KR20180034937A - 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 - Google Patents
유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 Download PDFInfo
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- KR20180034937A KR20180034937A KR1020160124797A KR20160124797A KR20180034937A KR 20180034937 A KR20180034937 A KR 20180034937A KR 1020160124797 A KR1020160124797 A KR 1020160124797A KR 20160124797 A KR20160124797 A KR 20160124797A KR 20180034937 A KR20180034937 A KR 20180034937A
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- alkyl
- copolymer
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- 239000000203 mixture Substances 0.000 title claims abstract description 42
- 239000008393 encapsulating agent Substances 0.000 title claims abstract description 32
- 229920001577 copolymer Polymers 0.000 claims abstract description 102
- 125000000217 alkyl group Chemical group 0.000 claims description 41
- 229920001296 polysiloxane Polymers 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 28
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 24
- 239000003566 sealing material Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 14
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 125000004036 acetal group Chemical group 0.000 claims description 8
- 150000004292 cyclic ethers Chemical group 0.000 claims description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 8
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 8
- 125000000686 lactone group Chemical group 0.000 claims description 8
- 125000000101 thioether group Chemical group 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 4
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 4
- 125000005157 alkyl carboxy group Chemical group 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000003368 amide group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000005189 alkyl hydroxy group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 42
- 230000015572 biosynthetic process Effects 0.000 description 28
- 238000003786 synthesis reaction Methods 0.000 description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 239000011521 glass Substances 0.000 description 26
- 238000001723 curing Methods 0.000 description 20
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000011342 resin composition Substances 0.000 description 18
- 239000000758 substrate Substances 0.000 description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 17
- 229910052710 silicon Inorganic materials 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- 229920002050 silicone resin Polymers 0.000 description 16
- 239000010703 silicon Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 14
- 229920005573 silicon-containing polymer Polymers 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000004793 Polystyrene Substances 0.000 description 6
- 238000005538 encapsulation Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000002411 thermogravimetry Methods 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- ARXKVVRQIIOZGF-UHFFFAOYSA-N 1,2,4-butanetriol Chemical compound OCCC(O)CO ARXKVVRQIIOZGF-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- CWABICBDFJMISP-UHFFFAOYSA-N 1,3,5-tris(prop-1-en-2-yl)benzene Chemical compound CC(=C)C1=CC(C(C)=C)=CC(C(C)=C)=C1 CWABICBDFJMISP-UHFFFAOYSA-N 0.000 description 1
- ZENYUPUKNXGVDY-UHFFFAOYSA-N 1,4-bis(prop-1-en-2-yl)benzene Chemical compound CC(=C)C1=CC=C(C(C)=C)C=C1 ZENYUPUKNXGVDY-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- JCTXKRPTIMZBJT-UHFFFAOYSA-N 2,2,4-trimethylpentane-1,3-diol Chemical compound CC(C)C(O)C(C)(C)CO JCTXKRPTIMZBJT-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KIJPZYXCIHZVGP-UHFFFAOYSA-N 2,3-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(C)=C2 KIJPZYXCIHZVGP-UHFFFAOYSA-N 0.000 description 1
- LZWVPGJPVCYAOC-UHFFFAOYSA-N 2,3-diphenylanthracene-9,10-dione Chemical compound C=1C=CC=CC=1C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 LZWVPGJPVCYAOC-UHFFFAOYSA-N 0.000 description 1
