JPH0741539B2 - Surface polishing device and fan-shaped solid whetstone piece used for the device - Google Patents
Surface polishing device and fan-shaped solid whetstone piece used for the deviceInfo
- Publication number
- JPH0741539B2 JPH0741539B2 JP4309642A JP30964292A JPH0741539B2 JP H0741539 B2 JPH0741539 B2 JP H0741539B2 JP 4309642 A JP4309642 A JP 4309642A JP 30964292 A JP30964292 A JP 30964292A JP H0741539 B2 JPH0741539 B2 JP H0741539B2
- Authority
- JP
- Japan
- Prior art keywords
- grindstone
- shaped
- fan
- piece
- flat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims description 64
- 239000007787 solid Substances 0.000 title claims description 40
- 230000002093 peripheral effect Effects 0.000 claims description 11
- 239000006061 abrasive grain Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000004575 stone Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000007619 statistical method Methods 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、金属、ガラス、プラス
チックス等からなる板状被研磨体の板面に固形砥石が固
定されたラッピング円盤を圧着して回転させ研磨液を供
給しつつ研磨を行う平面研磨装置及び該装置に関し、被
研磨体の平坦度の向上、疵の発生防止及び研磨能率の維
持がはかれる新規平面研磨装置を提供するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to polishing while supplying a polishing liquid by crimping a lapping disk having a solid grindstone fixed to a plate surface of a plate-shaped object to be polished made of metal, glass, plastics, etc. The present invention provides a flat polishing apparatus for performing the above, and a novel flat polishing apparatus capable of improving the flatness of an object to be polished, preventing the occurrence of flaws, and maintaining polishing efficiency.
【０００２】[0002]
【従来の技術】周知の通り、固形砥石が固定されたラッ
ピング円盤を備えた平面研磨装置は古くから汎用されて
おり、種々様々な形式のものが実用されているが、大別
すると、円形ラッピング定盤に該定盤の面積とほぼ等し
い面積をもつ固形砥石が固定されているラッピング円盤
を備えた平面研磨装置と円形ラッピング定盤に複数個の
固形砥石片が固定されているラッピング円盤を備えた平
面研磨装置とに分類できる。2. Description of the Related Art As is well known, flat polishing machines equipped with a lapping disk to which a solid grindstone is fixed have been widely used for a long time, and various types have been put into practical use. The lapping disk having a lapping disk having a solid grindstone having an area substantially equal to the area of the surface plate fixed to the surface plate, and the lapping disk having a plurality of solid whetstone pieces fixed to the circular lapping surface plate. It can be classified as a flat polishing machine.
【０００３】そして、後者に属するものの中に、円形ラ
ッピング定盤に同一の形状、面積及び厚さをもつ複数個
（通常、１０〜２０個程度）の平面形状が扇形の固形砥
石片を、その砥石面が同一平面を構成する円板状物を形
作るとともに該円板状の中心から外周縁に向う放射状流
路を隣接する各砥石片の両側間に形成するように、間隔
をおいて配置し固定してなるラッピング円盤を備えた平
面研磨装置が実用されていることも知られている。この
形式の平面研磨装置にあっては、研磨時に供給される研
磨液並びに研磨屑や脱離砥粒がラッピング円盤の回転に
よって生じる遠心力によって前記放射状流路を通じてス
ムーズに外部に排出できるという利点や同一形状と同一
厚さをもつ一種類の固形砥石を予備品として用意してお
けばよいという利点があることもよく知られている。な
お、前記平面形状扇形固形砥石片を円形ラッピング定盤
に固定するに当っては、一般に、該固形砥石片の裏面に
当該固形砥石片の平面形状と同一形状の取付板片を固着
し、この取付板片をボルト等を用いて着脱自在に円形ラ
ッピング定盤に固定するという手段が採られており、こ
れは破損した砥石片の交換を容易にするためである。[0003] Among the latter, a plurality of (usually about 10 to 20) solid whetstone pieces having a fan-shaped planar shape having the same shape, area and thickness are provided on a circular lapping plate. Form a disk-shaped object whose grinding wheel surface constitutes the same plane and form a radial flow path from the center of the disk-shaped material to the outer peripheral edge between the two sides of each adjacent grinding wheel piece, and arrange them at intervals. It is also known that a flat surface polishing apparatus having a fixed lapping disk is in practical use. In this type of surface polishing apparatus, the polishing liquid supplied at the time of polishing and the polishing debris and the desorbed abrasive grains can be smoothly discharged to the outside through the radial flow path by the centrifugal force generated by the rotation of the lapping disk. It is also well known that there is an advantage that one kind of solid grindstone having the same shape and the same thickness may be prepared as a spare part. Incidentally, in fixing the flat-shaped fan-shaped solid whetstone piece to the circular lapping platen, generally, a mounting plate piece of the same shape as the flat shape of the solid whetstone piece is fixed to the back surface of the solid whetstone piece, A means of detachably fixing the mounting plate piece to the circular lapping platen with bolts or the like is adopted, and this is for facilitating replacement of the broken whetstone piece.
