CN109954714B - Cleaning method and cleaning device for porous elastic fiber - Google Patents
Cleaning method and cleaning device for porous elastic fiber Download PDFInfo
- Publication number
- CN109954714B CN109954714B CN201910317157.XA CN201910317157A CN109954714B CN 109954714 B CN109954714 B CN 109954714B CN 201910317157 A CN201910317157 A CN 201910317157A CN 109954714 B CN109954714 B CN 109954714B
- Authority
- CN
- China
- Prior art keywords
- porous elastic
- elastic fiber
- gas
- jig
- etching solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to a cleaning method and a cleaning device for porous elastic fibers. A method of cleaning porous elastic fibers comprising the steps of: soaking the porous elastic fiber adsorbed with the glass chips in an etching solution to etch the glass chips; introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then carrying out oscillation treatment on the porous elastic fiber; and releasing the gas in the porous elastic fiber, and then carrying out oscillation treatment on the porous elastic fiber. The cleaning method of the porous elastic fiber has high removal rate of glass scraps.
Description
Technical Field
The invention relates to the technical field of elastic fibers, in particular to a cleaning method and cleaning equipment for porous elastic fibers.
Background
Glass chips are generated in the process of cutting glass by using diamonds and cutter wheels, the glass chips are attracted by static electricity or adhered to a processing platform which is easy to cause the absorption of the glass chips after cutting, and the glass chips can cause micro scratches on the surface of the glass to cause the reduction of the in-plane strength of the glass. Therefore, it is necessary to apply porous elastic fiber (porous fiber) on the conveying platform for glass cutting to adsorb the glass chips, so as to prevent the glass from being physically impacted by the glass chips.
The glass chips are accumulated too much during the process of adsorbing the glass chips by the porous elastic fibers to scratch the glass, so that the glass chips in the porous elastic fibers need to be cleaned. But the traditional brushing method has low clearance rate of the glass scraps.
Disclosure of Invention
In view of the above, there is a need for a method of cleaning porous elastic fibers with high glass debris removal.
In addition, a cleaning device is also provided.
A method of cleaning porous elastic fibers comprising the steps of:
soaking the porous elastic fiber adsorbed with the glass chips in an etching solution to etch the glass chips;
introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then oscillating the porous elastic fiber; and
releasing the gas in the porous elastic fiber, and then carrying out oscillation treatment on the porous elastic fiber.
The cleaning method of the porous elastic fiber comprises the steps of soaking the porous elastic fiber adsorbed with the glass scraps in an etching solution to etch the glass scraps, so that the volume of the glass scraps is reduced; gas is introduced into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and the porous elastic fiber is oscillated under the conditions that the volume of the glass scraps is reduced and the pores of the porous fiber are increased, so that the glass scraps are more easily separated from the porous elastic fiber, and the clearance rate of the glass scraps is improved; and releasing gas in the porous elastic fiber to raise the temperature of the etching solution, further improving the etching rate, further reducing the volume of the glass scraps, and then carrying out oscillation treatment on the porous elastic fiber to enable the glass scraps to be separated from the porous elastic fiber more easily, so that the clearance rate of the glass scraps is improved. Therefore, the cleaning method of the porous elastic fiber has high removal rate of the glass scraps.
In one embodiment, the step of immersing the porous elastic fiber adsorbed with the glass chips in the etching solution is as follows: placing the porous elastic fiber adsorbed with the glass chips and the etching solution into a jig;
the step of introducing gas into the porous elastic fiber in the etching solution comprises the following steps: sealing the jig, and introducing the gas into the jig so that the gas is filled into the porous elastic fibers to increase the pores of the porous fibers;
the step of releasing the gas in the porous elastic fiber comprises: releasing the gas in the jig.
In one embodiment, in the step of introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then performing oscillation treatment on the porous elastic fiber, the frequency of the oscillation treatment is 20Hz to 50 Hz.
