CN102592961A - Wafer discharging and arranging machine - Google Patents

Abstract

The invention relates to a wafer discharging and arranging machine, which comprises a discharging machine, a row of wafer screening machines and a cleaning machine; the wafer discharging screening machine comprises a mechanical arm and a visual detection device, wherein the mechanical arm can clamp a wafer from the wafer discharging position and is matched with the visual detection device to detect whether the wafer is damaged or not, if the wafer is completely moved into a wafer carrier on the other side, the wafer carrier can be conveyed into the cleaning machine, a plurality of solvent tanks and pure water tanks are used for cleaning the wax remained on the wafer, and finally, the wafer is dried by nitrogen and discharged.

Description

Wafer unloading and arranging machine

technical field

The invention relates to a machine tool, in particular to a wafer unloading and arranging machine integrated with the functions of removing wafers, screening and arranging wafers, cleaning wafers and grinding discs.

Background technique

In the LED chip manufacturing process of the prior art, one of the procedures is to grind the wafer, which is to wax a plurality of wafers and stick them on a ceramic or iron grinding disc, and then set the grinding disc on the corresponding grinding machine The thinning operation of wafer grinding is carried out. After each wafer is ground, the grinding disc can be taken out of the machine. The standard process is to dissolve the wax with an organic solvent and then remove the wafer from the grinding disc. This procedure must be Manually use wafer tweezers or a safety scraper to remove the wafer from the grinding disc, and then manually screen the damaged wafer and use a solvent to clean the wafer. However, the wafer removal procedure in the prior art has the following disadvantages;

First of all, the solvents used in the manufacturing process usually have carcinogenic ingredients, which are obviously harmful to the health of the operators. Furthermore, the manual removal of the wafers not only slows down the production speed, but also often causes wafer damage due to negligence in personnel operations, which increases the The defective rate of production, so the wafer manufacturing process of the prior art needs to be further improved.

Contents of the invention

In view of the fact that the wafer thinning process in the prior art has manual operations that increase the probability of chipping and may affect the health of the human body due to exposure to solvents, the purpose of the present invention is to provide a machine tool that can integrate the process and improve Production yield.

The present invention is a wafer unloading machine, which includes a unloading machine, a wafer screening machine and a cleaning machine;

The frame of the unloading machine is provided with a feeding conveying device, a plurality of solvent tanks, at least one pure water tank, a lifting device, a transverse moving device and a discharging conveying device;

The feeding conveying device is arranged at one end of the frame;

The solvent tank is provided with a solvent, and each solvent tank is sequentially arranged on the frame and one end thereof is adjacent to the feeding conveying device;

The pure water tank is provided with pure water, and the pure water tank is arranged on the frame at the other end of the solvent tank;

The lifting device includes a plurality of lifting arms, each lifting arm is respectively arranged above each tank body, and the lifting arm can be lowered to be located in the tank body or raised to be positioned above the tank body;

The traversing device is arranged on one side of each trough, and the traversing device has a plurality of push rods, and a push rod is respectively provided on one side of each trough, and the push rod can be pushed or retracted towards one end of the frame;

The discharge conveying device is arranged at the other end of the machine body;

The sheet arranging and screening machine includes a mechanical arm and a visual detection device; the mechanical arm is adjacent to the discharge conveying device of the unloading machine; the position of the visual detection device is relative to the mechanical arm;

The frame of the washing machine is provided with a feeding conveying device, at least one solvent tank, a plurality of pure water tanks, at least one nitrogen drying device, a lifting device, a transverse moving device and a discharging conveying device;

The feeding conveying device is arranged at one end of the frame and adjacent to the mechanical arm;

The solvent tank is provided with a solvent, and the solvent tank is arranged on the frame and adjacent to the feeding conveying device;

The pure water tank is provided with pure water, and each pure water tank is sequentially arranged on the frame and one end is adjacent to the solvent tank;

The nitrogen drying device is arranged on the frame and adjacent to the other end of the pure water tank;

The lifting device includes a plurality of lifting arms, each lifting arm is respectively arranged above each tank body, and the lifting arm can be lowered to be located in the tank body or raised to be positioned above the tank body;

The traversing device is arranged on one side of each trough, and the traversing device has a plurality of push rods, and a push rod is respectively provided on one side of each trough, and the push rod can be pushed or retracted towards one end of the frame;

The discharge conveying device is arranged at the other end of the frame, and is adjacent to the nitrogen drying device.

