JPH10147608A - Photocatalyst composition - Google Patents
Photocatalyst compositionInfo
- Publication number
- JPH10147608A JPH10147608A JP27218397A JP27218397A JPH10147608A JP H10147608 A JPH10147608 A JP H10147608A JP 27218397 A JP27218397 A JP 27218397A JP 27218397 A JP27218397 A JP 27218397A JP H10147608 A JPH10147608 A JP H10147608A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- derivative
- group
- salt
- photocatalyst composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 18
- -1 polycyclic aromatic compound Chemical class 0.000 claims abstract description 72
- 150000001875 compounds Chemical class 0.000 claims abstract description 37
- 238000010521 absorption reaction Methods 0.000 claims abstract description 12
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 12
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims abstract description 11
- 239000000049 pigment Substances 0.000 claims abstract description 10
- 125000001424 substituent group Chemical group 0.000 claims abstract description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 6
- 238000002211 ultraviolet spectrum Methods 0.000 claims abstract description 6
- 150000001454 anthracenes Chemical class 0.000 claims abstract description 4
- 150000001846 chrysenes Chemical class 0.000 claims abstract description 4
- 150000002790 naphthalenes Chemical class 0.000 claims abstract description 4
- 239000002685 polymerization catalyst Substances 0.000 claims abstract description 4
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims abstract 3
- 239000004593 Epoxy Substances 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 238000001723 curing Methods 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 238000012663 cationic photopolymerization Methods 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 150000002987 phenanthrenes Chemical class 0.000 claims description 3
- JWJMBKSFTTXMLL-UHFFFAOYSA-N 9,10-dimethoxyanthracene Chemical compound C1=CC=C2C(OC)=C(C=CC=C3)C3=C(OC)C2=C1 JWJMBKSFTTXMLL-UHFFFAOYSA-N 0.000 claims description 2
- 150000004782 1-naphthols Chemical class 0.000 claims 1
- 150000004786 2-naphthols Chemical class 0.000 claims 1
- FMVRRCDBALUUBI-UHFFFAOYSA-N 9,10-dibenzylanthracene Chemical compound C=12C=CC=CC2=C(CC=2C=CC=CC=2)C2=CC=CC=C2C=1CC1=CC=CC=C1 FMVRRCDBALUUBI-UHFFFAOYSA-N 0.000 claims 1
- GJNKQJAJXSUJBO-UHFFFAOYSA-N 9,10-diethoxyanthracene Chemical compound C1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 GJNKQJAJXSUJBO-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 abstract description 5
- 230000000996 additive effect Effects 0.000 abstract description 4
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical class C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 abstract description 3
- 125000002091 cationic group Chemical group 0.000 abstract description 2
- 150000001450 anions Chemical class 0.000 description 8
- 150000001716 carbazoles Chemical class 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical class C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- 229910017008 AsF 6 Inorganic materials 0.000 description 3
- 229910015892 BF 4 Inorganic materials 0.000 description 3
- 229910018286 SbF 6 Inorganic materials 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- NQMUGNMMFTYOHK-UHFFFAOYSA-N 1-methoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=CC2=C1 NQMUGNMMFTYOHK-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- NLDJRLVSKQKBQV-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)naphthalene Chemical compound C1=CC=CC2=CC(OCCOC=C)=CC=C21 NLDJRLVSKQKBQV-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- BOTGCZBEERTTDQ-UHFFFAOYSA-N 4-Methoxy-1-naphthol Chemical compound C1=CC=C2C(OC)=CC=C(O)C2=C1 BOTGCZBEERTTDQ-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 229910021115 PF 6 Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 2
- JDOSNGUCZXVIFA-UHFFFAOYSA-N naphthalen-1-yl(phenyl)iodanium Chemical class C=1C=CC2=CC=CC=C2C=1[I+]C1=CC=CC=C1 JDOSNGUCZXVIFA-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000005028 tinplate Substances 0.000 description 2
- 229960000834 vinyl ether Drugs 0.000 description 2
- NLQMSBJFLQPLIJ-UHFFFAOYSA-N (3-methyloxetan-3-yl)methanol Chemical compound OCC1(C)COC1 NLQMSBJFLQPLIJ-UHFFFAOYSA-N 0.000 description 1
- PPTXVXKCQZKFBN-UHFFFAOYSA-N (S)-(-)-1,1'-Bi-2-naphthol Chemical compound C1=CC=C2C(C3=C4C=CC=CC4=CC=C3O)=C(O)C=CC2=C1 PPTXVXKCQZKFBN-UHFFFAOYSA-N 0.000 description 1
- XVSBDEPLEQHLTE-UHFFFAOYSA-N 1,1-bis(ethenoxy)cyclohexane Chemical compound C=COC1(OC=C)CCCCC1 XVSBDEPLEQHLTE-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 1
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 1
- GZSTVZHJVIIZOQ-UHFFFAOYSA-N 1,2-diethoxyphenanthrene Chemical compound C(C)OC1=C(C=2C=CC3=CC=CC=C3C2C=C1)OCC GZSTVZHJVIIZOQ-UHFFFAOYSA-N 0.000 description 1
- NDUPZRVIJRGJBJ-UHFFFAOYSA-N 1,4,10-trioxaspiro[4.5]decane Chemical compound O1CCOC11OCCCC1 NDUPZRVIJRGJBJ-UHFFFAOYSA-N 0.000 description 1
- WQWHDRISACGTCO-UHFFFAOYSA-N 1,4,6-trioxaspiro[4.4]nonane Chemical compound C1CCOC21OCCO2 WQWHDRISACGTCO-UHFFFAOYSA-N 0.000 description 1
- NALISUVNCITOCO-UHFFFAOYSA-N 1,4-bis(ethenoxy)benzene Chemical compound C=COC1=CC=C(OC=C)C=C1 NALISUVNCITOCO-UHFFFAOYSA-N 0.000 description 1
- MWZJGRDWJVHRDV-UHFFFAOYSA-N 1,4-bis(ethenoxy)butane Chemical compound C=COCCCCOC=C MWZJGRDWJVHRDV-UHFFFAOYSA-N 0.000 description 1
- IYDMLQIUOVVNOP-UHFFFAOYSA-N 1,4-bis(ethenoxymethyl)benzene Chemical compound C=COCC1=CC=C(COC=C)C=C1 IYDMLQIUOVVNOP-UHFFFAOYSA-N 0.000 description 1
- PBFUEKVVMPLYFH-UHFFFAOYSA-N 1,4-bis(phenylmethoxy)chrysene Chemical compound C=1C=CC=CC=1COC(C1=C2C3=CC=C4C=CC=CC4=C3C=C1)=CC=C2OCC1=CC=CC=C1 PBFUEKVVMPLYFH-UHFFFAOYSA-N 0.000 description 1
- ONJJGUNDDUSPKW-UHFFFAOYSA-N 1,4-diethoxychrysene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C(OCC)=CC=C2OCC ONJJGUNDDUSPKW-UHFFFAOYSA-N 0.000 description 1
- ROYYJIIRTNVPFY-UHFFFAOYSA-N 1,4-dimethoxychrysene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C(OC)=CC=C2OC ROYYJIIRTNVPFY-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- JGOYPFYYIIIGRT-UHFFFAOYSA-N 1,4-dipropoxychrysene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C(OCCC)=CC=C2OCCC JGOYPFYYIIIGRT-UHFFFAOYSA-N 0.000 description 1
- PCEBNPHEKQSKKT-UHFFFAOYSA-N 1,5,7,11-tetraoxaspiro[5.5]undecane Chemical compound O1CCCOC21OCCCO2 PCEBNPHEKQSKKT-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- HGYMQZVPTMKXGI-UHFFFAOYSA-N 1-(2-hydroxynaphthalen-1-yl)sulfanylnaphthalen-2-ol Chemical compound C1=CC=C2C(SC3=C4C=CC=CC4=CC=C3O)=C(O)C=CC2=C1 HGYMQZVPTMKXGI-UHFFFAOYSA-N 0.000 description 1