In one embodiment, in the step of releasing the gas in the porous elastic fiber and then performing the oscillation treatment on the porous elastic fiber, the frequency of the oscillation treatment is 20Hz to 50 Hz.
In one embodiment, the step of releasing the gas from the porous elastic fiber and then oscillating the porous elastic fiber further comprises a step of washing the porous elastic fiber with water.
In one embodiment, the step of washing the porous elastic fiber with water further comprises a step of drying the porous elastic fiber.
In one embodiment, the etching solution is at least one selected from hydrofluoric acid and buffered oxide etching solutions.
In one embodiment, the etching solution is hydrofluoric acid, and the volume percentage concentration of the etching solution is 2% -40%.
The cleaning equipment comprises a jig and a gas conveying device, wherein the jig can contain etching liquid and porous elastic fibers and can seal the etching liquid and the porous elastic fibers, and the gas conveying device can convey gas into the jig and can receive the gas released from the jig.
In one embodiment, the jig comprises:
the housing is provided with an accommodating cavity and an opening communicated with the accommodating cavity, the accommodating cavity can accommodate the etching solution and the porous elastic fiber, the housing is provided with a vent hole, the vent hole is communicated with the accommodating cavity, and the gas conveying device can convey the gas into the accommodating cavity through the vent hole and can receive the gas released from the accommodating cavity;
and the shell cover can be covered on the opening and is connected with the shell in a sealing way.
Drawings
Fig. 1 is a schematic structural view of a housing of a jig according to an embodiment;
FIG. 2 is a schematic structural view of a housing cover of the fixture shown in FIG. 1;
fig. 3 is a partial structural view of the housing shown in fig. 1 near the open end.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
A method of cleaning porous elastic fibers according to an embodiment, comprising the steps of:
step S110: and soaking the porous elastic fiber adsorbed with the glass chips in an etching solution to etch the glass chips so as to reduce the volume of the glass chips.
Wherein, the material of the porous elastic fiber is selected from one of Polycarbonate (PC), polyethylene terephthalate (PET) and polypropylene (PP).
Specifically, the step of soaking the porous elastic fiber adsorbed with the glass chips in the etching solution is as follows: placing the porous elastic fiber adsorbed with the glass chips and the etching solution into a jig so as to enable the glass chips to react with the etching solution and reduce the volume of the glass chips; meanwhile, the glass chips have small volume and large surface area, and can accelerate the reaction of the glass chips and the etching solution. Wherein the porous elastic fiber and the etching solution do not react. Further, the etching solution is at least one selected from hydrofluoric acid and buffered oxide etching solutions.
In one embodiment, the etching solution is hydrofluoric acid, and the volume percentage concentration of the etching solution is 2% -40%. Under the condition of 24 ℃, when the volume percentage concentration of the etching solution is 40%, the etching rate of the glass chips is 1.3 μm/min; when the volume percentage concentration of the etching solution is 2%, the etching rate of the glass chips is 0.3 μm/min.
The reaction of the glass chips and the etching solution is specifically the reaction of silicon dioxide in the glass chips and hydrofluoric acid, so that the volume of the glass chips is reduced. The reaction formula is as follows: SiO 22+4HF→SiF4+2H2O,ΔH＝148.9kJ。
In another embodiment, the etching solution is a Buffered Oxide Etch (BOE). Specifically, the buffered oxide etching solution includes an aqueous solution of hydrofluoric acid and an aqueous solution of ammonium fluoride. More specifically, the buffered oxide etching solution includes an aqueous solution of hydrofluoric acid having a volume percentage concentration of 49% and an aqueous solution of ammonium fluoride having a volume percentage concentration of 40%, and a volume ratio of the aqueous solution of hydrofluoric acid having a volume percentage concentration of 49% to the aqueous solution of ammonium fluoride having a volume percentage concentration of 40% is 1: 6. Wherein, the etching rate of the buffer oxide etching solution is about 10 nm/s. By means of NH4F to fix H+So as to maintain a certain etching rate.
