JPH11111665A - Rotary substrate-treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To raise recovery percentage of used chemicals, to reduce the price of an apparatus, and to suppress vibrations related to a leaf-type rotary substrate-treatment apparatus. SOLUTION: Around a rotary mechanism 10 where a substrate 1 is horizontally supported for rotation, a cup 20 for receiving liquid which is splashed from the substrate 1 is provided. The cup 20 comprises a movable upper cup 20A, which is movable vertically and a fixed lower cup 20B. The upper cup 20A comprises a separator part 29 which separates its inside space into an upper part and a lower part. While in such a state as the partitioning part 29 being higher than the substrate 1, the splash liquid from the substrate 1 is introduced into a lower cup B, while it is introduced outside the lower cup B in a state such that the partitioning part 29 is lower than the substrate 1, so that two kinds of chemicals are separated and recovered.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate processing apparatus used for wet-processing substrates such as semiconductor wafers and glass substrates for liquid crystal, and more particularly to a single-wafer processing apparatus for processing the substrates one by one. The present invention relates to a rotary substrate processing apparatus.

[0002]

2. Description of the Related Art A single wafer type rotary substrate processing apparatus used for manufacturing a semiconductor device or a liquid crystal panel mounts a substrate horizontally on a rotor in a processing tank, and rotates the rotor at a predetermined speed. By spraying a liquid on the upper surface of the substrate, the upper surface is wet-processed. The liquid sprayed on the upper surface of the substrate scatters around due to centrifugal force. In addition, the rotor is rotated at a high speed in order to remove the liquid accumulated on the substrate after the liquid is sprayed, and the liquid also scatters around the substrate at this time. In order to collect these scattered liquids, a cup is provided around the rotation mechanism.

In this type of rotary substrate processing apparatus, chemical processing such as etching and cleaning with pure water may be continuously performed in the same tank. In this case, it is necessary to separate and collect the used chemical solution and the used pure water (waste liquid), and the following three known separation and collection mechanisms are known.

The first is a three-way valve system shown in FIG. In this embodiment, a drain pipe 4 is provided at the bottom of a cup 3 provided around a rotation mechanism 2 for rotating a substrate 1, and a three-way valve 4a is provided in the middle of the pipe. And the three-way valve 4a
By operating, the chemical liquid and the waste liquid are separated and collected.

The second method is a cup elevating type shown in FIGS. 5 and 6. This is an elastic member 5 such as a bellows or telesco.
, The cup 3 can be moved up and down, and a partition 3a for vertically dividing the inner space of the cup 3 is provided on the inner surface of the cup 3. When recovering the chemical, the cup 3 is fixed at a height where the partition 3a is below the substrate 1, as shown in FIG. As a result, the chemical solution is collected in the space above the partition 3 a in the cup 3, and is taken out of the cup 3 via the flexible tube 6. When collecting the waste liquid, as shown in FIG. 6, the cup 3 is fixed at a height such that the partition 3a is above the substrate 1. As a result, the waste liquid is collected in the space below the partition 3 a in the cup 3, and is led out of the cup 3 via the flexible pipe 7.

A third method is a rotor elevating type shown in FIGS. 7 and 8. This is a cup 3 with a partition 3a.
Is fixed, and the rotating mechanism 2 is moved up and down by the cylinder 7 instead. By moving the rotating mechanism 2 up and down, the chemical solution and the waste liquid are separated and collected as in the case of the cup elevating type. However, unlike the case of the cup elevating type, the cup 3 is fixed, so that the flexible pipes 6 and 7 are not required. ,
9 leads out of the cup 3.

[0007]

However, these separation and recovery mechanisms have the following problems.

In the case of the three-way valve system shown in FIG. 4, a part of the cup 2 and the drain pipe 4 is shared between the chemical solution and the waste liquid. The remaining pure water is mixed into the chemical. For this reason, the chemical liquid collected during this time must be used as a waste liquid, which causes a decrease in the chemical liquid collection rate.

In the case of the cup elevating type shown in FIGS. 5 and 6, since the cup 3 provided around the rotating mechanism 2 has to be moved up and down with respect to the rotating mechanism 2, there is a bellows or telescoping between the two. It is necessary to seal with the elastic member 5. Also, the liquid collected in the cup 3 is transferred to the cup 3
It is necessary to use flexible pipes 6 and 7 as the outlet pipes in order to lead out of the pipe. As a chemical solution here, for example, in the case of an etching process, very corrosive hydrogen fluoride or the like is used. Therefore, depending on the type of the chemical solution, the materials of the elastic member 5 and the flexible pipes 6 and 7 are limited. It will be expensive.