- KWQUUMNJLUNZTQ-UHFFFAOYSA-N 1-butyl-9,10-bis(phenylmethoxy)anthracene Chemical compound C(CCC)C1=CC=CC2=C(C3=CC=CC=C3C(=C12)OCC1=CC=CC=C1)OCC1=CC=CC=C1 KWQUUMNJLUNZTQ-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- PEBJBOQKIXHSOE-UHFFFAOYSA-N 1-ethenoxy-4-methoxybenzene Chemical compound COC1=CC=C(OC=C)C=C1 PEBJBOQKIXHSOE-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- QJJDJWUCRAPCOL-UHFFFAOYSA-N 1-ethenoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOC=C QJJDJWUCRAPCOL-UHFFFAOYSA-N 0.000 description 1
- YXQANRITUWTASV-UHFFFAOYSA-N 1-ethyl-4-phenyl-3,5,8-trioxabicyclo[2.2.2]octane Chemical compound O1CC(CC)(CO2)COC12C1=CC=CC=C1 YXQANRITUWTASV-UHFFFAOYSA-N 0.000 description 1
- GPCTVEYMDITHHQ-UHFFFAOYSA-N 1-octadecoxynaphthalene Chemical compound C1=CC=C2C(OCCCCCCCCCCCCCCCCCC)=CC=CC2=C1 GPCTVEYMDITHHQ-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- MSYHXPDISYORMC-UHFFFAOYSA-N 2,3-dimethyl-9,10-bis(phenylmethoxy)anthracene Chemical compound C12=CC=CC=C2C(OCC=2C=CC=CC=2)=C2C=C(C)C(C)=CC2=C1OCC1=CC=CC=C1 MSYHXPDISYORMC-UHFFFAOYSA-N 0.000 description 1
- AGTYTCIZMSYDFZ-UHFFFAOYSA-N 2,3-dimethyl-9,10-dipropoxyanthracene Chemical compound CC1=C(C)C=C2C(OCCC)=C(C=CC=C3)C3=C(OCCC)C2=C1 AGTYTCIZMSYDFZ-UHFFFAOYSA-N 0.000 description 1
- PPKHAIRFQKFMLE-UHFFFAOYSA-N 2,7-dimethoxynaphthalene Chemical compound C1=CC(OC)=CC2=CC(OC)=CC=C21 PPKHAIRFQKFMLE-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- BBBUAWSVILPJLL-UHFFFAOYSA-N 2-(2-ethylhexoxymethyl)oxirane Chemical compound CCCCC(CC)COCC1CO1 BBBUAWSVILPJLL-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- QYYCPWLLBSSFBW-UHFFFAOYSA-N 2-(naphthalen-1-yloxymethyl)oxirane Chemical compound C=1C=CC2=CC=CC=C2C=1OCC1CO1 QYYCPWLLBSSFBW-UHFFFAOYSA-N 0.000 description 1
- LUZDYPLAQQGJEA-UHFFFAOYSA-N 2-Methoxynaphthalene Chemical compound C1=CC=CC2=CC(OC)=CC=C21 LUZDYPLAQQGJEA-UHFFFAOYSA-N 0.000 description 1
- HHRACYLRBOUBKM-UHFFFAOYSA-N 2-[(4-tert-butylphenoxy)methyl]oxirane Chemical compound C1=CC(C(C)(C)C)=CC=C1OCC1OC1 HHRACYLRBOUBKM-UHFFFAOYSA-N 0.000 description 1
- MPGABYXKKCLIRW-UHFFFAOYSA-N 2-decyloxirane Chemical compound CCCCCCCCCCC1CO1 MPGABYXKKCLIRW-UHFFFAOYSA-N 0.000 description 1
- SGZSHWXSWILTIG-UHFFFAOYSA-N 2-dodecoxynaphthalene Chemical compound C1=CC=CC2=CC(OCCCCCCCCCCCC)=CC=C21 SGZSHWXSWILTIG-UHFFFAOYSA-N 0.000 description 1
- LMINVPVFKAFJAZ-UHFFFAOYSA-N 2-ethenoxyethoxybenzene Chemical compound C=COCCOC1=CC=CC=C1 LMINVPVFKAFJAZ-UHFFFAOYSA-N 0.000 description 1
- BSNJMDOYCPYHST-UHFFFAOYSA-N 2-ethenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC=C BSNJMDOYCPYHST-UHFFFAOYSA-N 0.000 description 1
- RLJPTOIWHAUUBO-UHFFFAOYSA-N 2-ethenoxyethyl acetate Chemical compound CC(=O)OCCOC=C RLJPTOIWHAUUBO-UHFFFAOYSA-N 0.000 description 1
- NBTXFNJPFOORGI-UHFFFAOYSA-N 2-ethenoxyethyl prop-2-enoate Chemical compound C=COCCOC(=O)C=C NBTXFNJPFOORGI-UHFFFAOYSA-N 0.000 description 1
- FLVWPWRASWZGRA-UHFFFAOYSA-N 2-ethyl-9,10-bis(phenylmethoxy)anthracene Chemical compound C=12C=CC=CC2=C(OCC=2C=CC=CC=2)C2=CC(CC)=CC=C2C=1OCC1=CC=CC=C1 FLVWPWRASWZGRA-UHFFFAOYSA-N 0.000 description 1
- SURWYRGVICLUBJ-UHFFFAOYSA-N 2-ethyl-9,10-dimethoxyanthracene Chemical compound C1=CC=CC2=C(OC)C3=CC(CC)=CC=C3C(OC)=C21 SURWYRGVICLUBJ-UHFFFAOYSA-N 0.000 description 1
- BDPJILVXUVJWBF-UHFFFAOYSA-N 2-ethyl-9,10-dipropoxyanthracene Chemical compound CCC1=CC=C2C(OCCC)=C(C=CC=C3)C3=C(OCCC)C2=C1 BDPJILVXUVJWBF-UHFFFAOYSA-N 0.000 description 1
- AAMHBRRZYSORSH-UHFFFAOYSA-N 2-octyloxirane Chemical compound CCCCCCCCC1CO1 AAMHBRRZYSORSH-UHFFFAOYSA-N 0.000 description 1
- CXURGFRDGROIKG-UHFFFAOYSA-N 3,3-bis(chloromethyl)oxetane Chemical compound ClCC1(CCl)COC1 CXURGFRDGROIKG-UHFFFAOYSA-N 0.000 description 1
- RVGLUKRYMXEQAH-UHFFFAOYSA-N 3,3-dimethyloxetane Chemical compound CC1(C)COC1 RVGLUKRYMXEQAH-UHFFFAOYSA-N 0.000 description 1
- ZTLIGKPZSOMKIX-UHFFFAOYSA-N 3,5,8-trioxabicyclo[2.2.2]octan-4-ylmethanol Chemical compound O1CC2COC1(CO)OC2 ZTLIGKPZSOMKIX-UHFFFAOYSA-N 0.000 description 1
- NETTWRSEFIQTIU-UHFFFAOYSA-N 3,9-dibenzyl-1,5,7,11-tetraoxaspiro[5.5]undecane Chemical compound C=1C=CC=CC=1CC(CO1)COC1(OC1)OCC1CC1=CC=CC=C1 NETTWRSEFIQTIU-UHFFFAOYSA-N 0.000 description 1
- YRNCACXJEDBLDE-UHFFFAOYSA-N 3-(methoxymethyl)-3-methyloxetane Chemical compound COCC1(C)COC1 YRNCACXJEDBLDE-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- PTTIGGBMNZRYME-UHFFFAOYSA-N 3-[10-(2-carboxyethoxy)-3-ethylanthracen-9-yl]oxypropanoic acid Chemical compound C1=CC=CC2=C(OCCC(O)=O)C3=CC(CC)=CC=C3C(OCCC(O)=O)=C21 PTTIGGBMNZRYME-UHFFFAOYSA-N 0.000 description 1
- ZXABMDQSAABDMG-UHFFFAOYSA-N 3-ethenoxyprop-1-ene Chemical compound C=CCOC=C ZXABMDQSAABDMG-UHFFFAOYSA-N 0.000 description 1
- JUXZNIDKDPLYBY-UHFFFAOYSA-N 3-ethyl-3-(phenoxymethyl)oxetane Chemical compound C=1C=CC=CC=1OCC1(CC)COC1 JUXZNIDKDPLYBY-UHFFFAOYSA-N 0.000 description 1
- BVWGMVUREJDENQ-UHFFFAOYSA-N 3-ethyl-3-[2-[2-(3-ethyloxetan-3-yl)ethoxy]ethyl]oxetane Chemical compound C(C)C1(COC1)CCOCCC1(COC1)CC BVWGMVUREJDENQ-UHFFFAOYSA-N 0.000 description 1
- IFJBREWXXKGPQM-UHFFFAOYSA-N 3-methyl-1,4,6-trioxaspiro[4.4]nonane Chemical compound O1C(C)COC11OCCC1 IFJBREWXXKGPQM-UHFFFAOYSA-N 0.000 description 1
- JFPDKWDMLQZZNS-UHFFFAOYSA-N 3-methyl-3-[2-[3-[2-(3-methyloxetan-3-yl)ethoxy]phenoxy]ethyl]oxetane Chemical compound C=1C=CC(OCCC2(C)COC2)=CC=1OCCC1(C)COC1 JFPDKWDMLQZZNS-UHFFFAOYSA-N 0.000 description 1
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
- FDWQGNULGGFFDP-UHFFFAOYSA-N 5-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C=CC1CCCC2OC12 FDWQGNULGGFFDP-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- CAKHDJPNOKXIED-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-5-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CCCC2OC12 CAKHDJPNOKXIED-UHFFFAOYSA-N 0.000 description 1
- ISRHJUURKPOCPC-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-5-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CCCC2OC12 ISRHJUURKPOCPC-UHFFFAOYSA-N 0.000 description 1
- GVQWEXVGSCZATN-UHFFFAOYSA-N 9,10-bis(phenylmethoxy)anthracene Chemical compound C=1C=CC=CC=1COC(C1=CC=CC=C11)=C2C=CC=CC2=C1OCC1=CC=CC=C1 GVQWEXVGSCZATN-UHFFFAOYSA-N 0.000 description 1
- SVNMDXTZBMAECY-UHFFFAOYSA-N 9,10-diethoxy-2,3-dimethylanthracene Chemical compound CC1=C(C)C=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 SVNMDXTZBMAECY-UHFFFAOYSA-N 0.000 description 1
- FUWFDADDJOUNDL-UHFFFAOYSA-N 9,10-diethoxy-2-ethylanthracene Chemical compound CCC1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 FUWFDADDJOUNDL-UHFFFAOYSA-N 0.000 description 1