Wherein, the silicon dioxide in the glass scraps reacts with hydrofluoric acid to reduce the volume of the glass scraps. The reaction formula is as follows: SiO 22+4HF→SiF4+2H2O,ΔH＝148.9kJ。
Further, the etching time is 50min to 60 min.
Step S120: and introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then carrying out oscillation treatment on the porous elastic fiber.
Wherein, gas is introduced into the porous elastic fiber in the etching solution, and the gas is filled into the porous elastic fiber to enlarge the pores of the porous fiber, so that the glass scraps are easier to separate from the porous elastic fiber. Wherein, the introduction of gas into the porous elastic fiber in the etching solution corresponds to the pressurization of the porous elastic fiber.
Specifically, the gas is selected from at least one of air, nitrogen, and helium. The prices of air, nitrogen and helium are relatively low, and the cost is saved. It should be noted that other inert gases may be used if cost considerations are not taken into account.
Specifically, the step of introducing gas into the porous elastic fiber in the etching solution comprises the following steps: and sealing the jig, and introducing gas into the jig so as to fill the gas into the porous elastic fibers to increase the pores of the porous fibers.
Introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then performing oscillation treatment on the porous elastic fiber, wherein the frequency of the oscillation treatment is 20 Hz-50 Hz; the time of the oscillation treatment is 10 min-20 min. Specifically, the oscillation process is ultrasonic oscillation.
Step S130: releasing the gas in the porous elastic fiber, and then carrying out oscillation treatment on the porous elastic fiber.
The gas in the porous elastic fiber is released, so that the porous elastic fiber can be decompressed, the temperature of the etching solution is increased, the etching rate is accelerated, the volume of the glass scraps is reduced, and the glass scraps are easier to separate from the porous elastic fiber.
Wherein, in step S120, gas is introduced into the porous elastic fiber in the etching solution, and the pressure of the gas is assumed to be from P1Increase to P2(P2Greater than P1) The mole number of the gas is from N1Increase to N2(N2Greater than N1)。
The average kinetic energy of a molecular gas is Ek，Ek3/2kT, where k is the Botzmann constant and T is the absolute temperature.
Then, n moles of the ideal gas internal energy is E ═ n (nN)A)3/2kT＝3/2n(NAk) T-3/2 nRT, where NAIs the Epighur constant, R is the ideal gas constant, and T is the absolute temperature.
Introducing a gas precursorEnergy of the body is 3/2N1RT, the energy of the gas after the gas is introduced is 3/2N2RT, the volume of gas is not changed to V, the temperature is fixed to T.
Assuming N in a closed system with a fixed volume V2The mol number of the gas is N from the mol number of the gas which is released after the etching solution reacts with the glass chips2Down to N1The difference in energy before and after the release of the gas in the porous elastic fiber causes the gas to release heat, and the heat Q is then transferred to the etching solution, causing the temperature of the etching solution to increase (Δ T), thereby accelerating the etching rate of the etching solution. Wherein Q is nCv Δ T (N)2-N1)CvΔT＝3/2(N2-N1)RT＝3/2(P2-P1) V and Cv are gas constant volume molar specific heat.
Assuming that the glass chips are simulated by a spherical shape, the radius is assumed to be 0.5mm, namely about 500um, and the etching rate of the etching solution is 0.6um/min, so that 833min is needed for completely reacting off the glass balls, and about 14h is needed; if the temperature is increased by 10 ℃, the etching rate can be doubled, and if the temperature is increased to 70 ℃, the etching rate is 16 times of the original etching rate at normal temperature, namely, the etching time of the glass chips can be shortened to about 0.9 hour.
Further, in the step of releasing the gas in the porous elastic fiber and then carrying out oscillation treatment on the porous elastic fiber, the frequency of the oscillation treatment is 20 Hz-50 Hz; the time of the oscillation treatment is 10 min-20 min. Specifically, the oscillation process is ultrasonic oscillation.