【０００４】従来、前記形式の平面研磨装置に使用され
ている平面形状扇形固形砥石片の砥石面に溝を設けるこ
とによって、研磨液等の外部への排出をよりスムーズな
ものにしようとする試みがなされている。例えば、「雑
誌・機械設計・1984年11月臨時増刊号・Ｐ５７〜６０・
日刊工業新聞社」に各種のウエハ研磨装置が紹介されて
おり、その「第６０頁の写真２」には、前記形式の平面
研磨装置に使用されている平面形状扇形固形砥石片の砥
石面に該砥石片の一側縁から他側縁に延びる斜溝を設け
たものが示されており、また、特公平３−７３４２５号
公報の第１図及び第２図には、前記形式の平面研磨装置
に使用されている平面形状扇形固形砥石片の砥石面に該
砥石片の一側縁から他側縁に延びて当該砥石片を斜めに
上（円板状物の中心方向）下（円板状物の外周縁方向）
二分割している砥石裏面に開口する斜溝を設けたものが
開示されている。Conventionally, an attempt is made to make the discharge of polishing liquid or the like to the outside smoother by providing a groove on the grindstone surface of a flat-shaped fan-shaped solid grindstone piece used in the above-mentioned type of flat polishing apparatus. Has been done. For example, “Magazine / Mechanical Design / November 1984 Special Issue / P57-60.
The Nikkan Kogyo Shimbun Co., Ltd. has introduced various types of wafer polishing equipment. In "Photo 2 on page 60", the surface of the flat-shaped fan-shaped solid whetstone used in the above-mentioned type of flat polishing equipment is shown. A grindstone piece provided with an oblique groove extending from one side edge to the other side edge is shown, and in FIGS. 1 and 2 of Japanese Patent Publication No. 3-73425, flat polishing of the type described above is shown. On the grindstone surface of the flat-shaped fan-shaped solid grindstone piece used in the apparatus, the grindstone piece extends from one side edge to the other side edge, and the grindstone piece is obliquely up (in the direction of the center of the disk-shaped object) down (disk). (Outer peripheral edge direction)
It is disclosed that an inclined groove is provided on the rear surface of the grindstone that is divided into two.
【０００５】[0005]
【発明が解決しようとする課題】本発明者は、永年にわ
たって、前記形式の平面研磨装置に使用されている平面
形状扇形固形砥石片の砥石面に設ける溝の位置や形状と
研磨液等の外部への排出作用との関係について系統的な
研究を行っているが、その途上において、前掲従来の斜
溝には次の通りの問題点が内在していることを知った。DISCLOSURE OF THE INVENTION The present inventor has, for many years, been aware of the position and shape of grooves provided on the grindstone surface of a flat-shaped fan-shaped solid grindstone piece used in the above-mentioned type of flat grinding apparatus and the external shape of the polishing liquid. While conducting a systematic study on the relationship with the discharge action to the, it was discovered that the following problems inherent in the above-mentioned conventional ditches are inherent.
【０００６】即ち、図４は、前記形式の平面研磨装置の
ラッピング円盤の代表的な従来例を示す斜視説明図であ
るが、同図に示す通り、このラッピング円盤１の円形ラ
ッピング定盤２には同一の形状、面積及び厚さをもつ１
０個の平面形状扇形固形砥石片３、３１、３２…が、そ
の各砥石面４、４１、４２…が同一平面を構成する円板
状物（図中矢印Ａ）を形作るとともに該円板状物の中心
から外周縁に向う放射状流路５、５１…を各砥石片の両
側縁３ａ、３ｂ、３１ａ、３１ｂ…間に形成するよう
に、間隔をおいて配置し固定されており、更に、各砥石
面４、４１、４２…には、それぞれ、砥石片３、３１…
の一側縁３ａ、３１ａ…から他側縁３ｂ，３１ｂ…に延
びて該砥石片３、３１…を斜めに上下二分割している砥
石裏面に開口する斜溝６、６１、６２…が設けられてい
る。なお、同図において、７、７１、７２…は、それぞ
れ、各砥石片３、３１、３２…の裏面に固着された取付
板片であり、この取付板片７、７１、７２…は円形ラッ
ピング定盤２にボルト（図示せず）によって着脱自在に
固定されている。That is, FIG. 4 is a perspective explanatory view showing a typical conventional lapping disk of the above-mentioned type flat polishing apparatus. As shown in FIG. 4, a circular lapping plate 2 of this lapping disk 1 is used. Have the same shape, area and thickness 1
0 pieces of planar fan-shaped solid whetstone pieces 3, 31, 32, ... Form a disc-shaped object (arrow A in the figure) in which the respective whetstone surfaces 4, 41, 42 ... Are arranged and fixed at intervals so as to form the radial flow paths 5, 51 ... From the center of the object toward the outer peripheral edge between the side edges 3a, 3b, 31a, 31b. Each of the grindstone surfaces 4, 41, 42, ...