- URNHKGAEEHGYPK-UHFFFAOYSA-N 9,10-dimethoxy-2,3-dimethylanthracene Chemical compound CC1=C(C)C=C2C(OC)=C(C=CC=C3)C3=C(OC)C2=C1 URNHKGAEEHGYPK-UHFFFAOYSA-N 0.000 description 1
- RSVPDHZJHULKHF-UHFFFAOYSA-N 9,10-dimethoxyphenanthrene Chemical class C1=CC=C2C(OC)=C(OC)C3=CC=CC=C3C2=C1 RSVPDHZJHULKHF-UHFFFAOYSA-N 0.000 description 1
- LBQJFQVDEJMUTF-UHFFFAOYSA-N 9,10-dipropoxyanthracene Chemical compound C1=CC=C2C(OCCC)=C(C=CC=C3)C3=C(OCCC)C2=C1 LBQJFQVDEJMUTF-UHFFFAOYSA-N 0.000 description 1
- FTNHBFLTHCMFRW-UHFFFAOYSA-N 9-ethoxy-10-methylanthracene Chemical compound C1=CC=C2C(OCC)=C(C=CC=C3)C3=C(C)C2=C1 FTNHBFLTHCMFRW-UHFFFAOYSA-N 0.000 description 1
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 1
- ROUPCHNBAWMYEW-UHFFFAOYSA-N 9-methoxy-10-methylanthracene Chemical compound C1=CC=C2C(OC)=C(C=CC=C3)C3=C(C)C2=C1 ROUPCHNBAWMYEW-UHFFFAOYSA-N 0.000 description 1
- VUMLWMKPSJPGLQ-UHFFFAOYSA-N 9-methyl-10-phenylmethoxyanthracene Chemical compound C12=CC=CC=C2C(C)=C2C=CC=CC2=C1OCC1=CC=CC=C1 VUMLWMKPSJPGLQ-UHFFFAOYSA-N 0.000 description 1
- WPKBFCIULMUVHF-UHFFFAOYSA-N 9-methyl-10-propan-2-yloxyanthracene Chemical compound C1=CC=C2C(OC(C)C)=C(C=CC=C3)C3=C(C)C2=C1 WPKBFCIULMUVHF-UHFFFAOYSA-N 0.000 description 1
- DZKIUEHLEXLYKM-UHFFFAOYSA-N 9-phenanthrol Chemical class C1=CC=C2C(O)=CC3=CC=CC=C3C2=C1 DZKIUEHLEXLYKM-UHFFFAOYSA-N 0.000 description 1
- VIJYEGDOKCKUOL-UHFFFAOYSA-N 9-phenylcarbazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 VIJYEGDOKCKUOL-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- GXBYFVGCMPJVJX-UHFFFAOYSA-N Epoxybutene Chemical compound C=CC1CO1 GXBYFVGCMPJVJX-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- WDRXYZSIBYGZDQ-UHFFFAOYSA-N OCCOC=1C2=CC=CC=C2C(=C2C=CC=CC12)OCCO.CC(C1=CC=CC=C1)OC=1C2=CC=CC=C2C(=C2C=CC=CC12)C Chemical compound OCCOC=1C2=CC=CC=C2C(=C2C=CC=CC12)OCCO.CC(C1=CC=CC=C1)OC=1C2=CC=CC=C2C(=C2C=CC=CC12)C WDRXYZSIBYGZDQ-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000003609 aryl vinyl group Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- 230000005250 beta ray Effects 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- IDSLNGDJQFVDPQ-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-yl) hexanedioate Chemical compound C1CC2OC2CC1OC(=O)CCCCC(=O)OC1CC2OC2CC1 IDSLNGDJQFVDPQ-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- PQZJTHGEFIQMCO-UHFFFAOYSA-N oxetan-2-ylmethanol Chemical compound OCC1CCO1 PQZJTHGEFIQMCO-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical class C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、増感された光カチ
オン重合触媒組成物に関し、更に詳しくは、光硬化型カ
チオン重合性化合物のための光カチオン重合触媒組成物
に関する。本発明の光触媒組成物は、カチオン重合性化
合物と混合し、光、電子線、X線等の活性エネルギー線
照射により、硬化することが可能であり、特に長波長感
光に優れた特性を有するため、光硬化型の塗料、接着
剤、インキおよびフォトレジスト、光造形用の感光性樹
脂等へ好適に用いられる。The present invention relates to a sensitized cationic photopolymerization catalyst composition, and more particularly to a photocationic polymerization catalyst composition for a photocurable cationically polymerizable compound. The photocatalyst composition of the present invention can be cured by mixing with a cationic polymerizable compound and irradiating with active energy rays such as light, an electron beam, and X-rays. It is suitably used for photocurable paints, adhesives, inks, photoresists, and photosensitive resins for stereolithography.
【0002】[0002]
【従来技術】本発明に使用できるアリールオニウム塩化
合物の例として、特開昭50-151997号、特開昭50-158680
号、特開昭50-151996号が知られており、光、電子線、
X線等の放射線によりエポキシ化合物等のカチオン重合
性化合物を硬化させる触媒として使用できることが記載
されている。これらのアリールオニウム塩化合物は、紫
外線硬化に有効とされる360nmよりも長波長にほと
んど吸収をもっていないため、長波長のレーザー光を使
用する光造形や顔料等の添加剤を使用する光硬化性組成
物では、硬化性が著しく低下することが知られている。
特に、アリールオニウム塩化合物のUV吸収と吸収が重な
る酸化チタン等のホワイト顔料を多量に含有する光硬化
性組成物では、問題が多い。この解決方法として増感剤
の検討が行われ、フェノチアジン、アントラセン、ペリ
レン等の化合物が有効であると報告されている。しか
し、これらの増感剤では、顔料等の添加剤を使用する光
硬化性組成物の光硬化性は不十分である。2. Description of the Related Art As examples of arylonium salt compounds that can be used in the present invention, JP-A-50-151997 and JP-A-50-158680
No., JP-A-50-151996 is known, light, electron beam,
It describes that it can be used as a catalyst for curing a cationically polymerizable compound such as an epoxy compound by radiation such as X-rays. Since these aryl onium salt compounds have little absorption at wavelengths longer than 360 nm, which is considered to be effective for ultraviolet curing, photocurable compositions using additives such as pigments and stereolithography using laser light of long wavelengths It is known that the curability of a product is significantly reduced.
In particular, the photocurable composition containing a large amount of a white pigment such as titanium oxide, in which the UV absorption of the arylonium salt compound and the absorption overlap, has many problems. As a solution to this, sensitizers have been studied, and compounds such as phenothiazine, anthracene, and perylene have been reported to be effective. However, with these sensitizers, the photocurability of a photocurable composition using an additive such as a pigment is insufficient.
【0003】また、ジフェニルヨードニウム塩に代表さ
れるアリールヨードニウム塩化合物では、その対アニオ
ンがSbF6およびB(C6F5)アニオン以外の例えば
PF6のようなアニオンではクリア系の塗料に使用して
も光硬化性が著しく悪いことが知られている。Further, in the case of aryliodonium salt compounds represented by diphenyliodonium salts, when the counter anion other than SbF6 and B (C6F5) anions, such as PF6, is used as a photocuring agent even when used in a clear paint. Is known to be significantly worse.
【0004】[0004]
【発明が解決すべき課題】本発明は、これらの事情から
みてなされたもので、対アニオンが例えばPF6のよう
なアニオンを有するジフェニルヨードニウム塩に代表さ
れるアリールヨードニウム塩化合物でも良好に硬化する
ことが可能な光カチオン重合触媒組成物を提供すると共
に、顔料等の添加剤を含む組成物であっても短時間で硬
化することが可能で、かつ優れた硬化物物性を有する光
カチオン硬化性組成物を提供することを目的としてい
る。DISCLOSURE OF THE INVENTION The present invention has been made in view of the above circumstances, and it has been found that an aryliodonium salt compound represented by a diphenyliodonium salt having a counter anion such as PF6 can be cured well. Cationic photopolymerization catalyst composition capable of being cured, and can be cured in a short time even with a composition containing an additive such as a pigment, and have excellent cured physical properties. It is intended to provide things.
【0005】[0005]
【課題を解決するための手段】本発明者等は、前記目的
を達成するため絵鋭意検討したところ、特定の増感剤を
使用することで、上記課題を克服する光触媒組成物を見
出し、本発明を完成するに至った。Means for Solving the Problems The present inventors have conducted intensive studies to achieve the above object, and found a photocatalyst composition which can overcome the above-mentioned problems by using a specific sensitizer. The invention has been completed.
