acrylate, and the like.
상기 광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-101®, M-111®, M-114® 등; 니혼 가야꾸(주)社의 KAYARAD TC-110S®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-210®, M-240®, M-6200® 등; 니혼 가야꾸(주)社의 KAYARAD HDDA®, HX-220®, R-604® 등; 오사카 유끼 가가꾸 고교(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-309®, M-400®, M-405®, M-450®, M-710®, M-8030®, M-8060® 등; 니혼 가야꾸(주)社의 KAYARAD TMPTA®, DPCA-20®, DPCA-30®, DPCA-60®, DPCA-120® 등; 오사카 유끼 가야꾸 고교(주)社의 V-295®, V-300®, V-360®, V-GPT®, V-3PA®, V-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.Examples of commercially available products of the photopolymerizable compound are as follows. Examples of monofunctional esters of (meth)acrylic acid include Aronix M-101 ® , M-111 ® , M-114 ® of Toagosei Chemical Industry Co., Ltd.; KAYARAD TC-110S ® of Nippon Kayaku Co., Ltd., the same TC-120S ® , etc.; Osaka Yuki Kagaku Kogyo Co., Ltd.'s V- 158® , V- 2311® , etc. are mentioned. Examples of the bifunctional ester of (meth)acrylic acid include Aronix M-210 ® , M-240 ® , M-6200 ® of Toagosei Chemical Industry Co., Ltd.; KAYARAD HDDA ® , HX-220 ® , R-604 ® and the like of Nippon Kayaku Co., Ltd.; Examples include V- 260® , V- 312® , and V-335 HP® of Osaka Yuki Kagaku Kogyo Co., Ltd. Examples of the trifunctional ester of (meth)acrylic acid include Aronix M-309 ® , M-400 ® , M-405 ® , M-450 ® , M-710 ® of Toagosei Chemical Industry Co., Ltd., M-8030 ® , M-8060 ® , etc.; KAYARAD TMPTA ® , DPCA-20 ® , DPCA-30 ® , DPCA-60 ® , DPCA-120 ® and the like of Nippon Kayaku Co., Ltd.; V- 295® , V- 300® , V- 360® , V- GPT® , V- 3PA® , V-400® , etc. of Osaka Yuki Kayaku Kogyo Co., Ltd. are mentioned. These products may be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 또는 에틸렌 옥사이드 변성물을 사용할 수도 있다.The photopolymerizable compound may be treated with an acid anhydride or modified ethylene oxide to impart better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 0.1 중량% 내지 5 중량%, 구체적으로 1 중량% 내지 4 중량%, 예컨대 1 중량% 내지 3 중량%로 포함될 수 있다. 광중합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광 시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다.The photopolymerizable compound may be included in an amount of 0.1 wt % to 5 wt %, specifically 1 wt % to 4 wt %, for example, 1 wt % to 3 wt %, based on the total amount of the photosensitive resin composition. When the photopolymerizable compound is included within the above range, sufficient curing occurs during exposure in the pattern forming process, resulting in excellent reliability and excellent developability with an alkaline developer.
(D) 광중합 개시제(D) photopolymerization initiator
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는 개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물 또는 이들의 조합을 사용할 수 있다. The photopolymerization initiator is an initiator generally used in photosensitive resin compositions, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof. can be used
상기 아세토페논계 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloro acetophenone, p-t -Butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸 아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2-클로로티오크산톤 등을 들 수 있다.Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethylketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3', 4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4, 6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis (trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, and the like.
상기 옥심계 화합물의 예로는, O-아실옥심계 화합물, 2-(o-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(o-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 들 수 있다. Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyloxime) )-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one etc. can be used. Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione 2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione 2 -Oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-one oxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-O- Acetate etc. are mentioned.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물, 플루오렌계 화합물 등을 사용할 수 있다.As the photopolymerization initiator, a carbazole-based compound, a diketone compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, a fluorene-based compound, and the like may be used in addition to the above compounds.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반응을 일으키는 광 증감제와 함께 사용될 수도 있다.The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy thereto.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스-3-머캡토 프로피오네이트, 펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트, 디펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like. can be heard
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.1 중량% 내지 5 중량%, 구체적으로 0.5 중량% 내지 4 중량%, 예컨대 0.1 중량% 내지 3 중량%로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반응 개시제로 인한 투과율의 저하를 막을 수 있다.The photopolymerization initiator may be included in an amount of 0.1 wt % to 5 wt %, specifically 0.5 wt % to 4 wt %, for example, 0.1 wt % to 3 wt %, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, excellent reliability can be obtained due to sufficient curing during exposure in the pattern forming process, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, and due to the unreacted initiator A decrease in transmittance can be prevented.