The wafer unloading machine, wherein each solvent tank of the unloading machine is equipped with an electric heater and an ultrasonic device, and the electric heater can heat the solvent;

The pure water tank of the unloading machine is equipped with an electric heater and an ultrasonic device, and the electric heater can heat the pure water.

The wafer unloading and arranging machine, wherein each solvent tank of the cleaning machine is equipped with an electric heater and an ultrasonic device, and the electric heater can heat the solvent;

The pure water tank of the washing machine is equipped with an electric heater and an ultrasonic device, and the electric heater can heat the pure water.

The wafer unloading machine is further provided with a suction device on the frame of the unloading machine. The suction device includes a lifting mechanism, a lateral movement mechanism and a suction cup part, and the suction cup part is located at the exit of the unloading machine. Above the material conveying device, the suction cup part can be driven by the lifting mechanism and the traversing mechanism to lift and move laterally.

The described wafer unloading machine is further provided with a disc conveying device on the frame of the unloading machine, which has a slide rail, a lifting table and a conveyor belt; the conveyor belt is arranged on the frame and protrudes Below the feed conveying device of the frame, the slide rail is connected to the conveyer belt at the bottom of the discharge conveying device, the lifting platform and the slide rail are slidably combined, and the lifting platform can move along the slide rail It can be raised on the surface of the discharge conveying device, and can also be lowered along the lifting slide rail to be located on the surface of the conveyor belt.

The wafer unloading machine, wherein the traversing device of the unloading machine includes a traversing push arm, the traversing push arm is located on one side of each liquid tank, and each push rod is vertically connected with the traversing push arm and Located on the side of the liquid tank.

Said wafer unloading machine, wherein the traversing device of the cleaning machine includes a traversing push arm, the traversing push arm is located on one side of each liquid tank, and each push rod is vertically connected with the traversing push arm and Located on the side of the liquid tank.

In the wafer unloading and arranging machine, the mechanical arm is a six-axis mechanical arm.

By means of the above-mentioned technical means, the lower chip machine can remove the wafer from the grinding disc, and the grinding disc can be cleaned and recovered, and the damaged wafer can be removed by the sorting and screening machine, and the good wafer can be placed in a wafer carrier , the cleaning machine can clean the wafers in the wafer carrier, and then dry the cleaned wafers with nitrogen gas. The present invention will take off the wafers, clean the grinding disc, screen the broken pieces, arrange the wafers and clean the wafers. Five production processes Integration, and can achieve standardized and automated production by connecting the control system, which can effectively increase production capacity, eliminate the defect rate of chip damage caused by human error, effectively reduce personnel costs, and further prevent operators from contacting solvents that affect their health risks in order to comply with the factory specifications of various countries.

Description of drawings

Figure 1 is a top view of the present invention.

Fig. 2 is a top view of the unloading machine of the present invention.

Fig. 3 is a side view of the unloading machine of the present invention.

Fig. 4 is a top view of the sheet arranging and screening machine of the present invention.

Fig. 5 is a side view of the sheet arranging and screening machine of the present invention.

Fig. 6 is a top view of the washing machine of the present invention.

Fig. 7 is a side view of the washing machine of the present invention.

FIG. 8 is a three-dimensional appearance view of the grinding disc and the carrying table of the present invention.

FIG. 9 is a schematic cross-sectional view of the grinding disc and the carrying table of the present invention.