【0006】以下、本発明を詳細に説明する。本発明
は、置換基として水酸基または置換されていてもよいア
ラルキルオキシ基、アルコキシ基を少なくとも一つ以上
有する多環芳香族化合物及びカルバゾール誘導体からな
る群から選ばれる化合物であり、かつ、330nmより
も長波長にUVスペクトル吸収をもつ少なくとも一種の
化合物を含有してなることを特徴とする光触媒組成物で
あり、より詳しくは、置換基として水酸基または置換さ
れていてもよいアラルキルオキシ基、アルコキシ基を少
なくとも一つ以上有する多環芳香族化合物及びカルバゾ
ール誘導体からなる群から選ばれる化合物であり、か
つ、330nmよりも長波長にUVスペクトル吸収をも
つ少なくとも一種の化合物と、光カチオン重合触媒とし
て作用するジフェニルアルキルスルホニム塩化合物、ジ
ナフチルアルキルスルホニム塩化合物、トリフェニルス
ルホニム塩化合物、ジフェニルヨードニウム塩化合物、
フェニルナフチルヨードニウム塩化合物、ジナフチルヨ
ードニウム塩化合物から選ばれたアリールオニウム塩化
合物の少なくとも一種とを含有してなることを特徴とす
る光触媒組成物である。Hereinafter, the present invention will be described in detail. The present invention is a compound selected from the group consisting of a hydroxyl group or an aralkyloxy group which may be substituted as a substituent, a polycyclic aromatic compound having at least one alkoxy group and a carbazole derivative, and A photocatalyst composition characterized by containing at least one compound having UV spectrum absorption at a long wavelength, more specifically, a hydroxyl group or an optionally substituted aralkyloxy group, an alkoxy group as a substituent. A compound selected from the group consisting of a polycyclic aromatic compound having at least one or more and a carbazole derivative, and at least one compound having UV spectrum absorption at a wavelength longer than 330 nm, and diphenyl acting as a photocationic polymerization catalyst Alkylsulfonium salt compound, dinaphthyl al Rusuruhonimu salt compounds, triphenyl sulfonium salt compounds, diphenyliodonium salt compound,
A photocatalyst composition comprising at least one of an arylonium salt compound selected from a phenylnaphthyliodonium salt compound and a dinaphthyliodonium salt compound.
【0007】本発明の、置換基として水酸基または置換
されていてもよいアラルキルオキシ基、アルコキシ基を
少なくとも一つ以上有する多環芳香族化合物及びカルバ
ゾール誘導体からなる群から選ばれる化合物であり、か
つ、330nmよりも長波長にUVスペクトル吸収をも
つ化合物は、主として光カチオン重合触媒の増感剤とし
て作用する。The compound of the present invention is selected from the group consisting of a polycyclic aromatic compound having at least one aralkyloxy group or an optionally substituted aralkyloxy group or an alkoxy group as a substituent and a carbazole derivative, and Compounds having UV spectral absorption at wavelengths longer than 330 nm mainly act as sensitizers for cationic photopolymerization catalysts.
【0008】[0008]
【発明の実施の形態】本発明に使用できるアリールオニ
ウム塩化合物としては、特開昭50-151997号、特開昭50-
158680号、特開昭50-151996号等に記載されているもの
などを例示することができ、特に、ジフェニルアルキル
スルホニム塩、ジナフチルアルキルスルホニム塩、トリ
フェニルスルホニム塩、ジフェニルヨードニウム塩、フ
ェニルナフチルヨードニウム塩、ジナフチルヨードニウ
ム塩化合物またはそれらの誘導体が好ましい。BEST MODE FOR CARRYING OUT THE INVENTION The arylonium salt compounds usable in the present invention are described in JP-A-50-151997 and JP-A-50-1997.
No. 158680, those described in JP-A-50-151996 and the like can be exemplified, in particular, diphenylalkylsulfonium salt, dinaphthylalkylsulfonium salt, triphenylsulfonium salt, diphenyliodonium salt, A phenylnaphthyliodonium salt, a dinaphthyliodonium salt compound or a derivative thereof is preferred.
【0009】対アニオンは非求核性のアニオンならばそ
の種類に限定されることはない。スルホニウム塩化合物
としては以下の物を例示することができる。式中Xはア
ニオン残基を表し、B(C6 F5 ),SbF6 ,AsF
6 ,PF6,BF4 などを例示することができる。The counter anion is not limited to its kind as long as it is a non-nucleophilic anion. The following compounds can be exemplified as the sulfonium salt compounds. In the formula, X represents an anion residue, and B (C 6 F 5 ), SbF 6 , AsF
6 , PF 6 , BF 4 and the like.
【0010】[0010]
【化1】 Embedded image
【0011】本発明の光触媒組成物と組み合わせると著
しく増感効果があるのは特にジアリールヨードニウム塩
化合物である。Particularly, a diaryliodonium salt compound has a remarkable sensitizing effect when combined with the photocatalyst composition of the present invention.
【0012】ジアリールヨードニウム塩化合物として
は、ジフェニルヨードニウム塩、フェニルナフチルヨー
ドニウム塩、ジナフチルヨードニウム塩化合物があげら
れ、メチル基、エチル基、プロピル基、イソプロピル
基、ブチル基、イソブチル基、t−ブチル基、ペンチル
基、ヘキシル基、デシル基等のアルキル基、シクロヘキ
シル基等のシクロアルキル基、メトキシ基、エトキシ
基、プロポキシ基、ブトキシ基、ヘキシルオキシ基、デ
シルオキシ基、ドデシルオキシ基等のアルコキシ基、フ
ッ素、塩素、臭素、ヨウ素等のハロゲン原子、ベンゾイ
ル基等のカルボニル基、フェニル基、ニトロ基等の置換
基で置換されていてもよいフェニル基やナフチル基を有
するものであり、非求核性の対アニオンとしては、B
(C6 F5 ),SbF6 ,AsF6 ,PF6 ,BF4 な
どを例示することがでる。Examples of the diaryliodonium salt compound include diphenyliodonium salt, phenylnaphthyliodonium salt and dinaphthyliodonium salt compound, and include methyl, ethyl, propyl, isopropyl, butyl, isobutyl and t-butyl. An alkyl group such as a pentyl group, a hexyl group and a decyl group, a cycloalkyl group such as a cyclohexyl group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a hexyloxy group, an alkoxy group such as a decyloxy group and a dodecyloxy group, and fluorine. Having a phenyl group or a naphthyl group which may be substituted with a halogen atom such as chlorine, bromine or iodine, a carbonyl group such as a benzoyl group, a phenyl group or a nitro group; As the counter anion, B
(C 6 F 5 ), SbF 6 , AsF 6 , PF 6 , BF 4 and the like can be exemplified.
【0013】ジアリルヨードニウム塩化合物としては以
下の物を例示することができる。式中Xはアニオン残基
を表し、B(C6 F5 ),SbF6 ,AsF6 ,P
F6,BF4 などを例示することができる。The following can be exemplified as the diallyliodonium salt compound. In the formula, X represents an anion residue, and B (C 6 F 5 ), SbF 6 , AsF 6 , P
F 6 and BF 4 can be exemplified.
【0014】[0014]
【化2】 Embedded image
【0015】本発明に使用される増感剤は、330nm
よりも長波長にUVスペクトル吸収をもつ化合物であり、
置換基として水酸基、置換されていてもよいアラルキル
オキシ基またはアルコキシ基を少なくとも一つ以上を有
する多環芳香族化合物またはカルバゾール誘導体であ
る。The sensitizer used in the present invention has a wavelength of 330 nm.
It is a compound that has UV spectrum absorption at longer wavelength than
A polycyclic aromatic compound or a carbazole derivative having at least one hydroxyl group, an optionally substituted aralkyloxy group, or an alkoxy group as a substituent.
【0016】多環芳香族化合物としては、ナフタレン誘
導体、アントラセン誘導体、クリセン誘導体、フェナン
トレン誘導体が好ましい。置換基であるアルコキシ基と
しては、炭素数1〜18のものが好ましく、特に炭素数
1〜8のものが好ましい。アラルキルオキシ基として
は、炭素数7〜10のものが好ましく、特に炭素数7〜
8のベンジルオキシ基、フェネチルオキシ基が好まし
い。As the polycyclic aromatic compound, naphthalene derivatives, anthracene derivatives, chrysene derivatives and phenanthrene derivatives are preferred. The alkoxy group as a substituent preferably has 1 to 18 carbon atoms, and particularly preferably has 1 to 8 carbon atoms. The aralkyloxy group preferably has 7 to 10 carbon atoms, and particularly preferably has 7 to 10 carbon atoms.
And a benzyloxy group and a phenethyloxy group of 8 are preferable.
