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CN102495239A - Device for simulating front-end technology by oscilloscope microwave thin film circuit - Google Patents

Device for simulating front-end technology by oscilloscope microwave thin film circuit Download PDF

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Publication number
CN102495239A
CN102495239A CN2011104102138A CN201110410213A CN102495239A CN 102495239 A CN102495239 A CN 102495239A CN 2011104102138 A CN2011104102138 A CN 2011104102138A CN 201110410213 A CN201110410213 A CN 201110410213A CN 102495239 A CN102495239 A CN 102495239A
Authority
CN
China
Prior art keywords
technology
thin film
microwave
film circuit
oscillograph
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011104102138A
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Chinese (zh)
Inventor
宋云衢
刘利伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIANGSU LVYANG ELECTRONIC INSTRUMENT GROUP CO Ltd
Original Assignee
JIANGSU LVYANG ELECTRONIC INSTRUMENT GROUP CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIANGSU LVYANG ELECTRONIC INSTRUMENT GROUP CO Ltd filed Critical JIANGSU LVYANG ELECTRONIC INSTRUMENT GROUP CO Ltd
Priority to CN2011104102138A priority Critical patent/CN102495239A/en
Publication of CN102495239A publication Critical patent/CN102495239A/en
Pending legal-status Critical Current

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Abstract

The invention provides a front-end technology simulated by an oscilloscope microwave thin film circuit. An ultrathin line circuit graph is made on a ceramic substrate by adopting a semiconductor manufacturing process; and a function of simulating a front end by an oscilloscope is realized by integrating a resistor and a microwave capacitor on the substrate. According to the technology, the volume of the simulated front end can be reduced effectively, interference among levels of the simulated front end is reduced, and extremely high processing precision can be realized; furthermore, the high-frequency performance is much higher than that of a printed circuit board (PCB) process; and the problems of high-frequency signal loss, distortion and the like are solved.

Description

A kind of device of oscillograph microwave thin film circuit AFE(analog front end) technology
Technical field
The present invention proposes a kind of oscillograph microwave thin film circuit AFE(analog front end) technology, and signal condition work such as the amplification of realization high-bandwidth signals, decay, impedance transformation, filtering belong to the signal Processing field.
Background technology
Conventional oscillograph AFE(analog front end) adopts traditional P CB technology usually, and its shortcoming is that the relative dielectric constant high frequency is unstable, and volume is big, and crosstalking between each grade is big, and high frequency characteristics is poor; Along with science and technology is constantly progressive, traditional technology has satisfied not the demand that modernized high request is measured.A kind of oscillograph microwave thin film circuit AFE(analog front end) technology that the present invention proposes well solves these problems.
Summary of the invention
The technical matters that the present invention will solve is to adopt the oscillograph AFE(analog front end) of traditional PCB technology to exist the relative dielectric constant high frequency unstable, and volume is big, and crosstalking between each grade is big, the shortcoming of high frequency characteristics difference.
For realizing the foregoing invention purpose; The present invention proposes a kind of device of oscillograph microwave thin film circuit AFE(analog front end) technology; It is characterized in that: adopt semiconductor fabrication process on ceramic substrate, to make the superfine line circuitous pattern, integrated resistor, microwave capacitors device are accomplished oscillograph AFE(analog front end) function on this substrate simultaneously.
Said ceramic substrate is aluminium oxide ceramic substrate or aluminium nitride ceramics substrate or beryllium oxide ceramics substrate.
Said microwave capacitors device adopts the multi-layer ceramics burning techniques.
The present invention is than the advantage of prior art: use ceramic bases can effectively reduce the volume of AFE(analog front end); Reduce crosstalking between each grade of AFE(analog front end); Can realize fabulous machining precision; Can realize the high frequency performance more much higher, solve problems such as high-frequency signal is lost, distortion than PCB technology.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Embodiment
The present invention proposes a kind of device of oscillograph microwave thin film circuit AFE(analog front end) technology, and this technology adopts semiconductor fabrication process, through magnetron sputtering; Graphical photoetching, the dry method wet etching is electroplated technologies such as thickening; (aluminium oxide, aluminium nitride, beryllia etc.) are made the superfine line circuitous pattern on ceramic substrate; While integrated resistor on substrate, microwave capacitors device are accomplished oscillograph AFE(analog front end) function.
Wherein the microwave capacitors device is based on the multi-layer ceramics burning techniques.In process of production, metal alloy electrodes layer and low-loss ceramic insulating layer of multilayer high conductivity are staggered, thereby obtain needed capacitance.Then, synthetic lamination is carried out high-temperature firing, sinter it into single chip architecture.This technology satisfies the needs of high capacity radio-frequency capacitor and high power capacitor well.