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- IKZMAWGJPJMWJG-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IKZMAWGJPJMWJG-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- -1 N, N-diethylaminoethyl Chemical group 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- UOGPKCHLHAWNIY-UHFFFAOYSA-N [2-hydroxy-3-(2-hydroxy-3-prop-2-enoyloxypropoxy)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(O)COCC(O)COC(=O)C=C UOGPKCHLHAWNIY-UHFFFAOYSA-N 0.000 description 1
- OPLZHVSHWLZOCP-UHFFFAOYSA-N [2-hydroxy-3-[2-hydroxy-3-(2-methylprop-2-enoyloxy)propoxy]propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)COCC(O)COC(=O)C(C)=C OPLZHVSHWLZOCP-UHFFFAOYSA-N 0.000 description 1
- NEXOUCXVUHLFNB-UHFFFAOYSA-N [2-hydroxy-3-[3-[2-hydroxy-3-(2-methylprop-2-enoyloxy)propoxy]-2,2-bis[[2-hydroxy-3-(2-methylprop-2-enoyloxy)propoxy]methyl]propoxy]propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)COCC(COCC(O)COC(=O)C(C)=C)(COCC(O)COC(=O)C(C)=C)COCC(O)COC(=O)C(C)=C NEXOUCXVUHLFNB-UHFFFAOYSA-N 0.000 description 1
- MDMKOESKPAVFJF-UHFFFAOYSA-N [4-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(OC(=O)C(C)=C)C=C1 MDMKOESKPAVFJF-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- LLVUBGQEALYPBE-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1.C1CCC=CC1 LLVUBGQEALYPBE-UHFFFAOYSA-N 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000005394 sealing glass Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
Classifications
-
- H01L51/0094—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
-
- H01L51/0034—
-
- H01L51/448—
-
- H01L51/5253—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
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Abstract
Description
구성성분(중량%) | ||||
제1 공중합체 | 제2 공중합체 | 실리콘계 올리고머 |
광개시제 | |
실시예 1 | 제1 공중합체 A 48 중량% |
제2 공중합체 A 48 중량% |
- | 4 중량% |
실시예 2 | 제1 공중합체 A 48 중량% |
제2 공중합체 B 48 중량% |
- | 4 중량% |
실시예 3 | 제1 공중합체 B 48 중량% |
제2 공중합체 A 48 중량% |
- | 4 중량% |
실시예 4 | 제1 공중합체 B 48 중량% |
제2 공중합체 B 48 중량% |
- | 4 중량% |
실시예 5 | 제1 공중합체 C 48 중량% |
제2 공중합체 A 48 중량% |
- | 4 중량% |
실시예 6 | 제1 공중합체 C 48 중량% |
제2 공중합체 B 48 중량% |
- | 4 중량% |
실시예 7 | 제1 공중합체 D 48 중량% |
제2 공중합체 A 48 중량% |
- | 4 중량% |
실시예 8 | 제1 공중합체 D 48 중량% |
제2 공중합체 B 48 중량% |
- | 4 중량% |
실시예 9 | 제1 공중합체 A 38.4 중량% |
제2 공중합체 A 19.2 중량% |
38.4 중량% | 4 중량% |
실시예 10 | 제1 공중합체 A 38.4 중량% |
제2 공중합체 B 19.2 중량% |
38.4 중량% | 4 중량% |
실시예 11 | 제1 공중합체 D 38.4 중량% |
제2 공중합체 A 19.2 중량% |
38.4 중량% | 4 중량% |
실시예 12 | 제1 공중합체 D 38.4 중량% |
제2 공중합체 B 19.2 중량% |
38.4 중량% | 4 중량% |
비교예 1 | - | 제2 공중합체 A 96 중량% |
- | 4 중량% |
비교예 2 | - | 제2 공중합체 B 96 중량% |
- | 4 중량% |
비교예 3 | - | 제2 공중합체 A 48 중량% |
48 중량% | 4 중량% |
비교예 4 | - | 제2 공중합체 B 48 중량% |
48 중량% | 4 중량% |
비교예 5 | - | - | 96 중량% | 4 중량% |
경화 후 점착테스트 |
광 경화율 (UV curing conversion) |
경화 후 박막의 중량손실 (%) |
연필경도 | |
실시예 1 | 경화 | 93% | 0.3% | 5H |
실시예 2 | 경화 | 92.7% | 0.45% | 5H |
실시예 3 | 경화 | 93.2% | 0.33% | 5H |
실시예 4 | 경화 | 94% | 0.32% | 5H |
실시예 5 | 경화 | 93.5% | 0.45% | 5H |
실시예 6 | 경화 | 95% | 0.2% | 5H |
실시예 7 | 경화 | 97.2% | 0.17% | 5H |
실시예 8 | 경화 | 96.8% | 0.15% | 5H |
실시예 9 | 경화 | 92.3% | 0.43% | 5H |
실시예 10 | 경화 | 92% | 0.46% | 5H |
실시예 11 | 경화 | 94.2% | 0.35% | 5H |
실시예 12 | 경화 | 93.1% | 0.3% | 5H |
비교예 1 | 미경화 | 22% | 13.5% | < 5B |
비교예 2 | 미경화 | 17% | 11.4% | < 5B |
비교예 3 | 경화 | 57.3% | 7.5% | 1B |
비교예 4 | 경화 | 61% | 6.3% | 1B |
비교예 5 | 경화 | 68% | 6.7% | 1B |
Claims (11)
2) 하기 화학식 2로 표시되는 제2 단위, 및 하기 화학식 3으로 표시되는 제3 단위를 포함하는 제2 공중합체; 및
3) 1종 이상의 광개시제
를 포함하는 봉지재용 조성물:
[화학식 1]
[화학식 2]
[화학식 3]
상기 화학식 1 내지 3에서,
R1은 직접결합, 또는 알킬렌기이고,
R2 내지 R7은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 알킬기, 알케닐기, 아릴기, 글리시딜기, 이소시아네이트기, 히드록시기, 카복실기, 비닐기, 아크릴레이트기, 메타크릴레이트기, 에폭시드(epoxide)기, 고리형 에테르(cyclic ether)기, 설파이드(sulfide)기, 아세탈(acetal)기, 락톤(lactone)기, 아미드기, 알킬아릴기, 알킬글리시딜기, 알킬이소시아네이트기, 알킬히드록시기, 알킬카복실기, 알킬비닐기, 알킬아크릴레이트기, 알킬메타크릴레이트기, 알킬고리형에테르기, 알킬설파이드기, 알킬아세탈기, 알킬락톤기 및 알킬아미드기로 이루어진 군으로부터 선택될 수 있고,
a, b, c 및 d는 각각 독립적으로 1 내지 200 이다.