(D) 용매(D) solvent
상기 용매는 상기 착색제, 상기 바인더 수지, 상기 광중합성 화합물 및 상기 광중합 개시제와의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.As the solvent, materials that have compatibility with the colorant, the binder resin, the photopolymerizable compound, and the photopolymerization initiator but do not react may be used.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르, n-부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸 아세테이트, 부틸 아세테이트 등의 알킬 아세테이트류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비톨, 디에틸 카르비톨, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸 에테르 아세테이트, 프로필렌 글리콜 프로필 에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 톨루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산-n-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메톡시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에톡시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메톡시 프로피온산 에틸, 2-에톡시 프로피온산 에틸, 2-에톡시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시-2-메틸 프로피온산 메틸, 2-옥시-2-메틸 프로피온산 에틸 등의 2-옥시-2-메틸 프로피온산 에스테르류, 2-메톡시-2-메틸 프로피온산 메틸, 2-에톡시-2-메틸 프로피온산 에틸 등의 2-알콕시-2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시-2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시-3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸, γ부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; alkyl acetates such as ethyl acetate and butyl acetate; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates, such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons, such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetic acid alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic acid alkyl esters such as 3-oxy methyl propionate and 3-oxy ethyl propionate; 3-alkoxy propionic acid alkyl esters such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxy propionic acid alkyl esters such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methyl propionic acid esters such as 2-oxy-2-methyl methyl propionate, 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, 2-ethoxy-2- monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl alkyl propionate such as methyl ethyl propionate; esters such as 2-hydroxy ethyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy ethyl acetate, and 2-hydroxy-3-methyl methyl butanoate; ketonic acid esters such as ethyl pyruvate, etc., and also N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide , N-methylpyrrolidone, dimethylsulfoxide, benzylethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid and high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 사이클로헥사논 등의 케톤류; 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류, 사이클로헥사논 등의 케톤류가 사용될 수 있다.Among these, considering compatibility and reactivity, ketones such as cyclohexanone; glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as 2-hydroxy ethyl propionate; carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate, and ketones such as cyclohexanone may be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 60 중량% 내지 80 중량%, 예컨대 65 중량% 내지 75 중량%로 포함될 수 있다. 상기 용매가 상기 범위 내로 포함될 경우 감광성 수지 조성물의 도포성이 우수하고, 평탄성이 우수한 도막을 얻을 수 있다.The solvent may be included in a balance amount, for example, 60 wt% to 80 wt%, for example, 65 wt% to 75 wt%, based on the total amount of the photosensitive resin composition. When the solvent is included within the above range, it is possible to obtain a coating film having excellent coatability of the photosensitive resin composition and excellent flatness.
(F) 기타 첨가제(F) other additives
상기 감광성 수지 조성물은 도포 시 얼룩이나 반점을 방지하고, 레벨링 성능을 개선하기 위해, 또한 미현상에 의한 잔사의 생성을 방지하기 위하여, 말론산; 3-아미노-1,2-프로판디올; 비닐기 또는 (메타)아크릴옥시기를 포함하는 커플링제; 레벨링제; 계면활성제; 및 라디칼 중합 개시제로부터 선택되는 적어도 하나의 첨가제를 더 포함할 수 있다.The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; A coupling agent containing a vinyl group or a (meth)acryloxy group; leveling agent; Surfactants; And it may further include at least one additive selected from a radical polymerization initiator.
상기 첨가제는 원하는 물성에 따라 용이하게 조절될 수 있다.The additives can be easily adjusted according to desired physical properties.
상기 커플링제는 실란계 커플링제일 수 있고, 상기 실란계 커플링제의 예로는, 트리메톡시실릴 벤조산, γ메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란, γ이소 시아네이트 프로필 트리에톡시실란, γ글리시독시 프로필 트리메톡시실란, β에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. The coupling agent may be a silane-based coupling agent, and examples of the silane-based coupling agent include trimethoxysilyl benzoic acid, γ methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ Isocyanate propyl triethoxysilane, (gamma) glycidoxy propyl trimethoxysilane, (beta) epoxycyclohexyl) ethyl trimethoxysilane, etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 실란계 커플링제는 구체적으로 상기 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 1 중량부로 사용될 수 있다.The silane-based coupling agent may be specifically used in an amount of 0.01 part by weight to 1 part by weight based on 100 parts by weight of the photosensitive resin composition.
또한 상기 컬러 필터용 감광성 수지 조성물은 필요에 따라 계면활성제, 예컨대 불소계 계면활성제를 더 포함할 수 있다. In addition, the photosensitive resin composition for color filters may further include a surfactant, for example, a fluorine-based surfactant, if necessary.
상기 불소계 계면활성제의 예로는 DIC社의 F-556, F-482, F-484, F-478 등이 있으며, 이에 한정되는 것은 아니다.Examples of the fluorine-based surfactant include F-556, F-482, F-484, and F-478 manufactured by DIC, but are not limited thereto.
상기 계면활성제는 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 5 중량%로 포함되는 것이 바람직하고 0.01 중량% 내지 2 중량%로 포함되는 것이 보다 바람직하다. 상기 범위를 벗어나는 경우 현상 후 이물질이 발생하는 문제점이 생길 수 있어 바람직하지 못하다.The surfactant is preferably included in an amount of 0.01% to 5% by weight and more preferably in an amount of 0.01% to 2% by weight based on the total amount of the photosensitive resin composition. If it is out of the above range, it is not preferable to cause a problem in that foreign substances are generated after development.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.
