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"Characterization of charge trapping in ..."

Giuseppina Puzzilli et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.01.040

access: closed

type: Journal Article

metadata version: 2020-02-22

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Giuseppina Puzzilli, Bogdan Govoreanu, Fernanda Irrera, Maarten Rosmeulen, Jan Van Houdt:
Characterization of charge trapping in SiO₂/Al₂O₃ dielectric stacks by pulsed C-V technique. Microelectron. Reliab. 47(4-5): 508-512 (2007)

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