KR20070067961A - LCD panel and manufacturing method - Google Patents

Abstract

An LCD(Liquid Crystal Display) and a manufacturing method thereof are provided to stabilize a support structure of an overcoat and an organic insulation layer, thereby forming a column spacer stably. A color filter substrate includes color filters formed thereon. A TFT(Thin Film Transistor) substrate includes an organic insulating layer formed thereon and is bonded with the color filter substrate by interposing the liquid crystal. A column spacer(4) is formed between the color filter substrate and the TFT substrate. An overcoat(240) is formed on the color filter of the color filter substrate. A portion of the overcoat is penetrated in order to be located the column spacer. In the organic insulating layer, a portion overlapped with the column spacer is penetrated.

Description

LCD panel and manufacturing method thereof {LIQUID CRYSTAL DIPLAY PANEL AND MANUFACTURING METHOD THEREOF}

1 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a first embodiment of the present invention.

2 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a second embodiment of the present invention.

3 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a third embodiment of the present invention.

4 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a fourth embodiment of the present invention.

5 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a fifth embodiment of the present invention.

6 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a sixth embodiment of the present invention.

<Description of Signs of Major Parts of Drawings>

1: thin film transistor substrate 110: substrate

120: gate wiring 130: organic insulating film

140: data wiring 150: pixel electrode

160: reflective electrode 170: gate insulating film

2: color filter substrate 210: substrate

220: black matrix 230: color filter

240: overcoat 250: common electrode

A: overcoat region in which column spacers are formed

B: organic insulating film region where column spacers overlap

The present invention relates to a liquid crystal display panel, and more particularly, to a semi-transmissive liquid crystal display panel and a method for manufacturing the same that can improve display quality by preventing the liquid crystals (Bruising) when the panel touch.

Each sub-pixel of the transflective liquid crystal display panel is divided into a reflection area and a transmission area, and the overcoat layer of the color filter substrate is patterned to compensate for the optical path difference between the reflection area and the transmission area. It has a double cell gap.

In the double cell gap structure, the cause of the liquid crystal bulging during the panel touch is considered as the liquid crystal slump around the column spacer which serves as a support for forming the cell gap when the panel is touched. In other words, it is known that the structure at the position of the thin film transistor substrate and the color filter substrate where the column spacers are stacked has a great influence on the fluctuation of the liquid crystal.

In the conventional double cell gap structure, the column spacer is formed on the unexposed overcoat layer and contacts the unexposed organic insulating layer of the thin film transistor substrate to support the color filter substrate and the thin film transistor substrate.

However, as the column spacer is formed at the end of the overcoat having an unstable surface profile, the patterning state of the column spacer is also unstable, and thus it is not possible to stably support the color filter substrate. Accordingly, the conventional transflective liquid crystal display panel is vulnerable to fluctuation of the liquid crystal when the panel is touched. In particular, in the case of a touch screen panel, the fluctuation of the liquid crystal has an important effect on the display quality.

The present invention has been made to solve the problems of the prior art as described above, the object of the present invention is to stabilize the support structure of the column spacer to remove the swelling of the liquid crystal when touching the panel to prevent light leakage and improve the display quality The present invention provides a liquid crystal display panel and a method of manufacturing the same.

In order to achieve the above object, the liquid crystal display panel of the present invention includes a color filter substrate having a color filter; A thin film transistor substrate on which an organic insulating film is formed and bonded with the color filter substrate and the liquid crystal interposed therebetween; A column spacer formed between the color filter substrate and the thin film transistor substrate; It is formed on the color filter of the color filter substrate, characterized in that it comprises an overcoat having a portion or a relatively low thickness through which the column spacer is located.

Alternatively, the thin film transistor may include an organic insulating layer formed on the thin film transistor substrate and having a relatively low thickness through a portion where the column spacer overlaps.

In addition, the portion in which the column spacer is positioned has an overcoat, and the portion in which the column spacer overlaps is penetrated or has an organic insulating film having a relatively low thickness.