상기 감광성 수지 조성물은 CMOS 이미지 센서의 컬러 필터용 감광성 수지 조성물, 구체적으로 CMOS 이미지 센서의 녹색 컬러 필터용 감광성 수지 조성물에 적용할 수 있다.The photosensitive resin composition may be applied to a photosensitive resin composition for a color filter of a CMOS image sensor, specifically a photosensitive resin composition for a green color filter of a CMOS image sensor.
(적색 감광성 수지막, 적색 컬러 필터 및 CMOS 이미지 센서)(red photosensitive resin film, red color filter and CMOS image sensor)
다른 일 구현예에 따르면, 일 구현예에 따른 적색 감광성 수지 조성물을 이용하여 제조된 적색 감광성 수지막을 제공한다.According to another embodiment, a red photosensitive resin film prepared using the red photosensitive resin composition according to the embodiment is provided.
또 다른 일 구현예에 따르면 전술한 적색 감광성 수지 조성물을 이용하여 제조된 적색 컬러 필터를 제공한다. According to another embodiment, a red color filter prepared using the red photosensitive resin composition described above is provided.
상기 컬러 필터의 제조 방법은 다음과 같다. A method of manufacturing the color filter is as follows.
유리기판 위에 스핀 도포, 롤러 도포, 스프레이 도포 등의 적당한 방법을 사용하여, 예를 들면, 적절한 두께로 전술한 감광성 수지 조성물을 도포하여 감광성 수지 조성물 층을 형성한다.For example, the photosensitive resin composition layer is formed by applying the photosensitive resin composition to an appropriate thickness on a glass substrate using an appropriate method such as spin coating, roller coating, or spray coating.
이어서, 상기 감광성 수지 조성물 층이 형성된 기판에 컬러 필터에 필요한 패턴을 형성하도록 광을 조사한다. 조사에 사용되는 광원으로는 UV, 전자선 또는 X선을 사용할 수 있고, 예를 들면, 190nm 내지 450nm, 구체적으로는 200nm 내지 400nm 영역의 UV를 조사할 수 있다. 상기 조사하는 공정에서 포토레지스트 마스크를 더욱 사용하여 실시할 수도 있다. 이와 같이 조사하는 공정을 실시한 후, 상기 광원이 조사된 감광성 수지 조성물 층을 현상액으로 처리한다. 이때 감광성 수지 조성물 층에서 비노광 부분은 용해됨으로써 컬러 필터에 필요한 패턴이 형성된다. 이러한 공정을 필요한 색의 수에 따라 반복함으로써 원하는 패턴을 갖는 컬러 필터를 수득할 수 있다. 또한 상기 공정에서 현상에 의해 수득된 화상 패턴을 다시 가열하거나 활성선 조사 등에 의해 경화시키면 내크랙성, 내용제성 등을 향상시킬 수 있다.Subsequently, light is irradiated to form a pattern required for a color filter on the substrate on which the photosensitive resin composition layer is formed. As a light source used for irradiation, UV, electron beam, or X-ray may be used, and for example, UV in a range of 190 nm to 450 nm, specifically, 200 nm to 400 nm may be irradiated. In the irradiation step, a photoresist mask may be further used. After performing the irradiation step in this way, the photosensitive resin composition layer irradiated with the light source is treated with a developing solution. At this time, the unexposed portion of the photosensitive resin composition layer is dissolved to form a pattern required for the color filter. By repeating this process according to the number of colors required, a color filter having a desired pattern can be obtained. In addition, when the image pattern obtained by development in the above process is heated again or cured by irradiation with actinic rays, etc., crack resistance, solvent resistance, and the like can be improved.
또 다른 일 구현예에 따르면 상기 적색 컬러 필터를 포함하는 CMOS 이미지 센서를 제공한다. According to another embodiment, a CMOS image sensor including the red color filter is provided.
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to examples, but the following examples are only preferred examples of the present invention and the present invention is not limited to the following examples.
