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JPH02275314A - Inductosyn substrate - Google Patents

Inductosyn substrate

Info

Publication number
JPH02275314A
JPH02275314A JP9696189A JP9696189A JPH02275314A JP H02275314 A JPH02275314 A JP H02275314A JP 9696189 A JP9696189 A JP 9696189A JP 9696189 A JP9696189 A JP 9696189A JP H02275314 A JPH02275314 A JP H02275314A
Authority
JP
Japan
Prior art keywords
substrate
coil patterns
patterns
inductosyn
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9696189A
Other languages
Japanese (ja)
Inventor
Naohisa Inoue
直久 井上
Takashi Niwa
孝志 丹羽
Keisuke Konishi
圭介 小西
Tomiyoshi Yoshida
吉田 富省
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp, Omron Tateisi Electronics Co filed Critical Omron Corp
Priority to JP9696189A priority Critical patent/JPH02275314A/en
Publication of JPH02275314A publication Critical patent/JPH02275314A/en
Pending legal-status Critical Current

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  • Switches That Are Operated By Magnetic Or Electric Fields (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)

Abstract

PURPOSE:To enhance the sensitivity of a displacement sensor and to make it possible to make the substrate compact by determining the number of paths of coil patterns which are arranged on an inductosyn substrate alternately as two outgoing and returning paths or more. CONSTITUTION:Two coil patterns 11 and 12 are formed with copper foils through an insulating film on a metal plate on an inductosyn substrate at a scale part. Sine wave currents in a phase A and a phase B whose phases are shifted by 90 degrees to each other are conducted through said patterns. The similar pattern is provided on the side of another slider. The patterns 11 and 12 are formed along two outgoing and returning paths (4 paths) alternately. Therefore, a useless region in the displacement direction can be decreased to 33 - 20% in comparison with conventional one path. As a result, the arranging density of the coil patterns becomes large, the output power of the coil pattern on the side of the slider is increased and the detecting sensitivity of the displacement sensor can be improved.

Description

【発明の詳細な説明】 (発明の分野) この発明は、電磁誘導方式より変位を検出する変位セン
サに用いられるインダクトシン基板に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of the Invention) The present invention relates to an inductosin substrate used in a displacement sensor that detects displacement using an electromagnetic induction method.

(発明の概要) この発明は、位相の90度異なる正弦波がそれぞれ通電
されるコイルパターンのパス数をそれぞれ2往復以上に
して、インダクトシン基板の感度を高め、小型化可能に
したものである。
(Summary of the Invention) This invention increases the sensitivity of the inductosin board and enables miniaturization by increasing the number of passes of each coil pattern, through which sine waves having phases different by 90 degrees are energized, to two or more round trips. be.

(従来技術とその問題点) 周知のように電磁誘導方式により変位を検出する変位セ
ンサに用いられるインダクトシン基板は、検出対象に追
随するスライダ部と、センサ本体に固定されているスケ
ール部の双方に設けられる。
(Prior art and its problems) As is well known, the inductosyn board used in a displacement sensor that detects displacement by electromagnetic induction has a slider part that follows the detection target and a scale part that is fixed to the sensor body. Provided on both sides.

通常スケール部に用いられるインダクトシン基板は、第
3図のように、2つのコイルパターン31.32が形成
され、このコイルパターン31゜32に、互いに90度
位相のずれたA相とB相の正弦波電流が通電され、発生
した磁界を他方のスライダ部が変位量に応じて位相のず
れた正弦波として検出するように構成されている。
As shown in Fig. 3, the inductosyn board normally used for the scale part has two coil patterns 31 and 32 formed thereon, and these coil patterns 31 and 32 have an A phase and a B phase that are 90 degrees out of phase with each other. A sine wave current is applied, and the other slider section is configured to detect the generated magnetic field as a sine wave whose phase is shifted according to the amount of displacement.

ところで、スケール部のインダクトシン基板は互いに9
0度位相のずれた正弦波電流が通電されるとともに、図
にも示されるように、変位方向と直角に形成されるコイ
ルパターン31.32が交互に1往復ずつ形成されてい
る。
By the way, the inductosin substrates of the scale part are 9
A sinusoidal current with a phase shift of 0 degrees is applied, and as shown in the figure, coil patterns 31 and 32 formed perpendicular to the displacement direction are alternately formed one round trip at a time.