The portion where the column spacer is positioned has an overcoat having a relatively low thickness, and the portion where the column spacer overlaps has an organic insulating layer having a penetrating or relatively low thickness.

In addition, a portion having a relatively low thickness or penetrating the organic insulating layer and the overcoat is formed on the gate line or the data line.

On the other hand, the liquid crystal display panel manufacturing method according to the present invention comprises the steps of forming a color filter on the substrate; Forming and patterning an overcoat over the color filter to form a penetration or a relatively low thickness at the location where the column spacer is to be formed; Forming a color filter substrate forming a column spacer in the overcoat penetrating portion; Forming a thin film transistor substrate; And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween.

At this time, by forming and patterning the organic insulating film on the thin film transistor substrate, it characterized in that it further comprises the step of forming a through portion or a relatively low thickness portion at the position where the column spacer overlap.

Or forming a color filter on the substrate; Forming an overcoat on the color filter; Forming a color filter substrate forming a column spacer on the overcoat; Forming and patterning an organic insulating film on the thin film transistor substrate to form a through portion or a relatively low thickness portion at a position where the column spacer overlaps; And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween.

At this time, by forming and patterning the overcoat on the color filter, characterized in that it further comprises the step of forming a through portion or a relatively low thickness at the position where the column spacer is to be formed.

Hereinafter, specific configurations and operations will be described in detail with reference to the accompanying drawings.

The transflective liquid crystal display panel reflects external light such as sunlight or lighting without turning on the backlight in daytime or bright places and can see the LCD screen. Because it can be reduced, it is widely used in portable information communication devices such as mobile phones and PDAs.

The semi-transmissive liquid crystal display panel is an apparatus for displaying an image by adjusting the light transmittance of the liquid crystal using an electric field.

The liquid crystal display panel according to the present invention has a structure (S1) in which the overcoat of the portion where the column spacer is formed is formed through the exposure treatment (S1), and the overcoat is partially etched by the partial exposure treatment, so that a relatively low thickness is obtained. The structure S2 to be formed, the structure in which the organic insulating film of the portion where the column spacer overlaps, and the through portion where the organic etching film is entirely etched by the exposure treatment, and the organic insulating film are partially etched by the partial exposure treatment, are relatively low in thickness. Characterized in that it is formed of any one structure selected from the structure (S4) to form a.

The column spacer 4 can be stably formed even if only one of the overcoat region A or the organic insulating layer region B on which the column spacer 4 is formed is subjected to surface treatment through exposure or partial exposure. It can eliminate the phenomenon of liquid crystal.

However, if both the overcoat region A and the organic insulating layer region B on which the column spacer 4 is formed are subjected to surface treatment by exposure or partial exposure, the column spacer 4 can be formed more stably, so that The effect of eliminating ripples is more excellent.

Therefore, four structures (S1-S3, S1-S4, S2-S3, S2) in which the overcoat 240, on which the column spacer 4 is formed, and the exposure treatment or partial exposure treatment of the organic insulating film 130 can be mixed and combined. It is possible to double the effect of preventing the liquid crystal from forming by forming one of the structures in -S4).

The column spacer 4 may be formed on the data wiring or the gate wiring which may play a role of BM (Black Matrix) at the bottom.

Hereinafter, the specific examples will be described.

1 is a cross-sectional view showing a column spacer 4 forming portion of a liquid crystal panel according to a first embodiment of the present invention. The liquid crystal display panel shown in FIG. 1 includes a thin film transistor substrate 1 and a color filter substrate 2 bonded together to face each other with a liquid crystal 3 therebetween.

The thin film transistor substrate 1 includes a thin film transistor, a pixel electrode 150 and a reflective electrode 160 connected to the thin film transistor on the substrate.

In addition, the thin film transistor substrate 1 further includes an organic insulating layer formed between the thin film transistor and the pixel electrode 150 to protect the thin film transistor.