(안료 분산액의 제조)(Preparation of Pigment Dispersion)
제조예 1: R254 안료 분산액Preparation Example 1: R254 Pigment Dispersion
하기 화학식 A으로 표시되는 적색 안료로서 R254 15 중량부, 분산제로서 DISPERBYK-2022(아민가:61mgKOH/g, 제조사: BYK) 3 중량부, 분산 수지로서 RY-117(제조사: 쇼와덴코, 분자량: 10,000 g/mol, 산가 130 KOHmg/g) 1.5 중량부, 프로필렌글리콜 메틸 에테르 아세테이트(PGMEA, 제조사: Sigma-Aldrich) 72.5 중량부, 프로필렌글리콜 메틸 에테르(PGME, 제조사: Sigma-Aldrich) 8 중량부를 혼합하여 지르코니아 비드와 쉐이커(제조사: skandex)를 이용하여 R254 안료 분산액을 얻었다. 상기 R254 안료 분산액 내 고형분의 D50은 51 nm이다.15 parts by weight of R254 as a red pigment represented by the following formula A, 3 parts by weight of DISPERBYK-2022 (amine value: 61 mgKOH/g, manufacturer: BYK) as a dispersant, RY-117 as a dispersing resin (manufacturer: Showa Denko, molecular weight: 10,000 g / mol, acid value 130 KOHmg / g) 1.5 parts by weight, propylene glycol methyl ether acetate (PGMEA, manufacturer: Sigma-Aldrich) 72.5 parts by weight, propylene glycol methyl ether (PGME, manufacturer: Sigma-Aldrich) 8 parts by weight were mixed An R254 pigment dispersion was obtained using zirconia beads and a shaker (manufacturer: skandex). The D50 of the solid content in the R254 pigment dispersion is 51 nm.
제조예 2: Y139 안료 분산액Preparation Example 2: Y139 Pigment Dispersion
하기 화학식 B로 표시되는 황색 안료로서 Y139 12 중량부, 분산제로서 DISPERBYK-2022(아민가:61mgKOH/g, 제조사: BYK) 4 중량부, 분산 수지로서 RY-117(제조사: 쇼와덴코, 분자량: 10,000 g/mol, 산가 130 KOHmg/g) 4 중량부, 프로필렌글리콜 메틸 에테르 아세테이트(PGMEA, 제조사: Sigma-Aldrich) 72 중량부, 프로필렌글리콜 메틸 에테르(PGME, 제조사: Sigma-Aldrich) 8 중량부를 혼합하여 지르코니아 비드와 쉐이커(제조사: skandex)를 이용하여 Y139 안료 분산액을 얻었다. 상기 Y139 안료 분산액 내 고형분의 D50은 35 nm이다.12 parts by weight of Y139 as a yellow pigment represented by the following formula B, 4 parts by weight of DISPERBYK-2022 (amine value: 61 mgKOH/g, manufacturer: BYK) as a dispersant, RY-117 as a dispersing resin (manufacturer: Showa Denko, molecular weight: 10,000 g / mol, acid value 130 KOHmg / g) 4 parts by weight, propylene glycol methyl ether acetate (PGMEA, manufacturer: Sigma-Aldrich) 72 parts by weight, propylene glycol methyl ether (PGME, manufacturer: Sigma-Aldrich) 8 parts by weight were mixed A Y139 pigment dispersion was obtained using zirconia beads and a shaker (manufacturer: skandex). The D50 of the solid content in the Y139 pigment dispersion was 35 nm.
[화학식 B][Formula B]
제조예 3: R254 및 G58 안료 분산액Preparation Example 3: R254 and G58 Pigment Dispersion
상기 화학식 A로 표시되는 적색 안료로서 R254 13 중량부, 하기 화학식 C로 표시되는 녹색 안료로서 G58 2 중량부, 분산제로서 DISPERBYK-2022(아민가:61mgKOH/g, 제조사: BYK) 3 중량부, 분산 수지로서 RY-117(제조사: 쇼와덴코, 분자량: 10,000 g/mol, 산가 130 KOHmg/g) 1.5 중량부, 프로필렌글리콜 메틸 에테르 아세테이트(PGMEA, 제조사: Sigma-Aldrich) 72.5 중량부, 프로필렌글리콜 메틸 에테르(PGME, 제조사: Sigma-Aldrich) 8 중량부를 혼합하여 지르코니아 비드와 쉐이커(제조사: skandex)를 이용하여 R254 및 G58 안료 분산액을 얻었다. 상기 R254 및 G58 안료 분산액 내 고형분의 D50은 49 nm이다.13 parts by weight of R254 as a red pigment represented by Formula A, 2 parts by weight of G58 as a green pigment represented by Formula C, 3 parts by weight of DISPERBYK-2022 (amine value: 61 mgKOH/g, manufacturer: BYK) as a dispersant, dispersion resin As RY-117 (manufacturer: Showa Denko, molecular weight: 10,000 g/mol, acid value 130 KOHmg/g) 1.5 parts by weight, propylene glycol methyl ether acetate (PGMEA, manufacturer: Sigma-Aldrich) 72.5 parts by weight, propylene glycol methyl ether (PGME, manufacturer: Sigma-Aldrich) 8 parts by weight were mixed to obtain R254 and G58 pigment dispersions using zirconia beads and a shaker (manufacturer: skandex). The D50 of the solids in the R254 and G58 pigment dispersions is 49 nm.
[화학식 C][Formula C]
상기 화학식 C에서, a 및 b는 각각 독립적으로, 0 내지 4의 정수이다.In Formula C, a and b are each independently an integer of 0 to 4.
(감광성 수지 조성물의 제조)(Preparation of photosensitive resin composition)
실시예 1 내지 8 및 비교예 1 내지 4Examples 1 to 8 and Comparative Examples 1 to 4
표 1 내지 3에 나타낸 조성으로 혼합하여 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared by mixing with the compositions shown in Tables 1 to 3.