Specifically, the step of releasing the gas in the porous elastic fiber comprises: and releasing the gas in the jig.
The method further includes a step of washing the porous elastic fiber with water after the step of releasing the gas in the porous elastic fiber and subjecting the porous elastic fiber to the oscillation treatment. Further, the method further comprises a step of drying the porous elastic fiber after the step of washing the porous elastic fiber with water.
The cleaning method of the porous elastic fiber at least has the following advantages:
1) the cleaning method of the porous elastic fiber comprises the steps of soaking the porous elastic fiber adsorbed with the glass scraps in an etching solution to etch the glass scraps, so that the volume of the glass scraps is reduced; gas is introduced into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and the porous elastic fiber is oscillated under the conditions that the volume of the glass scraps is reduced and the pores of the porous fiber are increased, so that the glass scraps are more easily separated from the porous elastic fiber, and the clearance rate of the glass scraps is improved; and releasing gas in the porous elastic fiber to raise the temperature of the etching solution, further improving the etching rate, further reducing the volume of the glass scraps, and then carrying out oscillation treatment on the porous elastic fiber to enable the glass scraps to be separated from the porous elastic fiber more easily, so that the clearance rate of the glass scraps is improved. Therefore, the cleaning method of the porous elastic fiber has high removal rate of the glass scraps.
2) The price of the porous elastic fiber is high, and the cleaning method of the porous elastic fiber can clean and recycle the porous elastic fiber adsorbed with the glass scraps, so that the acquisition cost of the porous elastic fiber is reduced.
3) The structure of the porous elastic fiber is fragile, the structure of the porous elastic fiber is easy to damage by adopting a traditional brushing method, and the cleaning method of the porous elastic fiber can be used for removing glass scraps in the porous elastic fiber under the condition of keeping the porous elastic fiber intact, and the removal rate of the glass scraps is high.
An embodiment of the cleaning apparatus is capable of cleaning porous elastic fiber adsorbed with glass dust. Specifically, the cleaning apparatus includes a jig and a gas delivery device (not shown).
The jig can contain the etching solution and the porous elastic fiber and can seal the etching solution and the porous elastic fiber. Specifically, referring to fig. 1 and fig. 2, the fixture includes a housing 210 and a housing cover 220.
Referring to fig. 3, the housing 210 has a receiving cavity 211 and an opening 212 communicating with the receiving cavity 211, and the housing 210 has a vent hole 213, and the vent hole 213 communicates with the receiving cavity 211.
Specifically, the housing 210 has a rectangular parallelepiped structure. More specifically, the outer dimensions of the housing 210 are: 1010mm 105mm (W L H); the internal dimensions of the housing 210 are: 1000mm 100mm (W L H).
Specifically, the vent hole 213 is a circular hole. Further, the diameter of the vent hole 213 is 20 mm. Further, the distance from the center of the circle of the vent hole 213 on the housing 210 to the end of the housing 210 near the opening 212 is 30 mm.
Specifically, the material of the housing 210 is Monel (Monel alloy). Monel alloy is also called nickel alloy, which is an alloy made by taking metal nickel as a matrix and adding other elements such as copper, iron, manganese and the like. The Monel alloy has good corrosion resistance and high temperature and pressure resistance, is silvery white and is suitable for being used as a border wire material. Further, the Monel alloy is selected from one of Monel 400 alloy and Monel K500 alloy.
Further, the housing 210 is provided with an annular groove 214 disposed around the opening. Specifically, the minimum distance from the side wall of the annular groove 214 to the outer wall of the housing 210 is 1.5 mm; the minimum distance from the side wall of the annular groove 213 to the inner wall of the housing 210 is 1 mm; the line width radius is 1.5 mm. Wherein the line width radius is half the width of the annular groove 213.