The thin film transistor includes a gate electrode connected to the gate line 120, a source electrode connected to the data line 140, and a drain electrode connected to the pixel electrode 150. The thin film transistor supplies the pixel signal supplied to the data line 140 to the pixel electrode 150 in response to the scan signal supplied to the gate line 120. As the organic insulating layer 130, a photosensitive organic material such as acryl is used.

The pixel electrode 150 is formed on the organic insulating film of each subpixel and is connected to the drain electrode of the thin film transistor through a contact hole penetrating through the organic insulating film.

The reflective electrode is deposited on the pixel electrode 150 in the reflective region to form the reflective region in each subpixel. Accordingly, the reflective electrode 160 receives the data signal from the thin film transistor through the pixel electrode 150.

The surface of the organic insulating film is formed in an embossed shape, thereby improving the reflection efficiency by making the surface of the reflective electrode have an embossed shape.

The color filter substrate 2 includes a black matrix 220 for preventing light leakage, a color filter 230 for color implementation, and an overcoat 240 formed on the reflective region to protect the color filter and form a double cell gap. ), A common electrode 250 forming an electric field with the pixel electrode 150 is formed.

A column spacer 4 is formed between the color filter substrate 2 and the thin film transistor substrate 1 so that the two substrates maintain a cell gap at predetermined intervals.

In the first embodiment according to Fig. 1, the overcoat at the position where the column spacer 4 is formed has a through portion A by exposure processing.

Through this, since the column spacer 4 does not overlap with the overcoat 240, it is possible to form a stable structure.

FIG. 2 is a cross-sectional view of a column spacer 4 forming portion of the liquid crystal panel according to the second embodiment of the present invention.

In the second embodiment according to Fig. 2, the overcoat at the position where the column spacer 4 is formed has a relatively low thickness portion A by the partial exposure process.

As a result, the column spacer 4 is formed on the overcoat having a uniform surface by partial exposure, so that the column spacer 4 is also formed in a uniform shape to form a stable structure.

3 is a cross-sectional view illustrating a column spacer forming portion of a liquid crystal panel according to a third embodiment of the present invention.

In the third embodiment according to FIG. 3, the organic insulating film 130 at the position where the overcoat at the position where the column spacer 4 is formed has a through portion A etched by the exposure process and overlaps the column spacer 4. ) Has a structure in which both of the through portions B are etched by the exposure process.

As a result, the column spacer 4 is not only overlapped with the overcoat 240, but also not overlapped with the organic insulating layer 130, thereby forming a more stable structure.

4 is a cross-sectional view showing a column spacer forming portion 4 of the liquid crystal panel according to the fourth embodiment of the present invention.

In the fourth embodiment according to FIG. 4, the organic insulating film 130 at the position where the overcoat at the position where the column spacer 4 is formed has the through portion A which is fully etched by the exposure treatment and overlaps the column spacer 4. ) Is partially etched by the partial exposure treatment and has a relatively low thickness portion B simultaneously.

As a result, the column spacer 4 is not only overlapped with the overcoat 240 but also formed on the organic insulating layer 130 having a uniform surface by partial exposure, whereby the column spacer 4 is shaped into a uniform shape. To form a more stable structure.

5 is a cross-sectional view illustrating a column spacer 4 forming portion of a liquid crystal panel according to a fifth embodiment of the present invention, and FIG. 6 is a section forming column spacer 4 of a liquid crystal panel according to a sixth embodiment of the present invention. It is a cross-sectional view showing.

The fifth embodiment according to FIG. 5 shows the same configuration as the third embodiment according to FIG. 3 but the column spacer 4 is formed on the gate wiring 120, and the sixth embodiment according to FIG. 6. 4 illustrates the same configuration as that of the fourth embodiment of FIG. 4, but the column spacer 4 is formed on the gate wiring 120.

Since the column spacer 4 may be formed in the transistor region facing the BM 220 of the color filter substrate, the column spacer 4 may be formed on the gate wiring 120 or the data wiring 140.

The gate wiring 120 or the data wiring 140 plays a role of BM that blocks light at the bottom. When the column spacer 4 is formed on the gate wiring 120 or the data wiring 140, the lower gate is disposed. The wiring 120 or the data wiring 140 may serve as a pedestal so that the column spacer 4 may have a more stable structure.