In the case of the rotor elevating type shown in FIGS. 7 and 8, since the cup 3 is of a fixed type, it is not necessary to use a flexible pipe as an outlet pipe for introducing liquid from inside the cup to outside the cup. However, the elastic member 5 as a seal member for sealing between the roller 2 and the cup 3 is still required. For this reason, the cost required for the elastic member 5 remains as a major problem. In addition, since the rotating mechanism 2 needs to have a movable structure that can move up and down, there is a problem that vibration is likely to increase.

An object of the present invention is not only to ensure a high chemical solution recovery rate, but also to reduce the cost of the apparatus by eliminating as much as possible the movable parts requiring a flexible material, and to reduce vibration. An object of the present invention is to provide a rotary type substrate processing apparatus with a small number.

[0012]

According to the present invention, there is provided a rotary substrate processing apparatus comprising: a rotating mechanism for horizontally supporting and rotating a substrate to be processed;
In a single-wafer-type rotary substrate processing apparatus including a cup provided around a rotation mechanism for recovering a liquid of a type, a movable upper cup capable of moving the cup in a vertical direction and a fixed lower cup are provided. The movable upper cup is divided into cups, and the movable upper cup has a partition part for vertically dividing an inner space thereof, and the first liquid scattered from the substrate is fixed in a state where the partition part is located above the substrate. The configuration is characterized in that the second liquid scattered from the substrate is guided to the outside of the fixed lower cup in a state where the liquid is guided into the lower cup and the partition portion is positioned below the substrate.

According to this configuration, the cup provided around the rotating mechanism is divided into a movable upper cup and a fixed lower cup, and two kinds of liquids are moved into and out of the lower cup by the raising and lowering operation of the upper cup. The pure water is not mixed into the chemical solution in the cup and drain piping, which is a problem in the three-way valve system.

For the liquid collected in the lower cup,
Since the lower cup is a fixed type, the lower cup can be led out of the lower cup by a fixed type pocket or the like, and the flexible tube is eliminated from the lead portion. Further, since the rotor is of a fixed type, and the seal between the rotor and the cup is of a fixed type, the elastic member is eliminated from the seal.

The liquid recovered outside the lower cup is guided from the inside of the upper cup to the outside of the upper cup (outside of the lower cup) via a flexible tube, although its structure is simple.
By using a fitting-type seal structure utilizing the lifting and lowering of the upper cup, it is possible to lead out to a fixed pocket or the like attached to the outer surface of the lower cup.

[0016]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic plan view and a schematic vertical sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic plan view and a schematic vertical section of a main part showing a chemical solution recovery operation in the rotary substrate processing apparatus. FIG. 3 and FIG. 3 are a schematic plan view and a schematic longitudinal sectional view of a main part showing a waste liquid collecting operation in the rotary substrate processing apparatus.

As shown in FIG. 1, a rotary substrate processing apparatus according to an embodiment of the present invention includes a rotation mechanism 10 for horizontally supporting and rotating a substrate 1 to be processed, and a rotation mechanism for rotating the substrate 1 from the substrate 1. Rotating mechanism 10 to collect the scattered liquid
And a cup 20 provided around the periphery. These are provided in a housing 30 which also serves as a processing tank.

The rotating mechanism 10 comprises a rotor 11 for horizontally supporting the substrate 1 and a driving unit 12 for the rotor. Drive unit 12
Is fixed by a gantry 31 in the housing 30.

The cup 20 is divided into a movable upper cup 20A having a cylindrical shape and a fixed lower cup 20B for accommodating the upper cup 20A.

The fixed lower cup 20B is an annular container having a U-shaped cross section.
0 and is fixed in the housing 30. Since both portions are fixed between the inner wall portion 21 of the lower cup 20B and the drive portion 12 of the rotating mechanism 10 located inside the lower cup portion 20B, they are sealed by a fixed seal structure.
On the inner surface of the outer wall portion 22 of the lower cup 20B, a liquid receiving portion 23 having an L-shaped cross section is provided over the entire circumference.

On the outer peripheral surface of the lower cup 20B (outer surface of the wall portion 22), there are provided two first pockets 4 for discharging a chemical solution.
0, 40 and two second pockets 50, 50 for discharging waste liquid are attached. 1st pocket 4
0 and 40 are at diagonal positions sandwiching the device center. The second pockets 50, 50 are at diagonal positions displaced by 90 degrees in the circumferential direction with respect to the first pockets 40, 40.

The first pocket 40 is, as shown in FIG.
It is located at the middle part of the lower cup 20B, and communicates with the inside of the lower cup 20B above the liquid receiving portion 23 provided on the inner surface of the outer wall 22 of the lower cup 20B. Further, as shown in FIG. 3, the second pocket 50 is located in a lower portion of the lower cup 20 </ b> B, and is located below the liquid receiving portion 23.
It communicates with B.