Explanation of reference signs

10 unloading machine 11 racks

111 outer end 112 inner end

113 tracks

12 Input delivery device 121 horizontal movement cylinder

122 lift cylinder 1221 telescopic rod

13 liquid tank

131, 132, 133, 134, 135 solvent tank

136, 137 pure water tank 138 electric heater

139 Ultrasonic equipment

14 Lifting device 141 Lifting cylinder

142 lifting slide rails 143 lifting seat

144 lifting arm 145 fork

15 traverse device

151 horizontal push arm 152 push rod

16 Discharge conveyor device 161 Discharge platform

1611 input end

162 Suction device 1621 Lifting mechanism

1622 Traversing mechanism                                                                                                                                                                                                                                      

17 Tray conveying device

171 slide rails 172 lift table

173 conveyor belt 18 solvent circulation tank

20 racks and sieving machine 21 racks

22 Mechanical arm 23 Visual inspection device

30 washing machines 31 racks

311 inner end 312 outer end

313 tracks

32 feed conveying device 321 conveyor belt

322 lifting cylinder

33 liquid tank 331 solvent tank

332, 333, 334 pure water tank

335 electric heater 336 ultrasonic equipment

34 Nitrogen drying device 35 Lifting device

351 lift cylinder 352 lift slide rail

353 Lifting Seat 354 Lifting Arm

355 fork

36 traverse device

361 horizontal push arm 362 push rod

37 discharge conveying device 371 conveyor belt

372 lifting cylinder

40 Grinding Disc 41 Carrying Table

42 wafer carrier 50 wafers

Detailed ways

The wafer unloading machine of the present invention, as shown in FIG. 1 , includes a unloading machine 10, an arranging and screening machine 20 and a cleaning machine 30;

This unloading machine 10, please refer to shown in Fig. 2 and Fig. 3, it comprises a frame 11, a feeding conveying device 12, a plurality of liquid tanks 13, a lifting device 14, a traverse device 15, a discharge Conveying device 16, a disc conveying device 17 and a solvent circulation tank 18;

The frame 11 is a frame body, which has an outer end 111 and an inner end 112, and a plurality of tracks 113 are arranged on the frame 11, and each track 113 is arranged at an interval;

The feeding conveying device 12 is arranged at the outer end 111 of the frame 11, and it includes a traverse cylinder 121 and a lift cylinder 122 connected to each other, and the traverse cylinder 121 can move towards the outer end 111 of the frame 11. The lifting cylinder 122 is released or retracted, and the lifting cylinder 122 has a telescopic rod 1221 that can be lifted or lowered. The lifting rod 1221 is provided with a platform that can carry objects at the top. The object is moved toward the outer end 111 of the frame 11 by the traverse cylinder 121 and then lifted by the lifting cylinder 122 to be located in the frame 11;

The liquid tank 13 is a hollow tank body, liquid, electric heater 138 and ultrasonic equipment 139 are arranged in each liquid tank, and each liquid tank 13 includes five solvent tanks 131, 132, 133, 134, 135 and two pure water tanks 136, 137 that are provided with pure water, the electric heater 138 can heat the liquid in the liquid tank 13, the ultrasonic equipment 139 is a prior art, it can generate vacuum bubbles in the liquid, Solvent tanks 131, 132, 133, 134, 135 and pure water tanks 136, 137 are sequentially arranged on the frame 11 along the direction from the outer end 111 to the inner end 112, and the two sides at the top of each solvent tank 13 are connected to the track 113 connected;

The lifting device 14 is arranged on the frame 11, and it includes a lifting cylinder 141, a plurality of lifting slide rails 142, a plurality of lifting seats 143 and a plurality of lifting arms 144, and the lifting slide rails 142 are vertically arranged on the frame 11. The lifting base 143 and the lifting slide rail 142 are slidably combined with each other, and the lifting cylinder 141 can drive the lifting base 143 to move up or down on the lifting slide rail 142. The top of the lifting arm 144 is connected to the lifting base. 143 connection, the bottom of the lifting arm 144 is provided with a fork frame 145 that can carry objects on the top surface, the lifting arm 144 can be positioned at the top of each liquid tank 13 when the lifting seat 143 rises, the fork frame of the lifting arm 144 145 can be located inside each liquid tank 13 when the lifting seat 143 descends;