この往復部は、他方のスライダ部に等間隔で同様に形成
されたコイルパターンのピッチPと同一に、つまり、線
間が1/2Pであるとともに、それぞれコイルパターン
ごとでは変位方向に同一位相で形成され、さらにコイル
パターン31と32では互いに位相が1/4Pずらされ
ている。そのため、両コイルパターン間には余白が生じ
てしまう。この余白には、コイルパターンが形成できな
いため、変位方向における無駄な領域になっている。図
では、基板面の全面に仮想的に等間隔でコイルパターン
を形成した場合に比較し、無駄な領域の比率が33%に
もなり、インダクトシン基板自体がその分天型化されて
しまう問題がある。
This reciprocating part has the same pitch P of the coil patterns similarly formed at equal intervals on the other slider part, that is, the line spacing is 1/2P, and each coil pattern has the same phase in the displacement direction. Further, the phases of the coil patterns 31 and 32 are shifted by 1/4P from each other. Therefore, a blank space is created between both coil patterns. Since a coil pattern cannot be formed in this margin, it is a wasted area in the displacement direction. In the figure, compared to the case where coil patterns are virtually formed at equal intervals over the entire surface of the board, the ratio of wasted area is as much as 33%, and the inductosin board itself is made into a shape corresponding to that amount. There's a problem.

(発明の目的) この発明は上記の問題点を解消するためになされたもの
で、その目的とするところは、無駄な領域の比率を小さ
くして、変位方向におけるコイルパターンの配置密度を
大きくしたインダクトシン基板を提供することにある。
(Objective of the Invention) This invention was made to solve the above problems, and its purpose is to reduce the ratio of wasted areas and increase the arrangement density of coil patterns in the displacement direction. The purpose of the present invention is to provide an inductosin substrate.

(発明の構成と効果) この発明は、上記目的を達成するために、互いに90度
位相のずれた正弦波電流が通電されるとともに互いに1
/4ピッチ位相のずれた2つのコイルパターンを、変位
検出方向上交互に形成配置したインダクトシン基板にお
いて、 交互に配置される上記コイルパターンのパス数をそれぞ
れ2往復以上にしたことを特徴とする。
(Structure and Effects of the Invention) In order to achieve the above object, the present invention provides that sinusoidal currents that are 90 degrees out of phase with each other and that are 1
The invention is characterized by an induct thin board in which two coil patterns having a phase shift of /4 pitch are formed and arranged alternately in the displacement detection direction, and the number of passes of the alternatingly arranged coil patterns is two or more each. do.

この発明は上記のようにパス数をそれぞれ2往復以上に
したコイルパターンが交互に形成されるので、変位方向
におけるコイルパターンの配置密度が大きくなり、その
分、インダクトシン基板の感度が高まると同時に小型化
が可能になる。
In this invention, as described above, coil patterns each having two or more reciprocating passes are formed alternately, so the arrangement density of the coil patterns in the displacement direction increases, and the sensitivity of the inductosyn board increases accordingly. At the same time, miniaturization becomes possible.

その結果、このインダクトシン基板を用いて小型で高性
能な変位センサを実現することができる。
As a result, a compact and high-performance displacement sensor can be realized using this inductosyn substrate.

(実施例) 次にこの発明の実施例を図面に基いて説明する。(Example) Next, embodiments of the present invention will be described based on the drawings.

第1図は、第1実施例のインダクトシン基板を示すパタ
ーン図である。
FIG. 1 is a pattern diagram showing the inductosin substrate of the first embodiment.

図に示したスケール部に用いられるインダクトシン基板
1は、金属板上に絶縁層を介して銅箔により2つのコイ
ルパターン11.12が形成されている。このコイルパ
ターン11.12は、互いに90度位相のずれたA相と
B相の正弦波電流が通電されるとともに、他方のスライ
ダ部(図示しない)°に等間隔で同様に形成されたコイ
ルパターンのピッチPと同一に、つまり、線間が1/2
Pで、しかも、それぞれコイルパターンは変位方向に同
一位相で形成され、さらにコイルパターン11と12で
は互いの位相が1/4Pずれている。
The inductosin substrate 1 used in the scale section shown in the figure has two coil patterns 11 and 12 formed of copper foil on a metal plate with an insulating layer interposed therebetween. These coil patterns 11 and 12 are coil patterns similarly formed at equal intervals on the other slider section (not shown), to which sine wave currents of phase A and phase B, which are 90 degrees out of phase with each other, are energized. is the same as the pitch P, that is, the line spacing is 1/2
P, and each coil pattern is formed with the same phase in the displacement direction, and furthermore, the phases of coil patterns 11 and 12 are shifted from each other by 1/4P.