The housing cover 220 can be placed over the opening 212 and sealingly connected to the housing 210. Specifically, the cover 220 has a plate-like structure. Further, the outer dimensions of the cover 220 are: 1010mm 30mm (W L H); inner size of the cover 220: 1000mm 25mm (W L H).
Specifically, the material of the cover 220 is Monel (Monel alloy). Monel alloy is also called nickel alloy, which is an alloy made by taking metal nickel as a matrix and adding other elements such as copper, iron, manganese and the like. The Monel alloy has good corrosion resistance and high temperature and pressure resistance, is silvery white and is suitable for being used as a border wire material. Further, the Monel alloy is selected from one of Monel 400 alloy and Monel K500 alloy.
Further, an annular groove 221 is formed in the cover 220, and the annular groove 221 is formed along an edge of the cover 220. Wherein, the inner wall of the annular groove 221 is semi-cylindrical. Specifically, the curvature radius of the outer ring of the annular groove 221 is 1.5 mm; the curvature radius of the inner ring of the annular groove 221 is 1 mm; the line width radius is 1.5 mm. Wherein the line width radius is half the width of the annular trench 221.
It should be noted that the jig further includes a sealing ring (not shown), the sealing ring can be at least partially accommodated in the annular groove 214, and the housing cover 220 can be elastically abutted against the sealing ring to limit the sealing ring, so that the air tightness between the housing 210 and the sealing ring 221 is better, and the housing cover 220 is hermetically connected with the housing 210. In one embodiment, the sealing ring can be partially received in the annular groove 214. In another embodiment, the seal ring can be entirely received in the annular groove 214.
Further, when the sealing ring can be partially accommodated in the annular groove 214, the sealing ring can also be partially accommodated in the annular groove 221 to limit the sealing ring, and the air tightness between the housing cover 220 and the sealing ring 221 is better. Wherein, the sealing washer is the rubber strip that is used for the oil blanket, and the structure can form the driving fit about external force pressurization to reach better sealed effect through inside and outside atmospheric pressure difference. Specifically, the sealing ring is an O-shaped ring.
The gas conveying device can convey gas into the jig and can receive the gas released from the jig so as to adjust the pressure in the jig. Further, the gas delivery device can deliver gas into the receiving cavity 211 through the vent hole 213 and can receive gas released from the receiving cavity 211 to adjust the pressure in the receiving cavity. Both can accept the chamber pressure boost, also can accept the chamber decompression. Specifically, the gas is air or an inert gas. Specifically, the gas delivery device comprises a pressure reducing assembly, a pressure increasing assembly, a valve assembly, a pipeline, a filter and a gas supply source.
It should be noted that the cleaning device further includes a hydraulic device, and the hydraulic device can pressurize the housing cover 220 to ensure the sealing between the housing cover 220 and the housing 210 during the process of delivering the gas to the jig. The hydraulic device is a transmission mode mainly utilizing hydraulic pressure to transmit power and control, and the hydraulic cylinder converts hydraulic energy into mechanical energy to clamp and fix the shell 210 and the shell cover 220 so as to seal the accommodating cavity. Specifically, the hydraulic device is a hydraulic press or an oil press.
The cleaning equipment is simple and easy to assemble and is suitable for industrial production.
The following are specific examples:
example 1
The cleaning procedure for the porous elastic fiber of this example was as follows:
(1) placing the porous elastic fiber polycarbonate adsorbed with the glass chips and a buffered oxide etching solution into a jig, and soaking the porous elastic fiber polycarbonate in the buffered oxide etching solution for 55min, wherein the buffered oxide etching solution comprises a hydrofluoric acid aqueous solution with a volume percentage concentration of 49% and an ammonium fluoride aqueous solution with a volume percentage concentration of 40%, and the volume ratio of the hydrofluoric acid aqueous solution with a volume percentage concentration of 49% to the ammonium fluoride aqueous solution with a volume percentage concentration of 40% is 1: 6;
(2) sealing the jig, applying pressure to the jig by adopting a hydraulic press, and introducing air into the jig to increase the pressure in the jig, wherein the pressure in the jig is less than the pressure of the hydraulic press; then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 20 Hz;
(3) releasing the air in the jig to reduce the pressure in the jig, then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 20Hz, and then sequentially washing and drying the porous elastic fiber.