The traverse device 15 is arranged on the frame 11, and it includes a traverse cylinder (not shown in the figure), a traverse push arm 151 and a plurality of push rods 152, and the traverse push arm 151 is arranged on each liquid tank 13 A plurality of push rods 152 protrude from the arm body of the traverse push arm 151, a push rod 152 is set between two adjacent liquid tanks 13, and a push rod 152 is set above the feeding conveying device 12. There is a push rod 152, and the traverse cylinder can push the traverse push arm 151 toward the inner end 112 of the frame 11 to push out or retract, and the traverse push arm 151 can drive each push rod 152 toward the inner end 112 of the frame 11. direction to push out or retract;

The discharge conveying device 16 includes a discharge platform 161 and a suction device 162; the top surface of the discharge platform 161 can carry objects, and the discharge platform has a feed end 1611 and a discharge end 1612, The discharge platform 161 is connected to the track 113 next to the pure water tank 137 with the feed end 1611; the suction device 162 includes a lift cylinder 1621, a traverse cylinder 1622 and a sucker part 1623, and the sucker part 1623 is relatively to the discharge Above the platform 161, the suction cup part 1623 can suck up or put down the objects on the discharge platform 161 at the bottom, and can be driven by the lifting cylinder 1621 and the traverse cylinder 1622 to perform lifting and lateral displacement;

The disc conveying device 17 includes a slide rail 171, a lifting platform 172 and a conveyor belt 173, the conveyor belt 173 is arranged on the bottom of the frame 11 and can be driven by a motor (not shown), and the conveyor belt 173 can be The object is transported from the inner end 112 of the frame 11 to the outer end 111, the slide rail 171 is vertically arranged between the feeding end 1611 of the discharge platform 161 and the conveyor belt 173, and the lifting platform 172 is arranged on the slide rail 171 There is also a lifting cylinder 1721 on the top, the lifting platform 172 can be driven by the lifting cylinder 1721 to move up or down along the slide rail 181, and the top surface of the lifting platform 172 is located at the feeding end of the discharge conveying device 16 after rising 1611 surface, located on the surface of conveyor belt 173 after descending;

This solvent circulation tank 18 is positioned on the frame 11, and its inside is provided with solvent and communicates with each solvent tank 131,132,133,134,135, and this solvent circulation tank 18 can be to each solvent tank 131,132,133,134 , The solvent in 135 is renewed in circulation;

The sheet arranging and screening machine 20, please refer to Fig. 4 and Fig. 5, it includes a frame 21, a mechanical arm 22 and a visual inspection device 23;

The frame 21 is a frame, and the frame is arranged on one side of the inner end 112 of the lower part 10;

The mechanical arm 22 is arranged on the frame 21, and it is a six-axis mechanical arm 22, which can rotate in multiple directions. The front end of the mechanical arm 22 can pick up objects or put them down;

The visual detection device 23 is a prior art, it is arranged on the frame 11 of the unloading machine 10 and faces the mechanical arm 22, the visual detection device 23 can cooperate with the mechanical arm 22;

This cleaning machine 30, please refer to shown in Fig. 6 and Fig. 7, it comprises a frame 31, a feeding conveying device 32, a plurality of liquid tanks 33, at least one nitrogen drying device 34, a lifting device 35, a Traversing device 36 and a discharge conveying device 37;

The frame 31 is a frame body, which has an inner end 311 and an outer end 312. The inner end 311 of the frame 31 is located on one side of the mechanical arm 22, and a plurality of tracks 313 are arranged on the frame 31, each The tracks 313 are arranged at intervals;

The feeding conveying device 32 is arranged at the inner end 311 of the frame 31, and it includes a conveyor belt 321 which can be rotated by a motor (not shown in the figure) and a lifting cylinder 322. The conveyor belt 321 can transport objects to the lift At the cylinder 322, the lifting cylinder 322 can lift the object into the inner end 311 of the frame 31;

The liquid tank 33 is a hollow tank body with a liquid inside, which includes a solvent tank 331 with a solvent inside and three pure water tanks 332, 333, 334 with pure water inside. The water tank 332, the pure water tank 333 and the pure water tank 334 are sequentially arranged on the frame 31 along the direction from the inner end 311 to the outer end 312, and the two sides of the top of each liquid tank 33 are respectively connected with the track 313. Electric heater 335, this electric heater 335 can heat the liquid in liquid tank 33, and is provided with ultrasonic equipment 336 in solvent tank 331 and pure water tank 332,333 respectively, and this ultrasonic equipment 336 is prior art, its Vacuum bubbles can be generated in the solvent tank 331 and the pure water tanks 332 and 333;

The nitrogen drying device 34 is arranged on the frame 31 adjacent to the pure water tank 334, the two sides of the top of the nitrogen drying device 34 are respectively connected to the track 313, and the track 313 on one side is connected to the pure water tank 334. connected, the nitrogen drying device 34 can dry the internal objects;

The lifting device 35 is arranged on the frame 31, and it includes a lifting cylinder 351, a plurality of lifting slide rails 352, a plurality of lifting seats 353 and a plurality of lifting arms 354, and the lifting slide rails 352 are vertically arranged on the frame 31. The lifting base 353 and the lifting slide rail 352 are slidably combined, and the lifting cylinder 351 can drive the lifting base 353 to move up or down on the lifting slide rail 352. The top of the lifting arm 354 is connected to the lifting base. 353 connection, the bottom of the lifting arm 354 is provided with a fork frame 355 that can carry objects on the top surface, the lifting arm 354 can be positioned at the top of each liquid tank 33 when the lifting seat 353 rises, the fork frame of each lifting arm 354 355 can be located inside each liquid tank 33 and nitrogen drying device 34 when the lifting seat 353 descends;

The traverse device 36 is arranged on the frame 31, and it includes a traverse cylinder (not shown), a traverse push arm 361 and a plurality of push rods 362, and the traverse push arm 361 is arranged on each liquid tank 33 A plurality of push rods 362 protrude from the arm body of the laterally moving push arm 361, a push rod 362 is set between two adjacent liquid tanks 33, and a push rod 362 is set above the feeding conveying device 32. There is a push rod 362, and the traverse cylinder can push the traverse push arm 361 toward the direction of the outer end 312 of the frame 31 to push out or retract, and the traverse push arm 361 can drive each push rod 362 toward the direction of the outer end 312 of the frame 31. direction to push out or retract;

The discharge conveying device 37 is arranged at the outer end 312 of the frame 31, and it includes a conveyor belt 371 that can be rotated by a motor (not shown) and a lift cylinder 372, and the lift cylinder 372 can move the frame 31 The object at the outer end 312 of the lower end is lowered and connected to the conveyor belt 371 to transport the object away from the frame 31 direction;

When the present invention is in use, it is used with a grinding disc 40, a carrier 41 and a wafer carrier 42. Please refer to FIG. 8 and FIG. There are a plurality of chips 50, the carrier 41 is a block, and the side of the block has a bonding surface 411 relative to the side of the grinding disc 40 with the chip 50, and a plurality of chips are recessed in the bonding surface 411 corresponding to the positions of each chip 50. a receiving groove 412, and a passage 413 is perforated on the surface of each receiving groove 412, so that when the grinding disc 40 is combined with the carrier 41, the liquid can flow into or out of the receiving groove 412 through the flow passage 413; The wafer carrier 42 is a single body, which can carry a plurality of wafers 50;

When the present invention is actually used, the grinding disc 40 and the carrying table 41 are combined with each other, so that each wafer 50 stuck on the grinding disc 40 is located in each accommodating groove 412 of the carrying table 40, and the combined grinding The disc 40 and the carrier table 41 are transported into the outer end 111 of the frame 11 by the feed conveying device 12 at the lower chip machine 10, and the push rod 152 of the traverse device 15 is relatively to the sides of the grinding disc 40 and the carrier table 41 And move along this track 113, make this grinding disc 40 and carrying platform 41 be positioned on the fork frame 145 of lifting arm 144 above this solvent tank 131, with the lifting arm 144 of this lifting device 14 this grinding disc 40 and carrying platform 41 descends to the solvent tank 131 for cleaning, the solvent can flow into the interior of the accommodating tank 412 along the flow channel 413 on the bottom surface of the carrier 41 to dissolve the wax between the wafer 50 and the grinding disc 40, and then lift the lifting arm 144 to drive The grinding disc 40 and the carrying platform 41 are located above the solvent tank 131, the solvent in the accommodating tank 412 can flow out along the flow channel 413, and the traversing device 15 can be pushed by the push rod 152 to push the grinding disc 40 and the carrying platform 41 to At the next lifting arm 144, and follow this step to dissolve and clean the wax between the grinding disc 40 and the wafer with solvent tanks 132, 133, 134, 135 and pure water tanks 136, 137, and then push with push rod 152 The grinding disc 40 and the carrying platform 41 enter the feeding end 1611 of the discharge platform 161, and the grinding disc 40 and the carrying platform 41 are jointly sucked up by the suction cup portion 1623 of the suction device 162 and moved towards the discharging end 1612 of the discharging platform 161. Move, the suction cup part 1623 lowers the carrier table 41 sucked up and is positioned at the discharge end 1612, and the suction cup part 1623 moves the grinding disc 40 to the feed end 1611 of the discharge platform 161 and lowers it to make the grinding Disc 40 is positioned at the top of lifting platform 172, and this lifting platform 172 can lower grinding disc 40 to conveyer belt 173 place and to the outer end 111 of frame 11; It can be picked up by the mechanical arm 22 and checked with the visual inspection device 23 for damage. If there is no damage, the mechanical arm 22 will clamp the wafer 50 to the wafer carrier on the feeding conveying device 32 of the cleaning part 30. 42, the wafer carrier 42 can be driven by the feeding conveying device 32 to enter below the frame 31 inner end 311 of the washing machine 30 and be lifted by the lifting cylinder 322, with the push rod 362 of the traverse device 36 relative to the The side of the wafer carrier 42 is moved along the track 313, so that the wafer carrier 42 is positioned on the fork frame 355 of the lifting arm 354 above the solvent tank 331, and the wafer carrier 42 is placed on the lifting arm 354 of the lifting device 35. 42 descend to the solvent tank 331 for cleaning and then ascend, and follow this step in order to lower the wafer carrier 42 to each liquid tank 33 for cleaning and then ascend, and move forward to the next liquid tank 33 driven by the traverse device 36 , the wafer carrier 42 is cleaned in the pure water tank 334 Afterwards, it will be driven by the lifting arm 354 and enter the nitrogen drying device 34 to dry the moisture on the wafer 50, and then output through the discharge conveying device 37 at the outer end 312 of the frame 31.

From the above, it can be seen that the present invention integrates the five production processes of wafer removal, cleaning of grinding discs, screening of fragments, arraying of wafers, and cleaning of wafers, and can be achieved by connecting the unloading machine, wafer sorting and screening machine and cleaning machine to the control system Achieving standardized and automated production can effectively increase production capacity, eliminate the defect rate of wafer damage caused by human error, effectively reduce personnel costs, and avoid the risk of cancer caused by operators' contact with solvents, so as to further comply with the factory establishment regulations of various countries.

Claims (8)

1. sheet screening machine under the wafer is characterized in that, includes sheet machine, a screening tablet screening machine and a scrubber;

The frame of this time sheet machine is provided with a charging transport, a plurality of flux bath, at least one pure water groove, a lowering or hoisting gear, a Traverse Displacement Unit and and goes out material conveying device;

This charging transport is arranged at an end place of frame;

Be provided with solvent in this flux bath, each flux bath be arranged on the frame in regular turn and with the one of which end adjacent to this charging transport;

Be provided with pure water in this pure water groove, this pure water groove is arranged on the frame of the other end of flux bath;

This lowering or hoisting gear includes plural lifting arm, and each lifting arm is arranged at the place, top of each cell body respectively, and this lifting arm can be fallen to be positioned at cell body or to rise and be positioned at the cell body top;