ここでインダクトシン基板1に、変位方向と直角に形成
されるコイルパターン11.12は、交互に2往復(4
パス)ずつ形成されたことにより、変位方向における無
駄な領域が従来よりも狭められる。図では、基板全面に
仮想的に等間隔でコイルパターンを形成した場合に比較
し、パターンが形成できない領域の比率が20%に低減
される。
Here, the coil patterns 11 and 12 formed perpendicularly to the displacement direction on the inductosin substrate 1 alternately make two reciprocations (four
By forming each pass), the wasted area in the displacement direction is narrower than in the past. In the figure, compared to the case where coil patterns are virtually formed at equal intervals over the entire surface of the substrate, the ratio of areas where no pattern can be formed is reduced to 20%.

第2図は、第2実施例のインダクトシン基板2を示すパ
ターン図である。
FIG. 2 is a pattern diagram showing the inductosin substrate 2 of the second embodiment.

この場合は、第1実施例よりもパス数の多いコイルパタ
ーン21.22を形成したものであり、図に示すように
、交互に3往復(6パス)ずつ形成されたことにより、
基板全面に仮想的に等間隔でコイルパターンを形成した
場合に比較し、パターンが形成できない領域の比率が1
4%に低減される。
In this case, the coil patterns 21 and 22 are formed with a larger number of passes than in the first embodiment, and as shown in the figure, the coil patterns 21 and 22 are formed alternately in three round trips (six passes).
Compared to the case where coil patterns are virtually formed at equal intervals over the entire surface of the board, the ratio of areas where no pattern can be formed is 1.
reduced to 4%.

さらに、図示しない第3の実施例として、コイルパター
ンのパス数を4往復(8バス)ずつにすると、パターン
が形成できない領域の比率は11%に低減される。
Furthermore, as a third embodiment (not shown), if the number of passes of the coil pattern is set to four round trips (eight buses), the ratio of the area where no pattern can be formed is reduced to 11%.

このように、交互に形成されるコイルパターンのパス数
を増していくと、パターンが形成できない領域の比率が
順次低減することができる。
In this way, by increasing the number of passes of coil patterns that are alternately formed, the ratio of areas where no pattern can be formed can be gradually reduced.

その結果、無駄な領域の比率が低下した分、変位方向に
おけるコイルパターンの配置密度が大きくなり、スライ
ダ側コイルパターンでの出力が増し、S/N比が改善さ
れて、変位センサの検出精度を向上させることが可能に
なる。
As a result, the ratio of wasted areas has decreased, and the arrangement density of the coil patterns in the displacement direction has increased, increasing the output of the coil pattern on the slider side, improving the S/N ratio, and improving the detection accuracy of the displacement sensor. It becomes possible to improve.

また同様にインダクトシン基板自体の変位方向の寸法が
短縮されるため、インダクトシン基板を用いる変位セン
サを小型化することも可能になる。
Similarly, since the dimension of the inductosyn substrate itself in the displacement direction is shortened, it is also possible to downsize the displacement sensor using the inductosyn substrate.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の第1の実施例のインダクトシン基板
を示すパターン図、第2図は同じく第2の実施例のイン
ダクトシン基板を示すパターン図、第3図は従来例を示
すパターン図である。 1.2・・・インダクトシン基板
FIG. 1 is a pattern diagram showing an inductosyn board according to the first embodiment of the present invention, FIG. 2 is a pattern diagram showing an inductosyn board according to the second embodiment, and FIG. 3 is a conventional example. It is a pattern diagram. 1.2...Inductosin board

Claims (1)

【特許請求の範囲】[Claims] 1、互いに90度位相のずれた正弦波電流が通電される
とともに互いに1/4ピッチ位相のずれた2つのコイル
パターンを、変位検出方向上交互に形成配置したインダ
クトシン基板において、交互に配置される上記コイルパ
ターンのパス数をそれぞれ2往復以上にしたことを特徴
とするインダクトシン基板。
1. Sine wave currents that are 90 degrees out of phase with each other are energized, and two coil patterns that are 1/4 pitch out of phase with each other are arranged alternately on an inductor thin board that is formed and arranged alternately in the displacement detection direction. The inductosin board is characterized in that the number of passes of the coil pattern is two or more round trips or more.
JP9696189A 1989-04-17 1989-04-17 Inductosyn substrate Pending JPH02275314A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9696189A JPH02275314A (en) 1989-04-17 1989-04-17 Inductosyn substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9696189A JPH02275314A (en) 1989-04-17 1989-04-17 Inductosyn substrate

Publications (1)

Publication Number Publication Date
JPH02275314A true JPH02275314A (en) 1990-11-09

Family

ID=14178848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9696189A Pending JPH02275314A (en) 1989-04-17 1989-04-17 Inductosyn substrate

Country Status (1)

