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JP2005036132A - Adhesive adjuvant composition - Google Patents

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JP2005036132A
JP2005036132A JP2003275815A JP2003275815A JP2005036132A JP 2005036132 A JP2005036132 A JP 2005036132A JP 2003275815 A JP2003275815 A JP 2003275815A JP 2003275815 A JP2003275815 A JP 2003275815A JP 2005036132 A JP2005036132 A JP 2005036132A
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film
adhesive
hydroxyl group
clad laminate
phenolic hydroxyl
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JP4557515B2 (en
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Makoto Uchida
誠 内田
Toyofumi Asano
豊文 浅野
Minoru Nomichi
稔 野路
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Nippon Kayaku Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an adhesive adjuvant composition providing excellent adhesive strength to a polyimide film or the like without reducing mechanical characteristics, and useful in an electric material field. <P>SOLUTION: The adhesive adjuvant composition contains a phenolic hydroxy group-containing polyamic acid having a structure represented by formula (A) (wherein, R<SB>1</SB>is an aromatic group; n is the average number of substituents, and a positive number of 1-4; and R<SB>2</SB>is a tetravalent aromatic group) and a solvent. The polyimide film treated with the adhesive adjuvant composition is also provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、フェノール性水酸基含有ポリアミド酸と溶媒を含有する接着補助剤組成物に関する。   The present invention relates to an adhesion aid composition containing a phenolic hydroxyl group-containing polyamic acid and a solvent.

通常、ポリイミドフィルムは、金属箔(主に銅箔)と張り合わせたり、金属を蒸着、メッキ、またはスパッタしたり、あるいは金属箔にポリイミド前駆体をコーティングし、加熱等によりイミド化したりして、片面銅張積層板等を作製し、更に接着剤によるポリイミドフィルム同士の張り合わせにより得られる両面銅張積層板等を、加工してフレキシブル印刷配線用基板や多層印刷配線用基板のベースフィルムとして使用される。ところが、従来のポリイミドフィルムは表面の接着性に乏しいことが問題になっており、そのままでは製品の不良を生じる原因となる。このため、ポリイミドフィルムは、その表面の接着性を改善することを目的に、フィルム表面にコロナ放電処理や、プラズマ処理を施して親水性を付与し使用されている(特許文献1)。また、ポリイミドフィルムの表面を粗面化するため、前駆体に不活性粒子を添加したり、フィルム表面の薬液処理したりする方法が知られている(特許文献2)。しかしながら、フィルム表面をコロナ放電処理や、プラズマ処理を施すことにより、表面に親水性を付与すると同時に表面は脆く、剥離しやすくなるため、本質的に接着力を向上させることはできない。また、フィルム表面の粗面化は、ポリイミドの場合通常その効果は小さく、フィルム作製または加工時の工程が煩雑になるばかりか、フィルムの持つ強度や電気特性等を低下させる要因となる。   Usually, polyimide film is bonded to metal foil (mainly copper foil), metal is deposited, plated, or sputtered, or polyimide precursor is coated on metal foil and imidized by heating, etc. Fabricate copper-clad laminates, etc., and process double-sided copper-clad laminates obtained by bonding polyimide films with adhesives, and use them as base films for flexible printed wiring boards and multilayer printed wiring boards . However, the conventional polyimide film has a problem of poor surface adhesion, and as such causes a product defect. For this reason, for the purpose of improving the adhesion of the surface of the polyimide film, the film surface is subjected to corona discharge treatment or plasma treatment to impart hydrophilicity and used (Patent Document 1). Moreover, in order to roughen the surface of a polyimide film, the method of adding an inert particle to a precursor or carrying out the chemical | medical solution process of the film surface is known (patent document 2). However, since the surface of the film is subjected to corona discharge treatment or plasma treatment to impart hydrophilicity to the surface and at the same time the surface is brittle and easily peels off, the adhesive force cannot be essentially improved. In addition, the roughening of the film surface is usually less effective in the case of polyimide, which not only complicates the steps for film production or processing, but also reduces the strength and electrical characteristics of the film.

特開平05−279497号公報JP 05-279497 A 特開平10−095847号公報Japanese Patent Laid-Open No. 10-095847 特開平08−124918号公報JP-A-08-124918

本発明は、ポリイミドフィルム等に対し、機械特性を低下させることなく、接着強度に優れた、電気材料分野で有用な接着補助剤組成物を提供することを目的とする。   An object of the present invention is to provide an adhesion assistant composition that is excellent in adhesive strength and useful in the field of electrical materials for polyimide films and the like without deteriorating mechanical properties.

本発明者らは、上記課題を解決するため、鋭意研究の結果、フィルム同士の接着性や、他の接着剤、接着層への接着性に優れ、かつフィルムが本来持つ優れた機械特性を低下させることがない接着補助剤組成物と、それを用いた接着性に優れるフィルムを製造し得る方法も見出し、本発明を完成した。すなわち本発明は、
(1)フェノール性水酸基含有ポリアミド酸と溶媒を含有する接着補助剤組成物
(2)フェノール性水酸基含有ポリアミド酸が、下記式(A)
As a result of diligent research, the present inventors have achieved excellent adhesive properties between films, adhesives to other adhesives and adhesive layers, and reduced excellent mechanical properties inherent to the films. The present invention has also been completed by finding a method of producing an adhesive auxiliary composition that is not allowed to be produced and a film that is excellent in adhesion using the composition. That is, the present invention
(1) Adhesive adjuvant composition containing a phenolic hydroxyl group-containing polyamic acid and a solvent (2) The phenolic hydroxyl group-containing polyamic acid is represented by the following formula (A)