[화학식 4]
상기 화학식 4에서,
R9, R10, R12 및 R16은 서로 동일하거나 상이하고, 각각 독립적으로 직접결합, 또는 알킬렌기이고,
R8, R11, R13, R14, R15 및 R17은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 알킬기, 알케닐기, 아릴기, 글리시딜기, 이소시아네이트기, 히드록시기, 카복실기, 비닐기, 아크릴레이트기, 메타크릴레이트기, 에폭시드(epoxide)기, 고리형 에테르(cyclic ether)기, 설파이드(sulfide)기, 아세탈(acetal)기, 락톤(lactone)기, 아미드기, 알킬아릴기, 알킬글리시딜기, 알킬이소시아네이트기, 알킬히드록시기, 알킬카복실기, 알킬비닐기, 알킬아크릴레이트기, 알킬메타크릴레이트기, 알킬고리형에테르기, 알킬설파이드기, 알킬아세탈기, 알킬락톤기 및 알킬아미드기로 이루어진 군으로부터 선택될 수 있고,
e는 1 내지 100 이다.
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PCT/KR2017/010602 WO2018062807A1 (ko) | 2016-09-28 | 2017-09-26 | 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 |
EP17856693.1A EP3522241B1 (en) | 2016-09-28 | 2017-09-26 | Composition for organic electronic element encapsulant, and encapsulant formed using same |
JP2019510364A JP2019528357A (ja) | 2016-09-28 | 2017-09-26 | 有機電子素子封止材用組成物およびこれを用いて形成された封止材 |
AU2017337720A AU2017337720A1 (en) | 2016-09-28 | 2017-09-26 | Composition for organic electronic element encapsulant, and encapsulant formed using same |
CN201780054912.9A CN109791978B (zh) | 2016-09-28 | 2017-09-26 | 用于有机电子元件封装剂的组合物及用其形成的封装剂 |
US16/330,267 US10822523B2 (en) | 2016-09-28 | 2017-09-26 | Composition for organic electronic element encapsulant, and encapsulant formed using same |
TW106133223A TW201817818A (zh) | 2016-09-28 | 2017-09-27 | 用於密封材料的組成物、密封材料以及有機電子裝置 |
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US11531516B2 (en) | 2019-01-18 | 2022-12-20 | Samsung Electronics Co., Ltd. | Intelligent volume control |
US20230232650A1 (en) * | 2020-03-19 | 2023-07-20 | Sfc Co., Ltd | Organoelectroluminescent device using polycyclic aromatic compounds |
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KR20010053068A (ko) * | 1998-06-24 | 2001-06-25 | 유진 에프. 밀러 | 이중 경화 실리콘 조성물 |
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JP6426023B2 (ja) * | 2015-02-16 | 2018-11-21 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 紫外線硬化型シリコーン樹脂組成物、及びそれを用いた画像表示装置 |
EP3268443B1 (en) * | 2015-03-10 | 2020-06-24 | Henkel IP & Holding GmbH | A moisture and radiation curable adhesive composition and the use thereof |
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WO2018062807A1 (ko) | 2018-04-05 |
US10822523B2 (en) | 2020-11-03 |
CN109791978A (zh) | 2019-05-21 |
US20190194492A1 (en) | 2019-06-27 |
EP3522241A1 (en) | 2019-08-07 |
JP2019528357A (ja) | 2019-10-10 |
AU2017337720A1 (en) | 2019-04-11 |
EP3522241B1 (en) | 2023-03-22 |
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CN109791978B (zh) | 2023-04-04 |
TW201817818A (zh) | 2018-05-16 |
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