Country Link
JP (1) JPH02275314A (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523683A (en) * 1993-12-27 1996-06-04 Nec Corporation Induction sensor responsive to a displacement of a movable body
US5793202A (en) * 1995-02-28 1998-08-11 Nec Corporation Position sensor, employing electromagnetic induction
WO1998054545A3 (en) * 1997-05-28 1999-03-04 Scient Generics Ltd Position transducer and method of manufacture
US6304014B1 (en) 1997-10-02 2001-10-16 Synaptics (Uk) Limited Motor control system
US6489899B1 (en) 1994-05-14 2002-12-03 Synaptics (Uk) Limited Position detector
US6522128B1 (en) 1997-10-15 2003-02-18 Synaptics (Uk) Limited Position sensor having compact arrangement of coils
US6534970B1 (en) 1998-05-22 2003-03-18 Synaptics (Uk) Limited Rotary position sensor and transducer for use therein
US6788221B1 (en) 1996-06-28 2004-09-07 Synaptics (Uk) Limited Signal processing apparatus and method
US6888538B2 (en) 1994-05-14 2005-05-03 Synaptics (Uk) Limited Position sensor
US7019672B2 (en) 1998-12-24 2006-03-28 Synaptics (Uk) Limited Position sensor
US7030782B2 (en) 1994-05-14 2006-04-18 Synaptics (Uk) Limited Position detector
US7133793B2 (en) 2003-07-24 2006-11-07 Synaptics (Uk) Limited Magnetic calibration array
US7406393B2 (en) 2002-03-05 2008-07-29 Synaptics (Uk) Limited Position sensor
US7511705B2 (en) 2001-05-21 2009-03-31 Synaptics (Uk) Limited Position sensor
US7812268B2 (en) 2003-08-26 2010-10-12 Synaptics (Uk) Limited Digitizer system
US7907130B2 (en) 2002-06-05 2011-03-15 Synaptics (Uk) Limited Signal transfer method and apparatus
CN102744925A (en) * 2012-06-28 2012-10-24 中国科学院上海技术物理研究所 Vacuum coating based round inductosyn shielding layer structure
US9410791B2 (en) 2010-12-24 2016-08-09 Cambridge Integrated Circuits Limited Position sensing transducer
US9470505B2 (en) 2012-06-13 2016-10-18 Cambridge Integrated Circuits Limited Position sensing transducer

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523683A (en) * 1993-12-27 1996-06-04 Nec Corporation Induction sensor responsive to a displacement of a movable body
US6888538B2 (en) 1994-05-14 2005-05-03 Synaptics (Uk) Limited Position sensor
US6489899B1 (en) 1994-05-14 2002-12-03 Synaptics (Uk) Limited Position detector
US7030782B2 (en) 1994-05-14 2006-04-18 Synaptics (Uk) Limited Position detector
US5793202A (en) * 1995-02-28 1998-08-11 Nec Corporation Position sensor, employing electromagnetic induction
US6788221B1 (en) 1996-06-28 2004-09-07 Synaptics (Uk) Limited Signal processing apparatus and method
WO1998054545A3 (en) * 1997-05-28 1999-03-04 Scient Generics Ltd Position transducer and method of manufacture
US6304014B1 (en) 1997-10-02 2001-10-16 Synaptics (Uk) Limited Motor control system
US6522128B1 (en) 1997-10-15 2003-02-18 Synaptics (Uk) Limited Position sensor having compact arrangement of coils
US6534970B1 (en) 1998-05-22 2003-03-18 Synaptics (Uk) Limited Rotary position sensor and transducer for use therein
US7019672B2 (en) 1998-12-24 2006-03-28 Synaptics (Uk) Limited Position sensor
US7511705B2 (en) 2001-05-21 2009-03-31 Synaptics (Uk) Limited Position sensor
US8243033B2 (en) 2001-05-21 2012-08-14 Synaptics (Uk) Limited Position sensor
US7406393B2 (en) 2002-03-05 2008-07-29 Synaptics (Uk) Limited Position sensor
US7907130B2 (en) 2002-06-05 2011-03-15 Synaptics (Uk) Limited Signal transfer method and apparatus
US7133793B2 (en) 2003-07-24 2006-11-07 Synaptics (Uk) Limited Magnetic calibration array
US7812268B2 (en) 2003-08-26 2010-10-12 Synaptics (Uk) Limited Digitizer system
US8022317B2 (en) 2003-08-26 2011-09-20 Synaptics (Uk) Limited Digitizer system
US9410791B2 (en) 2010-12-24 2016-08-09 Cambridge Integrated Circuits Limited Position sensing transducer
US9470505B2 (en) 2012-06-13 2016-10-18 Cambridge Integrated Circuits Limited Position sensing transducer
CN102744925A (en) * 2012-06-28 2012-10-24 中国科学院上海技术物理研究所 Vacuum coating based round inductosyn shielding layer structure

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