Figure 2005036132
Figure 2005036132

(式(A)中Rは芳香族基を表し、nは平均置換基数であって1〜4の正数を表す。Rは4価の芳香族基を表す。xは平均重合度であって10〜1,000の正数を表す。)で表される構造を有する上記(1)記載の接着補助剤組成物。
(3)フェノール性水酸基含有ポリアミド酸以外のポリイミド前駆体を含有する上記(1)または(2)記載の接着補助剤組成物
(4)上記(1)〜(3)のいずれか1項に記載の接着補助剤組成物を加熱して得られるフィルム
(5)上記(1)〜(3)のいずれか1項に記載の接着補助剤組成物をポリイミド前駆体に塗布し、加熱して得られるフィルム
(6)上記(4)または(5)記載のフィルムを有する片面銅張積層板
(7)上記(4)または(5)記載のフィルムを有する両面銅張積層板
(8)上記(4)または(5)記載のフィルムを有するフレキシブル印刷配線用基板
(9)上記(4)または(5)記載のフィルムを有する多層印刷配線用基板
に関する。
(In formula (A), R 1 represents an aromatic group, n is the average number of substituents and represents a positive number of 1 to 4. R 2 represents a tetravalent aromatic group. X is the average degree of polymerization. And represents a positive number of 10 to 1,000.) The adhesion auxiliary composition according to the above (1) having a structure represented by:
(3) The adhesive auxiliary composition according to (1) or (2) above, which contains a polyimide precursor other than the phenolic hydroxyl group-containing polyamic acid, (4) any one of (1) to (3) above. A film (5) obtained by heating the adhesion assistant composition of (5) obtained by applying the adhesion assistant composition according to any one of (1) to (3) above to a polyimide precursor and heating it. Film (6) Single-sided copper-clad laminate having the film according to (4) or (5) (7) Double-sided copper-clad laminate having the film according to (4) or (5) (8) Above (4) Or the board | substrate for flexible printed wiring which has the film of (5) description (9) It is related with the board | substrate for multilayer printed wiring which has the film of the said (4) or (5) description.

本発明の接着補助剤組成物は、本来接着性の乏しいポリイミドフィルム等への接着性を飛躍的に向上させ、エポキシ樹脂等との接着も容易であるため、加工性に優れる。また、被着体フィルムの持つ優れた機械特性を低下させることがないため、多層配線板の製造に広く用いることが可能であり、接着剤、基板等、電気材料分野で極めて有用である。   The adhesion adjuvant composition of this invention is excellent in workability, since it greatly improves the adhesion to a polyimide film or the like that originally has poor adhesion and is easy to adhere to an epoxy resin or the like. In addition, since the excellent mechanical properties of the adherend film are not deteriorated, it can be widely used in the production of multilayer wiring boards, and is extremely useful in the field of electrical materials such as adhesives and substrates.

本発明の接着補助剤組成物は、フェノール性水酸基含有ポリアミド酸と溶媒とを必須成分としており、フェノール性水酸基含有ポリアミド酸は、ポリアミド酸の分子構造中にフェノール性水酸基を持っていれば特に制限はないが、下記式(1)   The adhesion aid composition of the present invention comprises a phenolic hydroxyl group-containing polyamic acid and a solvent as essential components, and the phenolic hydroxyl group-containing polyamic acid is particularly limited as long as it has a phenolic hydroxyl group in the molecular structure of the polyamic acid. The following formula (1)

Figure 2005036132
Figure 2005036132

(式(1)中Rは芳香族基を表し、nは平均置換基数であって1〜4の正数を表す。Rは4価の芳香族基を表す。)で表されるセグメントを持つ、フェノール性水酸基含有ポリアミド酸が好ましい。式(1)のセグメントにおけるR基はフェノール性水酸基を持つ芳香族基であれば特に制限はないが、下記式(2) (In formula (1), R 1 represents an aromatic group, n represents an average number of substituents and represents a positive number of 1 to 4. R 2 represents a tetravalent aromatic group.) Phenolic hydroxyl group-containing polyamic acid having The R 1 group in the segment of the formula (1) is not particularly limited as long as it is an aromatic group having a phenolic hydroxyl group, but the following formula (2)

Figure 2005036132
Figure 2005036132

(式(2)中Rは直接結合又はO、S、P、F、Siを含んでもよい炭素数0〜6で構成される結合を表し、a、b、cは平均置換基数であってそれぞれ1〜4の正数を表す。)で表される有機基のうち一種以上を含有するのが好ましい。式(1)のセグメントにおけるR基は芳香族基であれば特に制限はないが、下記式(3) (In Formula (2), R 3 represents a direct bond or a bond composed of 0 to 6 carbon atoms that may include O, S, P, F, and Si, and a, b, and c are the average number of substituents, Each of them represents a positive number of 1 to 4). The R 2 group in the segment of the formula (1) is not particularly limited as long as it is an aromatic group, but the following formula (3)

Figure 2005036132
Figure 2005036132

(式(3)中Rは直接結合又はO、S、P、F、Siを含んでもよい炭素数0〜6で構成される結合を表す。)で表される芳香族基のうち一種以上を含有するのが好ましい。 (In formula (3), R 4 represents a direct bond or a bond composed of 0 to 6 carbon atoms that may contain O, S, P, F, and Si). It is preferable to contain.

このようなセグメントを有するポリアミド酸のうち本発明においては全てのセグメントが式(1)である化合物、即ち下記式(A)   Among the polyamic acids having such segments, in the present invention, all the segments are compounds of formula (1), that is, the following formula (A)

Figure 2005036132
Figure 2005036132

(式(A)中R、R及びnは式(1)におけるのと同じ意味を表す。xは平均重合度であって10〜1,000、好ましくは50〜500の正数を表す。)
で表される化合物が好ましい。また、本発明において前記ポリアミド酸の重量平均分子量は、10,000〜1,000,000が好ましい。
(In formula (A), R 1 , R 2 and n represent the same meaning as in formula (1). X represents the average degree of polymerization and represents a positive number of 10 to 1,000, preferably 50 to 500. .)
The compound represented by these is preferable. In the present invention, the polyamic acid preferably has a weight average molecular weight of 10,000 to 1,000,000.

本発明の接着補助剤組成物における前記フェノール性水酸基含有ポリアミド酸は、通常窒素気流下に溶媒中でフェノール性水酸基含有ジアミン成分、場合により他のジアミン成分と、テトラカルボン酸成分とをほぼ等モル、好適には全ジアミン成分1モルに対してテトラカルボン酸成分が0.90〜1.1モルとなる範囲で反応させて得られる。   The above-mentioned phenolic hydroxyl group-containing polyamic acid in the adhesion aid composition of the present invention is usually equimolar to a phenolic hydroxyl group-containing diamine component, optionally other diamine component, and a tetracarboxylic acid component in a solvent under a nitrogen stream. The tetracarboxylic acid component is preferably reacted in an amount of 0.90 to 1.1 mol per 1 mol of the total diamine component.