Example 2
The cleaning procedure for the porous elastic fiber of this example was as follows:
(1) placing the porous elastic fiber polycarbonate adsorbed with the glass chips and hydrofluoric acid with the volume percentage concentration of 40% in a jig, and soaking the porous elastic fiber polycarbonate in hydrofluoric acid solution for 50 min;
(2) sealing the jig, applying pressure to the jig by adopting a hydraulic press, and introducing nitrogen into the jig to increase the pressure in the jig, wherein the pressure in the jig is less than the pressure of the hydraulic press; then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 50 Hz;
(3) and releasing nitrogen in the jig to reduce the pressure in the jig, then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 50Hz, and then sequentially washing and drying the porous elastic fiber.
Example 3
The cleaning procedure for the porous elastic fiber of this example was as follows:
(1) placing the porous elastic fiber polycarbonate adsorbed with the glass chips and hydrofluoric acid with the volume percentage concentration of 2% in a jig, and soaking the porous elastic fiber polycarbonate in a hydrofluoric acid solution for 60 min;
(2) sealing the jig, applying pressure to the jig by adopting a hydraulic press, and introducing helium gas into the jig to increase the pressure in the jig, wherein the pressure in the jig is less than the pressure of the hydraulic press; then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 40 Hz;
(3) releasing helium in the jig to reduce the pressure in the jig, then carrying out ultrasonic oscillation on the porous elastic fiber for 10min, wherein the frequency of the ultrasonic oscillation is 40Hz, and then sequentially washing and drying the porous elastic fiber.
Comparative example 1
Placing the porous elastic fiber polycarbonate adsorbed with the glass chips and a buffered oxide etching solution in a traditional acid tank, and soaking the porous elastic fiber polycarbonate in the buffered oxide etching solution for 55min, wherein the buffered oxide etching solution comprises 49 volume percent hydrofluoric acid aqueous solution and 40 volume percent ammonium fluoride aqueous solution, and the volume ratio of the 49 volume percent hydrofluoric acid aqueous solution to the 40 volume percent ammonium fluoride aqueous solution is 1: 6; then washing the porous elastic fiber with water, performing ultrasonic oscillation for 10min, wherein the frequency of the ultrasonic oscillation is 20Hz, and then washing and drying the porous elastic fiber in sequence.
And (3) testing:
the sections of the porous elastic fibers cleaned in examples 1 to 3 and comparative example 1 were observed with a high magnification optical microscope OM to obtain the removal rate of glass debris, and the results are shown in table 1.
TABLE 1 results of glass chip removal rate test in porous elastic fibers of examples 1-2 and comparative example 1
| Examples | Example 1 | Example 2 | Example 3 | Comparative example 1 |
| Glass chip removal rate | 87％ | 64％ | 27％ | 8％ |
As can be seen from Table 1, the cleaning methods for the porous elastic fibers of examples 1 to 3 have a higher removal rate of glass cullet than the cleaning method of comparative example 1.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A method of cleaning porous elastic fibers, comprising the steps of:
soaking the porous elastic fiber adsorbed with the glass chips in an etching solution to etch the glass chips;
introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber, and then oscillating the porous elastic fiber; and
releasing the gas in the porous elastic fiber, and then carrying out oscillation treatment on the porous elastic fiber.
2. The method for cleaning porous elastic fiber according to claim 1, wherein the step of immersing the porous elastic fiber adsorbed with the glass chips in an etching solution comprises: placing the porous elastic fiber adsorbed with the glass chips and the etching solution into a jig;
the step of introducing gas into the porous elastic fiber in the etching solution comprises the following steps: sealing the jig, and introducing the gas into the jig so that the gas is filled into the porous elastic fibers to increase the pores of the porous fibers;
the step of releasing the gas in the porous elastic fiber comprises: releasing the gas in the jig.