This Traverse Displacement Unit is arranged at a side of each cell body, and this Traverse Displacement Unit has a plurality of push rods, is respectively equipped with a push rod in a side of each cell body, and this push rod can promote toward an end of frame or regain;

This goes out the other end place that material conveying device is arranged at body;

This screening tablet screening machine includes a mechanical arm and a vision inspection apparatus; This mechanical arm is adjacent to the material conveying device that goes out of this time sheet machine; The position of this vision inspection apparatus is with respect to this mechanical arm;

The frame of this scrubber is provided with a charging transport, at least one flux bath, a plurality of pure water groove, at least one nitrogen drying unit, a lowering or hoisting gear, a Traverse Displacement Unit and and goes out material conveying device;

This charging transport is arranged at an end of frame and adjacent to this mechanical arm;

Be provided with solvent in this flux bath, this flux bath is arranged on the frame and adjacent to charging transport place;

Be provided with pure water in this pure water groove, each pure water groove be arranged on the frame in regular turn and with an end adjacent to this flux bath;

This nitrogen drying unit is arranged on the frame and adjacent to the other end of this pure water groove;

This lowering or hoisting gear includes plural lifting arm, and each lifting arm is arranged at the place, top of each cell body respectively, and this lifting arm can be fallen to be positioned at cell body or to rise and be positioned at the cell body top;

This Traverse Displacement Unit is arranged at a side of each cell body, and this Traverse Displacement Unit has a plurality of push rods, is respectively equipped with a push rod in a side of each cell body, and this push rod can promote toward an end of frame or regain;

This goes out the other end that material conveying device is arranged at frame, and adjacent to this nitrogen drying unit.

2. sheet screening machine is characterized in that under the wafer as claimed in claim 1, is provided with electric heater and ultrasonic energy in each flux bath of said sheet machine down, and this electric heater can heat solvent;

Be provided with electric heater and ultrasonic energy in the pure water groove of this time sheet machine, this electric heater can heat pure water.

3. sheet screening machine is characterized in that under the wafer as claimed in claim 2, is provided with electric heater and ultrasonic energy in each flux bath of said scrubber, and this electric heater can heat solvent;

Be provided with electric heater and ultrasonic energy in the pure water groove of this scrubber, this electric heater can heat pure water.

4. like sheet screening machine under arbitrary described wafer in the claim 1 to 3; It is characterized in that; Sheet screening machine further is provided with a suction means under the said wafer on the frame of following sheet machine; This suction means includes an elevating mechanism, a transverse-moving mechanism and a sucking disk part, and this sucking disk part is positioned at the top that material conveying device of this time sheet machine, and this sucking disk part can receive elevating mechanism and transverse-moving mechanism to drive with traversing.

5. sheet screening machine is characterized in that under the wafer as claimed in claim 4, and sheet screening machine further is provided with a disk body transport under the said wafer on the frame of following sheet machine, and it has a slide rail, a lifting platform and a conveyer belt; This conveyer belt is arranged on the frame and is stretched on the charging transport below of frame; This slide rail is connected in this place, below that goes out material conveying device and this conveyer belt; This lifting platform and this slide rail are for slidably combining; This lifting platform can rise the surface that is positioned at material conveying device along this slide rail, and also can descend along this lifting sliding rail is positioned at this conveyor belt surface.

6. sheet screening machine is characterized in that under the wafer as claimed in claim 5, and the said Traverse Displacement Unit of sheet machine down includes a traversing push arm, and this traversing push arm is positioned at a side of each liquid tank, each push rod and the vertical side that is connected and is positioned at liquid tank of this traversing push arm.

7. sheet screening machine is characterized in that under the wafer as claimed in claim 6, and the Traverse Displacement Unit of said scrubber includes a traversing push arm, and this traversing push arm is positioned at a side of each liquid tank, each push rod and the vertical side that is connected and is positioned at liquid tank of this traversing push arm.

8. sheet screening machine is characterized in that under the wafer as claimed in claim 7, and said mechanical arm is a kind of mechanical arm of six shaft types.

Images