구체적으로, 용매에 광중합 개시제를 녹인 후 상온에서 30분 동안 교반한 다음, 여기에 광중합성 화합물을 첨가하여 상온에서 60분 동안 교반하였다. 이어서, 얻어진 상기 반응물에 착색제로서 안료 분산액 및 바인더 수지를 넣고 상온에서 30분 동안 교반하였다. 추가로, 첨가제를 넣고 상온에서 30분 동안 교반하였다. 이어 상기 생성물을 2회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.Specifically, after dissolving the photopolymerization initiator in a solvent, the mixture was stirred at room temperature for 30 minutes, and then a photopolymerizable compound was added thereto and stirred at room temperature for 60 minutes. Subsequently, a pigment dispersion and a binder resin as a colorant were added to the obtained reactant and stirred at room temperature for 30 minutes. Additionally, the additive was added and stirred at room temperature for 30 minutes. Subsequently, a photosensitive resin composition was prepared by filtering the product twice to remove impurities.
(중량%)solid content
(weight%)
(중량%)solid content
(weight%)
(중량%)solid content
(weight%)
상기 표 1 내지 3에서 사용된 각 성분은 다음과 같다.Each component used in Tables 1 to 3 is as follows.
(A) 착색제(A) colorant
(A-1) R254 안료 분산액 (제조예 1)(A-1) R254 pigment dispersion (Preparation Example 1)
(A-2) Y139 안료 분산액 (제조예 2)(A-2) Y139 Pigment Dispersion (Preparation Example 2)
(A-3) R254 및 G58 안료 분산액 (제조예 3)(A-3) R254 and G58 pigment dispersion (Preparation Example 3)
(B) 바인더 수지(B) binder resin
(B-1) 아크릴계 바인더 수지로서 RY-92(제조사: 쇼와덴코, 분자량: 6,000 g/mol, 산가: 35 KOHmg/g, 이중결합 당량: 350 g/mol) 및 프로필렌글리콜 메틸 에테르 아세테이트(PGMEA, 제조사: Sigma-Aldrich)를 포함하는 분산액 (고형분: 38.5 중량%)(B-1) RY-92 (manufacturer: Showa Denko, molecular weight: 6,000 g/mol, acid value: 35 KOHmg/g, double bond equivalent: 350 g/mol) and propylene glycol methyl ether acetate (PGMEA) as an acrylic binder resin , manufacturer: Sigma-Aldrich) containing a dispersion (solid content: 38.5% by weight)
(C) 광중합성 화합물(C) photopolymerizable compound
(C-1) 디펜타에리트리톨헥사아크릴레이트(DPHA, 제조사: 일본화약)(C-1) dipentaerythritol hexaacrylate (DPHA, manufacturer: Nippon Explosives)
(D) 광중합 개시제(D) photopolymerization initiator
(D-1) 옥심계 개시제 (제품명: SPI-03, 제조사: 삼양사)(D-1) Oxime-based initiator (product name: SPI-03, manufacturer: Samyang Corporation)
(E) 용매(E) solvent
(E-1) 프로필렌 글리콜 모노메틸 에테르 아세테이트 (PGMEA, 제조사: Sigma-Aldrich)(E-1) Propylene glycol monomethyl ether acetate (PGMEA, manufacturer: Sigma-Aldrich)
(F) 첨가제(F) additives
(F-1) 불소계 계면활성제 (F-556, 제조사: DIC)(F-1) Fluorine-based surfactant (F-556, manufacturer: DIC)
참고로, 실시예 1 내지 8 및 비교예 1 내지 4에 대해, 안료 분산액 내 전체 고형분 100 중량% 중에서, 상기 전체 안료의 함량(수학식 1)을 하기 표 4 내지 6에 정리하였다.For reference, for Examples 1 to 8 and Comparative Examples 1 to 4, the total pigment content (Equation 1) in 100% by weight of the total solid content in the pigment dispersion is summarized in Tables 4 to 6 below.