使用されるフェノール性水酸基含有ジアミン成分としては、ジアミノフェノール、ジアミノレゾルシン、ジアミノジヒドロキシビフェニル、ビス(アミノヒドロキシフェニル)エーテル、ビス(アミノヒドロキシフェニル)メタン、ビス(アミノヒドロキシフェニル)プロパン、ビス(アミノヒドロキシフェニル)ヘキサフルオロプロパン、ビス(アミノヒドロキシフェニル)スルホキシド、ジアミノヒドロキシナフタレンや、ジアミノジヒドロキシナフタレンなどが挙げられる。   The phenolic hydroxyl group-containing diamine components used include diaminophenol, diaminoresorcin, diaminodihydroxybiphenyl, bis (aminohydroxyphenyl) ether, bis (aminohydroxyphenyl) methane, bis (aminohydroxyphenyl) propane, and bis (aminohydroxy). Phenyl) hexafluoropropane, bis (aminohydroxyphenyl) sulfoxide, diaminohydroxynaphthalene, diaminodihydroxynaphthalene and the like.

この際用いることのできる他のジアミン成分の具体例としては、フェニレンジアミン、ジアミノトルエン、ジアミノキシレン、ジアミノメシチレン、ジアミノデュレン、ジアミノアゾベンゼン、ジアミノナフタレン、ジアミノビフェニル、ジアミノジフェニルエーテル、ジアミノジメチルジフェニルエーテル、メチレンジアニリン、メチレンビス(メチルアニリン)、メチレンビス(ジメチルアニリン)、メチレンビス(メトキシアニリン)、メチレンビス(ジメトキシアニリン)、メチレンビス(エチルアニリン)、メチレンビス(ジエチルアニリン)、メチレンビス(エトキシアニリン)、メチレンビス(ジエトキシアニリン)、イソプロピリデンジアニリン、ヘキサフルオロイソプロピリデンジアニリン、ジアミノベンゾフェノン、ジアミノジメチルベンゾフェノン、ジアミノアントラキノン、ジアミノジフェニルチオエーテル、ジアミノジメチルジフェニルチオエーテル、ジアミノジフェニルスルホン、ジアミノジフェニルスルホキシドや、ジアミノフルオレンなどが挙げられる。   Specific examples of other diamine components that can be used in this case include phenylenediamine, diaminotoluene, diaminoxylene, diaminomesitylene, diaminodurene, diaminoazobenzene, diaminonaphthalene, diaminobiphenyl, diaminodiphenyl ether, diaminodimethyldiphenyl ether, methylenedianiline , Methylene bis (methylaniline), methylene bis (dimethylaniline), methylene bis (methoxyaniline), methylene bis (dimethoxyaniline), methylene bis (ethylaniline), methylene bis (diethylaniline), methylene bis (ethoxyaniline), methylene bis (diethoxyaniline), Isopropylidene dianiline, hexafluoroisopropylidene dianiline, diaminobenzophenone, di Mino dimethyl benzophenone, diaminoanthraquinone, diaminodiphenyl thioether, diaminodiphenyl dimethyl diphenyl thioether, diaminodiphenyl sulfone, and diaminodiphenyl sulfoxide, diaminofluorene and the like.

また、反応に使用されるテトラカルボン酸成分の具体例としては、ピロメリット酸二無水物、ビフェニルテトラカルボン酸二無水物、ベンゾフェノンテトラカルボン酸二無水物、ジフェニルエーテルテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、メチレンジフタル酸無水物、イソプロピリデンジフタル酸無水物、ヘキサフルオロイソプロピリデンジフタル酸無水物、ジメチルジフェニルシランテトラカルボン酸二無水物や、ナフタレンテトラカルボン酸二無水物などが挙げられる。   Specific examples of tetracarboxylic acid components used in the reaction include pyromellitic dianhydride, biphenyl tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, diphenyl ether tetracarboxylic dianhydride, diphenyl sulfone. Tetracarboxylic dianhydride, methylene diphthalic anhydride, isopropylidene diphthalic anhydride, hexafluoroisopropylidene diphthalic anhydride, dimethyldiphenylsilane tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride Etc.

フェノール性水酸基含有ポリアミド酸の生成反応に使用される溶媒および本発明の接着補助剤組成物に含有される溶媒は、同じでも異なっていてもよいが、反応後フェノール性水酸基含有ポリアミド酸を取り出すことなく、接着補助剤組成物とできることから同じであるのが好ましい。溶媒としては、前記フェノール性水酸基含有ポリアミド酸を溶解させうるものであれば特に制限はないが、N−メチル−2−ピロリドン、N,N−ジメチルアセトアミド、N,N−ジメチルホルムアミド、N−メチルカプロラクタム、N,N−ジメチルイミダゾリドン、ジメチルスルホキシド、テトラメチル尿素、ピリジンのような非プロトン性極性溶媒、メタノール、エタノール、プロパノール、ブタノール等のアルコール溶媒、トルエン、キシレン、ヘキサン、シクロヘキサン、ヘプタン等の無極性溶媒、アセトン、メチルエチルケトン、シクロペンタノン、シクロヘキサノン、酢酸メチル、酢酸エチル、カプロラクトン、ブチロラクトン、バレロラクトン、カプロラクタム、ブチロラクタム、バレロラクタム、テトラヒドロフラン、ジグライム、ジオキサンや、トリオキサンなど、またはこれらの混合溶媒が挙げられ、中でもN−メチル−2−ピロリドン、N,N−ジメチルアセトアミド、N,N−ジメチルホルムアミドが好ましい。   The solvent used in the reaction for producing the phenolic hydroxyl group-containing polyamic acid and the solvent contained in the adhesion aid composition of the present invention may be the same or different, but the phenolic hydroxyl group-containing polyamic acid is taken out after the reaction. However, it is preferably the same because it can be used as an adhesion assistant composition. The solvent is not particularly limited as long as it can dissolve the phenolic hydroxyl group-containing polyamic acid, but N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, N-methyl Caprolactam, N, N-dimethylimidazolidone, dimethyl sulfoxide, tetramethylurea, aprotic polar solvents such as pyridine, alcohol solvents such as methanol, ethanol, propanol, butanol, toluene, xylene, hexane, cyclohexane, heptane, etc. Nonpolar solvent, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, methyl acetate, ethyl acetate, caprolactone, butyrolactone, valerolactone, caprolactam, butyrolactam, valerolactam, tetrahydrofuran, di Lime, dioxane or the like trioxane, or include a mixture of these solvents, among which N- methyl-2-pyrrolidone, N, N- dimethylacetamide, N, N- dimethylformamide is preferred.