3. The method for cleaning porous elastic fiber according to claim 1, wherein in the step of introducing gas into the porous elastic fiber in the etching solution to increase the pores of the porous fiber and then subjecting the porous elastic fiber to the oscillation treatment, the frequency of the oscillation treatment is 20Hz to 50 Hz.
4. The method for cleaning porous elastic fiber according to claim 1, wherein in the step of releasing the gas in the porous elastic fiber and then subjecting the porous elastic fiber to the oscillation treatment, the frequency of the oscillation treatment is 20Hz to 50 Hz.
5. The method for cleaning porous elastic fiber according to claim 4, further comprising a step of washing said porous elastic fiber with water after said step of releasing said gas from said porous elastic fiber and subjecting said porous elastic fiber to an oscillation treatment.
6. The method for cleaning porous elastic fiber according to claim 5, further comprising a step of drying the porous elastic fiber after the step of washing the porous elastic fiber with water.
7. The method of claim 1, wherein the etching solution is at least one selected from the group consisting of hydrofluoric acid and buffered oxide etching solutions.
8. The method for cleaning porous elastic fiber according to claim 7, wherein the etching solution is hydrofluoric acid, and the volume percentage concentration of the etching solution is 2-40%.
9. The cleaning equipment is characterized by comprising a jig and a gas conveying device, wherein the jig can contain etching liquid and porous elastic fibers and can seal the etching liquid and the porous elastic fibers, the gas conveying device can convey gas into the jig and can receive the gas released from the jig, the jig comprises a shell and a shell cover, the shell is provided with an opening for accommodating a cavity and communicating with the accommodating cavity, the shell cover can be covered on the opening and is connected with the shell in a sealing manner, the cleaning equipment further comprises a hydraulic device, and the hydraulic device can pressurize the shell cover so as to ensure that the shell cover is sealed between the shell cover and the shell in the process of conveying the gas to the jig.
10. The cleaning apparatus as claimed in claim 9, wherein the housing is capable of containing the etching solution and the porous elastic fiber, a vent hole is formed in the housing, the vent hole is in communication with the housing, and the gas delivery device is capable of delivering the gas into the housing through the vent hole and receiving the gas released from the housing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910317157.XA CN109954714B (en) | 2019-04-19 | 2019-04-19 | Cleaning method and cleaning device for porous elastic fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910317157.XA CN109954714B (en) | 2019-04-19 | 2019-04-19 | Cleaning method and cleaning device for porous elastic fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109954714A CN109954714A (en) | 2019-07-02 |
| CN109954714B true CN109954714B (en) | 2020-12-15 |
Family
ID=67026210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910317157.XA Active CN109954714B (en) | 2019-04-19 | 2019-04-19 | Cleaning method and cleaning device for porous elastic fiber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109954714B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113814224A (en) * | 2021-08-23 | 2021-12-21 | 中国电子科技集团公司第十五研究所 | Printed board hole wall drilling dirt treatment method |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2725312B2 (en) * | 1988-10-14 | 1998-03-11 | 大日本インキ化学工業株式会社 | Porous hollow fiber membrane type gas-liquid contactor |
| JPH06327949A (en) * | 1993-05-21 | 1994-11-29 | Nitto Denko Corp | Membrane cleaning method for membrane separation device |