Referring to the manufacturing method of the liquid crystal display panel according to the present invention, the gate metal is deposited on the substrate 110 and the metal is patterned by photolithography and etching to form the gate wiring 120. do.

Thereafter, the gate insulating layer 170 is deposited, an amorphous silicon layer and an n + amorphous silicon layer are deposited, and then the n + amorphous silicon layer and the amorphous silicon layer are patterned by photolithography and etching to form an active layer and an ohmic layer. Form a contact layer.

Thereafter, the data metal is deposited on the ohmic contact layer and the gate insulating layer, and the data metal is patterned by photolithography and etching to form the data wiring 140.

Thereafter, after forming the organic insulating film 130 on the data wiring 140 and the gate insulating film 170, the surface of the organic insulating film is embossed by the partial exposure process, and then all contact holes are formed by exposure.

In this case, the organic insulating film of the portion where the column spacer 4, which is the core of the present invention, is to be formed is exposed all to form a through-etched portion, or partially exposed to form a relatively low thickness portion, which is partially etched.

Embossing causes diffuse reflection to suppress specular reflection components and increase scattering efficiency and reflection efficiency of incident light.

Thereafter, a transparent conductive material is deposited on the organic insulating layer 130 and patterned by photolithography and etching to form the pixel electrode 150. Next, a metal having good reflectance is deposited on the pixel electrode and then patterned by photolithography and etching to form a reflective electrode 160 on the pixel electrode 150 in the reflective region.

Meanwhile, after forming a black metal or organic material under the color filter substrate 2, a black matrix 220 may be formed to block light in order to block external light and prevent light leakage current of the thin film transistor by an exposure process. In addition, an RGB color filter 230 is formed on the black matrix 220 pattern, and an overcoat 240 for protecting the color filter 230 is formed.

Thereafter, the entire transmissive region is etched by exposure in a photolithography process.

In this case, all of the overcoat areas on which the column spacer 4, which is the core of the present invention, is formed are exposed to form all-etched through portions, or partially exposed to form relatively low-thick portions etched.

Thereafter, the column spacer 4 is formed between the through portion or the relatively low thickness portion of the overcoat region and the through portion or the relatively low portion of the organic insulating film.

The column spacer 4 may be formed on the transistor substrate facing the BM of the color filter, and may be positioned on the gate wiring 120 or the data wiring 140. Accordingly, the exposed or partially exposed region may be over the gate line 120 or the data line 140, depending on the selection.

The exposure process includes applying a photoresist (PR), photolithography through a mask, etching the overcoat region A or organic insulating layer region B in contact with the column spacer 4, and stripping the PR.

 Through the above exposure treatment, the overcoat region A and / or the unexposed organic insulating layer region B on which the column spacer 4 is formed may be removed to stably form the column spacer 4.

The partial exposure process is performed by the same process as the exposure process except that a lithography step uses a diffraction mask such as a slit mask or a halftone mask. The partial exposure treatment causes the overcoat region A and / or the unexposed organic insulating film region B, on which the column spacer 4 is formed, to form a relatively low thickness portion of a uniform pattern.

The patterned thickness can be adjusted through the partial exposure process. The smaller the slit gap, the lower the patterning thickness is formed.

The feature of the present invention is to improve the profile of the overcoat region A and the organic insulating film region B in which the column spacer 4 is formed through the exposure treatment or the partial exposure treatment, and thus the overcoat region formed during the partial exposure treatment. The thicknesses of (A) and the organic insulating film region B are not limited to specific numerical values.

As described above, the liquid crystal display panel according to the present invention can stabilize the support structure of the overcoat and the organic insulating layer on which the column spacer is formed, thereby stably forming the column spacer, thereby removing light leakage by removing the slump of the liquid crystal when the panel is touched. An excellent effect occurs that can prevent and improve the display quality.