The movable upper cup 20A has a double cylinder structure in which an outer cylinder 24 and an inner cylinder 25 are combined with a predetermined gap. An annular space formed between the two is vertically divided by an annular partition plate 26 also serving as a connecting member. The upper cup 20A is connected to the cylinder 60, via a pair of opposite L-shaped support members 61, 61.
It is attached to the cylinder 60 and performs a vertical movement by a synchronous operation of the cylinders 60 and 60.

The outer cylinder 24 collects a chemical solution inside the outer cylinder 24, especially above the partition plate 26. The upper part of the outer cylinder 24 is inclined inward at a predetermined angle for collecting liquid. A burr 27 that is inclined downward is provided at the upper end opening edge of the outer cylinder 24. The burrs 27 are effective for preventing the droplets from scattering.
The outer cylinder 24 has openings at two places where the first pockets 40, 40 are provided in order to guide the chemical solution collected inside the outer cylinder 24 to the first pockets 40, 40 for deriving the chemical solution. A portion 28 is provided above the partition 26. The lower portion of the outer cylinder 24 below the partition plate 26 is a skirt that fits outside the liquid receiving portion 23 of the lower cup 20B with a slight gap, and forms a movable seal portion in cooperation with the liquid receiving portion 23. I have.

The inner cylinder 25 collects waste liquid inside.
In order to perform separation and recovery from the chemical solution, the inner cylinder 25 is
Is displaced downward. The upper part of the inner cylinder 25 is inclined inward at a predetermined angle for liquid collection. The inclined portion 29 is also a partitioning portion for vertically separating an inner space of the upper cup 20A in order to separate and collect a chemical solution and a waste liquid inside the upper cup 20A. At the upper end opening edge of the inner cylinder 25, a burr 27 'inclined downward is provided in order to prevent droplets from scattering. The lower part of the inner cylinder 25 is the liquid receiving portion 23 of the lower cup 20B.
The skirt is fitted inside with a slight gap therebetween, and forms a movable seal portion in cooperation with the liquid receiving portion 23.

Next, the function of the rotary substrate processing apparatus according to the embodiment of the present invention will be described.

When recovering the chemical, as shown in FIG. 2, the upper end of the outer cylinder 24 of the movable upper cup 20A is located above the substrate 1 placed on the rotor 11,
The upper cup 20A is moved up and down to a position where the upper end of the inner cylinder 25, that is, the upper end of the inclined portion 28, which partitions the inner space of the upper cup 20A up and down, is below the substrate 1.

When the rotor 21 is rotated in this state, the chemical solution on the substrate 1 is collected inside the outer cylinder 24, especially above the partition plate 26. The chemical solution passes through the opening portion 28 provided in the outer cylinder 24 to the inside of the liquid receiving portion 23 and the first pockets 40, 4.
The liquid is guided to the inside of the chamber, and further passed through ducts 41 and 41 to a gas-liquid separation box or the like for a chemical solution. At this time, the outer cylinder 24
Is fitted outside the liquid receiving portion 23, so that the chemical does not enter below the liquid receiving portion 23 in the lower cup 20B.

When recovering the waste liquid generated by the washing treatment with pure water, as shown in FIG. 3, the upper end of the inner cylinder 25 of the movable upper cup 20A, that is, a partition for vertically partitioning the inner space of the upper cup 20A. The upper cup 20 </ b> A rises to a position where the upper end of the inclined portion 28, which is a portion, is above the substrate 1 placed on the rotor 11.

When the rotor 21 is rotated in this state, the waste liquid on the substrate 1 is collected inside the inner cylinder 25. The waste liquid is led out into the second pockets 50, 50 via the inside of the fixed lower cup 20B, and further led to the gas-liquid separation box for waste liquid through the ducts 51, 51. At this time,
Since the lower end of the inner cylinder 25 is fitted inside the liquid receiving portion 23, the waste liquid does not enter the liquid receiving portion 23.

According to such a separation and recovery mechanism, the chemical liquid flows from the inside of the outer cylinder 24 of the movable upper cup 20A through the liquid receiving portion 23 of the lower cup 20B.
Derived within 0,40. On the other hand, the waste liquid is upper cup 20A
From the inside of the inner cylinder 25 of the lower cup 20B.
3 and is led out into the second pockets 50, 50 via a lower portion. Therefore, the chemical liquid and the waste liquid do not mix. Therefore, there is no decrease in the efficiency of recovering the chemical solution due to the mixing of the waste liquid.

Since the rotation mechanism 10 is fixed, vibration is small.