(중량%)Each pigment content in total pigment solids
(weight%)
(중량%)Each pigment content in total pigment solids
(weight%)
(중량%)Each pigment content in total pigment solids
(weight%)
(평가: 투과율 및 저노광 리프팅 평가)(Evaluation: evaluation of transmittance and low exposure lifting)
(1) 컬러 필터 시편의 제조(1) Preparation of color filter specimens
실시예 1 내지 8 및 비교예 1 내지 4에 따른 감광성 수지 조성물을 8 인치 유리 기판 위에 스핀 코팅기(Mikasa社, Opticoat MS-A150)를 사용하여 코팅한 후, 열판(hot-plate)을 이용하여 100℃에서 180초 동안 소프트-베이킹(soft-baking)을 하고, i-line stepper (Nikon社, NSR-2005i10C) 로 1000msec의동안 빛을 조사하여 노광하였다. 상기 노광된 기판을 실온에서 0.19% TMAH 수용액에서 스프레이 & 퍼들 방식으로 현상한 후, 열판(hot-plate)에서 200℃로 5분 동안 하드-베이킹(Hard-baking)을 진행하였다. 이에 따라, 유리 기판 위에 5800Å 두께의 감광성 수지막이 형성된 컬러 필터 시편을 얻었다.The “photosensitive” resin compositions according to Examples 1 to 8 and Comparative Examples 1 to 4 were coated on an 8-inch glass substrate using a spin coater (Mikasa, Opticoat MS-A150), and then coated with a hot-plate at 100 °C. Soft-baking was performed for 180 seconds at ° C., and exposure was performed by irradiating light for 1000 msec with an i-line stepper (Nikon Corp., NSR-2005i10C). The exposed substrate was developed by a spray & puddle method in a 0.19% TMAH aqueous solution at room temperature, and then hard-baked on a hot-plate at 200° C. for 5 minutes. Accordingly, a color filter specimen having a 5800 Å-thick photosensitive resin film formed on the glass substrate was obtained.
(2) 투과율 평가(2) Evaluation of transmittance
상기에서 얻어진 컬러 필터 시편을 이용하여, 미세현미분광계(Microspectrophotometery, 모델명 Lvmicro-Z, 제조사 Lamdba Vison Inc. 일본)를 사용하여 가시광영역에서의 광 투과 스펙트럼을 측정하였다. 430 ㎚, 560 ㎚, 625 ㎚ 및 725 ㎚에서의 투과율를 얻고, 하기 표 2에 그 결과를 기재하였다.Using the color filter specimen obtained above, a light transmission spectrum in the visible region was measured using a microspectrophotometery (model name: Lvmicro-Z, manufactured by Lambda Vison Inc., Japan). Transmittances at 430 nm, 560 nm, 625 nm and 725 nm were obtained, and the results are shown in Table 2 below.
(3) 저노광 리프팅 여부 평가(3) Evaluation of low exposure lifting
적절하지 않고 낮은 노광 에너지에서 픽셀 패턴이 기판에 부착되어 남아있지 못하는 것을 저노광 리프팅이라고 한다. 본 평가에서는 i-line stepper (Nikon社, NSR-2005i10C) 로 100 msec동안 빛을 조사하여 0.8um 크기의 패턴에 대해 평가하여, 하기 표 7에 그 결과를 기재하였다.The failure of the pixel pattern to remain adhered to the substrate at inappropriate and low exposure energy is called low exposure lifting. In this evaluation, light was irradiated for 100 msec with an i-line stepper (Nikon Co., NSR-2005i10C) to evaluate patterns having a size of 0.8 μm, and the results are shown in Table 7 below.
/(625 ㎚ 투과율)
[수학식 2](725 nm transmittance)
/(625 nm transmittance)
[Equation 2]
상기 표 7에 따르면, 실시예 1 내지 8의 감광성 수지 조성물을 사용하여 제조된 감광성 수지막을 포함하는 컬러 필터 시편은, (725 ㎚ 투과율)/(625 ㎚ 투과율)이 70 내지 100, 구체적으로 85 내지 95로서, 전술한 수학식 2를 만족한다.According to Table 7, the color filter specimens including the photosensitive resin films prepared using the photosensitive resin compositions of Examples 1 to 8 had (725 nm transmittance)/(625 nm transmittance) 70 to 100, specifically 85 to 85 nm. 95, which satisfies Equation 2 above.
그에 반면, 비교예 1 내지 4의 감광성 수지 조성물을 사용하여 제조된 감광성 수지막을 포함하는 컬러 필터 시편은, (725 ㎚ 투과율)/(625 ㎚ 투과율)이 70에 미달하거나 100을 초과하여, 전술한 수학식 2를 만족하지 못한다.On the other hand, the color filter specimens including the photosensitive resin films prepared using the photosensitive resin compositions of Comparative Examples 1 to 4 had (725 nm transmittance)/(625 nm transmittance) less than 70 or greater than 100, resulting in the above-mentioned Equation 2 is not satisfied.
나아가, 실시예 1 내지 8의 감광성 수지 조성물을 사용하여 제조된 감광성 수지막을 포함하는 컬러 필터 시편은, 430 ㎚의 파장에서 나타내는 투과율이 5 % 이하이고, 560 ㎚의 파장에서 나타내는 투과율이 3.5 % 이하이다.Furthermore, color filter specimens including photosensitive resin films prepared using the photosensitive resin compositions of Examples 1 to 8 had a transmittance of 5% or less at a wavelength of 430 nm and a transmittance of 3.5% or less at a wavelength of 560 nm. am.
