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2020 – today
- 2021
[j8]Hamideh Rostami
, Jakey Blue, Argon Chen, Claude Yugma:
Equipment deterioration modeling and cause diagnosis in semiconductor manufacturing. Int. J. Intell. Syst. 36(6): 2618-2638 (2021)- 2020
- [j7]Wei-Ting Yang, Jakey Blue, Agnès Roussy, Jacques Pinaton, Marco S. Reis:
A physics-informed Run-to-Run control framework for semiconductor manufacturing. Expert Syst. Appl. 155: 113424 (2020) - [j6]Wei-Ting Yang, Jakey Blue, Agnès Roussy, Jacques Pinaton, Marco S. Reis:
A Structure Data-Driven Framework for Virtual Metrology Modeling. IEEE Trans Autom. Sci. Eng. 17(3): 1297-1306 (2020)
2010 – 2019
- 2018
- [j5]Hamideh Rostami, Jakey Blue, Claude Yugma:
Automatic equipment fault fingerprint extraction for the fault diagnostic on the batch process data. Appl. Soft Comput. 68: 972-989 (2018) - [j4]Yu-Ting Kao, Stéphane Dauzère-Pérès, Jakey Blue, Shi-Chung Chang:
Impact of integrating equipment health in production scheduling for semiconductor fabrication. Comput. Ind. Eng. 120: 450-459 (2018) - [c7]Hamideh Rostami, Jakey Blue, Argon Chen, Claude Yugma:
Equipment Deterioration Modeling and Causes Diagnosis in Semiconductor Manufacturing. CASE 2018: 1316-1321 - [c6]Wei-Ting Yang, Jakey Blue, Agnès Roussy, Marco S. Reis, Jacques Pinaton:
Virtual Metrology Modeling based on Gaussian Bayesian Network. WSC 2018: 3574-3582 - [c5]Aabir Chouichi, Jakey Blue, Claude Yugma, François Pasqualini:
The Detection and the control of Machine/Chamber Mismatching in Semiconductormanufacturing. WSC 2018: 3583-3591 - 2017
- [j3]Tiago J. Rato, Jakey Blue, Jacques Pinaton, Marco S. Reis:
Translation-Invariant Multiscale Energy-Based PCA for Monitoring Batch Processes in Semiconductor Manufacturing. IEEE Trans Autom. Sci. Eng. 14(2): 894-904 (2017) - 2016
- [c4]Hamideh Rostami, Jakey Blue, Claude Yugma:
Equipment Condition Diagnosis and Fault Fingerprint Extraction in Semiconductor Manufacturing. ICMLA 2016: 534-539 - [c3]Jakey Blue, Agnès Roussy, Jacques Pinaton:
Run-to-Run sensor variation monitoring for process fault diagnosis in semiconductor manufacturing. WSC 2016: 2523-2534 - 2015
- [j2]Claude Yugma, Jakey Blue, Stéphane Dauzère-Pérès, Ali Obeid:
Integration of scheduling and advanced process control in semiconductor manufacturing: review and outlook. J. Sched. 18(2): 195-205 (2015) - 2014
- [c2]Claude Yugma, Jakey Blue, Stéphane Dauzère-Pérès, Philippe Vialletelle:
Integration of scheduling and advanced process control in semiconductor manufacturing: review and outlook. CASE 2014: 93-98 - 2011
- [j1]Jakey Blue, Argon Chen:
Spatial Variance Spectrum Analysis and Its Application to Unsupervised Detection of Systematic Wafer Spatial Variations. IEEE Trans Autom. Sci. Eng. 8(1): 56-66 (2011)
2000 – 2009
- 2009
- [c1]Argon Chen, Sean Hsueh, Jakey Blue:
Optimum sampling for track PEB CD Integrated Metrology. CASE 2009: 439-442
Coauthor Index
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