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Surface-field-induced feature in the quantum yield of silicon near 3.5 eV

Jon Geist, James L. Gardner, and Frank J. Wilkinson
Phys. Rev. B 42, 1262 – Published 15 July 1990
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Abstract

A broad feature near 3.5 eV was observed in the internal quantum-efficiency spectra of various silicon photodiodes. This appears to be the first time this feature has been reported. The feature was clearly resolved in spectra from photodiodes with strong surface fields at the oxide-silicon interface, but was small enough to preclude observation in a previously published spectrum of field-free silicon. The feature is attributed to a local maximum in the quantum yield for electron-hole pair production that is expected at direct transitions in the vicinity of the Γ point in the silicon Brillouin zone. Qualitative arguments suggest that the magnitude of the feature increases with increasing surface field due to field-assisted impact ionization, and in the case of depleted surfaces, also due to band-gap narrowing in the surface-depletion region.

  • Received 18 January 1990

DOI:https://doi.org/10.1103/PhysRevB.42.1262

©1990 American Physical Society

Authors & Affiliations

Jon Geist

  • National Institute of Standards and Technology, Gaithersburg, Maryland 20899

James L. Gardner and Frank J. Wilkinson

  • Commonwealth Scientific and Industrial Research Organization, Division of Applied Physics, Sydney, Australia

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Issue

Vol. 42, Iss. 2 — 15 July 1990

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