.. extending from one side edge 3a, 31a ... to the other side edge 3b, 31b ... and obliquely dividing the grindstone piece 3, 31. Has been. In the figure, reference numerals 7, 71, 72, ... Are mounting plate pieces fixed to the back surface of the respective grindstone pieces 3, 31, 32, ..., The mounting plate pieces 7, 71, 72. It is detachably fixed to the surface plate 2 with bolts (not shown).
【０００７】本発明者等が行った実験結果によれば、図
４に示すラッピング円盤１を用いて研磨を行った場合に
は、研磨中に生じた研磨屑や脱離砥粒が斜溝６、６１、
６２…内に落ち、ラッピング円盤１の回転により生じる
遠心力によって一側縁３ｂ、３１ｂ…から他側縁３ａ、
３１ａ…に向かって移動して各砥石片３、３１、３２…
間の放射状流路５、５１、５２…に入って該流路を通り
外部へ排出されるが、斜溝６、６１、６２…から放射状
流路５、５１、５２…への移動には流路の方向変化があ
り、この時、研磨屑や脱離砥粒は隣の砥石片の側面に当
たるため、放射状流路５、５１、５２…を通って外部へ
向かうと同時に一部が内部へも向って流れて、かなりの
量の研磨屑や脱離砥粒が斜溝６、６１、６２…中や放射
状流路５、５１、５２…中に堆積し、次第に排出効果が
低下することを確認した。このため、砥石片３、３１、
３２…の斜溝６、６１、６２…の周辺部分や放射状流路
５、５１、５２…の側縁部分の気孔内に研磨屑や脱離砥
粒が入り込み、目詰まりを生ずるのである。According to the results of experiments conducted by the inventors of the present invention, when the lapping disk 1 shown in FIG. 4 is used for polishing, the polishing dust and desorbed abrasive grains generated during polishing are inclined grooves 6 , 61,
62 fall inside 62, and due to the centrifugal force generated by the rotation of the lapping disk 1, the one side edges 3b, 31b ...
31a ... Moving toward the respective grindstone pieces 3, 31, 32 ...
Between the oblique grooves 6, 61, 62, ..., and the radial flow paths 5, 51, 52, ... There is a change in the direction of the path, and at this time, polishing debris and desorbed abrasive particles hit the side surface of the adjacent grindstone piece, so that some of them go inside through the radial flow paths 5, 51, 52, ... It was confirmed that a considerable amount of polishing debris and desorbed abrasive grains flowed toward the inside of the slanted grooves 6, 61, 62 ... and the radial flow paths 5, 51, 52, ..., and the discharge effect gradually decreased. did. Therefore, the grindstone pieces 3, 31,
32. The polishing debris and the desorbed abrasive grains enter the pores of the peripheral portions of the oblique grooves 6, 61, 62 ... of 32 and the side edge portions of the radial flow paths 5, 51, 52, and cause clogging.
【０００８】固形砥石に目詰まりが生じると、研磨能率
の低下が起きるとともに、被研磨体に有害な深い疵を生
じさせる危険があり、更に、目詰まり部分は他の砥石部
分より硬度が硬くなり固形砥石に偏磨耗が生じて被研磨
体の平坦度が悪くなる問題点がある。また、放射状流路
５、５１、５２…と斜溝６、６１、６２…との各交差部
に形成される砥石角部の存在は、その数が増加すればす
る程、被研磨体の引掛りや砥石破損を引起す蓋然性が大
きくなり、これが要因で被研磨体の平坦度の悪化や有害
な深い疵を発生させるという問題点もある。本発明は、
前記諸問題点に鑑み、研磨時に生じる研磨屑や脱離砥粒
の外部への排出を充分に行なうことができ、被研磨体の
平坦度の向上、疵の発生防止及び研磨能率の維持がはか
れる平面研磨装置を提供することを技術的課題とするも
のである。When the solid grindstone is clogged, the polishing efficiency is lowered, and there is a risk of causing deep scratches that are harmful to the object to be polished. Further, the clogged portion is harder than the other grindstone portions. There is a problem that uneven wear occurs on the solid whetstone and the flatness of the object to be polished deteriorates. Further, the existence of the grindstone corners formed at the intersections of the radial flow paths 5, 51, 52 ... And the slanted grooves 6, 61, 62. There is also a problem that the probability of causing damage to the grindstone increases, which causes deterioration of the flatness of the object to be polished and harmful deep flaws. The present invention is
In view of the above problems, it is possible to sufficiently discharge polishing scraps and desorbed abrasive grains generated during polishing to the outside, improve flatness of an object to be polished, prevent scratches from occurring, and maintain polishing efficiency. It is a technical object to provide a surface polishing apparatus.