Although the detailed description of the present invention described above has been described with reference to the preferred embodiment of the present invention, the protection scope of the present invention is not limited to the above embodiment, and those skilled in the art will appreciate It will be understood that various modifications and changes can be made in the present invention without departing from the spirit and scope of the invention.

Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (18)

A color filter substrate on which a color filter is formed; A thin film transistor substrate on which an organic insulating film is formed and bonded with the color filter substrate and the liquid crystal interposed therebetween; A column spacer formed between the color filter substrate and the thin film transistor substrate;  And an overcoat formed on the color filter of the color filter substrate and having a portion through which the column spacer is located. A color filter substrate on which a color filter is formed; A thin film transistor substrate on which an organic insulating film is formed and bonded with the color filter substrate and the liquid crystal interposed therebetween; A column spacer formed between the color filter substrate and the thin film transistor substrate;  And an overcoat formed on the color filter of the color filter substrate and having a relatively small thickness of a portion where the column spacer is formed. A color filter substrate on which a color filter is formed; A thin film transistor substrate bonded with the color filter substrate and the liquid crystal interposed therebetween; A column spacer formed between the color filter substrate and the thin film transistor substrate;  And an organic insulating layer formed on the thin film transistor substrate and having a portion where the column spacer overlaps. A color filter substrate on which a color filter is formed; A thin film transistor substrate bonded with the color filter substrate and the liquid crystal interposed therebetween; A column spacer formed between the color filter substrate and the thin film transistor substrate;  And an organic insulating film formed on the thin film transistor substrate and having a relatively small thickness of an overlapping portion of the column spacer. 2. The liquid crystal display panel of claim 1, wherein the organic insulating layer has a portion through which the column spacer overlaps. The liquid crystal display panel of claim 1, wherein the organic insulating layer has a relatively small thickness of a portion where the column spacer overlaps. The liquid crystal display panel of claim 2, wherein the organic insulating layer penetrates a portion where the column spacer overlaps. The liquid crystal display panel of claim 2, wherein the organic insulating layer has a relatively small thickness of a portion where the column spacer overlaps. The liquid crystal display panel according to any one of claims 1 to 8, wherein the column spacer is formed on the gate line or the data line. Forming a color filter on the substrate; Forming and patterning an overcoat on the color filter to form a penetration at a position where a column spacer is to be formed; Forming a color filter substrate forming a column spacer in the overcoat penetrating portion; Forming a thin film transistor substrate; And And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween. Forming a color filter on the substrate; Forming and patterning an overcoat on the color filter to form a relatively low thickness at the location where the column spacer is to be formed; Forming a color filter substrate forming a column spacer in the overcoat penetrating portion; Forming a thin film transistor substrate; And And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween. Forming a color filter on the substrate; Forming an overcoat on the color filter; Forming a color filter substrate forming a column spacer on the overcoat; Forming and patterning an organic insulating layer on the thin film transistor substrate to form a through portion at a position where the column spacer is to be overlapped; And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween. Forming a color filter on the substrate; Forming an overcoat on the color filter; Forming a color filter substrate forming a column spacer on the overcoat; Forming and patterning an organic insulating layer on the thin film transistor substrate to form a relatively low thickness portion at a position where the column spacer is to be overlapped; And bonding the color filter substrate and the thin film transistor substrate with the liquid crystal interposed therebetween. The method of claim 10, further comprising forming a through portion at a position where the column spacer overlaps by forming and patterning an organic insulating layer on the thin film transistor substrate. 11. The method of claim 10, further comprising forming a relatively thin portion at a position where the column spacers overlap by forming and patterning an organic insulating layer on the thin film transistor substrate. 12. The method of claim 11, further comprising forming a through portion at a position where the column spacer overlaps by forming and patterning an organic insulating layer on the thin film transistor substrate. 12. The method of claim 11, further comprising forming a relatively low thickness portion at a position where the column spacer overlaps by forming and patterning an organic insulating layer on the thin film transistor substrate. 18. The liquid crystal display panel manufacturing method according to any one of claims 10 to 17, wherein the column spacer is formed on the gate wiring or the data wiring.

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