【0017】本発明に使用できる増感剤を例示すると、
カルバゾール、N−エチルカルバゾール、N−ビニルカ
ルバゾール、N−フェニルカルバゾール等のカルバゾー
ル誘導体、1−ナフトール、2−ナフトール、1−メトキ
シナフタレン、1−ステアリルオキシナフタレン、2−メ
トキシナフタレン、2−ドデシルオキシナフタレン、4
−メトキシ−1−ナフトール、グリシジル−1−ナフチ
ルエーテル、2−(2−ナフトキシ)エチルビニルエーテ
ル、1,4−ジヒドロキシナフタレン、1,5−ジヒドロキシ
ナフタレン、1,6−ジヒドロキシナフタレン、2,7−ジヒ
ドロキシナフタレン、2,7−ジメトキシナフタレン、1,
1’−チオビス(2−ナフトール)、1,1’−ビ−2−ナフ
トール、1,5−ナフチルジグリシジルエーテル、2,7−ジ
(2−ビニルオキシエチル)ナフチルエーテル、4−メト
キシ−1−ナフトール、E S N−175(新日鉄化学社製
のエポキシ樹脂)またはそのシリーズ、ナフトール誘導
体とホルマリンとの縮合体等のナフタレン誘導体、9,10
−ジメトキシアントラセン、2−エチル−9,10−ジメト
キシアントラセン、2−tブチル−9,10−ジメトキシア
ントラセン、2,3−ジメチル−9,10−ジメトキシアント
ラセン、9−メトキシ−10−メチルアントラセン、9,10
−ジエトキシアントラセン、2−エチル−9,10−ジエト
キシアントラセン、2−tブチル−9,10−ジエトキシア
ントラセン、2,3−ジメチル−9,10−ジエトキシアント
ラセン、9−エトキシ−10−メチルアントラセン、9,10
−ジプロポキシアントラセン、2−エチル−9,10−ジプ
ロポキシアントラセン、2−tブチル−9,10−ジプロポ
キシアントラセン、2,3−ジメチル−9,10−ジプロポキ
シアントラセン、9−イソプロポキシ−10−メチルアン
トラセン、9,10−ジベンジルオキシアントラセン、2−
エチル−9,10−ジベンジルオキシアントラセン、2−t
ブチル−9,10−ジベンジルオキシアントラセン、2,3−
ジメチル−9,10−ジベンジルオキシアントラセン、9−
ベンジルオキシ−10−メチルアントラセン、9,10−ジ−
α−メチルベンジルオキシアントラセン、2−エチル−
9,10−ジ−α−メチルベンジルオキシアントラセン、2
−tブチル−9,10−ジ−α−メチルベンジルオキシアン
トラセン、2,3−ジメチル−9,10−ジ−α−メチルベン
ジルオキシアントラセン、9−(α−メチルベンジルオ
キシ)−10−メチルアントラセン、9,10−ジ(2−ヒド
ロキシエトキシ)アントラセン、2−エチル−9,10−ジ
(2−カルボキシエトキシ)アントラセン等のアントラ
セン誘導体、1,4−ジメトキシクリセン、1,4−ジエトキ
シクリセン、1,4−ジプロポキシクリセン、1,4−ジベン
ジルオキシクリセン、1,4−ジ−α−メチルベンジルオ
キシクリセン等のクリセン誘導体、9−ヒドロキシフェ
ナントレン、9,10−ジメトキシフェナントレン、9,10−
ジエトキシフェナントレン等のフェナントレン誘導体な
どを挙げることができる。これら誘導体の中でも、特に
炭素数1〜4のアルキル基を置換基として有していても
良い9,10−ジアルコキシアントラセン誘導体が好ま
しく、アルコキシ基としてはメトキシ基、エトキシ基が
好ましい。Illustrative sensitizers that can be used in the present invention are:
Carbazole derivatives such as carbazole, N-ethylcarbazole, N-vinylcarbazole, N-phenylcarbazole, 1-naphthol, 2-naphthol, 1-methoxynaphthalene, 1-stearyloxynaphthalene, 2-methoxynaphthalene, 2-dodecyloxynaphthalene , 4
-Methoxy-1-naphthol, glycidyl-1-naphthyl ether, 2- (2-naphthoxy) ethyl vinyl ether, 1,4-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,7-dihydroxy Naphthalene, 2,7-dimethoxynaphthalene, 1,
1'-thiobis (2-naphthol), 1,1'-bi-2-naphthol, 1,5-naphthyldiglycidyl ether, 2,7-di (2-vinyloxyethyl) naphthyl ether, 4-methoxy-1 Naphthol, ESN-175 (epoxy resin manufactured by Nippon Steel Chemical) or a series thereof, naphthalene derivatives such as condensates of naphthol derivatives and formalin, 9,10
-Dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 2-tbutyl-9,10-dimethoxyanthracene, 2,3-dimethyl-9,10-dimethoxyanthracene, 9-methoxy-10-methylanthracene, 9 ,Ten
-Diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 2-tbutyl-9,10-diethoxyanthracene, 2,3-dimethyl-9,10-diethoxyanthracene, 9-ethoxy-10- Methylanthracene, 9,10
-Dipropoxyanthracene, 2-ethyl-9,10-dipropoxyanthracene, 2-tbutyl-9,10-dipropoxyanthracene, 2,3-dimethyl-9,10-dipropoxyanthracene, 9-isopropoxy-10 -Methylanthracene, 9,10-dibenzyloxyanthracene, 2-
Ethyl-9,10-dibenzyloxyanthracene, 2-t
Butyl-9,10-dibenzyloxyanthracene, 2,3-
Dimethyl-9,10-dibenzyloxyanthracene, 9-
Benzyloxy-10-methylanthracene, 9,10-di-
α-methylbenzyloxyanthracene, 2-ethyl-
9,10-di-α-methylbenzyloxyanthracene, 2
-Tbutyl-9,10-di-α-methylbenzyloxyanthracene, 2,3-dimethyl-9,10-di-α-methylbenzyloxyanthracene, 9- (α-methylbenzyloxy) -10-methylanthracene 9,10-di (2-hydroxyethoxy) anthracene, anthracene derivatives such as 2-ethyl-9,10-di (2-carboxyethoxy) anthracene, 1,4-dimethoxychrysene, 1,4-diethoxychrysene, Chrysene derivatives such as 1,4-dipropoxychrysene, 1,4-dibenzyloxychrysene, 1,4-di-α-methylbenzyloxychrysene, 9-hydroxyphenanthrene, 9,10-dimethoxyphenanthrene, 9,10-
Phenanthrene derivatives such as diethoxyphenanthrene can be exemplified. Among these derivatives, a 9,10-dialkoxyanthracene derivative which may have an alkyl group having 1 to 4 carbon atoms as a substituent is particularly preferable, and a methoxy group or an ethoxy group is preferable as the alkoxy group.
【0018】本発明に使用されるカチオン重合性化合物
は、一般に知られているカチオン重合性基を有するモノ
マー、オリゴマーやポリマーであれば何ら制限されるこ
となく使用可能であり、例えば、下記のようなものが例
示される。The cationically polymerizable compound used in the present invention can be used without any limitation as long as it is a generally known monomer, oligomer or polymer having a cationically polymerizable group. Are exemplified.
【0019】(a)ビニル化合物として、スチレン、α
−メチルスチレン、p−メトキシスチレン、p−t−ブ
トキシスチレン等のスチレン化合物、メチルビニルエー
テル、n−ブチルビニルエーテル、エチルビニルエーテ
ル、イソブチルビニルエーテル、シクロヘキシルビニル
エーテル、2−クロロエチルビニルエーテル、2−フェ
ノキシエチルビニルエーテル、2−ヒドロキシエチルビ
ニルエーテル、4−ヒドロキシブチルビニルエーテル、
ステアリルビニルエーテル、2−アセトキシエチルビニ
ルエーテル等のアルキルビニルエーテル化合物、アリル
ビニルエーテル、2−メタクリロイルオキシエチルビニ
ルエーテル、2−アクリロイルオキシエチルビニルエー
テル等のアルケニルビニルエーテル化合物、フェニルビ
ニルエーテル、p−メトキシフェニルビニルエーテル等
のアリールビニルエーテル化合物、N−ビニルカルバゾ
ール、N−ビニルピロリドン等のカチオン重合性窒素含
有化合物、ブタンジオールジビニルエーテル、トリエチ
レングリコールジビニルエーテル、シクロヘキサンジオ
ールジビニルエーテル、1,4−ベンゼンジメタノール
ジビニルエーテル、ハイドロキノンジビニルエーテル、
サゾルシノールジビニルエーテル等の多官能ビニル化合
物が挙げられる。(A) As the vinyl compound, styrene, α
Styrene compounds such as -methylstyrene, p-methoxystyrene, pt-butoxystyrene, methyl vinyl ether, n-butyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, cyclohexyl vinyl ether, 2-chloroethyl vinyl ether, 2-phenoxyethyl vinyl ether, -Hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether,
Stearyl vinyl ether, alkyl vinyl ether compounds such as 2-acetoxyethyl vinyl ether, allyl vinyl ether, alkenyl vinyl ether compounds such as 2-methacryloyloxyethyl vinyl ether, 2-acryloyloxyethyl vinyl ether, phenyl vinyl ether, aryl vinyl ether compounds such as p-methoxyphenyl vinyl ether, N-vinyl carbazole, cationically polymerizable nitrogen-containing compounds such as N-vinyl pyrrolidone, butanediol divinyl ether, triethylene glycol divinyl ether, cyclohexanediol divinyl ether, 1,4-benzenedimethanol divinyl ether, hydroquinone divinyl ether,
And polyfunctional vinyl compounds such as sasolcinol divinyl ether.