그에 반면, 비교예 1 내지 4의 감광성 수지 조성물을 사용하여 제조된 감광성 수지막을 포함하는 컬러 필터 시편은, 430 ㎚의 파장에서 나타내는 투과율이 5 % 초과이거나 560 ㎚의 파장에서 나타내는 투과율이 3.5 %를 초과한다.On the other hand, color filter specimens including photosensitive resin films prepared using the photosensitive resin compositions of Comparative Examples 1 to 4 had a transmittance of more than 5% at a wavelength of 430 nm or a transmittance of 3.5% at a wavelength of 560 nm. exceed
종합적으로, 실시예 1 내지 8의 감광성 수지 조성물로 대표되는 일 구현예의 적색 감광성 수지 조성물은, 근적외선에 대한 영향성이 적어, 실리콘계 포토 다이오드, 적외선 차단 필터 등의 성능과 무관하게, 이미지 센서에 의한 화상 품질을 일정한 수준으로 구현할 수 있다.Overall, the red photosensitive resin composition of one embodiment, represented by the photosensitive resin compositions of Examples 1 to 8, has little effect on near-infrared rays, regardless of the performance of a silicon-based photodiode, an infrared cut filter, etc., by an image sensor. Image quality can be implemented at a certain level.
또한, 실시예 1 내지 8을 토대로, 안료 분산액 등 일 구현예의 적색 감광성 수지 조성물을 구성하는 성분들의 배합비 등을 조절하여, 목적하는 범위로 투과율을 제어할 수 있을 것이다.In addition, based on Examples 1 to 8, the transmittance may be controlled within a desired range by adjusting the compounding ratio of components constituting the red photosensitive resin composition of one embodiment, such as a pigment dispersion.
이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and it is possible to carry out various modifications within the scope of the claims and detailed description of the invention and the accompanying drawings, and this also It goes without saying that it falls within the scope of the invention.
Claims (18)
(B) 바인더 수지;
(C) 광중합성 화합물;
(D) 광중합 개시제; 및
(E) 용매를 포함하고,
상기 착색제는 안료 분산액을 포함하고,
상기 안료 분산액은 전체 안료 100 중량% 중에서, C.I. 적색 안료 254를 50 중량% 내지 80 중량% 포함하고, C.I. 황색 안료 139를 20 중량% 내지 40 중량% 포함하고, C.I. 녹색 안료 58을 0.1 중량% 내지 10 중량% 포함하는,
적색 감광성 수지 조성물.
(A) a colorant;
(B) a binder resin;
(C) a photopolymerizable compound;
(D) a photopolymerization initiator; and
(E) contains a solvent;
The colorant includes a pigment dispersion,
The pigment dispersion contains 50 wt% to 80 wt% of CI red pigment 254, 20 wt% to 40 wt% of CI yellow pigment 139, and 0.1 wt% to 0.1 wt% of CI green pigment 58, based on 100 wt% of the total pigment. containing 10% by weight,
A red photosensitive resin composition.
상기 전체 안료 100 중량% 중에서, C.I. 적색 안료 254를 57 중량% 내지 67 중량% 포함하고, C.I. 황색 안료 139를 30 중량% 내지 35 중량% 포함하고, C.I. 녹색 안료 58을 1.5 중량% 내지 9 중량% 포함하는, 적색 감광성 수지 조성물.
According to claim 1,
In 100% by weight of the total pigment, 57% to 67% by weight of CI red pigment 254, 30% to 35% by weight of CI yellow pigment 139, and 1.5% to 9% by weight of CI green pigment 58 A red photosensitive resin composition comprising:
상기 안료 분산액은, 분산제, 분산 수지, 분산매 또는 이들의 조합을 더 포함하는, 적색 감광성 수지 조성물.
According to claim 1,
The pigment dispersion further comprises a dispersing agent, a dispersing resin, a dispersing medium, or a combination thereof, the red photosensitive resin composition.
상기 분산제는, 아민가가 100 mgKOH/g 이하(단, 0 mgKOH/g 초과)인, 적색 감광성 수지 조성물.
According to claim 3,
The dispersant has an amine value of 100 mgKOH/g or less (however, greater than 0 mgKOH/g), a red photosensitive resin composition.
상기 안료 분산액은, 하기 수학식 1에 따른 안료의 함량이 40 중량% 내지 80 중량%인, 적색 감광성 수지 조성물:
[수학식 1]
안료 함량 = 100 * p / b
상기 수학식 1에서,
p는 상기 안료 분산액 내 안료 고형분의 무게이고,
b는 상기 안료 분산액 내 전체 고형분의 무게이다.
According to claim 3,
The pigment dispersion has a pigment content of 40% to 80% by weight according to Equation 1 below, a red photosensitive resin composition:
[Equation 1]
Pigment content = 100 * p/b
In Equation 1 above,
p is the weight of the pigment solids in the pigment dispersion,
b is the weight of total solids in the pigment dispersion.
상기 분산매는, 프로필렌 글리콜 모노메틸 에테르 아세테이트(propylene glycol monomethyl ether acetate, PGMEA), 프로필렌 글리콜 메틸 에테르(Propylene glycol monomethyl ether, PGME), 또는 이들의 조합을 포함하는, 적색 감광성 수지 조성물.