溶媒は、フェノール性水酸基含有ポリアミド酸が5〜50重量%、好ましくは10〜30重量%溶解した溶液となる量使用すると取り扱いやすくなり好ましい。
本発明の接着補助剤組成物には、更に前記フェノール性水酸基含有ポリアミド酸以外のポリイミド前駆体を含有させてもよい。使用できるポリイミド前駆体は、その構造に特に制限はなく、テトラカルボン酸成分とジアミン成分をほぼ等モル反応させ、前記フェノール性水酸基含有ポリアミド酸と同様にして得られる。ここで使用できる、ジアミン成分とテトラカルボン酸成分の具体例は、前記他のジアミン成分と前記テトラカルボン酸成分等が挙げられ、その重量平均分子量は、10,000〜1,000,000が好ましい。ポリイミド前駆体は、接着補助剤組成物中に0〜50重量%、好ましくは0〜30重量%溶解した溶液が取り扱いやすい。
The solvent is preferably used in an amount that makes a solution in which the phenolic hydroxyl group-containing polyamic acid is dissolved in an amount of 5 to 50% by weight, preferably 10 to 30% by weight.
The adhesion aid composition of the present invention may further contain a polyimide precursor other than the phenolic hydroxyl group-containing polyamic acid. The polyimide precursor that can be used is not particularly limited in its structure, and can be obtained in the same manner as the above-mentioned phenolic hydroxyl group-containing polyamic acid by reacting a tetracarboxylic acid component and a diamine component in an approximately equimolar amount. Specific examples of the diamine component and the tetracarboxylic acid component that can be used here include the other diamine component and the tetracarboxylic acid component, and the weight average molecular weight is preferably 10,000 to 1,000,000. . The polyimide precursor is easy to handle a solution in which 0 to 50% by weight, preferably 0 to 30% by weight, is dissolved in the adhesion aid composition.

また、本発明の接着補助剤組成物には、接着性を損ねない範囲内で、種々の添加剤を加えることができ、例えば、有機又は無機顔料、染料、レベリング剤、カブリ防止剤、退色防止剤、ハレーション防止剤、蛍光増白剤、界面活性剤、可塑剤、難燃剤、酸化防止剤、充填剤、静電防止剤、消泡剤、流動調整剤、イミド化触媒、促進剤、脱水剤、遅延剤、光安定剤、光触媒、防かび剤、抗菌剤、低誘電体、導電体、磁性体、層状鉱物や、熱分解性化合物等が挙げられ、特に触媒や脱水剤を入れておけば、後のイミド化が促進され、比較的温和な条件でポリイミドフィルムが得られる。   In addition, various additives can be added to the adhesion aid composition of the present invention within a range that does not impair the adhesiveness. For example, organic or inorganic pigments, dyes, leveling agents, antifoggants, antifade Agent, antihalation agent, optical brightener, surfactant, plasticizer, flame retardant, antioxidant, filler, antistatic agent, antifoaming agent, flow control agent, imidation catalyst, accelerator, dehydrating agent , Retarders, light stabilizers, photocatalysts, fungicides, antibacterial agents, low dielectric materials, conductors, magnetic materials, layered minerals, thermal decomposable compounds, etc. Later imidization is promoted, and a polyimide film can be obtained under relatively mild conditions.

本発明の接着補助剤組成物は前記各成分を所定の割合で均一に混合して得られる。またその使用方法は、所望のイミドフィルム厚になるよう基板に塗布して、50〜150℃で5〜180分間乾燥してフェノール性水酸基含有ポリアミド酸フィルムを作製し、その後、窒素気流下200〜500℃で20〜300分間熱処理して、全面接着性のフィルムとする。あるいはフェノール性水酸基含有ポリアミド酸以外のポリイミド前駆体溶液を所望のイミドフィルム厚になるよう基板に塗布し、50〜150℃で5〜180分間乾燥してポリイミド前駆体フィルムを作製し、その上に接着補助剤組成物を塗布し、さらに50〜150℃で5〜180分間乾燥した後、窒素気流下200〜500℃で20〜300分間熱処理して、表面接着性のフィルムを作製することもできる。また、触媒や脱水剤をポリイミド前駆体に添加した系では、比較的低温または短時間での熱処理も可能である。   The adhesion adjuvant composition of this invention is obtained by mixing each said component uniformly by a predetermined ratio. Moreover, the usage method is apply | coated to a board | substrate so that it may become desired imide film thickness, and it is 5-180 minutes drying at 50-150 degreeC, and produces a phenolic hydroxyl group containing polyamic-acid film, Then, 200-under nitrogen stream. It heat-processes for 20 to 300 minutes at 500 degreeC, and is set as a whole surface adhesive film. Alternatively, a polyimide precursor solution other than a phenolic hydroxyl group-containing polyamic acid is applied to a substrate so as to have a desired imide film thickness, and dried at 50 to 150 ° C. for 5 to 180 minutes to produce a polyimide precursor film, on which It is also possible to produce a surface-adhesive film by applying an adhesion aid composition and further drying at 50 to 150 ° C. for 5 to 180 minutes, followed by heat treatment at 200 to 500 ° C. for 20 to 300 minutes in a nitrogen stream. . Further, in a system in which a catalyst or a dehydrating agent is added to a polyimide precursor, heat treatment can be performed at a relatively low temperature or in a short time.