| AU773233B2 (en) * | 1998-11-23 | 2004-05-20 | Zenon Technology Partnership | Water filtration using immersed membranes |
| CA2533505C (en) * | 2003-09-22 | 2013-02-19 | U.S. Filter Wastewater Group, Inc. | Backwash and cleaning method |
| KR20080005993A (en) * | 2005-04-29 | 2008-01-15 | 지멘스 워터 테크놀로지스 코포레이션 | Chemical Cleaning of Membrane Filters |
| EP2274066B9 (en) * | 2008-04-11 | 2020-12-09 | LiqTech International A/S | A ceramic dead-end filter, a filter system and method of filtering |
| JP5371145B2 (en) * | 2008-12-25 | 2013-12-18 | 志摩環境事業協業組合 | Immersion membrane separator |
| CN201404772Y (en) * | 2009-04-15 | 2010-02-17 | 北京中水源膜技术有限公司 | Hollow fiber ultrasonic cleaning device |
| CN102078713B (en) * | 2010-11-13 | 2013-01-16 | 国家电网公司 | Method for cleaning polypropylene fiber rope filtering elements of powdered resin filter |
| KR101818802B1 (en) * | 2011-02-07 | 2018-01-15 | 미쯔비시 케미컬 주식회사 | Washing device for porous hollow fiber membranes, and porous hollow fiber membrane production method |
| CN203577650U (en) * | 2013-11-11 | 2014-05-07 | 济南沃特佳科技有限公司 | Reverse osmosis membrane ultrasonic cleaning device |
| CN204193670U (en) * | 2014-09-29 | 2015-03-11 | 北京中设国维机电技术有限公司 | A kind of cleaning case of industrial filter core |
| CN107603749A (en) * | 2017-09-15 | 2018-01-19 | 衢州市鼎盛化工科技有限公司 | Cleaning fluid and its application for acid-etched glass slag |
| CN108525396B (en) * | 2018-04-28 | 2019-08-27 | 江苏灵氟隆环境工程有限公司 | A kind of automation filter cloth cleaning device |
-
2019
- 2019-04-19 CN CN201910317157.XA patent/CN109954714B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109954714A (en) | 2019-07-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109954714B (en) | Cleaning method and cleaning device for porous elastic fiber | |
| CN102923939B (en) | Method for cutting tempered glass | |
| CN101740341B (en) | Carbon dioxide low-temperature aerosol semiconductor cleaning equipment | |
| TW349244B (en) | Method of fabricating a semiconductor device using a CMP process and a polishing apparatus for such a CMP process | |
| JPH10275798A (en) | Anodizing apparatus and related apparatus and method | |
| JPH0384919A (en) | Method and apparatus for bonding semiconductor substrates | |
| WO2020024498A1 (en) | Glass composite, housing, display apparatus, and terminal device | |
| CN102652350B (en) | The method of metal pollutant is removed from the upper electrode for plasma indoor | |
| US9082715B2 (en) | Substrate polishing apparatus | |
| CN103663988A (en) | Mixed acid and method for treating surface of optical fiber preform | |
| CN103238211B (en) | For the treatment of the method for wafer and nude film | |
| CN210000934U (en) | chemical industry is with chemical industry holding vessel that can crashproof | |
| CN109794844B (en) | Grinding and manufacturing process of high-purity gas cylinder | |
| CN218830741U (en) | Sucking disc formula low temperature radio frequency plasma treater of local restoration bronze ware | |
| CN113889399B (en) | Liquid seepage prevention trimming process | |
| JP5128985B2 (en) | Universal stopper | |
| KR20020010529A (en) | Process for the Chemical Treatment of Semiconductor Wafers | |
| CN106350252A (en) | Glass door and window washing agent | |
| CN109534683B (en) | Method for eliminating defects of quartz glass subsurface layer | |
| CN113751445A (en) | Cleaning device and method for glass bulb of micro atomic gas chamber | |
| JP3489104B2 (en) | Manufacturing method of polarization maintaining optical fiber | |
| CN1332064C (en) | Method for reducing fluorine residue in chamber of deposition reaction chamber | |
| JPH1035418A (en) | Wiper blade rubber and method for producing the same | |
| CN102034699A (en) | Polishing method | |
| CN115591850B (en) | A method for cleaning and regenerating quartz parts for semiconductor dry etching equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |