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JPS61118724A - Optical shutter array element - Google Patents

Optical shutter array element

Info

Publication number
JPS61118724A
JPS61118724A JP59239808A JP23980884A JPS61118724A JP S61118724 A JPS61118724 A JP S61118724A JP 59239808 A JP59239808 A JP 59239808A JP 23980884 A JP23980884 A JP 23980884A JP S61118724 A JPS61118724 A JP S61118724A
Authority
JP
Japan
Prior art keywords
optical shutter
electrode
voltage
flat plate
array element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59239808A
Other languages
Japanese (ja)
Inventor
Yoneji Takubo
米治 田窪
Yasutaka Horibe
堀部 泰孝
Nobue Tsujiuchi
辻内 伸恵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59239808A priority Critical patent/JPS61118724A/en
Priority to US06/798,029 priority patent/US4697889A/en
Priority to EP85308315A priority patent/EP0182622B1/en
Priority to DE8585308315T priority patent/DE3584419D1/en
Publication of JPS61118724A publication Critical patent/JPS61118724A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G02F1/055Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect the active material being a ceramic
    • G02F1/0551Constructional details

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To lower a driving voltage and to eliminate a secular change of an element due to long-period driving by forming electrodes and an insulating resin film on a groove wall surface provided on plate type light transmissive ceramic and a flat plate connecting with it. CONSTITUTION:A polarizer 15 is irradiated with light from behind and a voltage is applied between a voltage application electrode group 13 and a common electrode 12 formed on the PLZT flat plate 11, so that the applied part changes in polarization state and the light is transmitted. Electrodes are formed on the groove wall surface for electrode arrangement and the surface of the flat plate 11 connecting with it to prevent an electric field from being applied to a part B which is easily congested, and the insulating resin film 14 makes a part C hard to strain mechanically, thereby eliminating deterioration at the parts B and C. Therefore, while the driving voltage is lowered, deterioration of the element due to long-period driving is eliminated and the reliability is improved.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、光学式プリンターの書き込み用デバイス、カ
メラにおける高速光シャッター等、光制御機器に用いる
ことが出来る固体の光シャッターアレイ素子に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a solid-state optical shutter array element that can be used in optical control equipment, such as writing devices in optical printers, high-speed optical shutters in cameras, and the like.

従来例の構成とその問題点 近年、光通信、光学情報処理などの光関連技術の開発が
非常に活発に行なわれており、それに伴う、光学部品、
光制御デバイスの開発が重要視されている。その中にあ
って、電気光学効果を有する固体の透光性磁器も、光制
御デバイスとしての光シャッターとして利用出来1種々
の応用が期待されている。特に、上記光シャッター素子
をアレイ状に形成し、最近非常に注目を集めている非衝
撃形プリンターの一種である光学式プリンターの書き込
み用ヘッドとしての応用が期待されている。
Conventional configurations and their problems In recent years, the development of optical-related technologies such as optical communication and optical information processing has been very active, and as a result, optical components,
The development of optical control devices is gaining importance. Among these, solid translucent porcelain having an electro-optical effect can also be used as an optical shutter as a light control device, and is expected to have various applications. In particular, the optical shutter elements formed in an array are expected to be applied as a writing head for an optical printer, which is a type of non-impact printer that has recently been attracting a lot of attention.

現在、上記光シャッターアレイ素子として知られている
ものは、  La添加のチタン酸ジルコン酸鉛(PLZ
T)等の透光性磁器の平板上の表裏対称に、もしくは少
なくとも片面に、複数個の電極を設けた基板を、上記電
極に電圧を印加した時に生じる電界ベクトルの方向に対
して、±46°の偏光軸を有する偏光板で挾んだ構造を
有したものである。
Currently, what is known as the above-mentioned optical shutter array element is La-doped lead zirconate titanate (PLZ).
±46° with respect to the direction of the electric field vector that occurs when a voltage is applied to the electrodes on a flat plate of translucent porcelain such as T), which has a plurality of electrodes symmetrically on the front and back sides, or on at least one side. It has a structure in which it is sandwiched between polarizing plates having a polarization axis of °.

しかし、上記のような表面電極構造では、素子に電圧を
印加した場合、電極端部及び表面に電界が集中し、駆動
効率が悪く、印加電圧が高くなる。
However, in the surface electrode structure as described above, when a voltage is applied to the element, the electric field concentrates on the electrode end and the surface, resulting in poor driving efficiency and high applied voltage.

そのため、電極形成部に溝を設け、溝壁面に電極を設け
ることによシ、低電圧駆動を可能にした構造も・提案さ
れている。以下従来の光シャッターアレイ素子について
、図面を参照しながら説明する。
Therefore, a structure has been proposed in which a groove is provided in the electrode forming portion and an electrode is provided on the wall surface of the groove, thereby making it possible to drive at a low voltage. A conventional optical shutter array element will be described below with reference to the drawings.

第1図亀は、従来の光シャッターアレイ素子の構成図を
示したものであり、1はPLZT平板、2はPLZT平
板1上に設けられた共通電極、3は電圧印加用電極群で
ある。4は偏光子、5は検光子であり、これらは、共通
電極2と、電圧印加用電極群間に電圧を印加した時に生
じる電界ベクトルの方向に対して、±46°の方向に、
偏光軸が互いに直交するように構成される。第1図すは
The tortoise in FIG. 1 shows a configuration diagram of a conventional optical shutter array element, in which 1 is a PLZT flat plate, 2 is a common electrode provided on the PLZT flat plate 1, and 3 is a group of voltage application electrodes. 4 is a polarizer, and 5 is an analyzer, which are arranged in the direction of ±46° with respect to the direction of the electric field vector generated when a voltage is applied between the common electrode 2 and the voltage application electrode group.
The polarization axes are configured to be orthogonal to each other. Figure 1.

第1図aのイーロ間の断面図を示したものであシ。This is a cross-sectional view of the space between Eiro in FIG. 1a.

図からも明らかなように、PLZT平板に設ける電極は
、PLZT平板1の表面に溝を設け、上記溝の側面及び
底面に形成されている。
As is clear from the figure, the electrodes provided on the PLZT flat plate are provided with grooves on the surface of the PLZT flat plate 1, and are formed on the side and bottom surfaces of the grooves.

以下、図のように構成された従来の光シャッターアレイ
素子について、その動作を説明する。
The operation of the conventional optical shutter array element configured as shown in the figure will be described below.

第1図a偏光子4の後部から光を照射した場合、PLZ
T平板1上に形成された電圧印加用電極群3と、共通電
極2の電極間に電圧を印加しない時は、電気光学効果に
よる複屈折は生じず、偏光子4、及び検光子5によって
光は遮断されるが、電圧印加用電極群3に電圧を印加す
ると、電気光学効果のカー効果によって複屈折を生じ、
光の偏光状態が変化し、光が透過する。従って、電圧印
加用電極群3の任意の電極に電圧を印加すれば、任意の
部分の光を透過することが出来、検光子6の前部に感光
体などを置いておけば、任意のパターン表示が可能であ
シ、非撃形の光プリンターの書き込みヘッドとして利用
出来る。また、電極部分を溝の壁面に形成しているので
、共通電極2と、電圧印加用電極群3間に印加する電圧
が低下出来ておシ、特性の上では、実用的な光シャッタ
ーアレイ素子である。
Figure 1a When light is irradiated from the rear of polarizer 4, PLZ
When no voltage is applied between the voltage application electrode group 3 formed on the T-plate 1 and the common electrode 2, birefringence due to the electro-optic effect does not occur, and the polarizer 4 and analyzer 5 is blocked, but when a voltage is applied to the voltage application electrode group 3, birefringence occurs due to the Kerr effect of the electro-optic effect,
The polarization state of the light changes and the light is transmitted. Therefore, by applying a voltage to any electrode in the voltage application electrode group 3, light from any part can be transmitted, and by placing a photoconductor or the like in front of the analyzer 6, any pattern can be created. It can be used as a writing head for non-striking optical printers. In addition, since the electrode portion is formed on the wall surface of the groove, the voltage applied between the common electrode 2 and the voltage application electrode group 3 can be reduced. It is.

しかしながら、PLZT電気光学材料は、電気光学効果
としてのカー効果が大きいだけでなく。
However, the PLZT electro-optic material not only has a large Kerr effect as an electro-optic effect.

電界を印加すると、電界の2乗に比例した歪を生じる現
象(電歪現象)も大きく、第1図a、bのような従来の
電極構造では、第1図すのムの部分、即ち、溝壁面と、
PLZT平板1の表面の交線部分に電界が集中する傾向
があシ、さらに、構造の上からも、電歪現象による歪が
ムの部分に集中し、機械的な破壊を起こし易く、従来素
子構造では、電圧の0N10FFをくり返すことにより
、経時的な劣化が起こるという問題を有していた。
When an electric field is applied, there is a large phenomenon (electrostrictive phenomenon) that causes distortion proportional to the square of the electric field, and in the conventional electrode structure as shown in Fig. 1 a and b, the part shown in Fig. 1 is a groove wall surface;
The electric field tends to concentrate on the intersection lines on the surface of the PLZT flat plate 1, and furthermore, from the top of the structure, the strain due to the electrostrictive phenomenon concentrates on the areas where the lines intersect, making it easy to cause mechanical breakdown, which is different from conventional elements. The structure had a problem in that it deteriorated over time due to repeated voltage changes of 0N10FF.

発明の目的 本発明の目的は、光学式プリンター等、光制御デバイス
として用いて非常に有効であり、駆動電圧が低く、長期
駆動による経時的な変化の少ない信頼性に優れた光シャ
ッターアレイ素子を提供することである。
OBJECT OF THE INVENTION The object of the present invention is to provide an optical shutter array element which is very effective when used as a light control device such as an optical printer, has a low driving voltage, and has excellent reliability with little change over time due to long-term operation. It is to provide.

発明の構成 複数個の電極を設け、前記平板の表裏に偏光板を偏光軸
が互いに90°の角度をなすように配置した光シャッタ
ーアレイ素子であって、前記板状透光性磁器の上記電極
配設位置には、電極配設用の溝を設け、上記電極を少な
くとも上記溝壁面と上記溝壁面につらなる前記板状透光
性磁器表面にわたって形成し、かつ、上記電極部とそれ
につらなる光シャッター部の一部にわたって、樹脂を形
成した構造を有するものであって、これによシ、低電圧
駆動で、長期信頼性に優れた光シャッターアレイ素子と
なるものである。
Structure of the Invention An optical shutter array element is provided with a plurality of electrodes, and polarizing plates are arranged on the front and back sides of the flat plate so that the polarization axes make an angle of 90° with each other, the electrode of the plate-shaped transparent porcelain. A groove for electrode placement is provided at the placement position, the electrode is formed over at least the groove wall surface and the plate-shaped translucent porcelain surface connected to the groove wall surface, and the electrode portion and an optical shutter connected thereto are provided. The optical shutter array element has a structure in which resin is formed over a part of the part, and thereby the optical shutter array element can be driven at a low voltage and has excellent long-term reliability.

実施例の説明 以下本発明の一実施例について、図面を参照しながら説
明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

第2図a、bは、本発明の実施例における光シャッター
アレイ素子の構成を示したものである。
FIGS. 2a and 2b show the structure of an optical shutter array element in an embodiment of the present invention.

第2図a、bにおいて、11はPLZT平板、12はP
LZT平板11上に設けられた共通電極、13は電圧印
加用電極群である。14はPLZT平板上の電極部と、
それに連なる光シャッター部の−部にわたって形成され
た絶縁性の樹脂、16は偏光子、16は検光子を示して
あシ、共通電極12と電圧印加用電極群13間に電圧を
印加した時に生じる電界ベクトルの方向に対して、±4
5°の方向に偏光軸を有するように構成されている。第
2図すは、第2図aのイーロ間の断面図を示したもので
ある。
In Figures 2a and b, 11 is a PLZT flat plate, 12 is a P
A common electrode is provided on the LZT flat plate 11, and 13 is a group of electrodes for voltage application. 14 is an electrode part on a PLZT flat plate;
An insulating resin is formed over the negative part of the optical shutter section connected to the reed, 16 is a polarizer, and 16 is an analyzer. ±4 relative to the direction of the electric field vector
It is configured to have a polarization axis in a direction of 5°. FIG. 2 shows a cross-sectional view between Eiro in FIG. 2a.

以上のように構成された本実施例の光シャッターアレイ
素子について、以下にその動作を説明する。
The operation of the optical shutter array element of this embodiment configured as described above will be described below.

本発明にかかる構成を有する光シャッターアレイ素子に
おいても、従来の構成を有する光シャッターアレイ素子
の原理と同様であり、第2図!L15の偏光子の後部か
ら光を照射した場合、PLZT平板11上に形成された
電圧印加用電極群13と、共通電極12の間に電圧を印
加しない時は、電気光学効果てよる複屈折は生じず、光
は遮断されるが、電圧印加用電極群13に電圧を印加す
ると、その電圧の印加された部分のみ、光の偏光状態が
変化し、光が透過するようになる。しかし1本発明にか
かわる実施例の場合は、第2図すの断面図かられかるよ
うに、電極を電極配設用の溝壁面及び、それにつらなる
PLZT平板11表面にわたって形成することにより、
電歪現象による歪が集中し易く、機械的破壊の起こり易
い第2図すにおけるBの部分(第1図ム部と同じ)に電
界がかがらないようにし、8部が歪まないようにすると
同時に、電極端部である第2図すにおけるCの部分には
、樹脂を形成することにより、機械的に歪みに<<シ、
電極端部で起こる急激な歪量の差によるストレスを緩和
している。これにょシ、8部。
The principle of the optical shutter array element having the configuration according to the present invention is the same as that of the optical shutter array element having the conventional configuration, and FIG. When light is irradiated from the rear of the polarizer L15, when no voltage is applied between the voltage application electrode group 13 formed on the PLZT flat plate 11 and the common electrode 12, birefringence due to the electro-optic effect is However, when a voltage is applied to the voltage application electrode group 13, the polarization state of the light changes only in the portion to which the voltage is applied, and the light is transmitted. However, in the case of the embodiment according to the present invention, as can be seen from the cross-sectional view of FIG.
If the electric field is not applied to the part B in Fig. 2 (same as the M part in Fig. 1), where strain due to electrostriction phenomenon tends to concentrate and mechanical damage is likely to occur, and the part 8 is not distorted, At the same time, by forming resin on the electrode end portion C in Figure 2, it is possible to mechanically prevent strain.
This alleviates the stress caused by the sudden difference in strain that occurs at the electrode ends. This is part 8.

0部での劣化をなくし、かつ、従来と同様、電極部を埋
込み型にすることによシ、厚み方向に対しても有効な電
界がかかり、低電圧駆動を実現出来ている。以上のよう
に、本実施例の構造により、駆動電圧は低下させたまま
で、長期駆動にょる経時的な素子の劣化のない信頼性に
非常に優れた光      1シャッターアンイ素子が
実現出来た。
By eliminating deterioration at the 0 part and making the electrode part a buried type as in the past, an effective electric field is applied also in the thickness direction, making it possible to realize low voltage driving. As described above, with the structure of this example, it was possible to realize an optical one-shutter device with extremely high reliability without deterioration of the device over time due to long-term driving, while keeping the driving voltage low.

本実施例においては、厚さ400μmのPLZT平板を
用い、フォトリソグラフィ技術を用い。
In this example, a PLZT flat plate with a thickness of 400 μm was used, and photolithography technology was used.

PLZT平板11のエツチングを、化学エツチング法に
よシ行ない、電極配設部の溝を形成した。
The PLZT flat plate 11 was etched by a chemical etching method to form grooves for the electrode placement portions.

PLZTのエツチング深さは約2μmであった。The etching depth of PLZT was about 2 μm.

その後、全面に電極としてcr−ムUを蒸着し、再度フ
ォトリソグラフィー技術によシ、前記PLZTエツチン
グ部を完全だ覆ってしまう複数個の電極を形成した。こ
の時、 Or−ムUの電極厚みは約1μmであった。ま
た、第2図aにおいて、電圧印加用電極群13の電極幅
は50μm、電極間隔は70μm、光シャッター部の電
極間隔は40μmで構成した。この時、本発明にかかわ
る光シャッターアレイ素子、及び従来構成の光シャッタ
ー7レイ素子のどちらの場合も、印加電圧70Vで光シ
ャッター部の透過率が最大となった。さらに、本発明に
かかわる光シャッターアレイ素子と、従来構成の光シャ
ッターアレイ素子について、70V 、 I K11z
の矩形波パルスを長期印加した場合の、各素子の経時変
化を調べた結果、従来素子構造では、約200時間で、
第1図すの太部にクラックが入シ、素子が劣化したが、
本発明における素子構造では、2000時間駆動後も、
変化が見られず、安定した透過率が得られた。
Thereafter, Cr-Mom U was deposited on the entire surface as an electrode, and again by photolithography, a plurality of electrodes were formed to completely cover the PLZT etched portion. At this time, the electrode thickness of Or-mu U was about 1 μm. In addition, in FIG. 2a, the voltage application electrode group 13 had an electrode width of 50 μm, an electrode spacing of 70 μm, and an electrode spacing of the optical shutter section of 40 μm. At this time, in both the case of the optical shutter array element according to the present invention and the optical shutter 7-ray element of the conventional configuration, the transmittance of the optical shutter section reached the maximum at an applied voltage of 70 V. Furthermore, for the optical shutter array element according to the present invention and the optical shutter array element of the conventional configuration, 70V, I K11z
As a result of investigating the changes in each element over time when applying a square wave pulse of
There was a crack in the thick part of Figure 1, and the element deteriorated.
In the device structure of the present invention, even after driving for 2000 hours,
No change was observed, and stable transmittance was obtained.

なお、本実施例では、電極材料として、Or−ムUを使
用したが、他の電極材料でも同様の効果が得られること
は容易に推測される。また、PLZT平板上の電極配設
用の溝も、化学エツチングによシ行なったが、物理的な
エツチング、機械的な方法でも可能で1)、限定するも
のではない。
In this example, Or-mu U was used as the electrode material, but it is easily assumed that similar effects can be obtained with other electrode materials. Furthermore, although the grooves for arranging the electrodes on the PLZT flat plate were formed by chemical etching, physical etching or mechanical methods may also be used (1), and the present invention is not limited thereto.

発明の効果 以上の説明から明らかなように、本発明は、電気光学効
果を有する固体の板状透光性磁器上の少なくとも一方の
面に、光シャッター列を形成するように複数個の電極を
設け、前記平板の表裏に、偏光板を偏光軸が互いに90
°の角度をなすように配置した光シャッターアレイ素子
であって、前記板状透光性磁器の上記電極配設位置には
、電極配設用の溝を設け、上記電極を少なくとも上記溝
壁面と上記溝壁面につらなる前記板状透光性磁器表面に
わたって形成し、かつ、上記電極部とそれに連なる光シ
ャッター部の一部にわたって、樹脂を形成した構造を有
することにより、電圧を印加した時に、電歪現象によっ
て生じる歪の集中を緩和し、長時間駆動による素子の機
械的な破壊による劣化をなくし、かつ、低電圧駆動を実
現した信頼性の高い光シャッターアレイ素子である。以
上述べたことは、今後増々開発が注目されている光制御
デバイス、光情報処理技術の中にあって、光学式プリン
ター等の書き込みヘッドや、その他の応用機器において
、低電圧でかつ、高信頼性を有する本発明の光シャッタ
ーアレイ素子は、大きな効果を与えるものである。
Effects of the Invention As is clear from the above description, the present invention provides a method of forming a plurality of electrodes on at least one surface of a solid plate-like translucent porcelain having an electro-optic effect so as to form a row of optical shutters. A polarizing plate is provided on the front and back sides of the flat plate so that the polarizing axes thereof are 90 degrees to each other.
The optical shutter array element is arranged at an angle of .degree., wherein a groove for arranging an electrode is provided at the electrode arranging position of the plate-shaped translucent porcelain, and the electrode is arranged at least on the wall surface of the groove. By having a structure in which resin is formed over the surface of the plate-shaped translucent porcelain connected to the groove wall surface, and also over a part of the electrode section and the optical shutter section connected thereto, when a voltage is applied, an electric current is generated. This is a highly reliable optical shutter array element that alleviates the concentration of distortion caused by distortion phenomena, eliminates deterioration due to mechanical destruction of the element due to long-term operation, and realizes low-voltage operation. The above-mentioned optical control devices and optical information processing technologies are attracting increasing attention for development in the future. The optical shutter array element of the present invention having the above properties provides great effects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aは従来の光シャッターアレイ素子の一構成図、
第1図すはその局部断面図、第2図aは本発明の一実施
例における光シャッターアレイ素子の構成図、第2図す
は同局部断面図である。 1・・・・・・PI、Zで平板、2・・・・・・共通電
極、3・・・・・・電圧印加用電極群、4・・・・・・
偏光子、6・・・・・・検光子、11・・・・・・PL
ZT平板、12・・・・・・共通電極、13・・・・・
・電圧印加用電極群、14・・・・・・絶縁樹脂膜、1
5・・・・・・偏光子、16・・・・・・検光子。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図     ((L) ? (1P) 第2図 (αラ バ
FIG. 1a is a configuration diagram of a conventional optical shutter array element.
FIG. 1 is a local sectional view thereof, FIG. 2a is a configuration diagram of an optical shutter array element according to an embodiment of the present invention, and FIG. 2 is a local sectional view thereof. 1... Flat plate at PI and Z, 2... Common electrode, 3... Voltage application electrode group, 4...
Polarizer, 6...Analyzer, 11...PL
ZT flat plate, 12... Common electrode, 13...
・Voltage application electrode group, 14...Insulating resin film, 1
5...Polarizer, 16...Analyzer. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure ((L)? (1P) Figure 2 (α mule

Claims (1)

【特許請求の範囲】[Claims] 電気光学効果を有する固体の板状透光性磁器上の少なく
とも一方の面に、光シャッター列を形成するように複数
個の電極を設け、前記平板の表裏に偏光板を偏光軸が互
いに90°の角度をなすように配置した光シャッターア
レイ素子であって、前記板状透光性磁器の上記電極配設
位置には、電極配設用の溝を設け、上記電極を少なくと
も上記溝壁面と上記溝壁面につらなる前記板状透光性磁
器表面にわたって形成し、かつ、上記電極部とそれにつ
らなる光シャッター部の一部にわたって、樹脂を形成し
た構造を有することを特徴とする光シャッターアレイ素
子。
A plurality of electrodes are provided on at least one surface of a solid plate-shaped translucent porcelain having an electro-optical effect so as to form an optical shutter row, and polarizing plates are placed on the front and back surfaces of the flat plate so that the polarization axes thereof are 90 degrees to each other. an optical shutter array element arranged so as to form an angle of An optical shutter array element characterized in that it has a structure in which a resin is formed over the surface of the plate-shaped translucent porcelain connected to the groove wall surface, and also over a part of the electrode section and the optical shutter section connected thereto.
JP59239808A 1984-11-14 1984-11-14 Optical shutter array element Pending JPS61118724A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59239808A JPS61118724A (en) 1984-11-14 1984-11-14 Optical shutter array element
US06/798,029 US4697889A (en) 1984-11-14 1985-11-14 Light shutter array element
EP85308315A EP0182622B1 (en) 1984-11-14 1985-11-14 Light shutter array element
DE8585308315T DE3584419D1 (en) 1984-11-14 1985-11-14 ELEMENT CONSISTING OF A RANGE OF LIGHT SWITCHES.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59239808A JPS61118724A (en) 1984-11-14 1984-11-14 Optical shutter array element

Publications (1)

Publication Number Publication Date
JPS61118724A true JPS61118724A (en) 1986-06-06

Family

ID=17050160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59239808A Pending JPS61118724A (en) 1984-11-14 1984-11-14 Optical shutter array element

Country Status (4)

Country Link
US (1) US4697889A (en)
EP (1) EP0182622B1 (en)
JP (1) JPS61118724A (en)
DE (1) DE3584419D1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333727A (en) * 1986-07-29 1988-02-13 Fuji Xerox Co Ltd Optical shuttering device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4802741A (en) * 1987-10-09 1989-02-07 Eastman Kodak Company In-depth electrode light valve array devices and improved fabrication method therefor
US4899183A (en) * 1988-02-08 1990-02-06 Minolta Camera Kabushiki Kaisha Image forming apparatus
US6816296B2 (en) 1997-10-29 2004-11-09 Teloptics Corporation Optical switching network and network node and method of optical switching
US6768572B2 (en) 1997-10-29 2004-07-27 Teloptics Corporation Solid state free space switch array on a substrate
US6310712B1 (en) 1997-10-29 2001-10-30 Teloptics Corporation Discrete element light modulating microstructure devices
US6486996B1 (en) 1998-10-27 2002-11-26 Teloptics Corporations Discrete element light modulating microstructure devices

Citations (2)

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Publication number Priority date Publication date Assignee Title
JPS57172316A (en) * 1981-04-17 1982-10-23 Yokogawa Hokushin Electric Corp Image pickup device
JPS57188013A (en) * 1981-05-15 1982-11-18 Matsushita Electric Ind Co Ltd Optical shutter element

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Publication number Priority date Publication date Assignee Title
DE1797291A1 (en) * 1968-09-10 1971-08-19 Atomic Energy Commission Optical delay device made of ferroelectric ceramic
US3695747A (en) * 1971-06-04 1972-10-03 Bell Telephone Labor Inc Optical transmission system including strain-biased electrooptic ceramic devices
US3873187A (en) * 1973-10-29 1975-03-25 Trw Inc Light modulator array and method of making it
JPS50130464A (en) * 1974-03-02 1975-10-15
DE3002956C2 (en) * 1980-01-29 1983-12-15 Standard Elektrik Lorenz Ag, 7000 Stuttgart Electro-optical switch

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57172316A (en) * 1981-04-17 1982-10-23 Yokogawa Hokushin Electric Corp Image pickup device
JPS57188013A (en) * 1981-05-15 1982-11-18 Matsushita Electric Ind Co Ltd Optical shutter element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333727A (en) * 1986-07-29 1988-02-13 Fuji Xerox Co Ltd Optical shuttering device

Also Published As

Publication number Publication date
US4697889A (en) 1987-10-06
EP0182622B1 (en) 1991-10-16
EP0182622A2 (en) 1986-05-28
DE3584419D1 (en) 1991-11-21
EP0182622A3 (en) 1987-12-16

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