【0020】(b)エポキシ化合物として、フェニルグ
リシジルエーテル、p−tert−ブチルフェニルグリ
シジルエーテル、ブチルグリシジルエーテル、2−エチ
ルヘキシルグリシジルエーテル、アリルグリシジルエー
テル、1,2−ブチレンオキサイド、1,3−ブタジエ
ンモノオキサイド、1,2−ドデシレンオキサイド、エ
ピクロロヒドリン、1,2−エポキシデカン、エチレン
オキサイド、プロピレンオキサイド、スチレンオキサイ
ド、シクロヘキセンオキサイド、3−メタクリロイルオ
キシメチルシクロヘキセンオキサイド、3−アクリロイ
ルオキシメチルシクロヘキセンオキサイド、3−ビニル
シクロヘキセンオキサイド等の単官能のモノマー、1,
1,3−テトラデカジエンジオキサイド、リモネンジオ
キサイド、3,4−エポキシシクロヘキシルメチル−
(3,4−エポキシシクロヘキシル)カルボキシレー
ト、ジ(3,4−エポキシシクロヘキシル)アジペー
ト、ビスフェノールA型エポキシ樹脂、ビスフェノール
F型エポキシ樹脂、o−,m−,p−クレゾールノボラ
ック型エポキシ樹脂、フェノールノボラック型エポキシ
樹脂、多価アルコールのポリグリシジルエーテル等の多
官能エポキシ化合物が挙げられる。(B) As the epoxy compound, phenyl glycidyl ether, p-tert-butylphenyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, allyl glycidyl ether, 1,2-butylene oxide, 1,3-butadiene mono Oxide, 1,2-dodecylene oxide, epichlorohydrin, 1,2-epoxydecane, ethylene oxide, propylene oxide, styrene oxide, cyclohexene oxide, 3-methacryloyloxymethylcyclohexene oxide, 3-acryloyloxymethylcyclohexene oxide Monofunctional monomers such as, 3-vinylcyclohexene oxide,
1,3-tetradecadienedoxide, limonenedoxide, 3,4-epoxycyclohexylmethyl-
(3,4-epoxycyclohexyl) carboxylate, di (3,4-epoxycyclohexyl) adipate, bisphenol A type epoxy resin, bisphenol F type epoxy resin, o-, m-, p-cresol novolak type epoxy resin, phenol novolak And polyfunctional epoxy compounds such as polyepoxy resin and polyglycidyl ether of polyhydric alcohol.
【0021】(c)ビシクロオルソエステル化合物とし
て、1−フェニル−4−エチル−2,6,7−トリオキ
サビシクロ〔2,2,2〕オクタン、1−エチル−4−
ヒドロキシメチル−2,6,7−トリオキサビシクロ
〔2,2,2〕オクタン等の化合物が挙げられる。(C) As bicycloorthoester compounds, 1-phenyl-4-ethyl-2,6,7-trioxabicyclo [2,2,2] octane, 1-ethyl-4-
Compounds such as hydroxymethyl-2,6,7-trioxabicyclo [2,2,2] octane are exemplified.
【0022】(d)スピロオルソカーボネート化合物と
して、1,5,7,11−テトラオキサスピロ〔5,
5〕ウンデカン、3,9−ジベンジル−1,5,7,1
1−テトラオキサスピロ〔5,5〕ウンデカン、1,
4,6−トリオキサスピロ〔4,4〕ノナン、2−メチ
ル−1,4,6−トリオキサスピロ〔4,4〕ノナン、
1,4,6−トリオキサスピロ〔4,5〕デカン等の化
合物が挙げられる。(D) As the spiro orthocarbonate compound, 1,5,7,11-tetraoxaspiro [5,
5] undecane, 3,9-dibenzyl-1,5,7,1
1-tetraoxaspiro [5,5] undecane, 1,
4,6-trioxaspiro [4,4] nonane, 2-methyl-1,4,6-trioxaspiro [4,4] nonane,
Compounds such as 1,4,6-trioxaspiro [4,5] decane are exemplified.
【0023】(e)オキセタン化合物として、3,3−
ジメチルオキセタン、3,3−ビス(クロロメチル)オ
キセタン、2−ヒドロキシメチルオキセタン、3−メチ
ル−3−オキセタンメタノール、3−メチル−3−メト
キシメチルオキセタン、3−エチル−3−フェノキシメ
チルオキセタン、レゾルシノールビス(3−メチル−3
−オキセタニルエチル)エーテル、m−キシリレンビス
(3−エチル−3−オキセタニルエチルエーテル)等の
化合物が挙げられる。(E) As the oxetane compound, 3,3-
Dimethyl oxetane, 3,3-bis (chloromethyl) oxetane, 2-hydroxymethyl oxetane, 3-methyl-3-oxetane methanol, 3-methyl-3-methoxymethyl oxetane, 3-ethyl-3-phenoxymethyl oxetane, resorcinol Bis (3-methyl-3
-Oxetanylethyl) ether and m-xylylenebis (3-ethyl-3-oxetanylethyl ether).
【0024】これらは、単独もしくは2種以上を併用し
て用いても差し支えない。These may be used alone or in combination of two or more.
【0025】本発明において、アリールオニウム塩化合
物と増感剤との配合割合は、任意に設定できるが、重量
比でアリールオニウム塩化合物1に対して、増感剤0.1
〜10、好ましくは0.3〜5である。このアリールオニウム
塩化合物に対する増感剤の割合が少ないと、増感効果が
低下し、過剰であると硬化物の特性が低下する。但し、
増感剤がE S N−175(新日鉄化学社製のエポキシ樹
脂)や2−(2−ナフトキシ)エチルビニルエーテルのよ
うにエポキシ基やビニルエーテル基等の反応性基を有す
るものは、この限りではない。In the present invention, the mixing ratio of the arylonium salt compound and the sensitizer can be arbitrarily set, but the weight ratio of the arylonium salt compound to the sensitizer is 0.1 to 0.1.
-10, preferably 0.3-5. If the ratio of the sensitizer to the arylonium salt compound is small, the sensitizing effect decreases, and if it is excessive, the properties of the cured product deteriorate. However,
The sensitizer having a reactive group such as an epoxy group or a vinyl ether group such as ESN-175 (epoxy resin manufactured by Nippon Steel Chemical Co., Ltd.) or 2- (2-naphthoxy) ethyl vinyl ether is not limited to this.
【0026】本発明において、アリールオニウム塩化合
物と増感剤との配合の組合せとしては、アリールオニウ
ム塩化合物がスルホニム塩化合物の場合は、増感剤とし
て9,10−ジアルコキシアントラセン誘導体が好ましい。
一方、アリールオニウム塩化合物がヨードニウム塩化合
物の場合は、クリア系の配合物にはカルバゾール誘導
体、ナフトール誘導体、アルコキシナフタレン誘導体、
フェナントレン誘導体が好ましく、顔料系の配合物に
は、9,10−ジアルコキシアントラセン誘導体が好まし
い。In the present invention, the combination of the arylonium salt compound and the sensitizer is preferably a 9,10-dialkoxyanthracene derivative as the sensitizer when the arylonium salt compound is a sulfonium salt compound.
On the other hand, when the arylonium salt compound is an iodonium salt compound, the clear compound is a carbazole derivative, a naphthol derivative, an alkoxynaphthalene derivative,
Phenanthrene derivatives are preferred, and 9,10-dialkoxyanthracene derivatives are preferred for pigment-based formulations.
【0027】本発明の触媒組成物を使用した硬化性組成
物は、光により容易に硬化することができる。光源とし
ては、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水
銀灯、メタルハライドランプ、クセノンランプ、カーボ
ンアーク灯等が用いられる。また、半導体レーザー、ア
ルゴンレーザー、He-Cdレーザー等のレーザー光を用い
ることができる。特に、厚膜硬化や酸化チタンのような
顔料含有の光硬化性組成物に使用する際は、ガリウム入
りメタルハライドランプが好適に用いられる。The curable composition using the catalyst composition of the present invention can be easily cured by light. As a light source, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a xenon lamp, a carbon arc lamp, or the like is used. Further, laser light such as a semiconductor laser, an argon laser, and a He-Cd laser can be used. In particular, a gallium-containing metal halide lamp is preferably used when used for thick film curing or a pigment-containing photocurable composition such as titanium oxide.
【0028】本発明の触媒組成物を使用した硬化性組成
物は、α線、β線、γ線、中性子線、X線、加速電子線
のような電離性放射線によっても容易に硬化することが
できる。The curable composition using the catalyst composition of the present invention can be easily cured by ionizing radiation such as α-ray, β-ray, γ-ray, neutron beam, X-ray, and accelerating electron beam. it can.