基板は、ガラス基板、銅箔、アルミ箔、ステンレススチール基板、ドラムや、エンドレスベルト等、上記熱処理に耐えうるものであれば特に制限はないが、銅箔を用いることで片面銅張積層板が得られる。また、接着補助剤組成物の塗布厚は、得られるフィルム厚として5〜50μm厚、好ましくは10〜25μm厚となるよう塗布するのが好ましい。   The substrate is not particularly limited as long as it can withstand the above heat treatment, such as a glass substrate, copper foil, aluminum foil, stainless steel substrate, drum, endless belt, etc. can get. Moreover, it is preferable to apply | coat so that the application | coating thickness of an adhesion adjuvant composition may be 5-50 micrometers thickness as an obtained film thickness, Preferably it is 10-25 micrometers thickness.

本発明の接着性フィルムは、そのフィルム表面にフェノール性水酸基を含有しており、極性があり、反応性もある。そのため、特に種々のエポキシ化合物を含有する接着剤組成物、接着フィルム等と極めて良く反応、結合し、接着強度に優れる。例えば、前述した片面銅張積層板のフィルム表面同士を、エポキシ化合物含有接着剤組成物を介して接着させることで、接着強度に優れた両面銅張積層板が得られる。ここで使用できるエポキシ化合物含有接着剤組成物としては、エポキシ基を2個以上含有するエポキシ化合物とその硬化剤並びに必要により硬化促進剤、イオン補足剤、無機充填剤及び溶剤等を含有する組成物で、銅張積層板等の電気・電子分野で使用される材料の接着剤として使用されているものであれば特に制限はない。例えば、エポキシ化合物として、ビスフェノールA型エポキシ樹脂等のビスフェノール型エポキシ樹脂;フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂またはフェノール−ビフェビルノボラック型エポキシ樹脂等のノボラック型エポキシ樹脂;フェノールアラルキル型エポキシ樹脂等のエポキシ樹脂とビスフェノールA等のビスフェノール樹脂;フェノールノボラック樹脂、クレゾールノボラック樹脂またはフェノール−ビフェビルノボラック樹脂等のノボラック樹脂;フェノールアラルキル等の硬化剤を主原料とした接着剤組成物が挙げられる。
また、前述銅張積層板を更に加工した場合にも同様に、接着強度に優れたフレキシブル印刷配線用基板が得られ、これを多層化することで多層印刷配線用基板が得られる。
The adhesive film of the present invention contains a phenolic hydroxyl group on the film surface, is polar, and is reactive. Therefore, it reacts and bonds particularly well with adhesive compositions, adhesive films and the like containing various epoxy compounds, and is excellent in adhesive strength. For example, a double-sided copper-clad laminate having excellent adhesive strength can be obtained by bonding the film surfaces of the single-sided copper-clad laminate described above via an epoxy compound-containing adhesive composition. The epoxy compound-containing adhesive composition that can be used here includes an epoxy compound containing two or more epoxy groups, a curing agent thereof, and a curing accelerator, an ion supplementing agent, an inorganic filler, a solvent, and the like as necessary. There is no particular limitation as long as it is used as an adhesive for materials used in the electric / electronic field such as copper-clad laminates. For example, as an epoxy compound, a bisphenol type epoxy resin such as a bisphenol A type epoxy resin; a novolak type epoxy resin such as a phenol novolak type epoxy resin, a cresol novolak type epoxy resin or a phenol-bifevir novolak type epoxy resin; a phenol aralkyl type epoxy resin And epoxy resins such as bisphenol A; novolak resins such as phenol novolac resin, cresol novolac resin or phenol-bifevir novolac resin; and adhesive compositions mainly composed of a curing agent such as phenol aralkyl.
Similarly, when the copper-clad laminate is further processed, a flexible printed wiring board having excellent adhesive strength is obtained, and a multilayer printed wiring board is obtained by multilayering the same.

以下に実施例によって本発明を更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。   The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

なお、実施例におけるフィルムの特性測定方法は以下の通りである。
(引張弾性率の測定)
フィルムをテンシロン試験機(東洋ボールドウィン製)を用いて、ASTM D882に準拠して測定した。
(両面銅張積層板の剥離強度の測定)
両面銅張積層板をテンシロン試験機(東洋ボールドウィン製)を用いて、JIS C6481に準拠して測定した。
In addition, the characteristic measuring method of the film in an Example is as follows.
(Measurement of tensile modulus)
The film was measured according to ASTM D882 using a Tensilon tester (manufactured by Toyo Baldwin).
(Measurement of peel strength of double-sided copper-clad laminate)
The double-sided copper-clad laminate was measured according to JIS C6481 using a Tensilon tester (manufactured by Toyo Baldwin).

実施例1
温度計、環流冷却器、粉体導入口、窒素導入装置、攪拌装置のついた500mlの反応器に、ビス(3−アミノ−4−ヒドロキシフェニル)エーテル46.45g(0.200モル)と、N−メチル−2−ピロリドン360.30gを仕込み、乾燥窒素を流しながら室温で撹拌し、固形分を溶解させた。その後、反応器内を45℃以下に保ちながらピロメリット酸二無水物43.63g(0.200モル)を粉体導入口より約30分で添加し、添加後反応器内を35℃以下で、さらに18時間反応させた。反応終了後、孔径3μmのテフロン(登録商標)フィルターを用い加圧濾過し、下記式(4)
Example 1
In a 500 ml reactor equipped with a thermometer, a reflux condenser, a powder inlet, a nitrogen inlet, and a stirrer, 46.45 g (0.200 mol) of bis (3-amino-4-hydroxyphenyl) ether, 360.30 g of N-methyl-2-pyrrolidone was charged and stirred at room temperature while flowing dry nitrogen to dissolve the solid content. Thereafter, 43.63 g (0.200 mol) of pyromellitic dianhydride was added from the powder introduction port in about 30 minutes while keeping the inside of the reactor at 45 ° C. or lower. The mixture was further reacted for 18 hours. After completion of the reaction, pressure filtration was performed using a Teflon (registered trademark) filter having a pore diameter of 3 μm, and the following formula (4)

Figure 2005036132
Figure 2005036132

(式(4)中mは平均重合度であり、重量平均分子量は82,000である。)で表されるフェノール性水酸基含有ポリアミド酸がN−メチル−2−ピロリドンに20重量%溶解した、本発明の接着補助剤組成物を得た。 (M in the formula (4) is the average degree of polymerization, and the weight average molecular weight is 82,000.) The phenolic hydroxyl group-containing polyamic acid represented by 20% by weight was dissolved in N-methyl-2-pyrrolidone. The adhesion adjuvant composition of this invention was obtained.

実施例2
温度計、環流冷却器、粉体導入口、窒素導入装置、攪拌装置のついた500mlの反応器に、ビス(3−アミノ−4−ヒドロキシフェニル)エーテル41.81g(0.180モル)と、N−メチル−2−ピロリドン379.00gを仕込み、乾燥窒素を流しながら室温で撹拌し、固形分を溶解させた。その後、反応器内を45℃以下に保ちながら3,3',4,4'−ビフェニルテトラカルボン酸二無水物52.96g(0.180モル)を粉体導入口より約30分で添加し、添加後反応器内を35℃以下で、さらに18時間反応させた。反応終了後、孔径3μmのテフロン(登録商標)フィルターを用い加圧濾過し、下記式(5)
Example 2
In a 500 ml reactor equipped with a thermometer, a reflux condenser, a powder inlet, a nitrogen inlet, and a stirrer, 41.81 g (0.180 mol) of bis (3-amino-4-hydroxyphenyl) ether, 379.00 g of N-methyl-2-pyrrolidone was charged and stirred at room temperature while flowing dry nitrogen to dissolve the solid content. Thereafter, 52.96 g (0.180 mol) of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride was added from the powder inlet in about 30 minutes while maintaining the inside of the reactor at 45 ° C. or lower. After the addition, the inside of the reactor was further reacted at 35 ° C. or lower for 18 hours. After completion of the reaction, pressure filtration was performed using a Teflon (registered trademark) filter having a pore size of 3 μm, and the following formula (5)

Figure 2005036132
Figure 2005036132

(式(5)中mは平均重合度であり、重量平均分子量は120,000である。)で表されるフェノール性水酸基含有ポリアミド酸がN−メチル−2−ピロリドンに20重量%溶解した、本発明の接着補助剤組成物を得た。 (M in formula (5) is the average degree of polymerization and the weight average molecular weight is 120,000.) The phenolic hydroxyl group-containing polyamic acid represented by 20% by weight was dissolved in N-methyl-2-pyrrolidone. The adhesion adjuvant composition of this invention was obtained.

実施例3
実施例1で得られた接着補助剤組成物を、オートマチックアプリケーター(安田精機製作所製)を用い18μm厚の電解銅箔(株式会社ジャパンエナジー製)上に塗布後の厚みが125μmになるように塗布した後、130℃×10分乾燥した。その後、窒素気流下、130℃から350℃まで2時間かけて昇温し、更に350℃×2時間の加熱処理でイミド化し、本発明の接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは22μm厚、引張弾性率3.6GPaであった。
Example 3
Using the automatic applicator (manufactured by Yasuda Seiki Seisakusho), the adhesion assistant composition obtained in Example 1 was coated on an 18 μm-thick electrolytic copper foil (manufactured by Japan Energy Co., Ltd.) so that the thickness after coating was 125 μm. And then dried at 130 ° C. for 10 minutes. Thereafter, the temperature was raised from 130 ° C. to 350 ° C. in a nitrogen stream over 2 hours, and further imidized by heat treatment at 350 ° C. for 2 hours to obtain an adhesive single-sided copper-clad laminate of the present invention. The film obtained by etching the copper foil had a thickness of 22 μm and a tensile modulus of 3.6 GPa.

実施例4
実施例3において、実施例1で得られた接着補助剤組成物の代わりに実施例2で得られた接着補助剤組成物を用いた以外は同様にし、本発明の接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは22μm厚、引張弾性率4.0GPaであった。
Example 4
In Example 3, the adhesive single-sided copper-clad laminate of the present invention was made in the same manner except that the adhesive auxiliary composition obtained in Example 2 was used instead of the adhesive auxiliary composition obtained in Example 1. Got. The film obtained by etching the copper foil had a thickness of 22 μm and a tensile modulus of 4.0 GPa.

実施例5
下記式(6)
Example 5
Following formula (6)

Figure 2005036132
Figure 2005036132

(式(6)中e、f、gはそれぞれ平均重合度であり、e:f=75:25、重量平均分子量は180,000である。)で表されるポリイミド前駆体をN−メチル−2−ピロリドンに15重量%溶解した溶液を調製し、オートマチックアプリケーター(安田精機製作所製)を用い18μm厚の電解銅箔(株式会社ジャパンエナジー製)上に塗布厚150μmとなるように塗布した後、130℃×10分乾燥した。そのポリイミド前駆体上に、実施例1で得られた接着補助剤組成物を20μm厚で塗布した後、130℃×10分乾燥した。その後、窒素気流下、130℃から350℃まで2時間かけて昇温し、更に350℃×2時間の加熱処理でイミド化し、本発明の表面接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは25μm厚、引張弾性率4.5GPaであった。 (In formula (6), e, f, and g are average polymerization degrees, respectively, e: f = 75: 25, and a weight average molecular weight is 180,000.) A polyimide precursor represented by N-methyl- After preparing a solution of 15% by weight dissolved in 2-pyrrolidone and applying it on an 18 μm thick electrolytic copper foil (manufactured by Japan Energy Co., Ltd.) using an automatic applicator (manufactured by Yasuda Seiki Seisakusho), the coating thickness is 150 μm. Dry at 130 ° C. for 10 minutes. On the polyimide precursor, after apply | coating the adhesion adjuvant composition obtained in Example 1 by 20 micrometers thickness, it dried at 130 degreeC * 10 minutes. Thereafter, the temperature was raised from 130 ° C. to 350 ° C. in a nitrogen stream over 2 hours, and further imidized by a heat treatment of 350 ° C. × 2 hours to obtain a surface-adhesive single-sided copper-clad laminate of the present invention. The film obtained by etching the copper foil had a thickness of 25 μm and a tensile modulus of 4.5 GPa.

実施例6
実施例5において、実施例1で得られた接着補助剤組成物の代わりに、実施例2で得られた接着補助剤組成物を用いた以外は同様にし、本発明の表面接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは24μm厚、引張弾性率4.4GPaであった。
Example 6
In Example 5, the same procedure was used except that the adhesion aid composition obtained in Example 2 was used instead of the adhesion aid composition obtained in Example 1. A laminate was obtained. The film obtained by etching the copper foil had a thickness of 24 μm and a tensile modulus of 4.4 GPa.

実施例7
実施例5で用いた、ポリイミド前駆体がN−メチル−2−ピロリドンに15重量%溶解した溶液と、実施例1で得られた接着補助剤組成物とを同量混合したものを用い、実施例3と同様にし、本発明の接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは20μm厚、引張弾性率4.3GPaであった。
Example 7
Using a solution in which the polyimide precursor used in Example 5 was dissolved by 15% by weight in N-methyl-2-pyrrolidone and the same amount of the adhesion aid composition obtained in Example 1 were used. In the same manner as in Example 3, an adhesive single-sided copper-clad laminate of the present invention was obtained. The film obtained by etching the copper foil had a thickness of 20 μm and a tensile modulus of 4.3 GPa.

実施例8
実施例7において、実施例1で得られた接着補助剤組成物の代わりに、実施例2で得られた接着補助剤組成物を用いた以外は同様にし、本発明の接着性片面銅張積層板を得た。銅箔をエッチングしたフィルムは21μm厚、引張弾性率4.2GPaであった。
Example 8
In Example 7, the adhesive single-sided copper-clad laminate of the present invention was made in the same manner except that the adhesive auxiliary composition obtained in Example 2 was used instead of the adhesive auxiliary composition obtained in Example 1. I got a plate. The film obtained by etching the copper foil had a thickness of 21 μm and a tensile modulus of 4.2 GPa.

実施例9
実施例3で得られた片面銅張積層板の樹脂面同士を、EPPN−501H(トリフェニルメタン骨格含有ノボラック型エポキシ樹脂、日本化薬株式会社製、エポキシ当量167g/eq)50重量部、RE−310S(ビスフェノールA型エポキシ樹脂、日本化薬株式会社製、エポキシ当量182g/eq)50重量部、カヤハードTPM(トリフェニルメタン骨格を有するノボラック樹脂、日本化薬株式会社製、水酸基当量97g/eq)54.5重量部、カヤフレックス(フェノール性水酸基含有芳香族ポリアミド−ポリ(ブタジエン−アクリロニトリル)ブロック共重合体、日本化薬株式会社製)70重量部、DHT−4A(協和化学工業株式会社製、ハイドロタルサイト系イオン捕捉剤、Mg4.3Al(OH)12.6CO・3.5HO)5重量部、IXE−100(東亞合成株式会社製、リン酸ジルコニウム系イオン捕捉剤)2重量部と、CS−3N−A(宇部マテリアルズ株式会社製、高純度炭酸カルシウム、純度99.9%以上)50重量部とからなるエポキシ系接着剤で張り合わせた後、170℃、5MPaで60分間加熱圧着し、本発明の両面銅張積層板を得た。
Example 9
EPPN-501H (triphenylmethane skeleton containing novolac type epoxy resin, manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent 167 g / eq) 50 parts by weight, resin surfaces of the single-sided copper clad laminate obtained in Example 3 -310S (bisphenol A type epoxy resin, Nippon Kayaku Co., Ltd., epoxy equivalent 182 g / eq) 50 parts by weight, Kayahard TPM (Novolac resin having triphenylmethane skeleton, Nippon Kayaku Co., Ltd., hydroxyl group equivalent 97 g / eq ) 54.5 parts by weight, Kayaflex (phenolic hydroxyl group-containing aromatic polyamide-poly (butadiene-acrylonitrile) block copolymer, manufactured by Nippon Kayaku Co., Ltd.), DHT-4A (produced by Kyowa Chemical Industry Co., Ltd.) , Hydrotalcite-based ion scavenger, Mg 4.3 Al 2 (OH) 12.6 CO 3 · 3.5 H 2 O) 5 parts by weight, IXE-100 (manufactured by Toagosei Co., Ltd., a zirconium phosphate ion scavenger) and 2 parts by weight, CS-3N-A (Ube Material Industries, Ltd., purity After bonding with an epoxy adhesive comprising 50 parts by weight of calcium carbonate (purity 99.9% or more), heat-pressure bonding was performed at 170 ° C. and 5 MPa for 60 minutes to obtain a double-sided copper-clad laminate of the present invention.

実施例10
実施例9において、実施例3で得られた片面銅張積層板の代わりに、実施例4で得られた片面銅張積層板を用いた以外は同様にし、本発明の両面銅張積層板を得た。
Example 10
In Example 9, instead of the single-sided copper-clad laminate obtained in Example 3, the double-sided copper-clad laminate of the present invention was prepared in the same manner except that the single-sided copper-clad laminate obtained in Example 4 was used. Obtained.

実施例11
実施例9において、実施例3で得られた片面銅張積層板の代わりに、実施例5で得られた片面銅張積層板を用いた以外は同様にし、本発明の両面銅張積層板を得た。
Example 11
In Example 9, instead of the single-sided copper-clad laminate obtained in Example 3, the double-sided copper-clad laminate of the present invention was prepared in the same manner except that the single-sided copper-clad laminate obtained in Example 5 was used. Obtained.

実施例12
実施例9において、実施例3で得られた片面銅張積層板の代わりに、実施例6で得られた片面銅張積層板を用いた以外は同様にし、本発明の両面銅張積層板を得た。
Example 12
In Example 9, instead of the single-sided copper-clad laminate obtained in Example 3, the double-sided copper-clad laminate of the present invention was prepared in the same manner except that the single-sided copper-clad laminate obtained in Example 6 was used. Obtained.

実施例13
実施例9において、実施例3で得られた片面銅張積層板の代わりに、実施例7で得られた片面銅張積層板を用いた以外は同様にし、本発明の両面銅張積層板を得た。
Example 13
In Example 9, instead of the single-sided copper-clad laminate obtained in Example 3, the double-sided copper-clad laminate of the present invention was prepared in the same manner except that the single-sided copper-clad laminate obtained in Example 7 was used. Obtained.