【０００９】[0009]
【課題を解決するための手段】前記技術的課題は、次の
通りの本発明によって達成できる。図１は、本発明に係
る平面研磨装置におけるラッピング円盤の構成を示す斜
視説明図であり、図２は本発明に係る平面研磨装置にお
けるラッピング円盤に使用する固形砥石片の構成を示す
斜視説明図であり、図３は、そのＡ−Ａ′線断面説明図
である。The above technical problems can be achieved by the present invention as follows. FIG. 1 is a perspective explanatory view showing a configuration of a lapping disk in a flat surface polishing apparatus according to the present invention, and FIG. 2 is a perspective explanatory view showing a configuration of a solid whetstone used for the lapping disk in a flat surface polishing apparatus according to the present invention. FIG. 3 is a cross-sectional explanatory view taken along the line AA ′.
【００１０】即ち、本発明は、図１〜３に示す通り、円
形ラッピング定盤２に同一の形状、面積及び厚さをも
ち、且つ、砥石面に溝が設けられている複数個の平面形
状扇形固形砥石片３、３１、３２…を、その各砥石面
４、４１、４２…が同一平面を構成する円板状物（図１
中の矢印Ａ）を形作るとともに該円板状物の中心から外
周縁に向う放射状流路５、５１…を各砥石片の両側縁３
ａ、３ｂ、３１ａ、３１ｂ…間に形成するように、間隔
をおいて配置し固定してなるラッピング円盤１を備えた
平面研磨装置において、前記複数個の平面形状扇形固形
砥石片の各砥石面４、４１、４２…に設けられている全
ての溝３、３１、３２…が、それぞれ、外周円弧縁３
ｃ、３１ｃ、３２ｃ…からこれに接する一側縁３ｂ、３
１ｂ、３２ｂ…に向って斜めに延びているが該側縁端に
は到っていない砥石裏面に開口する直線状溝６′、６
１′、６２′…であることを特徴とする平面研磨装置で
ある。なお、直線状溝６′の巾は５〜１５ｍｍ程度に、
直線状溝６′の先端から上記側縁端までの距離は１０〜
２０ｍ−程度に、それぞれ設定することが好ましい。That is, according to the present invention, as shown in FIGS. 1 to 3, the circular lapping platen 2 has the same shape, area and thickness.
A disk-shaped object in which a plurality of flat-shaped fan-shaped solid whetstone pieces 3, 31, 32, ... In which grooves are provided on the whetstone surface, and the whetstone surfaces 4, 41, 42, ... (Fig. 1
The arrow A) in the inside is formed and the radial flow paths 5, 51, ...
a, 3b, 31a, so as to form between 31b ..., in the surface polishing apparatus having a lapping disc 1 formed of a fixed and spaced apart, each grinding wheel surfaces of said plurality of planar shape fan solid pieces of grindstone All provided in 4, 41, 42 ...
All the grooves 3 , 31, 32 ...
c, 31c, 32c ... One side edge 3b, 3 which contacts this
Straight grooves 6 ', 6 which extend obliquely toward 1b, 32b ...
1 ', 62' ... is a surface polishing apparatus according to claim der Rukoto. The width of the linear groove 6'is about 5 to 15 mm,
The distance from the tip of the linear groove 6'to the side edge is 10
It is preferable to set each to about 20 m-.
【００１１】本発明に係る平面研磨装置にあっては、平
面形状扇形固形砥石片３の裏面に該砥石片３、３１、３
２…の平面形状と同一形状の取付板片７、７１、７２…
が固着されており、当該取付板片７、７１、７２…が着
脱自在に円形ラッピング定盤２に固定されている態様を
採ることができる。In the surface polishing apparatus according to the present invention, the grinding stone pieces 3, 31, 3 are provided on the back surface of the planar fan-shaped solid grinding stone piece 3.
Mounting plate pieces 7, 71, 72 having the same shape as the planar shape of 2 ...
Can be fixed, and the mounting plate pieces 7, 71, 72, ... Can be detachably fixed to the circular lapping platen 2.
【００１２】また、本発明に係る平面研磨装置には、平
面形状扇形固形砥石片の砥石面４に設けられている全て
の溝が、外周円弧縁３ｃ、３１ｃ、３２ｃ…からこれに
接する一側縁３ｂ、３１ｂ、３２ｂ…に向って斜めに延
びているが該側縁端には到っていない砥石裏面に開口す
る直線状溝６′である平面形状扇形固形砥石片３を使用
する。The flat polishing apparatus according to the present invention has a flat surface.
All provided on the grindstone surface 4 of the surface-shaped fan-shaped solid grindstone
Groove extends obliquely from the outer circumferential arc edge 3c, 31c, 32c ... To the one side edge 3b, 31b, 32b. using the linear grooves 6 'planar shape sectorial solid pieces of grindstone 3 Ru der.
【００１３】なお、本発明に係る平面研磨装置及び該装
置に使用する平面形状扇形固形砥石片は、砥石面に設け
る溝の位置と形状以外は、全て周知の技術手段によって
構成されている。The planar polishing apparatus according to the present invention and the planar fan-shaped solid whetstone pieces used in the apparatus are all constructed by well-known technical means except for the position and shape of the grooves provided on the surface of the whetstone.