【0029】[0029]
【実施例】以下、本発明を実施例によって更に詳細に説
明するが、本発明は以下のもののみに限定されるもので
はない。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to only the following Examples.
【0030】実施例1(光硬化性テストI(クリア
系)) UVR−6110(UCC社製脂環型エポキシ)100部に、純分
としてアリールオニウム塩化合物1部と増感剤1部を混
合し、配合物を調製した。この配合物を、ブリキ板に厚
さ5μmになるように塗布し、下記の条件で光硬化させ
た。この時、硬化膜にタックがなかったものは○印、タ
ックがあったものには×印で表−1に示した。 UV照射機器:ベルトコンベア式UV照射機器(アイグラフ
ィックス社製) ランプ:集光型80W高圧水銀灯1灯 照射距離:10cm(焦点距離)Example 1 (Photocuring test I (clear system)) 100 parts of UVR-6110 (alicyclic epoxy manufactured by UCC) were mixed with 1 part of an arylonium salt compound and 1 part of a sensitizer as pure components. To prepare a formulation. This composition was applied to a tin plate at a thickness of 5 μm and photocured under the following conditions. At this time, those having no tack in the cured film were shown in Table 1 by ○, and those having tack were shown in Table 1 by x. UV irradiation equipment: belt conveyor type UV irradiation equipment (manufactured by Eye Graphics Co., Ltd.) Lamp: 1 condensing 80W high-pressure mercury lamp Irradiation distance: 10 cm (focal length)
【0031】[0031]
【表1】 [Table 1]
【0032】実施例2(光硬化性テストII(顔料
系)) UVR−6110(UCC社製脂環型エポキシ)100部と酸化チ
タン(石原産業社製CR−58)100部に、純分とし
てアリールオニウム塩化合物3部と増感剤1部を混合
し、配合物を調製した。この配合物を、ブリキ板に厚さ
5μmになるように塗布し、下記の条件で光硬化させた。
この時、配合物の内部まで硬化したものは○印、硬化し
なかったものには×印で表−2に示した。 UV照射機器:ベルトコンベア式UV照射機器(アイグラフ
ィックス社製) ランプ:集光型160Wガリウム入りメタハラタンプ1
灯 照射距離:10cm(焦点距離) ベルトコンベア速度:30m/分Example 2 (Photocuring test II (pigment type)) 100 parts of UVR-6110 (alicyclic epoxy manufactured by UCC) and 100 parts of titanium oxide (CR-58 manufactured by Ishihara Sangyo) were used as pure components. A mixture was prepared by mixing 3 parts of the arylonium salt compound and 1 part of the sensitizer. Add this composition to a tin plate
It was applied so as to have a thickness of 5 μm, and was photocured under the following conditions.
At this time, those which were cured to the inside of the compound were indicated by ○, and those not cured were indicated by × in Table-2. UV irradiation equipment: belt conveyor type UV irradiation equipment (manufactured by Eye Graphics Co., Ltd.) Lamp: condensing type 160W gallium-containing metaharatampu 1
Light Irradiation distance: 10cm (focal length) Belt conveyor speed: 30m / min
【0033】[0033]
【表2】 [Table 2]
【0034】[0034]
【発明の効果】本発明の光触媒組成物は、カチオン重合
性化合物と混合し、光、電子線、X線等の活性エネルギ
ー線照射により、硬化が可能である。更に、トリフェニ
ルスルホニウム塩化合物やジフェニルヨードニウム塩化
合物には吸収領域がないかまたは極めて吸収が小さい3
30nmよりも長波長の光でも硬化することができるた
め、クリア系組成物では硬化速度が著しく加速された
り、顔料等の添加剤を含有する組成物においても効果的
に光硬化することができる。従って、光硬化型の塗料、
接着剤、インキおよびフォトレジスト、光造形用の感光
性樹脂等へ好適に用いることができる。The photocatalyst composition of the present invention can be cured by mixing it with a cationically polymerizable compound and irradiating it with an active energy ray such as light, an electron beam, or an X-ray. Further, the triphenylsulfonium salt compound and the diphenyliodonium salt compound have no absorption region or extremely low absorption.
Since curing can be performed even with light having a wavelength longer than 30 nm, the curing speed of the clear composition can be remarkably accelerated, and even a composition containing an additive such as a pigment can be effectively photocured. Therefore, light-curing paints,
It can be suitably used for adhesives, inks, photoresists, photosensitive resins for stereolithography, and the like.
Claims (13)
もよいアラルキルオキシ基、アルコキシ基を少なくとも
一つ以上有する多環芳香族化合物及びカルバゾール誘導
体からなる群から選ばれる化合物であり、かつ、330
nmよりも長波長にUVスペクトル吸収をもつ少なくと
も一種の化合物を含有してなることを特徴とする光触媒
組成物。1. A compound selected from the group consisting of a polycyclic aromatic compound having at least one hydroxyl group or an optionally substituted aralkyloxy group or an alkoxy group as a substituent and a carbazole derivative, and 330
A photocatalyst composition comprising at least one compound having UV spectrum absorption at a wavelength longer than nm.
もよいアラルキルオキシ基、アルコキシ基を少なくとも
一つ以上有する多環芳香族化合物及びカルバゾール誘導
体からなる群から選ばれる化合物であり、かつ、330
nmよりも長波長にUVスペクトル吸収をもつ少なくと
も一種の化合物と、光カチオン重合触媒として作用する
ジフェニルアルキルスルホニム塩化合物、ジナフチルア
ルキルスルホニム塩化合物、トリフェニルスルホニム塩
化合物、ジフェニルヨードニウム塩化合物、フェニルナ
フチルヨードニウム塩化合物、ジナフチルヨードニウム
塩化合物から選ばれたアリールオニウム塩化合物の少な
くとも一種とを含有してなることを特徴とする請求項1
記載の光触媒組成物。2. A compound selected from the group consisting of a polycyclic aromatic compound having at least one hydroxyl group or an optionally substituted aralkyloxy group or an alkoxy group as a substituent and a carbazole derivative, and 330
at least one compound having a UV spectrum absorption at a wavelength longer than nm, and a diphenylalkylsulfonium salt compound, a dinaphthylalkylsulfonium salt compound, a triphenylsulfonium salt compound, a diphenyliodonium salt compound acting as a photocationic polymerization catalyst And at least one arylonium salt compound selected from a phenylnaphthyliodonium salt compound and a dinaphthyliodonium salt compound.
The photocatalyst composition according to any one of the preceding claims.
アントラセン誘導体、クリセン誘導体またはフェナント
レン誘導体である請求項1または2記載の光触媒組成
物。3. The polycyclic aromatic compound is a naphthalene derivative,
3. The photocatalyst composition according to claim 1, which is an anthracene derivative, a chrysene derivative or a phenanthrene derivative.
キシアントラセン誘導体または9,10−ジアラルキル
オキシアントラセン誘導体である請求項2記載の光触媒
組成物。4. The photocatalyst composition according to claim 2, wherein the polycyclic aromatic compound is a 9,10-dialkoxyanthracene derivative or a 9,10-diaralkyloxyanthracene derivative.
体、2−ナフトール誘導体、1−アルコキシナフタレン
誘導体、2−アルコキシナフタレン誘導体である請求項
2記載の光触媒組成物。5. The photocatalyst composition according to claim 2, wherein the polycyclic aromatic compound is a 1-naphthol derivative, a 2-naphthol derivative, a 1-alkoxynaphthalene derivative, or a 2-alkoxynaphthalene derivative.
体のアルコキシ基が炭素数1〜8のアルコキシである化
合物または9,10−ジアラルキルオキシアントラセン
誘導体のアラルキルオキシ基が炭素数7〜8のアラルキ
ルオキシである化合物を多環芳香族化合物として用いる
ことを特徴とする請求項4記載の光触媒組成物。6. A compound in which the alkoxy group of the 9,10-dialkoxyanthracene derivative is an alkoxy having 1 to 8 carbon atoms, or the aralkyloxy group of the 9,10-diaralkyloxyanthracene derivative is an aralkyloxy having 7 to 8 carbon atoms. 5. The photocatalyst composition according to claim 4, wherein the compound is used as a polycyclic aromatic compound.
シアントラセン、9,10−ジエトキシアントラセン、
9,10−ジベンジルアントラセンおよびそれらの誘導
体から選ばれる一種以上である請求項6記載の光触媒組
成物。7. The polycyclic aromatic compound is 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene,
The photocatalyst composition according to claim 6, which is at least one selected from 9,10-dibenzylanthracene and a derivative thereof.
合性化合物、実用上光カチオン重合に使用可能な顔料か
らなる光硬化性組成物。8. A photocurable composition comprising the photocatalyst composition according to claim 6, a cationically polymerizable compound, and a pigment which can be practically used for cationic photopolymerization.
硬化性組成物。9. A photocurable composition wherein the pigment according to claim 8 is titanium oxide.