Claims (5)

1. the device of oscillograph microwave thin film circuit AFE(analog front end) technology; It is characterized in that: adopt semiconductor fabrication process on ceramic substrate, to make the superfine line circuitous pattern, integrated resistor, microwave capacitors device are accomplished oscillograph AFE(analog front end) function on this substrate simultaneously.
2. the device of oscillograph microwave thin film circuit AFE(analog front end) technology as claimed in claim 1 is characterized in that said ceramic substrate is an aluminium oxide ceramic substrate.
3. the device of oscillograph microwave thin film circuit AFE(analog front end) technology as claimed in claim 1 is characterized in that said ceramic substrate is the aluminium nitride ceramics substrate.
4. the device of oscillograph microwave thin film circuit AFE(analog front end) technology as claimed in claim 1 is characterized in that said ceramic substrate is the beryllium oxide ceramics substrate.
5. the device of oscillograph microwave thin film circuit AFE(analog front end) technology as claimed in claim 1 is characterized in that said microwave capacitors device adopts the multi-layer ceramics burning techniques.
CN2011104102138A 2011-12-12 2011-12-12 Device for simulating front-end technology by oscilloscope microwave thin film circuit Pending CN102495239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011104102138A CN102495239A (en) 2011-12-12 2011-12-12 Device for simulating front-end technology by oscilloscope microwave thin film circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011104102138A CN102495239A (en) 2011-12-12 2011-12-12 Device for simulating front-end technology by oscilloscope microwave thin film circuit

Publications (1)

Publication Number Publication Date
CN102495239A true CN102495239A (en) 2012-06-13

Family

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Family Applications (1)

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CN2011104102138A Pending CN102495239A (en) 2011-12-12 2011-12-12 Device for simulating front-end technology by oscilloscope microwave thin film circuit

Country Status (1)

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CN (1) CN102495239A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105548695A (en) * 2014-11-03 2016-05-04 江苏绿扬电子仪器集团有限公司 Realization system for microwave frequency channel

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100275177A1 (en) * 2006-11-24 2010-10-28 Hynix Semiconductor Inc. Method for transferring self-assembled dummy pattern to substrate
TW201119001A (en) * 2009-11-09 2011-06-01 Taiwan Semiconductor Mfg Through-silicon via structure and a process for forming the same
CN102110673A (en) * 2010-10-27 2011-06-29 中国科学院上海微系统与信息技术研究所 Wafer level MMCM (microwave multichip module) packaging structure using photosensitive BCB (benzocyclobutene) as dielectric layer and method
CN101788578B (en) * 2009-12-25 2012-07-04 北京普源精电科技有限公司 Oscilloscope with front end analog circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100275177A1 (en) * 2006-11-24 2010-10-28 Hynix Semiconductor Inc. Method for transferring self-assembled dummy pattern to substrate
TW201119001A (en) * 2009-11-09 2011-06-01 Taiwan Semiconductor Mfg Through-silicon via structure and a process for forming the same
CN101788578B (en) * 2009-12-25 2012-07-04 北京普源精电科技有限公司 Oscilloscope with front end analog circuit
CN102110673A (en) * 2010-10-27 2011-06-29 中国科学院上海微系统与信息技术研究所 Wafer level MMCM (microwave multichip module) packaging structure using photosensitive BCB (benzocyclobutene) as dielectric layer and method

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
宋毅: "《国家产业技术政策研究报告》", 31 October 2003, 中国社会科学出版社 *
陵国权等: "《电子信息研究 信息技术 2002》", 31 December 2002, 信息产业部科学技术司等 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105548695A (en) * 2014-11-03 2016-05-04 江苏绿扬电子仪器集团有限公司 Realization system for microwave frequency channel

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Application publication date: 20120613