実施例14
実施例9において、実施例3で得られた片面銅張積層板の代わりに、実施例8で得られた片面銅張積層板を用いた以外は同様にし、本発明の両面銅張積層板を得た。
Example 14
In Example 9, instead of the single-sided copper-clad laminate obtained in Example 3, the double-sided copper-clad laminate of the present invention was prepared in the same manner except that the single-sided copper-clad laminate obtained in Example 8 was used. Obtained.

比較例1
実施例5において、本発明の接着補助剤組成物を用いなかった以外は同様にし、片面銅張積層板(フィルム厚22μm、引張弾性率4.6GPa)を得、実施例9と同様にしてエポキシ系接着剤により両面銅張積層板を得た。
Comparative Example 1
In Example 5, a single-sided copper-clad laminate (film thickness: 22 μm, tensile elastic modulus: 4.6 GPa) was obtained in the same manner except that the adhesion aid composition of the present invention was not used. A double-sided copper-clad laminate was obtained with a system adhesive.

実施例9、10、11、12、13、14、比較例1の両面銅張積層板の剥離強度について結果を表に示した。 The results for the peel strengths of the double-sided copper-clad laminates of Examples 9, 10, 11, 12, 13, 14 and Comparative Example 1 are shown in the table.

表1
剥離強度 剥離界面
実施例9 10.9N/cm 銅箔/フィルム
実施例10 12.6N/cm 銅箔/フィルム
実施例11 11.8N/cm 銅箔/フィルム
実施例12 11.6N/cm 銅箔/フィルム
実施例13 13.3N/cm 銅箔/フィルム
実施例14 12.5N/cm 銅箔/フィルム
比較例1 6.3N/cm エポキシ系接着層/フィルム
Table 1
Peel Strength Peel Interface Example 9 10.9 N / cm Copper Foil / Film Example 10 12.6 N / cm Copper Foil / Film Example 11 11.8 N / cm Copper Foil / Film Example 12 11.6 N / cm Copper Foil / Film Example 13 13.3 N / cm Copper Foil / Film Example 14 12.5 N / cm Copper Foil / Film Comparative Example 1 6.3 N / cm Epoxy Adhesive Layer / Film

Claims (9)

フェノール性水酸基含有ポリアミド酸と溶媒を含有する接着補助剤組成物。 An adhesion aid composition containing a phenolic hydroxyl group-containing polyamic acid and a solvent. フェノール性水酸基含有ポリアミド酸が、下記式(A)
Figure 2005036132
(式(A)中Rは芳香族基を表し、nは平均置換基数であって1〜4の正数を表す。Rは4価の芳香族基を表す。xは平均重合度であって10〜1,000の正数を表す。)で表される構造を有する請求項1記載の接着補助剤組成物。
The phenolic hydroxyl group-containing polyamic acid is represented by the following formula (A)
Figure 2005036132
(In formula (A), R 1 represents an aromatic group, n is the average number of substituents and represents a positive number of 1 to 4. R 2 represents a tetravalent aromatic group. X is the average degree of polymerization. The adhesive auxiliary composition according to claim 1, which has a structure represented by: a positive number of 10 to 1,000.
フェノール性水酸基含有ポリアミド酸以外のポリイミド前駆体を含有する請求項1または2記載の接着補助剤組成物。 The adhesion adjuvant composition of Claim 1 or 2 containing polyimide precursors other than a phenolic hydroxyl group containing polyamic acid. 請求項1〜3のいずれか1項に記載の接着補助剤組成物を加熱して得られるフィルム。 The film obtained by heating the adhesion adjuvant composition of any one of Claims 1-3. 請求項1〜3のいずれか1項に記載の接着補助剤組成物をポリイミド前駆体に塗布し、加熱して得られるフィルム。 The film obtained by apply | coating the adhesion adjuvant composition of any one of Claims 1-3 to a polyimide precursor, and heating. 請求項4または請求項5記載のフィルムを有する片面銅張積層板。 A single-sided copper-clad laminate having the film according to claim 4 or 5. 請求項4または請求項5記載のフィルムを有する両面銅張積層板。 A double-sided copper-clad laminate having the film according to claim 4 or 5. 請求項4または請求項5記載のフィルムを有するフレキシブル印刷配線用基板。 A flexible printed wiring board comprising the film according to claim 4. 請求項4または請求項5記載のフィルムを有する多層印刷配線用基板。 A multilayer printed wiring board comprising the film according to claim 4.
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JPH0841438A (en) * 1994-07-27 1996-02-13 Sumitomo Bakelite Co Ltd Heat-resistant film adhesive having excellent low-temperature processability and method for producing the same
JP2002113812A (en) * 2000-02-14 2002-04-16 Kanegafuchi Chem Ind Co Ltd Laminate of polyimide and conductor layer and multilayer interconnection board using the same as well as its manufacturing method
JP2002361788A (en) * 2001-06-06 2002-12-18 Kanegafuchi Chem Ind Co Ltd Adhesive composition, laminated body using this and multi-layered printed-wiring board
JP2003118054A (en) * 2001-10-12 2003-04-23 Kanegafuchi Chem Ind Co Ltd Laminate and multilayered printed wiring board
JP2003133704A (en) * 2001-10-26 2003-05-09 Ube Ind Ltd Adhesive sheet for circuit board and coverlay

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JPH07258623A (en) * 1994-03-28 1995-10-09 Hitachi Chem Co Ltd Heat-resistant adhesive composition
JPH0841438A (en) * 1994-07-27 1996-02-13 Sumitomo Bakelite Co Ltd Heat-resistant film adhesive having excellent low-temperature processability and method for producing the same
JP2002113812A (en) * 2000-02-14 2002-04-16 Kanegafuchi Chem Ind Co Ltd Laminate of polyimide and conductor layer and multilayer interconnection board using the same as well as its manufacturing method
JP2002361788A (en) * 2001-06-06 2002-12-18 Kanegafuchi Chem Ind Co Ltd Adhesive composition, laminated body using this and multi-layered printed-wiring board
JP2003118054A (en) * 2001-10-12 2003-04-23 Kanegafuchi Chem Ind Co Ltd Laminate and multilayered printed wiring board
JP2003133704A (en) * 2001-10-26 2003-05-09 Ube Ind Ltd Adhesive sheet for circuit board and coverlay

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