が、脂環型エポキシ化合物、ビニルエーテル化合物また
はオキセタン化合物である光硬化性組成物。10. A photocurable composition wherein the cationically polymerizable compound according to claim 8 is an alicyclic epoxy compound, a vinyl ether compound or an oxetane compound.
重合性化合物からなる光硬化性組成物。11. A photocurable composition comprising the photocatalyst composition according to claim 5, and a cationically polymerizable compound.
が、脂環型エポキシ化合物、ビニルエーテル化合物また
はオキセタン化合物である光硬化性組成物。12. A photocurable composition wherein the cationically polymerizable compound according to claim 11 is an alicyclic epoxy compound, a vinyl ether compound or an oxetane compound.
物をガリウム含有ランプで光硬化する硬化方法。13. A curing method, wherein the photocurable composition according to claim 7 or 10 is photocured with a gallium-containing lamp.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27218397A JP3437069B2 (en) | 1996-09-19 | 1997-09-18 | Photocatalyst composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26930796 | 1996-09-19 | ||
JP8-269307 | 1996-09-19 | ||
JP27218397A JP3437069B2 (en) | 1996-09-19 | 1997-09-18 | Photocatalyst composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10147608A true JPH10147608A (en) | 1998-06-02 |
JP3437069B2 JP3437069B2 (en) | 2003-08-18 |
Family
ID=26548715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27218397A Expired - Fee Related JP3437069B2 (en) | 1996-09-19 | 1997-09-18 | Photocatalyst composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3437069B2 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003096184A (en) * | 2001-07-17 | 2003-04-03 | Mitsui Chemicals Inc | Photocurable resin composition |
WO2005093514A1 (en) * | 2004-03-26 | 2005-10-06 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition and method of forming pattern with the composition |
JP2007070404A (en) * | 2005-09-05 | 2007-03-22 | Fujifilm Corp | Ink composition, ink-jet printing method, printed matter, method for producing lithographic printing plate, and the resultant lithographic printing plate |
JP2007217515A (en) * | 2006-02-15 | 2007-08-30 | Sumitomo Chemical Co Ltd | Novel aromatic ether compounds and photoinitiators |
WO2007148558A1 (en) * | 2006-06-20 | 2007-12-27 | Konica Minolta Medical & Graphic, Inc. | Active ray curable composition, method for curing the same, active ray curable ink composition, image forming method, and compound |
US7455887B2 (en) | 2003-11-06 | 2008-11-25 | Konica Minolta Medical & Graphic Inc. | Actinic ray curable ink-jet ink composition, image formation method employing the same, and ink-jet recording apparatus |
US7709546B2 (en) | 2006-04-18 | 2010-05-04 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate |
KR101032154B1 (en) * | 2007-06-15 | 2011-05-02 | 도쿄 오카 고교 가부시키가이샤 | Photosensitive resin composition, photosensitive resin laminated body, and pattern formation method |
JP2011168702A (en) * | 2010-02-18 | 2011-09-01 | Kawasaki Kasei Chem Ltd | Photocationic polymerization sensitizer composition, photosensitive acid-generator composition, photocationically polymerizable composition, and polymer produced by polymerizing the photocationically polymerizable composition |
KR20140087814A (en) * | 2012-12-31 | 2014-07-09 | 동우 화인켐 주식회사 | Photosensitive resin composition and insulating layer prepared from the same |
JP2014159412A (en) * | 2013-01-25 | 2014-09-04 | Kawasaki Kasei Chem Ltd | 9,10-bis(long chain acyloxy)anthracene compound, production method thereof and use thereof |
JP2015105292A (en) * | 2013-11-28 | 2015-06-08 | 川崎化成工業株式会社 | Photocation polymerizable composition, and polymerization method thereof |
US9993393B2 (en) | 2005-12-29 | 2018-06-12 | 3M Innovative Properties Company | Dental compositions and initiator systems with polycyclic aromatic component |
JP2019070106A (en) * | 2017-10-06 | 2019-05-09 | 株式会社Adeka | Composition and curable composition |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5106285B2 (en) | 2008-07-16 | 2012-12-26 | 富士フイルム株式会社 | Photocurable composition, ink composition, and ink jet recording method using the ink composition |
-
1997
- 1997-09-18 JP JP27218397A patent/JP3437069B2/en not_active Expired - Fee Related
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003096184A (en) * | 2001-07-17 | 2003-04-03 | Mitsui Chemicals Inc | Photocurable resin composition |
US7455887B2 (en) | 2003-11-06 | 2008-11-25 | Konica Minolta Medical & Graphic Inc. | Actinic ray curable ink-jet ink composition, image formation method employing the same, and ink-jet recording apparatus |
WO2005093514A1 (en) * | 2004-03-26 | 2005-10-06 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition and method of forming pattern with the composition |
JP2007070404A (en) * | 2005-09-05 | 2007-03-22 | Fujifilm Corp | Ink composition, ink-jet printing method, printed matter, method for producing lithographic printing plate, and the resultant lithographic printing plate |
US9993393B2 (en) | 2005-12-29 | 2018-06-12 | 3M Innovative Properties Company | Dental compositions and initiator systems with polycyclic aromatic component |
JP2007217515A (en) * | 2006-02-15 | 2007-08-30 | Sumitomo Chemical Co Ltd | Novel aromatic ether compounds and photoinitiators |
US7709546B2 (en) | 2006-04-18 | 2010-05-04 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate |
WO2007148558A1 (en) * | 2006-06-20 | 2007-12-27 | Konica Minolta Medical & Graphic, Inc. | Active ray curable composition, method for curing the same, active ray curable ink composition, image forming method, and compound |
KR101032154B1 (en) * | 2007-06-15 | 2011-05-02 | 도쿄 오카 고교 가부시키가이샤 | Photosensitive resin composition, photosensitive resin laminated body, and pattern formation method |
US7977030B2 (en) | 2007-06-15 | 2011-07-12 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming |
JP2011168702A (en) * | 2010-02-18 | 2011-09-01 | Kawasaki Kasei Chem Ltd | Photocationic polymerization sensitizer composition, photosensitive acid-generator composition, photocationically polymerizable composition, and polymer produced by polymerizing the photocationically polymerizable composition |
KR20140087814A (en) * | 2012-12-31 | 2014-07-09 | 동우 화인켐 주식회사 | Photosensitive resin composition and insulating layer prepared from the same |
JP2014159412A (en) * | 2013-01-25 | 2014-09-04 | Kawasaki Kasei Chem Ltd | 9,10-bis(long chain acyloxy)anthracene compound, production method thereof and use thereof |
JP2015105292A (en) * | 2013-11-28 | 2015-06-08 | 川崎化成工業株式会社 | Photocation polymerizable composition, and polymerization method thereof |
JP2019070106A (en) * | 2017-10-06 | 2019-05-09 | 株式会社Adeka | Composition and curable composition |
Also Published As
Publication number | Publication date |
---|---|
JP3437069B2 (en) | 2003-08-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6313188B1 (en) | Photocationically polymerizable composition comprising a polycyclic aromatic compound | |
JP3437069B2 (en) | Photocatalyst composition | |
EP0846681B1 (en) | Novel sulfonium salt compounds, polymerization initiator, curable composition, and curing method | |
JPH09118663A (en) | New sulfonium salt compound, polymerization initiator, curable composition containing the same compound and curing | |
US7709548B2 (en) | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | |
JPH11322900A (en) | Photocurable composition and curing | |
US6558871B1 (en) | Photocurable composition containing iodonium salt compound | |
JPH11279212A (en) | Photocurable composition containing new iodonium salt compound | |
JPH10212286A (en) | Photoinitiator, energy ray-hardenable composition containing the same and hardened material thereof | |
JPH11263804A (en) | Photo-curing composition and method of curing | |
JP2001081116A (en) | Active energy ray curing type composition and formation of film using the same composition | |
JPH06345726A (en) | Novel sulfonium salt compound and its use as initiator for polymerization | |
JPH10195117A (en) | Photocurable composition and method for curing | |
JPH11279213A (en) | Onium salt compound and photocurable composition containing the same | |
JP3741387B2 (en) | Novel sulfonium salt compound, polymerization initiator and curable composition containing them | |
JPH11269209A (en) | Onium salt compound and photocurable composition containing the same | |
JP3326775B2 (en) | Polymerization initiator composition | |
JP3565516B2 (en) | New onium salt compound and polymerization initiator | |
JP3923096B2 (en) | Novel sulfonium salt compound, polymerization initiator and curable composition containing them | |
JP3555119B2 (en) | New sulfonium salt compound and polymerization initiator | |
JP3512437B2 (en) | New sulfonium salt compounds and polymerization initiators | |
JP3309419B2 (en) | Curable composition containing nitrogen-containing cationic polymerization catalyst and sulfur-containing cationic polymerization catalyst | |
JPH11269107A (en) | Onium salt compound and photocurable composition containing the same | |
EP3260444A1 (en) | Sulfonium borate salt, acid generating agent and curable composition | |
JPH10182634A (en) | Photopolymerization initiator, energy ray-curable composition and cured product |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20030520 |
|
LAPS | Cancellation because of no payment of annual fees |