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Mordechai Rothschild

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2010 – 2019

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2015
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Kenneth W. Allen, Vladimir Liberman, Mordechai Rothschild, Nicholaos I. Limberopoulos, Dennis E. Walker, Augustine M. Urbas, Vasily N. Astratov:
Deep-UV microsphere-assisted ultramicroscopy. ICTON 2015: 1-4

2000 – 2009

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2001
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A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes:
Review of technology for 157-nm lithography. IBM J. Res. Dev. 45(5): 605-614 (2001)

1990 – 1999

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1997
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Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek:
Lithography at a wavelength of 193 nm. IBM J. Res. Dev. 41(1&2): 49-56 (1997)

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