According to claim 3,
The dispersion medium is a red photosensitive resin composition comprising propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), or a combination thereof.
상기 안료 분산액 내 전체 고형분 함량은 10 중량% 내지 40 중량%인, 적색 감광성 수지 조성물.
According to claim 3,
The total solid content in the pigment dispersion is 10% by weight to 40% by weight, the red photosensitive resin composition.
상기 안료 분산액 내 전체 고형분의 D50 입경은 15 ㎚ 내지 70 ㎚인, 적색 감광성 수지 조성물.
According to claim 3,
The D50 particle diameter of the total solids in the pigment dispersion is 15 nm to 70 nm, the red photosensitive resin composition.
상기 안료 분산액은, 상기 안료 분산액 총량에 대해,
상기 전체 안료를 10 중량% 내지 20 중량% 포함하고,
상기 분산제를 0.1 중량% 내지 5 중량% 포함하고,
상기 분산 수지를 0.1 중량% 내지 5 중량% 포함하고,
상기 분산매를 잔부로 포함하는,
적색 감광성 수지 조성물.
According to claim 3,
The pigment dispersion, relative to the total amount of the pigment dispersion,
10% to 20% by weight of the total pigment,
0.1% to 5% by weight of the dispersant,
0.1% to 5% by weight of the dispersion resin,
Comprising the dispersion medium as the remainder,
A red photosensitive resin composition.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 하기 수학식 2를 만족하는, 적색 감광성 수지 조성물:
[수학식 2]
70 ≤ A/B ≤ 100
상기 수학식 2에서,
A는 상기 적색 감광성 수지막이 725 ㎚의 파장에서 나타내는 투과율이고,
B는 상기 적색 감광성 수지막이 625 ㎚의 파장에서 나타내는 투과율이다.
According to claim 1,
Upon spectroscopic analysis of a red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, a red photosensitive resin composition satisfying Equation 2 below:
[Equation 2]
70 ≤ A/B ≤ 100
In Equation 2 above,
A is the transmittance of the red photosensitive resin film at a wavelength of 725 nm,
B is the transmittance of the red photosensitive resin film at a wavelength of 625 nm.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 430 ㎚의 파장에서 나타내는 투과율이 5 % 이하(단, 0% 초과)인, 적색 감광성 수지 조성물.
According to claim 10,
Upon spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, the transmittance at a wavelength of 430 nm is 5% or less (however, greater than 0%), the red photosensitive resin composition.
상기 적색 감광성 수지 조성물을 이용하여 제조된 5500 Å 내지 6000 Å 두께의 적색 감광성 수지막에 대해 분광 분석 시, 560 ㎚의 파장에서 나타내는 투과율이 3.5 % 이하(단, 0% 초과)인, 적색 감광성 수지 조성물.
According to claim 10,
Upon spectroscopic analysis of the red photosensitive resin film having a thickness of 5500 Å to 6000 Å prepared using the red photosensitive resin composition, the transmittance at a wavelength of 560 nm is 3.5% or less (however, greater than 0%), the red photosensitive resin. composition.
상기 바인더 수지는 아크릴계 바인더 수지를 포함하는 적색 감광성 수지 조성물.
According to claim 1,
The binder resin is a red photosensitive resin composition comprising an acrylic binder resin.
상기 감광성 수지 조성물은, 상기 감광성 수지 조성물 총량에 대해,
상기 (A) 착색제 5 중량% 내지 70 중량%;
상기 (B) 바인더 수지 0.1 중량% 내지 20 중량%;
상기 (C) 광중합성 화합물 0.1 중량% 내지 20 중량%;
상기 (D) 광중합 개시제 0.1 중량% 내지 5 중량%; 및
상기 (E) 용매 잔부량
을 포함하는 감광성 수지 조성물.
According to claim 1,
The photosensitive resin composition, relative to the total amount of the photosensitive resin composition,
5% to 70% by weight of the (A) colorant;
0.1% to 20% by weight of the (B) binder resin;
0.1% to 20% by weight of the (C) photopolymerizable compound;
0.1% to 5% by weight of the (D) photopolymerization initiator; and
The remaining amount of the above (E) solvent
Photosensitive resin composition comprising a.
상기 감광성 수지 조성물은 말론산; 3-아미노-1,2-프로판디올; 비닐기 또는 (메타)아크릴옥시기를 포함하는 커플링제; 레벨링제; 불소계 계면활성제; 및 라디칼 중합 개시제로부터 선택되는 적어도 하나의 첨가제를 더 포함하는 감광성 수지 조성물.
According to claim 1,
The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; A coupling agent containing a vinyl group or a (meth)acryloxy group; leveling agent; fluorine-based surfactants; And a photosensitive resin composition further comprising at least one additive selected from a radical polymerization initiator.
A red photosensitive resin film prepared using the red photosensitive resin composition according to any one of claims 1 to 15.
A red color filter comprising the red photosensitive resin film of claim 16 .
A CMOS image sensor comprising the red color filter of claim 17 .
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