Since the rotating mechanism 10 is fixed and the lower cup 20B for collecting waste liquid is also of a fixed type, there is no need for an extendable member to seal between them. Further, the waste liquid collected in the lower cup 20B is led out to the second pockets 50, 50 attached to the lower cup 20B, and the flexible tube is excluded from the lead-out portion. Furthermore, the flexible tube is also excluded from the outlet of the chemical solution. Therefore, even when a highly corrosive chemical is used, the apparatus cost does not increase.

Since a movable seal structure is adopted in which the lower ends of the outer cylinder 24 and the inner cylinder 25 are fitted inside and outside of the receiving portion 23, the flexible pipe can be excluded from each of the liquid and waste liquid outlets. Regardless, mixing of both solutions is avoided.

When the substrate 1 is rotated, a large amount of wind is generated by the rotor 11 and the pins for supporting the substrate 1 thereon. In order to prevent the liquid from being scattered by the wind, the upper part of the cup 20 (the upper part of each of the outer cylinder 24 and the inner cylinder 25) is inclined inward. Heading upward along the inner surface of the upper part,
The liquid adhering to the inner surface is scattered outside the cup 20 as droplets. Then, when this scattering occurs, there is a danger that the liquid adheres to the apparatus and the inner surface of the apparatus outside the cup 20 and falls on the substrate 1 when the substrate 1 is transported.

However, in the present substrate processing apparatus, the burrs 27, 27 'inclined downward are provided at the upper edge of the cup 20 (the upper edge of the outer cylinder 24 and the inner cylinder 25). In addition, there is no possibility that the liquid may be scattered outside the cup 20. The burrs are effective not only in the rotary substrate processing apparatus according to the present invention but also in a conventional rotary substrate processing apparatus.

[0037]

As described above, the rotary substrate processing apparatus according to the present invention divides the cup provided around the rotation mechanism into a movable upper cup and a fixed lower cup, and By adopting a configuration in which the two kinds of liquids are separated and collected inside and outside the lower cup by the elevating operation, mixing of the liquids is avoided, so that a high chemical liquid collection rate can be secured. Further, since a movable portion requiring a flexible material is eliminated as much as possible, the cost of the apparatus can be reduced. Furthermore, since the rotation mechanism is fixed, vibration can be suppressed.

[Brief description of the drawings]

FIG. 1 shows the structure of a rotary substrate processing apparatus according to an embodiment of the present invention, wherein (a) is a schematic plan view and (b) is a schematic longitudinal sectional view.

FIGS. 2A and 2B show a chemical solution recovery operation in the rotary substrate processing apparatus, wherein FIG. 2A is a schematic plan view, and FIG.

3A and 3B show a waste liquid collecting operation in the rotary type substrate processing apparatus, wherein FIG. 3A is a schematic plan view, and FIG. 3B is a schematic longitudinal sectional view.

FIG. 4 is a schematic longitudinal sectional view showing the structure of a conventional rotary substrate processing apparatus (three-way valve type).

5A and 5B show the structure of a conventional rotary substrate processing apparatus (cup elevating type) in the case of a chemical liquid collecting operation, wherein FIG. 5A is a schematic plan view, and FIG. 5B is a schematic longitudinal sectional view.

FIGS. 6A and 6B show the structure of a conventional rotary substrate processing apparatus (cup elevating type) in the case of a waste liquid collecting operation, wherein FIG. 6A is a schematic plan view, and FIG.

FIGS. 7A and 7B show the structure of a conventional rotary substrate processing apparatus (rotor elevating type) in the case of a chemical solution recovery operation, in which FIG. 7A is a schematic plan view, and FIG.

8A and 8B show the structure of a conventional rotary substrate processing apparatus (rotor elevating type) in the case of a waste liquid collecting operation, in which FIG. 8A is a schematic plan view, and FIG. 8B is a schematic longitudinal sectional view.

DESCRIPTION OF SYMBOLS 1 Substrate 10 Rotating mechanism 11 Rotor 12 Drive unit 20 Cup 20A Movable upper cup 20B Fixed lower cup 23 Liquid receiving unit 24 Outer cylinder 25 Inner cylinder 28 Opening 29 Partitioning part 30 Housing 40 First Pocket 50 Second pocket 60 Cylinder

Claims (1)

[Claims] 1. A rotating mechanism for horizontally supporting and rotating a substrate to be processed, and a cup provided around the rotating mechanism for collecting two kinds of liquid scattered from the substrate by the rotation of the substrate. In a single wafer type rotary substrate processing apparatus, the cup is divided into a movable upper cup movable in a vertical direction and a fixed lower cup, and the movable upper cup vertically moves its inner space. Having a partitioning portion, and guiding the first liquid scattered from the substrate into the fixed lower cup in a state where the partitioning portion is located above the substrate;
A rotary substrate processing apparatus, wherein a second liquid scattered from a substrate is guided out of a fixed lower cup in a state where a partition portion is located below the substrate.