【００１４】[0014]
【作用】本発明に係る平面研磨装置においては、ラッピ
ング円盤１を回転しつつ研磨作業を行う時、固形砥石の
作用による研磨屑や脱離砥粒は、供給される研削液中に
懸濁した状態で砥石面を流れて該面に形成された直線状
溝６′、６１′、６２′…中に流れ込み、当該溝６′、
６１′、６２′…の下（円板状物の外周縁方向）部はラ
ッピング円盤１外に開口しているから、流路の方向変化
がなく、各砥石片３、３１、３２…より直接ラッピング
円盤１外に勢いよく排出される。その結果、直線状溝
６′、６１′、６２′…中や放射状流路５、５１、５２
…中への研磨屑や脱離砥粒の堆積量は殆んど零となり、
砥石の気孔中への目詰まりが可及的に抑制され、研磨能
率の維持と被研磨体の面状態と精度の向上をもたらすと
ともに研磨能率の維持がはかれる。In the flat surface polishing apparatus according to the present invention, when the lapping disk 1 is rotated to perform the polishing operation, the polishing debris and the desorbed abrasive grains due to the action of the solid grindstone are suspended in the supplied grinding fluid. In a state where it flows through the grindstone surface and into the linear grooves 6 ', 61', 62 '...
Since the lower portions of 61 ', 62' ... (in the direction of the outer peripheral edge of the disk-shaped object) are open to the outside of the lapping disk 1, there is no change in the direction of the flow path, and the grinding stone pieces 3, 31, 32 ... It is ejected vigorously out of the lapping disk 1. As a result, the straight grooves 6 ', 61', 62 '... and the radial flow paths 5, 51, 52.
… The amount of polishing debris and desorption abrasive grains deposited inside is almost zero,
The clogging of the grindstone into the pores is suppressed as much as possible, the polishing efficiency is maintained, the surface condition of the object to be polished and the accuracy are improved, and the polishing efficiency is maintained.
【００１５】更に、平面形状扇形固形砥石片３、３１、
３２…の両側縁（面）３ａ、３ｂ、３１ａ、３１ｂ…に
は溝が開口していないから、直線状溝６′、６１′、６
２′…と放射状流路５、５１、５２…との交差部分が無
く、交差部分が存在する場合に形成される砥石角部もな
いため、被研磨体の引掛りや砥石破壊を引起す蓋然性が
極めて小さくなり、破壊した砥石による有害な深い疵の
発生の防止と被研磨体の平坦度の向上がはかれる。Further, the flat-shaped fan-shaped solid whetstone pieces 3, 31,
Since the grooves are not opened on both side edges (faces) 3a, 3b, 31a, 31b of 32 ..., Straight grooves 6 ', 61', 6
Since there is no intersection between 2 '... and the radial flow paths 5, 51, 52 ..., and there is no corner portion of the grindstone formed when the intersection exists, there is a possibility of causing catching of the object to be polished or destruction of the grindstone. It becomes extremely small, and it is possible to prevent the generation of harmful deep flaws due to the broken grindstone and improve the flatness of the object to be polished.
【００１６】また、研削液の流れがよいため冷却効果が
よく、熱による砥石物性変化や被研磨体の反りなどが発
生しない。Further, since the flow of the grinding fluid is good, the cooling effect is good, and the physical properties of the grindstone and the warp of the object to be polished due to heat do not occur.
【００１７】[0017]
【実施例】本発明を実施例と従来例によって詳細に説明
すれば、次の通りである。EXAMPLES The present invention will be described in detail below with reference to examples and conventional examples.
【００１８】実施例 （１）平面形状扇形固形砥石片の製作 常法に従がい、平均粒径４．０μm （砥粒番手３０００
番）の炭化珪素粉末を９．０体積％含有しポリビニルア
ルコール系樹脂を結合剤とする微細連通気孔を有する三
次元網状構造をなすＰＶＡ砥石を作成し、これにフェノ
ール系樹脂、メラミン系樹脂を含浸硬化させて固形砥石
とした。この固形砥石は、気孔率を約８０体積％、厚さ
は４５mmとした。上記固形砥石を切断して同一の形状、
面積及び厚さをもつ平面形状扇形固形砥石片を８０個製
作した。この砥石片１個の砥石面の面積は４２１．８cm
2 とした。 （２）溝の形成 上記砥石片４０個のそれぞれ砥石面に、図２に示す通
り、外周円弧縁からこれに接する一側縁に向って斜めに
延びているが該側縁端には到っていない砥石裏面に開口
する直線状溝を設けた。この溝の巾は５mmとした。ま
た、この溝の先端から上記側縁端までの距離は２０mmと
した。Example (1) Manufacture of a flat-shaped fan-shaped solid whetstone piece, according to a conventional method, an average grain size of 4.0 μm (abrasive grain count 3000)
No.) containing 9.0 volume% of silicon carbide powder and having a three-dimensional network structure having fine interconnecting pores using polyvinyl alcohol resin as a binder, a PVA grindstone having a three-dimensional network structure is prepared, and a phenol resin and a melamine resin are added thereto. It was impregnated and cured to obtain a solid whetstone. This solid grindstone had a porosity of about 80% by volume and a thickness of 45 mm. The same shape by cutting the solid grindstone,
Eighty pieces of planar fan-shaped solid whetstone pieces having an area and a thickness were manufactured. The area of the surface of one grindstone is 421.8 cm
2 (2) Groove formation As shown in FIG. 2, on each of the 40 grinding wheel pieces, the grinding wheel surface extends obliquely from the outer circumferential arc edge toward one side edge in contact therewith, but reaches the side edge. A straight groove that opens on the back side of the grindstone was provided. The width of this groove was 5 mm. The distance from the tip of this groove to the side edge is 20 mm.
【００１９】（３）円形ラッピング定盤への装着 面積８５８８．６cm2 の上定盤（内周ギアと外周ギアと
の間隔は１６インチ）と同面積の下定盤（同上）とのそ
れぞれに、上記砥石片を２０個づつ、図１に示す如く、
その砥石面が同一平面を構成する円板状物を形作るとと
もに該円板状物の中心から外周縁に向う巾５mmの流路を
各砥石片の両側間に形成するように、配置して装着し
た。なお、装着に当っては、各砥石片の裏面に、図２と
図３に示す通り、該砥石片の平面形状と同一形状のアル
ミニウム製取付板片を接着剤によって固着し、この取付
板片を砥石片に穿ったボルト挿入孔８（第１図において
は、この孔８を省略し図示していない）ボルト９を用い
て着脱自在に各定盤に固定した。(3) Mounting on a circular lapping platen Each of an upper platen having an area of 8588.6 cm 2 (the distance between the inner peripheral gear and the outer peripheral gear is 16 inches) and a lower platen having the same area (same as above), As shown in FIG. 1, 20 pieces of the above-mentioned grindstones,
The grindstone surface forms a disk-shaped object which constitutes the same plane, and the wheel-shaped surface is arranged and mounted so that a flow path of 5 mm width extending from the center of the disk-shaped object to the outer peripheral edge is formed between both sides of each wheel. did. In addition, upon mounting, an aluminum mounting plate piece having the same shape as the planar shape of the whetstone piece is fixed to the back surface of each whetstone piece with an adhesive as shown in FIGS. A bolt insertion hole 8 (not shown in FIG. 1 for omitting the hole 8) formed in a grindstone piece was detachably fixed to each surface plate.
【００２０】（４）研磨作業 周知のラッピング研磨装置のラッピング円盤として上記
各円形ラッピング定盤を使用し、外形９５mm、内径２５
mm、厚さ０．８mmのドーナッツ型アルミニウム板４０枚
を被研磨体として、当該被研磨体４０枚を同時に下記研
磨条件によって研磨した。 定盤回転数 ： 上定盤 １５ｒ．ｐ．ｍ 下定盤 ４５ｒ．ｐ．ｍ 研磨圧力 ： ８０ ｇ／cm2 研磨液 ： ディスクカット （商品名：株式会
社 フジミインコーポレーテッド製） 研磨液供給量 ： １５ l／分 研磨時間・１回： １分(4) Polishing work Each of the above circular lapping plates is used as a lapping disk of a well-known lapping and polishing machine, and the outer diameter is 95 mm and the inner diameter is 25.
40 donut type aluminum plates having a thickness of 0.8 mm and a thickness of 0.8 mm were used as the objects to be polished, and the 40 objects to be polished were simultaneously polished under the following polishing conditions. Plate rotation speed: Upper plate 15r. p. m lower surface plate 45r. p. m Polishing pressure: 80 g / cm 2 Polishing liquid: Disc cut (Product name: made by Fujimi Incorporated) Polishing liquid supply rate: 15 l / min Polishing time: 1 time: 1 min
【００２１】（５）測定 上記研磨条件にて、２０回研磨し、毎回２枚づつアルミ
ニウム板を抜き取り、４０枚全てについて研削量と平坦
度を測定した。なお、研削量は片面の研削量（２枚の平
均値）を求めた。また、目視によって全数検査を行い
「不良」と判定される深い疵の発生状態をチェックし
た。(5) Measurement Under the above-mentioned polishing conditions, polishing was performed 20 times, two aluminum plates were taken out each time, and the grinding amount and the flatness of all 40 sheets were measured. As the grinding amount, the grinding amount on one side (average value of two sheets) was obtained. In addition, 100% inspection was performed by visual inspection to check the state of occurrence of deep scratches that were judged as "defective".
【００２２】（６）結果 研削量と「不良」と判断した深い疵の発生数を表１に示
した。(6) Results Table 1 shows the amount of grinding and the number of deep flaws judged to be "defective".
【００２３】また、平坦度は、４０枚の平均値が６．１
８μm であって標準偏差（σn-1 ）は１．１４μm であ
った。平坦度分布の測定結果を図５にヒストグラムにし
て統計解析値とともに示した。The average flatness of 40 sheets is 6.1.
It was 8 μm and the standard deviation (σ n-1 ) was 1.14 μm. The measurement result of the flatness distribution is shown in FIG. 5 as a histogram together with the statistical analysis values.
【００２４】比較例 （１′）平面形状扇形固形砥石片の製作 実施例における（１）で製作した固形砥石片４０個を使
用した。 （２′）溝の形成 上記砥石片４０個のそれぞれ砥石面に、図４に示す通
り、一側縁から他側縁に延びて該砥石片を斜めに上下二
分割している砥石裏面に開口する斜溝を設けた。この溝
の巾は５mmとした。 （３′）円形ラッピング定盤への装着 上記の斜溝を設けた砥石片を用いた以外は実施例におけ
る（３）と全く同様に行った。 （４′）研磨作業 上記の斜溝を設けた砥石片を用いた以外は実施例におけ
る（４）と全く同様に行った。 （５′）測定 実施例における（５）と全く同様に行った。 （６′）結果 研削量と「不良」と判断した深い疵の発生数を表１に示
した。Comparative Example (1 ') Manufacture of Planar-Shaped Fan-Shaped Solid Grinding Stone Pieces 40 solid grinding stone pieces manufactured in (1) of the example were used. (2 ') Formation of groove On each of the grindstone surfaces of the 40 grindstone pieces, as shown in FIG. 4, an opening is formed on the rear surface of the grindstone that extends from one side edge to the other side edge and divides the grindstone piece diagonally into upper and lower parts. A diagonal groove is provided. The width of this groove was 5 mm. (3 ') Mounting on circular lapping platen The procedure was exactly the same as (3) in Example except that the grindstone piece provided with the oblique groove was used. (4 ') Polishing work Except for using the grindstone piece having the above-mentioned oblique grooves, the polishing operation was exactly the same as (4) in the example. (5 ') Measurement The measurement was performed in exactly the same manner as (5) in the example. (6 ') Results Table 1 shows the amount of grinding and the number of deep defects judged to be "defective".
【００２５】また、平坦度は４０枚の平均値が７．２８
μm であって標準偏差（σn-1 ）は１．３３μm であっ
た。平坦度分布の測定結果を図５にヒストグラムにして
統計解析値とともに示した。The average flatness of 40 sheets is 7.28.
The standard deviation (σ n-1 ) was 1.33 μm. The measurement result of the flatness distribution is shown in FIG. 5 as a histogram together with the statistical analysis values.
【００２６】[0026]
【表１】 [Table 1]
【００２７】[0027]
【発明の効果】以上説明した通りの構成・作用によっ
て、実施例にも示したように、本発明によれば被研磨体
の平坦度の向上、疵の発生防止及び研磨能率の維持がは
かれる。また、本発明によれば、砥石の破壊が防止でき
る。更に、本発明は、砥石面に形成する溝の形状を変更
するだけで実施できるので、コスト的にも極めて有利で
ある。According to the present invention, the flatness of the object to be polished, the occurrence of flaws, and the polishing efficiency can be maintained by the constitution and operation as described above, as shown in the examples. Further, according to the present invention, breakage of the grindstone can be prevented. Further, since the present invention can be carried out only by changing the shape of the groove formed on the surface of the grindstone, it is extremely advantageous in terms of cost.
【図１】本発明に係る平面研磨装置におけるラッピング
円盤の構成を示す斜視説明図FIG. 1 is a perspective explanatory view showing a configuration of a lapping disk in a flat surface polishing apparatus according to the present invention.
【図２】本発明に係る平面研磨装置におけるラッピング
円盤に使用する固形砥石片の構成を示す斜視説明図FIG. 2 is a perspective explanatory view showing a configuration of a solid whetstone piece used for a lapping disk in a flat surface polishing apparatus according to the present invention.
【図３】図２のＡ−Ａ′線断面説明図3 is a cross-sectional explanatory view taken along the line AA ′ of FIG.
【図４】従来の平面研磨装置におけるラッピング円盤の
構成を示す斜視説明図FIG. 4 is an explanatory perspective view showing a configuration of a lapping disk in a conventional flat surface polishing apparatus.
【図５】実施例並びに比較例における平坦度分布の測定
結果を示したヒストグラム図FIG. 5 is a histogram diagram showing measurement results of flatness distributions in Examples and Comparative Examples.
１ ラッピング円盤 ２ 円形ラッピング
定盤 ３ 平面形状扇形固形砥石片 ３ａ 側縁
３ｂ 側縁 ３ｃ 外周円弧縁 ４ 砥石面
５ 流路 ６ 斜溝 ６′ 直線状溝
７ 取付片 ８ ボルト挿入孔 ９ ボルト1 Lapping disk 2 Circular lapping plate 3 Planar fan-shaped solid whetstone piece 3a Side edge
3b Side edge 3c Perimeter arc edge 4 Grindstone surface
5 Flow path 6 Oblique groove 6'Linear groove
7 Mounting piece 8 Bolt insertion hole 9 Bolt
───────────────────────────────────────────────────── フロントページの続き (72)発明者 桜井 均 北海道苫小牧市晴海町43番地３ 日本軽金 属株式会社 苫小牧製造所内 (72)発明者 北島 英一 京都府京都市南区吉祥院御池町18番地 日 本特殊研砥株式会社内 (72)発明者 小林 裕始 京都府京都市南区吉祥院御池町18番地 日 本特殊研砥株式会社内 (56)参考文献 特開 昭60−242975（ＪＰ，Ａ) 特開 昭63−116747（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hitoshi Sakurai 43-3 Harumi-cho, Tomakomai-shi, Hokkaido 3 Japan Light Metals Co., Ltd. Tomakomai Plant (72) Inventor Eiichi Kitajima 18 Kichishoin Miike-cho, Minami-ku, Kyoto-shi, Kyoto Prefecture In the Nihon Special Grinding Co., Ltd. (72) Inventor Hiroshi Kobayashi 18 Miike-cho, Kichijoin, Minami-ku, Kyoto City, Kyoto Prefecture (56) In the Nihon Special Grinding & Co., Ltd. (56) ) JP-A-63-116747 (JP, A)
Claims (3)
及び厚さをもち、且つ、砥石面に溝が設けられている複
数個の平面形状扇形固形砥石片を、その各砥石面が同一
平面を構成する円板状物を形作るとともに該円板状物の
中心から外周縁に向う放射状流路を各砥石片両側縁間に
形成するように、間隔をおいて配置し固定してなるラッ
ピング円盤を備えた平面研磨装置において、前記複数個
の平面形状扇形固形砥石片の各砥石面に設けられている
全ての溝が、それぞれ、外周円弧縁からこれに接する一
側縁に向って斜めに延びているが該側縁端には到ってい
ない砥石裏面に開口する直線状溝であることを特徴とす
る平面研磨装置。1. A circular lapping plate into the same shape, Chi also the area and thickness, and, a multi <br/> several planar shape fan solid grindstone pieces are grooves provided on the grinding surface, the Form a disk-shaped object in which each grindstone surface constitutes the same plane, and arrange them at intervals so as to form a radial flow path from the center of the disk-shaped object to the outer peripheral edge between both side edges of each grindstone piece. In a flat surface polishing apparatus having a fixed lapping disk, the flat surface polishing tool is provided on each of the plurality of planar fan-shaped solid whetstone pieces .
Wherein all of the grooves, respectively, but extends obliquely toward the one side edge in contact with it from the outer peripheral arcuate edge straight groove der Rukoto open to grinding the back side that is not led to the side edge Plane polishing device.
片の平面形状と同一形状の取付板片が固着されており、
当該取付板片が着脱自在に円形ラッピング定盤に固定さ
れている請求項１記載の平面研磨装置。2. An attachment plate piece having the same shape as the plane shape of the grindstone piece is fixed to the back surface of the flat-shaped fan-shaped solid grindstone piece,
The surface polishing apparatus according to claim 1, wherein the mounting plate piece is detachably fixed to a circular lapping platen.
られている全ての溝が、外周円弧縁からこれに接する一
側縁に向って斜めに延びているが該側縁端には到ってい
ない砥石裏面に開口する直線状溝であることを特徴とす
る請求項１記載の平面研磨装置に使用する扇形固形砥石
片。3. A flat-shaped fan-shaped solid whetstone is provided on the whetstone surface of the whetstone.
All the grooves that are found a linear groove der Rukoto but extends obliquely toward the one side edge in contact with it from the outer peripheral arcuate edge which is open to the grindstone back surface that is not led to the side edge A fan-shaped solid whetstone piece used in the flat polishing apparatus according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4309642A JPH0741539B2 (en) | 1992-10-22 | 1992-10-22 | Surface polishing device and fan-shaped solid whetstone piece used for the device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4309642A JPH0741539B2 (en) | 1992-10-22 | 1992-10-22 | Surface polishing device and fan-shaped solid whetstone piece used for the device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06134674A JPH06134674A (en) | 1994-05-17 |
| JPH0741539B2 true JPH0741539B2 (en) | 1995-05-10 |
Family
ID=17995502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4309642A Expired - Fee Related JPH0741539B2 (en) | 1992-10-22 | 1992-10-22 | Surface polishing device and fan-shaped solid whetstone piece used for the device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0741539B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100528483C (en) * | 2005-03-29 | 2009-08-19 | 株式会社捷太格特 | Superfinishing grind stone and superfinishing method using the same |
| US10586708B2 (en) * | 2017-06-14 | 2020-03-10 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Uniform CMP polishing method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60242975A (en) * | 1984-05-14 | 1985-12-02 | Kanebo Ltd | Surface grinding device |
| JPS63116747A (en) * | 1986-11-04 | 1988-05-21 | 増田 恒男 | Segment type new ceramic material grinding stone |
-
1992
- 1992-10-22 JP JP4309642A patent/JPH0741539B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06134674A (en) | 1994-05-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19951107 |
|
| LAPS | Cancellation because of no payment of annual fees |